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1. 发明申请

US20080291419A1 PROJECTION OBJECTIVE FOR IMMERSION LITHOGRAPHY 审中-公开
公开(公告)号：US20080291419A1
公开(公告)日：2008-11-27
申请号：US12187116
申请日：2008-08-06
申请人： Karl-Stefan Weissenrieder , Alexander Hirnet , Alexandra Pazidis , Karl-Heinz Schuster , Christoph Zaczek , Michael Lill , Patrick Scheible , Guenter Scheible , Harald Schink , Markus Brotsack , Ulrich Loering , Toralf Gruner , Sigrid Scheible
发明人： Karl-Stefan Weissenrieder , Alexander Hirnet , Alexandra Pazidis , Karl-Heinz Schuster , Christoph Zaczek , Michael Lill , Patrick Scheible , Guenter Scheible , Harald Schink , Markus Brotsack , Ulrich Loering , Toralf Gruner , Sigrid Scheible
IPC分类号： G03B27/54 , G03B27/32
CPC分类号： G03F7/70983 , G03F7/70341
摘要： In a projection objective provided for imaging a pattern arranged in an object plane of the projection objective into an image plane of the projection objective with the aid of an immersion medium arranged between a last optical element of the projection objective in the light path and the image plane, the last optical element has a transparent substrate and a protective layer system that is fitted to the substrate, is provided for contact with the immersion medium and serves for increasing the resistance of the last optical element to degradation caused by the immersion medium.

2. 发明申请

US20050225737A1 Projection objective for immersion lithography 有权
标题翻译：浸没光刻的投影目标
公开(公告)号：US20050225737A1
公开(公告)日：2005-10-13
申请号：US11015553
申请日：2004-12-20
申请人： Karl-Stefan Weissenrieder , Alexander Hirnet , Alexandra Pazidis , Karl-Heinz Schuster , Christoph Zaczek , Michael Lill , Patrick Scheible , Harald Schink , Markus Brotsack , Ulrich Loering , Toralf Gruner , Guenter Scheible
发明人： Karl-Stefan Weissenrieder , Alexander Hirnet , Alexandra Pazidis , Karl-Heinz Schuster , Christoph Zaczek , Michael Lill , Patrick Scheible , Harald Schink , Markus Brotsack , Ulrich Loering , Toralf Gruner , Guenter Scheible
IPC分类号： G03B27/42 , G03F7/20
CPC分类号： G03F7/70983 , G03F7/70341
摘要： In a projection objective provided for imaging a pattern arranged in an object plane of the projection objective into an image plane of the projection objective with the aid of an immersion medium arranged between a last optical element of the projection objective in the light path and the image plane, the last optical element has a transparent substrate and a protective layer system that is fitted to the substrate, is provided for contact with the immersion medium and serves for increasing the resistance of the last optical element to degradation caused by the immersion medium.
摘要翻译：在投影物镜中，借助于设置在光路中的投影物镜的最后一个光学元件与图像之间的浸没介质，将布置在投影物镜的物平面中的图案成像到投影物镜的像平面中平面，最后一个光学元件具有透明基板和与基板相配合的保护层系统，用于与浸没介质接触，用于增加最后一个光学元件对浸入介质引起的劣化的电阻。

3. 发明申请

US20110222043A1 MICROLITHOGRAPHIC PROJECTION EXPOSURE APPARATUS 有权
标题翻译：微波投影曝光装置
公开(公告)号：US20110222043A1
公开(公告)日：2011-09-15
申请号：US13112357
申请日：2011-05-20
申请人： Vladimir Kamenov , Daniel Kraehmer , Toralf Gruner , Karl-Stefan Weissenrieder , Heiko Feldmann , Achim Zirkel , Alexandra Pazidis , Bruno Thome , Stephan Six
发明人： Vladimir Kamenov , Daniel Kraehmer , Toralf Gruner , Karl-Stefan Weissenrieder , Heiko Feldmann , Achim Zirkel , Alexandra Pazidis , Bruno Thome , Stephan Six
IPC分类号： G03B27/72
CPC分类号： G02B1/11 , G03F7/70191 , G03F7/70308 , G03F7/70958
摘要： The disclosure relates to a microlithographic projection exposure apparatus, such as are used for the production of large-scale integrated electrical circuits and other microstructured components. The disclosure relates in particular to coatings of optical elements in order to increase or reduce the reflectivity.
摘要翻译：本公开涉及一种微光刻投影曝光装置，例如用于生产大型集成电路和其它微结构元件的微光投影曝光装置。本公开特别涉及光学元件的涂层以增加或降低反射率。

