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1. 发明申请

US20050157401A1 Objective with crystal lenses 有权
标题翻译：目标水晶镜片
公开(公告)号：US20050157401A1
公开(公告)日：2005-07-21
申请号：US10931745
申请日：2004-09-01
申请人： Aksel Goehnermeier , Alexandra Pazidis , Birgit Kuerz , Christoph Zaczek , Daniel Kraehmer
发明人： Aksel Goehnermeier , Alexandra Pazidis , Birgit Kuerz , Christoph Zaczek , Daniel Kraehmer
IPC分类号： G02B1/02 , G02B5/30 , G03F7/20 , G02B21/02
CPC分类号： G02B1/02 , G02B1/08 , G02B5/3083 , G02B13/14 , G02B27/0043 , G02B27/286 , G03F7/70225 , G03F7/70241 , G03F7/70566 , G03F7/70958 , G03F7/70966
摘要： Objective, in particular a projection objective for a microlithography projection-exposure installation, with at least one fluoride crystal lens. A reduction in the detrimental influence of birefringence is achieved if this lens is a (100)-lens with a lens axis which is approximately perpendicular to the {100} crystallographic planes or to the crystallographic planes equivalent thereto of the fluoride crystal. In the case of objectives with at least two fluoride crystal lenses, it is favorable if the fluoride crystal lenses are arranged such that they are rotated with respect to one another. The lens axes of the fluoride crystal lenses may in this case point not only in the crystallographic direction but also in the crystallographic direction or in the crystallographic direction. A further reduction in the detrimental influence of birefringence is achieved by the simultaneous use of groups with (100)-lenses rotated with respect to one another and groups with (111)-lenses or (110)-lenses rotated with respect to one another. A further reduction in the detrimental influence of birefringence is obtained by covering an optical element with a compensation coating.
摘要翻译：目的，特别是具有至少一种氟化物晶体透镜的微光刻投影曝光装置的投影物镜。如果该透镜是具有近似垂直于{100}晶面的透镜轴或与氟化物晶体相当的结晶平面的透镜轴，则实现双折射的有害影响的减小。在具有至少两个氟化物晶体透镜的物镜的情况下，如果将氟化物晶体透镜相对于彼此旋转布置是有利的。在这种情况下，氟化物晶体透镜的透镜轴不仅在<100>晶体方向，而且在<111>晶体方向或<110>晶体方向。双折射的有害影响的进一步减少是通过同时使用具有相对于彼此旋转的（100） - 相的组和具有相对于彼此旋转的（111） - 透镜或（110）相的组而实现的。通过用补偿涂层覆盖光学元件来获得双折射的有害影响的进一步减少。

2. 发明申请

US20070242250A1 Objective with crystal lenses 审中-公开
标题翻译：目标水晶镜片
公开(公告)号：US20070242250A1
公开(公告)日：2007-10-18
申请号：US11765200
申请日：2007-06-19
申请人： Aksel Goehnermeier , Alexandra Pazidis , Birgit Kuerz , Christoph Zaczek , Daniel Kraehmer
发明人： Aksel Goehnermeier , Alexandra Pazidis , Birgit Kuerz , Christoph Zaczek , Daniel Kraehmer
IPC分类号： G02B27/28 , G03B27/52 , H01L21/00
CPC分类号： G02B1/02 , G02B1/08 , G02B5/3083 , G02B13/14 , G02B27/0043 , G02B27/286 , G03F7/70225 , G03F7/70241 , G03F7/70566 , G03F7/70958 , G03F7/70966
摘要： Objective, in particular a projection objective for a microlithography projection-exposure installation, with at least one fluoride crystal lens. A reduction in the detrimental influence of birefringence is achieved if this lens is a (100)-lens with a lens axis which is approximately perpendicular to the {100} crystallographic planes or to the crystallographic planes equivalent thereto of the fluoride crystal. In the case of objectives with at least two fluoride crystal lenses, it is favorable if the fluoride crystal lenses are arranged such that they are rotated with respect to one another. The lens axes of the fluoride crystal lenses may in this case point not only in the crystallographic direction but also in the crystallographic direction or in the crystallographic direction. A further reduction in the detrimental influence of birefringence is achieved by the simultaneous use of groups with (100)-lenses rotated with respect to one another and groups with (111)-lenses or (110)-lenses rotated with respect to one another. A further reduction in the detrimental influence of birefringence is obtained by covering an optical element with a compensation coating.
摘要翻译：目的，特别是具有至少一种氟化物晶体透镜的微光刻投影曝光装置的投影物镜。如果该透镜是具有近似垂直于{100}晶面的透镜轴或与氟化物晶体相当的结晶平面的透镜轴，则实现双折射的有害影响的减小。在具有至少两个氟化物晶体透镜的物镜的情况下，如果将氟化物晶体透镜相对于彼此旋转布置是有利的。在这种情况下，氟化物晶体透镜的透镜轴不仅在<100>晶体方向，而且在<111>晶体方向或<110>晶体方向。双折射的有害影响的进一步减少是通过同时使用具有相对于彼此旋转的（100） - 相的组和具有相对于彼此旋转的（111） - 透镜或（110）相的组而实现的。通过用补偿涂层覆盖光学元件来获得双折射的有害影响的进一步减少。

