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1. 发明申请

US20050157401A1 Objective with crystal lenses 有权
标题翻译：目标水晶镜片
公开(公告)号：US20050157401A1
公开(公告)日：2005-07-21
申请号：US10931745
申请日：2004-09-01
申请人： Aksel Goehnermeier , Alexandra Pazidis , Birgit Kuerz , Christoph Zaczek , Daniel Kraehmer
发明人： Aksel Goehnermeier , Alexandra Pazidis , Birgit Kuerz , Christoph Zaczek , Daniel Kraehmer
IPC分类号： G02B1/02 , G02B5/30 , G03F7/20 , G02B21/02
CPC分类号： G02B1/02 , G02B1/08 , G02B5/3083 , G02B13/14 , G02B27/0043 , G02B27/286 , G03F7/70225 , G03F7/70241 , G03F7/70566 , G03F7/70958 , G03F7/70966
摘要： Objective, in particular a projection objective for a microlithography projection-exposure installation, with at least one fluoride crystal lens. A reduction in the detrimental influence of birefringence is achieved if this lens is a (100)-lens with a lens axis which is approximately perpendicular to the {100} crystallographic planes or to the crystallographic planes equivalent thereto of the fluoride crystal. In the case of objectives with at least two fluoride crystal lenses, it is favorable if the fluoride crystal lenses are arranged such that they are rotated with respect to one another. The lens axes of the fluoride crystal lenses may in this case point not only in the crystallographic direction but also in the crystallographic direction or in the crystallographic direction. A further reduction in the detrimental influence of birefringence is achieved by the simultaneous use of groups with (100)-lenses rotated with respect to one another and groups with (111)-lenses or (110)-lenses rotated with respect to one another. A further reduction in the detrimental influence of birefringence is obtained by covering an optical element with a compensation coating.
摘要翻译：目的，特别是具有至少一种氟化物晶体透镜的微光刻投影曝光装置的投影物镜。如果该透镜是具有近似垂直于{100}晶面的透镜轴或与氟化物晶体相当的结晶平面的透镜轴，则实现双折射的有害影响的减小。在具有至少两个氟化物晶体透镜的物镜的情况下，如果将氟化物晶体透镜相对于彼此旋转布置是有利的。在这种情况下，氟化物晶体透镜的透镜轴不仅在<100>晶体方向，而且在<111>晶体方向或<110>晶体方向。双折射的有害影响的进一步减少是通过同时使用具有相对于彼此旋转的（100） - 相的组和具有相对于彼此旋转的（111） - 透镜或（110）相的组而实现的。通过用补偿涂层覆盖光学元件来获得双折射的有害影响的进一步减少。

2. 发明申请

US20070242250A1 Objective with crystal lenses 审中-公开
标题翻译：目标水晶镜片
公开(公告)号：US20070242250A1
公开(公告)日：2007-10-18
申请号：US11765200
申请日：2007-06-19
申请人： Aksel Goehnermeier , Alexandra Pazidis , Birgit Kuerz , Christoph Zaczek , Daniel Kraehmer
发明人： Aksel Goehnermeier , Alexandra Pazidis , Birgit Kuerz , Christoph Zaczek , Daniel Kraehmer
IPC分类号： G02B27/28 , G03B27/52 , H01L21/00
CPC分类号： G02B1/02 , G02B1/08 , G02B5/3083 , G02B13/14 , G02B27/0043 , G02B27/286 , G03F7/70225 , G03F7/70241 , G03F7/70566 , G03F7/70958 , G03F7/70966
摘要： Objective, in particular a projection objective for a microlithography projection-exposure installation, with at least one fluoride crystal lens. A reduction in the detrimental influence of birefringence is achieved if this lens is a (100)-lens with a lens axis which is approximately perpendicular to the {100} crystallographic planes or to the crystallographic planes equivalent thereto of the fluoride crystal. In the case of objectives with at least two fluoride crystal lenses, it is favorable if the fluoride crystal lenses are arranged such that they are rotated with respect to one another. The lens axes of the fluoride crystal lenses may in this case point not only in the crystallographic direction but also in the crystallographic direction or in the crystallographic direction. A further reduction in the detrimental influence of birefringence is achieved by the simultaneous use of groups with (100)-lenses rotated with respect to one another and groups with (111)-lenses or (110)-lenses rotated with respect to one another. A further reduction in the detrimental influence of birefringence is obtained by covering an optical element with a compensation coating.
摘要翻译：目的，特别是具有至少一种氟化物晶体透镜的微光刻投影曝光装置的投影物镜。如果该透镜是具有近似垂直于{100}晶面的透镜轴或与氟化物晶体相当的结晶平面的透镜轴，则实现双折射的有害影响的减小。在具有至少两个氟化物晶体透镜的物镜的情况下，如果将氟化物晶体透镜相对于彼此旋转布置是有利的。在这种情况下，氟化物晶体透镜的透镜轴不仅在<100>晶体方向，而且在<111>晶体方向或<110>晶体方向。双折射的有害影响的进一步减少是通过同时使用具有相对于彼此旋转的（100） - 相的组和具有相对于彼此旋转的（111） - 透镜或（110）相的组而实现的。通过用补偿涂层覆盖光学元件来获得双折射的有害影响的进一步减少。