4. 发明授权

US09733395B2 Microlithographic projection exposure apparatus 有权
公开(公告)号：US09733395B2
公开(公告)日：2017-08-15
申请号：US13112357
申请日：2011-05-20
申请人： Vladimir Kamenov , Daniel Kraehmer , Toralf Gruner , Karl-Stefan Weissenrieder , Heiko Feldmann , Achim Zirkel , Alexandra Pazidis , Bruno Thome , Stephan Six
发明人： Vladimir Kamenov , Daniel Kraehmer , Toralf Gruner , Karl-Stefan Weissenrieder , Heiko Feldmann , Achim Zirkel , Alexandra Pazidis , Bruno Thome , Stephan Six
IPC分类号： G03B27/68 , G02B1/11 , G03F7/20
CPC分类号： G02B1/11 , G03F7/70191 , G03F7/70308 , G03F7/70958
摘要： The disclosure relates to a microlithographic projection exposure apparatus, such as are used for the production of large-scale integrated electrical circuits and other microstructured components. The disclosure relates in particular to coatings of optical elements in order to increase or reduce the reflectivity.

5. 发明申请

US20080297754A1 Microlithographic projection exposure apparatus 审中-公开
标题翻译：微光刻投影曝光装置
公开(公告)号：US20080297754A1
公开(公告)日：2008-12-04
申请号：US12031595
申请日：2008-02-14
申请人： Vladimir Kamenov , Daniel Kraehmer , Toralf Gruner , Karl-Stefan Weissenrieder , Heiko Feldmann , Achim Zirkel , Alexandra Pazidis , Bruno Thome , Stephan Six
发明人： Vladimir Kamenov , Daniel Kraehmer , Toralf Gruner , Karl-Stefan Weissenrieder , Heiko Feldmann , Achim Zirkel , Alexandra Pazidis , Bruno Thome , Stephan Six
IPC分类号： G03B27/54 , G02B5/00
CPC分类号： G02B1/11 , G03F7/70191 , G03F7/70308 , G03F7/70958
摘要： The disclosure relates to a microlithographic projection exposure apparatus, such as are used for the production of large-scale integrated electrical circuits and other microstructured components. The disclosure relates in particular to coatings of optical elements in order to increase or reduce the reflectivity.
摘要翻译：本公开涉及一种微光刻投影曝光装置，例如用于生产大型集成电路和其它微结构元件的微光投影曝光装置。本公开特别涉及光学元件的涂层以增加或降低反射率。

6. 发明授权

US08435726B2 Method of processing an optical element and an optical element, in particular for a microlithographic projection exposure apparatus 有权
标题翻译：特别是用于微光刻投影曝光装置的光学元件和光学元件的处理方法
公开(公告)号：US08435726B2
公开(公告)日：2013-05-07
申请号：US12135781
申请日：2008-06-09
申请人： Alexandra Pazidis , Christoph Zaczek , Alexander Hirnet , Herbert Fink , Dieter Schmerek
发明人： Alexandra Pazidis , Christoph Zaczek , Alexander Hirnet , Herbert Fink , Dieter Schmerek
IPC分类号： G02B3/00
CPC分类号： G03F7/70958
摘要： A method of processing an optical element which has a substrate (110) and a layer system (120) applied to the substrate (110), wherein the layer system (120) in a starting condition has a plurality of volume defects (130), wherein the method includes at least partially filling at least one of the volume defects (130) with a filling material (140). Also disclosed is an associated method of manufacturing an optical element.
摘要翻译：一种处理光学元件的方法，所述光学元件具有施加到所述衬底（110）上的衬底（110）和层系统（120），其中处于起始状态的层系统（120）具有多个体积缺陷（130），其中所述方法包括用填充材料（140）至少部分地填充所述体积缺陷（130）中的至少一个。还公开了一种制造光学元件的相关方法。