3. 发明授权

US07239447B2 Objective with crystal lenses 有权
标题翻译：目标水晶镜片
公开(公告)号：US07239447B2
公开(公告)日：2007-07-03
申请号：US10931745
申请日：2004-09-01
申请人： Aksel Goehnermeier , Alexandra Pazidis , Birgit Kuerz , Christoph Zaczek , Daniel Kraehmer
发明人： Aksel Goehnermeier , Alexandra Pazidis , Birgit Kuerz , Christoph Zaczek , Daniel Kraehmer
IPC分类号： G02B5/30
CPC分类号： G02B1/02 , G02B1/08 , G02B5/3083 , G02B13/14 , G02B27/0043 , G02B27/286 , G03F7/70225 , G03F7/70241 , G03F7/70566 , G03F7/70958 , G03F7/70966
摘要： An objective, in particular a projection objective for a microlithography projection-exposure installation, with at least one fluoride crystal lens is disclosed. A reduction in the detrimental influence of birefringence is achieved if this lens is a (100)-lens with a lens axis which is approximately perpendicular to the {100} crystallographic planes or to the crystallographic planes equivalent thereto of the fluoride crystal. A further reduction in the detrimental influence of birefringence is obtained by covering an optical element with a compensation coating.
摘要翻译：公开了具有至少一种氟化物晶体透镜的目的，特别是用于微光刻投影曝光装置的投影物镜。如果该透镜是具有近似垂直于{100}晶面的透镜轴或与氟化物晶体相当的结晶平面的透镜轴，则实现双折射的有害影响的减小。通过用补偿涂层覆盖光学元件来获得双折射的有害影响的进一步减少。

4. 发明申请

US20050190446A1 Catadioptric reduction objective 审中-公开
标题翻译：反射折射减少目标
公开(公告)号：US20050190446A1
公开(公告)日：2005-09-01
申请号：US11019202
申请日：2004-12-23
申请人： Birgit Kuerz , Olaf Dittmann , Toralf Gruner , Vladimir Kamenov , Martin Brunotte
发明人： Birgit Kuerz , Olaf Dittmann , Toralf Gruner , Vladimir Kamenov , Martin Brunotte
IPC分类号： G02B1/02 , G02B13/14 , G02B17/08 , G02B27/28 , G03F7/20 , G02B17/00
CPC分类号： G02B17/0892 , G02B1/02 , G02B13/143 , G02B17/08 , G02B27/283 , G03F7/70225 , G03F7/70566
摘要： A catadioptric projection objective for projecting a pattern, which is located in the object plane of the projection objective, into the image plane of the projection objective has, between the object plane and the image plane, a catadioptric objective part provided with a concave mirror (17), with a first deviating mirror (16) and with at least one second deviating mirror (19). A polarization rotating device (26) rotates the preferred polarization direction of the light approximately 90° inside the light path between the deviating mirrors. This permits an at least partial compensation for polarization-dependent reflectivity differences and phase effect differences of the deviating mirrors thereby enabling a projection with a largely identical contrast for all structural directions.
摘要翻译：用于将位于投影物镜的物平面中的图案投影到投影物镜的像平面中的反射折射投射物镜在物平面和像平面之间具有设置有凹面镜的反射折射物镜部（ 17），具有第一偏转镜（16）和至少一个第二偏转镜（19）。偏振旋转装置（26）将偏光镜之间的光路内的光的优选偏振方向旋转大约90°。这允许偏振相关反射率差异和偏离反射镜的相位效应差异的至少部分补偿，从而使得能够对于所有结构方向具有大致相同的对比度的投影。

