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1. 发明授权

US4878086A Flat panel display device and manufacturing of the same 失效
公开(公告)号：US4878086A
公开(公告)日：1989-10-31
申请号：US326108
申请日：1988-03-20
申请人： Junji Isohata , Masao Totsuka , Yoshiharu Nakamura
发明人： Junji Isohata , Masao Totsuka , Yoshiharu Nakamura
IPC分类号： G02F1/1362 , G03F7/20
CPC分类号： G03F7/70233 , G03F7/20 , G03F7/70475 , G03F7/707 , G03F7/70716 , G03F7/70733 , G03F7/70791 , G02F2001/13625
摘要： A flat panel display device, such as a liquid crystal panel display device, of large size and a method and apparatus of manufacture of the same. The display device may be provided by discrete or divided display sections. For the manufacture of the panel display device, a pattern for forming picture elements and a drive circuit therefor is photolithographically transferred onto the whole surface of a substrate or base plate in a step-and-repeat manner. In one aspect of the invention, different masks having patterns corresponding to portions of the first-mentioned pattern are used. After the pattern of one of the masks is transferred onto one portion of the substrate, the one mask is replaced by another which the substrate is moved stepwise so that the pattern of the other mask can be transferred onto another portion of the substrate. By repeating the pattern transfer, with different masks, and repeating the stepwise movement of the substrate, the whole of the first-mentioned pattern is transferred onto the whole surface of the substrate with a high resolving power.

2. 发明授权

US4814830A Flat panel display device and manufacturing of the same 失效
标题翻译：平板显示设备及其制造相同
公开(公告)号：US4814830A
公开(公告)日：1989-03-21
申请号：US203558
申请日：1988-06-01
申请人： Junji Isohata , Masao Totsuka , Yoshiharu Nakamura
发明人： Junji Isohata , Masao Totsuka , Yoshiharu Nakamura
IPC分类号： G02F1/1362 , G03F7/20 , G03B27/44
CPC分类号： G03F7/70216 , G03F7/20 , G03F7/70475 , G03F7/707 , G03F7/70716 , G03F7/70733 , G03F7/70791 , G02F2001/13625
摘要： A flat panel display device, such as a liquid crystal panel display device, of large size and a method and apparatus of manufacture of the same. The display device may be provided by discrete or divided display sections. For the manufacture of the panel display device, a pattern for forming picture elements and a drive circuit therefor is photolithographically transferred onto the whole surface of a substrate or base plate in a step-and-repeat manner. In one aspect of the invention, different masks having patterns corresponding to portions of the first-mentioned pattern are used. After the pattern of one of the masks is transferred onto one portion of the substrate, the one mask is replaced by another which the substrate is moved stepwise so that the pattern of the other mask can be transferred onto another portion of the substrate. By repeating the pattern transfer, with different masks, and repeating the stepwise movement of the substrate, the whole of the first-mentioned pattern is transferred onto the whole surface of the substrate with a high resolving power.
摘要翻译：大尺寸的液晶面板显示装置的平板显示装置及其制造方法和装置。显示装置可以由离散或分开的显示部分提供。对于面板显示装置的制造，用于形成图像元素的图案及其驱动电路以分步重复的方式被光刻地转印到基板或基板的整个表面上。在本发明的一个方面中，使用具有对应于第一种图案的部分的图案的不同掩模。在将一个掩模的图案转移到基板的一部分上之后，一个掩模由另一个掩模代替，其中基板逐步移动，使得另一个掩模的图案可以转移到基板的另一部分上。通过用不同的掩模重复图案转印，并重复基板的逐步移动，将整个首先提到的图案以高分辨能力转印到基板的整个表面上。