7. 发明授权

US08928980B2 Micromirror arrangement having a coating and method for the production thereof 有权
标题翻译：具有涂层的微镜布置及其制造方法
公开(公告)号：US08928980B2
公开(公告)日：2015-01-06
申请号：US13350719
申请日：2012-01-13
申请人： Karl-Stefan Weissenrieder , Roland Loercher , Alexandra Pazidis
发明人： Karl-Stefan Weissenrieder , Roland Loercher , Alexandra Pazidis
IPC分类号： G02B1/10 , G03F7/20
CPC分类号： G03F7/70958 , G03F7/70291
摘要： A micromirror arrangement (1) having: at least one micromirror (3) having a reflective surface (11) formed at a mirror substrate (2), and an antireflective coating (7) formed at the mirror substrate (2) outside the reflective surface (11). A reflective coating (8) is formed within the reflective surface (11) and has at least two layer subsystems, wherein the first layer subsystem has layers (8e, 8f) composed of a periodic sequence of alternate high and low refractive index layers composed of a nonmetallic material and is optimized with regard to the reflectivity in respect of a used wavelength of the micromirror arrangement, and wherein the second layer subsystem is optimized with regard to the reflectivity in respect of a measurement wavelength of the micromirror arrangement, said measurement wavelength deviating from the used wavelength.
摘要翻译：一种微镜装置（1），具有：具有形成在反射镜基板（2）上的反射表面（11）的至少一个微反射镜（3）和形成在所述反射镜基板（2）的反射表面外侧的抗反射涂层（11）。反射涂层（8）形成在反射表面（11）内，并且具有至少两个层子系统，其中第一层子系统具有层（8e，8f），层（8e，8f）由周期性序列组成，交替的高低折射率层由非金属材料，并且关于微镜装置的使用波长的反射率被优化，并且其中关于微镜装置的测量波长的反射率优化第二层子系统，所述测量波长偏离从使用的波长。

8. 发明申请

US20070242250A1 Objective with crystal lenses 审中-公开
标题翻译：目标水晶镜片
公开(公告)号：US20070242250A1
公开(公告)日：2007-10-18
申请号：US11765200
申请日：2007-06-19
申请人： Aksel Goehnermeier , Alexandra Pazidis , Birgit Kuerz , Christoph Zaczek , Daniel Kraehmer
发明人： Aksel Goehnermeier , Alexandra Pazidis , Birgit Kuerz , Christoph Zaczek , Daniel Kraehmer
IPC分类号： G02B27/28 , G03B27/52 , H01L21/00
CPC分类号： G02B1/02 , G02B1/08 , G02B5/3083 , G02B13/14 , G02B27/0043 , G02B27/286 , G03F7/70225 , G03F7/70241 , G03F7/70566 , G03F7/70958 , G03F7/70966
摘要： Objective, in particular a projection objective for a microlithography projection-exposure installation, with at least one fluoride crystal lens. A reduction in the detrimental influence of birefringence is achieved if this lens is a (100)-lens with a lens axis which is approximately perpendicular to the {100} crystallographic planes or to the crystallographic planes equivalent thereto of the fluoride crystal. In the case of objectives with at least two fluoride crystal lenses, it is favorable if the fluoride crystal lenses are arranged such that they are rotated with respect to one another. The lens axes of the fluoride crystal lenses may in this case point not only in the crystallographic direction but also in the crystallographic direction or in the crystallographic direction. A further reduction in the detrimental influence of birefringence is achieved by the simultaneous use of groups with (100)-lenses rotated with respect to one another and groups with (111)-lenses or (110)-lenses rotated with respect to one another. A further reduction in the detrimental influence of birefringence is obtained by covering an optical element with a compensation coating.
摘要翻译：目的，特别是具有至少一种氟化物晶体透镜的微光刻投影曝光装置的投影物镜。如果该透镜是具有近似垂直于{100}晶面的透镜轴或与氟化物晶体相当的结晶平面的透镜轴，则实现双折射的有害影响的减小。在具有至少两个氟化物晶体透镜的物镜的情况下，如果将氟化物晶体透镜相对于彼此旋转布置是有利的。在这种情况下，氟化物晶体透镜的透镜轴不仅在<100>晶体方向，而且在<111>晶体方向或<110>晶体方向。双折射的有害影响的进一步减少是通过同时使用具有相对于彼此旋转的（100） - 相的组和具有相对于彼此旋转的（111） - 透镜或（110）相的组而实现的。通过用补偿涂层覆盖光学元件来获得双折射的有害影响的进一步减少。