5. 发明授权

US07605386B2 Optical device with raster elements, and illumination system with the optical device 有权
标题翻译：具有光栅元件的光学装置，以及具有光学装置的照明系统
公开(公告)号：US07605386B2
公开(公告)日：2009-10-20
申请号：US11598180
申请日：2006-11-10
申请人： Wolfgang Singer , Johannes Wangler , Markus Deguenther , Birgit Kuerz , Christoph Menke
发明人： Wolfgang Singer , Johannes Wangler , Markus Deguenther , Birgit Kuerz , Christoph Menke
IPC分类号： G03B27/54 , G03B27/42 , G21K5/04
CPC分类号： G02B27/0961 , G02B17/0657 , G02B27/0983 , G03F7/70075
摘要： The invention relates to an optical device that includes (a) a first optical element with at least one first raster element, where the first raster element has a first axis, (b) a second optical element with at least one second raster element, where the second raster element has a second axis. The first raster element can be changed in its position relative to the second raster element, so that a distance between the first axis and the second axis is variable.
摘要翻译：本发明涉及一种光学装置，其包括（a）具有至少一个第一光栅元件的第一光学元件，其中第一光栅元件具有第一轴，（b）具有至少一个第二光栅元件的第二光学元件，其中第二光栅元件具有第二轴。可以将第一光栅元件相对于第二光栅元件的位置改变，使得第一轴与第二轴之间的距离是可变的。

6. 发明申请

US20050219495A1 Beam reshaping unit for an illumination system of a microlithographic projection exposure apparatus 有权
标题翻译：用于微光刻投影曝光装置的照明系统的光束整形单元
公开(公告)号：US20050219495A1
公开(公告)日：2005-10-06
申请号：US11015312
申请日：2004-12-17
申请人： Wolfgang Singer , Markus Deguenther , Birgit Kuerz , Rafael Egger , Johannes Wangler , Manfred Maul
发明人： Wolfgang Singer , Markus Deguenther , Birgit Kuerz , Rafael Egger , Johannes Wangler , Manfred Maul
IPC分类号： G03B27/54 , G03F7/20
CPC分类号： G03F7/70108 , G03F7/70183
摘要： A beam reshaping unit for an illumination system (10) of a microlithographic projection exposure apparatus comprises a first beam reshaping element (62) having a first beam reshaping surface (68) and a second beam reshaping element having a second beam reshaping surface (74) which faces the first beam reshaping surface (68). The two beam reshaping surfaces (68; 74) are rotationally symmetrical with respect to an optical axis (22) of the beam reshaping unit. At least the first beam reshaping surface (68, 74) has a concavely or convexly curved region (70, 76).
摘要翻译：用于微光刻投影曝光装置的照明系统（10）的光束整形单元包括具有第一光束重塑表面（68）的第一光束重塑元件（62）和具有第二光束重塑表面（74）的第二光束重塑元件，其面向第一光束重塑表面（68）。两个光束整形表面（68; 74）相对于光束整形单元的光轴（22）旋转对称。至少第一光束整形表面（68,74）具有凹或凸弯曲的区域（70,76）。