3. 发明授权

US07239447B2 Objective with crystal lenses 有权
标题翻译：目标水晶镜片
公开(公告)号：US07239447B2
公开(公告)日：2007-07-03
申请号：US10931745
申请日：2004-09-01
申请人： Aksel Goehnermeier , Alexandra Pazidis , Birgit Kuerz , Christoph Zaczek , Daniel Kraehmer
发明人： Aksel Goehnermeier , Alexandra Pazidis , Birgit Kuerz , Christoph Zaczek , Daniel Kraehmer
IPC分类号： G02B5/30
CPC分类号： G02B1/02 , G02B1/08 , G02B5/3083 , G02B13/14 , G02B27/0043 , G02B27/286 , G03F7/70225 , G03F7/70241 , G03F7/70566 , G03F7/70958 , G03F7/70966
摘要： An objective, in particular a projection objective for a microlithography projection-exposure installation, with at least one fluoride crystal lens is disclosed. A reduction in the detrimental influence of birefringence is achieved if this lens is a (100)-lens with a lens axis which is approximately perpendicular to the {100} crystallographic planes or to the crystallographic planes equivalent thereto of the fluoride crystal. A further reduction in the detrimental influence of birefringence is obtained by covering an optical element with a compensation coating.
摘要翻译：公开了具有至少一种氟化物晶体透镜的目的，特别是用于微光刻投影曝光装置的投影物镜。如果该透镜是具有近似垂直于{100}晶面的透镜轴或与氟化物晶体相当的结晶平面的透镜轴，则实现双折射的有害影响的减小。通过用补偿涂层覆盖光学元件来获得双折射的有害影响的进一步减少。

4. 发明授权

US08339575B2 Off-axis objectives with rotatable optical element 有权
标题翻译：带旋转光学元件的离轴物镜
公开(公告)号：US08339575B2
公开(公告)日：2012-12-25
申请号：US12206550
申请日：2008-09-08
申请人： Alexandra Pazidis , Aksel Goehnermeier
发明人： Alexandra Pazidis , Aksel Goehnermeier
IPC分类号： G02B7/02 , G03B27/32 , G03B27/42 , G03B27/54 , G03B27/72
CPC分类号： G03F7/70916 , G03F7/70308 , G03F7/70983
摘要： An objective and a method for operating an objective, in particular a projection objective or an illumination objective for microlithography for imaging a reticle onto a wafer, with a plurality of optical elements that are arranged along a ray path, wherein at least one optical element of a first kind (1) is provided, which is irradiated only partially by a ray bundle, wherein the one or more optical element(s) of the first kind are rotatably mounted or positionable about the optical axis or an axis parallel thereto, wherein, for each optical element of the first kind at least two mounting positions are provided, and wherein the rotation angle between the two mounting positions is defined by the surface (7) irradiated by the ray bundle such that, in the various mounting positions, the surfaces irradiated by the ray path do not overlap.
摘要翻译：一种用于操作物镜的目的和方法，特别是具有沿着光线路径布置的多个光学元件的用于将光罩成像到晶片上的微光刻的投影物镜或照明物镜，其中至少一个光学元件提供第一种（1），其仅部分地被射线束照射，其中第一类的一个或多个光学元件围绕光轴或平行于其的轴线可旋转地安装或定位，其中，对于第一种的每个光学元件，提供至少两个安装位置，并且其中两个安装位置之间的旋转角度被由射线束照射的表面（7）限定，使得在各种安装位置，表面由射线路径照射不重叠。