3. 发明授权

US4659228A Aligning apparatus 失效
标题翻译：对准装置
公开(公告)号：US4659228A
公开(公告)日：1987-04-21
申请号：US774167
申请日：1985-09-09
申请人： Masao Totsuka , Akiyoshi Suzuki
发明人： Masao Totsuka , Akiyoshi Suzuki
IPC分类号： H01L21/30 , G03F9/00 , H01L21/027 , G01B11/00
CPC分类号： G03F9/70 , G03F9/00
摘要： Disclosed is an aligning apparatus in which two bodies such as a semiconductor mask and a wafer having elongate (or bar-like) alignment marks are scanned by a bar-like beam having an elongate irradiating area and further scanned by the bar-like beam with the direction of inclination thereof changed, and the positional relation between the two bodies is detected, whereby alignment of the two bodies is achieved. The bar-like beam is formed by an anamorphic optical system (for example, a cylindrical lens or the like). The bar-like beam scans the alignment marks through a beam scanning system, and the inclination of the beam is changed by beam inclination changing element at a desired time, for example, after the first cycle of scanning has been terminated, and then scanning is effected again.
摘要翻译：公开了一种对准装置，其中诸如半导体掩模和具有细长（或棒状）对准标记的晶片的两个主体被具有细长照射区域的棒状光束扫描并且被条形光束进一步扫描，其倾斜方向发生变化，并且检测到两个物体之间的位置关系，从而实现两个物体的对准。棒状光束由变形光学系统（例如，柱面透镜等）形成。棒状光束通过光束扫描系统扫描对准标记，并且例如在扫描的第一周期已经终止之后，光束倾斜改变元件在期望的时间改变光束的倾斜，然后扫描是再次受到影响

4. 发明授权

US4576475A Contacting method and apparatus in contact copying 失效
标题翻译：接触式接触方法和装置
公开(公告)号：US4576475A
公开(公告)日：1986-03-18
申请号：US756568
申请日：1985-07-18
申请人： Takahiro Kitagawa , Masao Totsuka
发明人： Takahiro Kitagawa , Masao Totsuka
IPC分类号： G03B27/02 , G03B27/18 , G03F7/20 , G03F9/00 , G03B27/20
CPC分类号： G03F7/70691 , G03B27/18
摘要： A contacting method comprises the steps of holding a photomask and a wafer at a predetermined interval, curving at least one of the photomask and the wafer so as to form a convexity relative to the other, and moving the photomask and the wafer relative to each other to bring them into intimate contact with each other.
摘要翻译：接触方法包括以预定间隔保持光掩模和晶片的步骤，弯曲光掩模和晶片中的至少一个，以便相对于另一个形成凸面，并且相对于彼此移动光掩模和晶片使他们彼此亲密接触。

5. 发明授权

US4651009A Contact exposure apparatus 失效
标题翻译：接触曝光装置
公开(公告)号：US4651009A
公开(公告)日：1987-03-17
申请号：US708783
申请日：1985-03-06
申请人： Masao Totsuka
发明人： Masao Totsuka
IPC分类号： H01L21/027 , G03B27/20 , G03F7/20 , G21K5/10
CPC分类号： G03F7/70691 , G03F7/2014
摘要： An apparatus wherein a first thin member and a second thin member, the first thin member bearing a pattern, and the second thin member is exposed to the pattern of the first thin member. It includes a vacuum line for discharging a gas existing between the first thin member and the second thin member without close-contact therebetween, and a device for bringing the first and second members into proximity close-contact with each other after said discharging means discharges the gas from between the first thin member and the second thin member.
摘要翻译：一种装置，其中第一薄构件和第二薄构件，具有图案的第一薄构件和第二薄构件暴露于第一薄构件的图案。它包括用于排出存在于第一薄构件和第二薄构件之间的气体而没有紧密接触的真空管线，以及用于在所述排放装置将所述第一和第二薄膜构件放电之后将第一和第二薄膜构件彼此靠近接触的活动从第一薄构件和第二薄构件之间的气体。

6. 发明授权

US4611122A Signal detection apparatus with plural elongate beams corresponding 失效
标题翻译：具有多个细长梁的信号检测装置对应
公开(公告)号：US4611122A
公开(公告)日：1986-09-09
申请号：US554630
申请日：1983-11-23
申请人： Shigeki Nakano , Masao Totsuka
发明人： Shigeki Nakano , Masao Totsuka
IPC分类号： H01L21/30 , G03F9/00 , G05D3/12 , H01L21/027 , H01L21/68 , G01N21/86
CPC分类号： G03F9/7065 , G03F9/7076
摘要： A signal detection apparatus comprises a device for forming with separable lights illumination areas extending in different plural directions, a scanner for causing the illumination areas to scan bar-like marks extending in different directions on an object, and a photoreceptor for separately receiving signal lights corresponding to the respective different directions from the rays reflected by the marks.
摘要翻译：信号检测装置包括用于形成具有沿不同的多个方向延伸的可分离的照明区域的装置，用于使照明区域扫描在物体上沿不同方向延伸的棒状标记的扫描仪和用于分别接收对应的信号灯的感光体到由标记反射的光线到各个不同的方向。