7. 发明授权

US07542217B2 Beam reshaping unit for an illumination system of a microlithographic projection exposure apparatus 有权
标题翻译：用于微光刻投影曝光装置的照明系统的光束整形单元
公开(公告)号：US07542217B2
公开(公告)日：2009-06-02
申请号：US11015312
申请日：2004-12-17
申请人： Wolfgang Singer , Markus Deguenther , Birgit Kuerz , Rafael Egger , Johannes Wangler , Manfred Maul
发明人： Wolfgang Singer , Markus Deguenther , Birgit Kuerz , Rafael Egger , Johannes Wangler , Manfred Maul
IPC分类号： G02B13/08 , G02B3/02 , G02B9/00 , G02B3/00 , G03B27/54
CPC分类号： G03F7/70108 , G03F7/70183
摘要： A beam reshaping unit for an illumination system of a microlithographic projection exposure apparatus includes a first beam reshaping element having a first beam reshaping surface and a second beam reshaping element having a second beam reshaping surface which faces the first beam reshaping surface. The two beam reshaping surfaces are rotationally symmetrical with respect to an optical axis of the beam reshaping unit. At least the first beam reshaping surface has a concavely or convexly curved region.
摘要翻译：用于微光刻投影曝光装置的照明系统的光束整形单元包括具有第一光束重塑表面的第一光束重塑元件和具有面向第一光束重塑表面的第二光束重塑表面的第二光束重塑元件。两个光束整形表面相对于光束整形单元的光轴旋转对称。至少第一光束整形表面具有凹或凸曲面的区域。

8. 发明申请

US20070146853A1 Optical device with raster elements, and illumination system with the optical device 有权
标题翻译：具有光栅元件的光学装置，以及具有光学装置的照明系统
公开(公告)号：US20070146853A1
公开(公告)日：2007-06-28
申请号：US11598180
申请日：2006-11-10
申请人： Wolfgang Singer , Johannes Wangler , Markus Deguenther , Birgit Kuerz , Christoph Menke
发明人： Wolfgang Singer , Johannes Wangler , Markus Deguenther , Birgit Kuerz , Christoph Menke
IPC分类号： G02B26/08
CPC分类号： G02B27/0961 , G02B17/0657 , G02B27/0983 , G03F7/70075
摘要： The invention relates to an optical device that includes (a) a first optical element with at least one first raster element, where the first raster element has a first axis, (b) a second optical element with at least one second raster element, where the second raster element has a second axis. The first raster element can be changed in its position relative to the second raster element, so that a distance between the first axis and the second axis is variable.
摘要翻译：本发明涉及一种光学装置，其包括（a）具有至少一个第一光栅元件的第一光学元件，其中第一光栅元件具有第一轴，（b）具有至少一个第二光栅元件的第二光学元件，其中第二光栅元件具有第二轴。可以将第一光栅元件相对于第二光栅元件的位置改变，使得第一轴与第二轴之间的距离是可变的。

9. 发明申请

US20070024972A1 Polarization-optimized illumination system 审中-公开
标题翻译：极化优化照明系统
公开(公告)号：US20070024972A1
公开(公告)日：2007-02-01
申请号：US11488002
申请日：2006-07-18
申请人： Birgit Kuerz , Markus Schwab
发明人： Birgit Kuerz , Markus Schwab
IPC分类号： G02B27/28 , G02B5/30
CPC分类号： G03F7/70958 , G02B26/101 , G02B27/28 , G03F7/70566
摘要： An illumination system for a microlithography projection exposure apparatus for illuminating an illumination field with the aid of light from a primary light source has an optical axis and a mirror arrangement having a first deflecting mirror and at least one second deflecting mirror. The first deflecting mirror is tilted in relation to the optical axis about a first tilt axis and by a first tilt angle, and the second deflecting mirror is tilted in relation to the optical axis about a second tilt axis and by a second tilt angle. The mirror arrangement is set up such that a total change in the degree of polarization ΔDOP effected by the mirror arrangement is smaller than the first change in degree of polarization ΔDOP1 effected by the first deflecting mirror, or than the second change in degree of polarization ΔDOP2 effected by the second deflecting mirror.
摘要翻译：用于借助于来自初级光源的光照射照明场的微光刻投影曝光装置的照明系统具有光轴和具有第一偏转镜和至少一个第二偏转镜的反射镜装置。第一偏转镜相对于光轴绕第一倾斜轴线倾斜并且以第一倾斜角度倾斜，并且第二偏转镜相对于光轴围绕第二倾斜轴线倾斜并且倾斜第二倾斜角度。反射镜装置被设置为使得由反射镜装置实现的偏振度DeltaDOP的总变化小于由第一偏转镜实现的偏振度DeltaDOP 1的第一变化，或者比第二偏振度的第二变化 DeltaDOP 2由第二偏转镜实现。

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