5. 发明申请

US20090073412A1 OFF-AXIS OBJECTIVES WITH ROTATABLE OPTICAL ELEMENT 有权
标题翻译：具有可旋转光学元件的偏轴目标
公开(公告)号：US20090073412A1
公开(公告)日：2009-03-19
申请号：US12206550
申请日：2008-09-08
申请人： Alexandra PAZIDIS , Aksel Goehnermeier
发明人： Alexandra PAZIDIS , Aksel Goehnermeier
IPC分类号： G03B27/54
CPC分类号： G03F7/70916 , G03F7/70308 , G03F7/70983
摘要： An objective and a method for operating an objective, in particular a projection objective or an illumination objective for microlithography for imaging a reticle onto a wafer, with a plurality of optical elements that are arranged along a ray path, wherein at least one optical element of a first kind (1) is provided, which is irradiated only partially by a ray bundle, wherein the one or more optical element(s) of the first kind are rotatably mounted or positionable about the optical axis or an axis parallel thereto, wherein, for each optical element of the first kind at least two mounting positions are provided, and wherein the rotation angle between the two mounting positions is defined by the surface (7) irradiated by the ray bundle such that, in the various mounting positions, the surfaces irradiated by the ray path do not overlap.
摘要翻译：一种用于操作物镜的目的和方法，特别是具有沿着光线路径布置的多个光学元件的用于将光罩成像到晶片上的微光刻的投影物镜或照明物镜，其中至少一个光学元件提供第一种（1），其仅部分地被射线束照射，其中第一类的一个或多个光学元件围绕光轴或平行于其的轴线可旋转地安装或定位，其中，对于第一种的每个光学元件，提供至少两个安装位置，并且其中两个安装位置之间的旋转角度被由射线束照射的表面（7）限定，使得在各种安装位置，表面由射线路径照射不重叠。

6. 发明申请

US20090059189A1 PELLICLE FOR USE IN A MICROLITHOGRAPHIC EXPOSURE APPARATUS 审中-公开
标题翻译：用于微波曝光装置的胶囊
公开(公告)号：US20090059189A1
公开(公告)日：2009-03-05
申请号：US11994747
申请日：2006-06-19
申请人： Aksel Goehnermeier , Alexandra Pazidis
发明人： Aksel Goehnermeier , Alexandra Pazidis
IPC分类号： G03B27/52 , F21V9/06 , G03B27/72
CPC分类号： G03F1/62 , G03F7/70308 , G03F7/70341
摘要： A pellicle for use in microlithographic exposure apparatus (10) has, for an operating wavelength of the apparatus, a maximum transmittance for light rays (56) that obliquely impinge on the pellicle (34; 134; 234). This ensures smaller variations of the transmittance over a broad range of angles of incidence, as it occurs in very high numerical aperture projection lenses.
摘要翻译：在微光刻曝光设备（10）中使用的防护薄膜组件对于设备的工作波长具有倾斜地撞击防护薄膜组件（34; 134; 234）上的光线（56）的最大透射率。这确保了在宽的入射角范围内的透射率的变化较小，因为它在非常高的数值孔径投影透镜中出现。

7. 发明授权

US09063439B2 Projection objective for microlithography with stray light compensation and related methods 有权
标题翻译：具有杂散光补偿和相关方法的微光刻的投影目标
公开(公告)号：US09063439B2
公开(公告)日：2015-06-23
申请号：US12624993
申请日：2009-11-24
申请人： Aksel Goehnermeier , Daniel Kraehmer , Vladimir Kamenov , Michael Totzeck
发明人： Aksel Goehnermeier , Daniel Kraehmer , Vladimir Kamenov , Michael Totzeck
IPC分类号： G03B27/68 , G03F7/20
CPC分类号： G03F7/70958 , G03F7/70308 , G03F7/70341 , G03F7/70591 , G03F7/70941
摘要： A projection objective for applications in microlithography, a microlithography projection exposure apparatus with a projection objective, a microlithographic manufacturing method for microstructured components, and a component manufactured using such a manufacturing method are disclosed. The projection objective includes an optical component configured so that, during use of the projection objective, the optical component generates a stray light component in the exposure field of the projection objective which adapts a parameter of the projection objective to a parameter of a second projection objective. The parameter is the stray light component at the exposure field of the projection objective and/or a variation of the stray light component at the exposure field of the projection objective. The parameter of the second projection objective is a stray light component at an exposure field of the second projection objective and/or a variation of the stray light component at the exposure field of the second projection objective. The second projection objective is different from the projection objective.
摘要翻译：公开了一种用于微光刻的投影物镜，具有投影物镜的微光刻投影曝光设备，微结构元件的微光刻制造方法以及使用这种制造方法制造的元件。投影物镜包括一个光学元件，其被构造成使得在投影物镜的使用期间，光学元件在投影物镜的曝光区域中产生杂散光分量，该投射物镜将投射物镜的参数适应于第二投影物镜的参数。该参数是在投影物镜的曝光场处的杂散光分量和/或投影物镜的曝光场处的杂散光分量的变化。第二投影物镜的参数是在第二投影物镜的曝光场处的杂散光分量和/或第二投影物镜的曝光场处的杂散光分量的变化。第二个投影目标与投影目标不同。