9. 发明授权

US07239447B2 Objective with crystal lenses 有权
标题翻译：目标水晶镜片
公开(公告)号：US07239447B2
公开(公告)日：2007-07-03
申请号：US10931745
申请日：2004-09-01
申请人： Aksel Goehnermeier , Alexandra Pazidis , Birgit Kuerz , Christoph Zaczek , Daniel Kraehmer
发明人： Aksel Goehnermeier , Alexandra Pazidis , Birgit Kuerz , Christoph Zaczek , Daniel Kraehmer
IPC分类号： G02B5/30
CPC分类号： G02B1/02 , G02B1/08 , G02B5/3083 , G02B13/14 , G02B27/0043 , G02B27/286 , G03F7/70225 , G03F7/70241 , G03F7/70566 , G03F7/70958 , G03F7/70966
摘要： An objective, in particular a projection objective for a microlithography projection-exposure installation, with at least one fluoride crystal lens is disclosed. A reduction in the detrimental influence of birefringence is achieved if this lens is a (100)-lens with a lens axis which is approximately perpendicular to the {100} crystallographic planes or to the crystallographic planes equivalent thereto of the fluoride crystal. A further reduction in the detrimental influence of birefringence is obtained by covering an optical element with a compensation coating.
摘要翻译：公开了具有至少一种氟化物晶体透镜的目的，特别是用于微光刻投影曝光装置的投影物镜。如果该透镜是具有近似垂直于{100}晶面的透镜轴或与氟化物晶体相当的结晶平面的透镜轴，则实现双折射的有害影响的减小。通过用补偿涂层覆盖光学元件来获得双折射的有害影响的进一步减少。

10. 发明授权

US08605257B2 Projection system with compensation of intensity variations and compensation element therefor 有权
标题翻译：具有强度变化补偿和补偿要素的投影系统
公开(公告)号：US08605257B2
公开(公告)日：2013-12-10
申请号：US11628356
申请日：2005-06-03
申请人： Alexandra Pazidis , Reiner Garreis , Michael Totzeck , Heiko Feldmann , Paul Graeupner , Hans-Juergen Rostalski , Wolfgang Singer , Guenter Scheible , Sigrid Scheible
发明人： Patrick Scheible , Alexandra Pazidis , Reiner Garreis , Michael Totzeck , Heiko Feldmann , Paul Graeupner , Hans-Juergen Rostalski , Wolfgang Singer
IPC分类号： G03B27/72 , G03B27/68
CPC分类号： G02B13/02 , G02B17/0812 , G02B17/0892 , G03F7/70308
摘要： In a projection objective for imaging a pattern arranged in the object plane of the projection objective into the image plane of the projection objective, at least one optical component is provided which has a substrate in which at least one substrate surface is covered with an interference layer system having a great spatial modulation of the reflectance and/or of the transmittance over a usable cross section of the optical component, the modulation being adapted to a spatial transmission distribution of the remaining components of the projection objective in such a way that an intensity distribution of the radiation that is measured in a pupil surface has a substantially reduced spatial modulation in comparison with a projection objective without the interference layer system.
摘要翻译：在将投影物镜的物平面中布置的图案成像到投影物镜的像平面中的投影物镜中，提供至少一个光学部件，该光学元件具有基板，其中至少一个基板表面被干涉层覆盖系统具有在光学部件的可用横截面上的反射率和/或透射率的大的空间调制，该调制适于投射物镜的其余部件的空间传输分布，使得强度分布与没有干涉层系统的投射物镜相比，在瞳孔表面中测量的辐射具有显着降低的空间调制。

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