8. 发明授权

US07847921B2 Microlithographic exposure method as well as a projection exposure system for carrying out the method 有权
标题翻译：微光刻曝光方法以及用于实施该方法的投影曝光系统
公开(公告)号：US07847921B2
公开(公告)日：2010-12-07
申请号：US12177715
申请日：2008-07-22
申请人： Toralf Gruner , Daniel Kraehmer , Michael Totzeck , Johannes Wangler , Markus Brotsack , Nils Dieckmann , Aksel Goehnermeier , Markus Schwab , Damian Fiolka , Markus Zenzinger
发明人： Toralf Gruner , Daniel Kraehmer , Michael Totzeck , Johannes Wangler , Markus Brotsack , Nils Dieckmann , Aksel Goehnermeier , Markus Schwab , Damian Fiolka , Markus Zenzinger
IPC分类号： G03B27/72 , G03B27/54
CPC分类号： G03F7/70566 , G03F7/70108 , G03F7/70225 , G03F7/70308
摘要： In an exposure method for exposing a substrate which is arranged in the area of an image plane of a projection objective as well as in a projection exposure system for performing that method, output radiation directed at the substrate and having an output polarization state is produced. Through variable adjustment of the output polarization state with the aid of at least one polarization manipulation device, the output polarization state can be formed to approach a nominal output polarization state. The polarization manipulation can be performed in a control loop on the basis of polarization-optical measuring data.
摘要翻译：在用于曝光布置在投影物镜的像面的区域中的基板以及用于执行该方法的投影曝光系统中的曝光方法中，产生了指向基板并具有输出偏振态的输出辐射。通过借助于至少一个偏振操纵装置对输出偏振状态的可变调节，输出偏振状态可以形成为接近标称输出偏振状态。可以在基于偏振光学测量数据的控制回路中进行极化处理。

9. 发明授权

US08767181B2 Microlithographic exposure method as well as a projection exposure system for carrying out the method 有权
标题翻译：微光刻曝光方法以及用于实施该方法的投影曝光系统
公开(公告)号：US08767181B2
公开(公告)日：2014-07-01
申请号：US12946380
申请日：2010-11-15
申请人： Toralf Gruner , Daniel Kraehmer , Michael Totzeck , Johannes Wangler , Markus Brotsack , Nils Dieckmann , Aksel Goehnermeier , Markus Schwab , Damian Fiolka , Markus Zenzinger
发明人： Toralf Gruner , Daniel Kraehmer , Michael Totzeck , Johannes Wangler , Markus Brotsack , Nils Dieckmann , Aksel Goehnermeier , Markus Schwab , Damian Fiolka , Markus Zenzinger
IPC分类号： G03B27/72 , G03B27/54 , G03F7/20
CPC分类号： G03F7/70566 , G03F7/70108 , G03F7/70225 , G03F7/70308
摘要： In an exposure method for exposing a substrate which is arranged in the area of an image plane of a projection objective as well as in a projection exposure system for performing that method, output radiation directed at the substrate and having an output polarization state is produced. Through variable adjustment of the output polarization state with the aid of at least one polarization manipulation device, the output polarization state can be formed to approach a nominal output polarization state. The polarization manipulation can be performed in a control loop on the basis of polarization-optical measuring data.
摘要翻译：在用于曝光布置在投影物镜的像面的区域中的基板以及用于执行该方法的投影曝光系统中的曝光方法中，产生了指向基板并具有输出偏振态的输出辐射。通过借助于至少一个偏振操纵装置对输出偏振状态的可变调节，输出偏振状态可以形成为接近标称输出偏振状态。可以在基于偏振光学测量数据的控制回路中进行极化处理。

10. 发明申请

US20100079739A1 PROJECTION OBJECTIVE FOR MICROLITHOGRAPHY 有权
标题翻译：投影目标的微观算法
公开(公告)号：US20100079739A1
公开(公告)日：2010-04-01
申请号：US12624993
申请日：2009-11-24
申请人： Aksel Goehnermeier , Daniel Kraehmer , Vladimir Kamenov , Michael Totzeck
发明人： Aksel Goehnermeier , Daniel Kraehmer , Vladimir Kamenov , Michael Totzeck
IPC分类号： G03B27/54
CPC分类号： G03F7/70958 , G03F7/70308 , G03F7/70341 , G03F7/70591 , G03F7/70941
摘要： A projection objective for applications in microlithography, a microlithography projection exposure apparatus with a projection objective, a microlithographic manufacturing method for microstructured components, and a component manufactured using such a manufacturing method are disclosed.
摘要翻译：公开了一种用于微光刻的投影物镜，具有投影物镜的微光刻投影曝光设备，微结构元件的微光刻制造方法以及使用这种制造方法制造的元件。

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