7. 发明授权

US4062623A Device for observing an object 失效
标题翻译：用于观察物体的装置
公开(公告)号：US4062623A
公开(公告)日：1977-12-13
申请号：US672022
申请日：1976-03-30
申请人： Akiyoshi Suzuki , Masao Totsuka
发明人： Akiyoshi Suzuki , Masao Totsuka
IPC分类号： G06K9/20 , G03F9/00 , G06T1/00 , H01L21/027 , H01L21/30 , G02B21/06
CPC分类号： G03F9/70
摘要： A device for observing an object such as, for example, a mask, wafer, and so forth to be used in a printer for IC and LSI, and including a flat reflection surface and an inclined reflection surface having a certain inclination with respect to the flat reflection surface, by which light beam reflected at the flat reflection surface is removed by filter means to make it possible to observe only the inclined reflection surface of the object.
摘要翻译：一种用于观察用于IC和LSI的打印机中的例如掩模，晶片等的物体的装置，并且包括平坦的反射表面和相对于通过滤光器装置去除在平坦反射表面处反射的光束的平坦反射表面，以使得仅可观察到物体的倾斜反射面。

8. 发明授权

US4834540A Projection exposure apparatus 失效
标题翻译：投影曝光装置
公开(公告)号：US4834540A
公开(公告)日：1989-05-30
申请号：US69225
申请日：1987-07-02
申请人： Masao Totsuka , Akiyoshi Suzuki , Hideki Ina
发明人： Masao Totsuka , Akiyoshi Suzuki , Hideki Ina
IPC分类号： G01B11/00 , G01R31/308 , G03F9/00 , H01L21/027 , H01L21/30
CPC分类号： G03F9/7076 , G01R31/308
摘要： A projection exposure apparatus for projecting a pattern, formed on a reticle, upon a wafer by way of a projection lens system is disclosed. The apparatus includes an alignment system wherein light is projected upon an alignment mark of the wafer by use of the projection lens system, and the light diffracted by an edge of the wafer alignment mark is guidingly directed from between the projection lens system and the wafer to a photoelectric detector without intervention of the projection lens system. From the photodetector, an alignment signal corresponding to the position of the wafer alignment mark is obtained and, on the basis of the alignment mark signal, the wafer and the reticle are brought into a predetermined positional relation. With the disclosed alignment system, the wafer alignment mark can be detected without being affected by a photoresist layer applied to the wafer surface, with the result that the reticle and the wafer can be aligned more accurately.
摘要翻译：公开了一种用于通过投影透镜系统将形成在掩模版上的图案投射在晶片上的投影曝光装置。该装置包括对准系统，其中通过使用投影透镜系统将光投射到晶片的对准标记上，并且由晶片对准标记的边缘衍射的光从投影透镜系统和晶片之间引导引导到光电探测器，无需投影镜头系统的干预。从光电检测器获得与晶片对准标记的位置对应的对准信号，并且基于对准标记信号，使晶片和标线片成为预定的位置关系。利用公开的对准系统，可以检测晶片对准标记，而不受施加到晶片表面的光致抗蚀剂层的影响，结果可以更准确地对准标线片和晶片。

9. 发明授权

US4814829A Projection exposure apparatus 失效
标题翻译：投影曝光装置
公开(公告)号：US4814829A
公开(公告)日：1989-03-21
申请号：US60398
申请日：1987-06-10
申请人： Masao Kosugi , Akiyoshi Suzuki , Hideki Ina , Kazuhito Outsuka , Shigeki Ogawa , Masao Totsuka , Fumio Sakai
发明人： Masao Kosugi , Akiyoshi Suzuki , Hideki Ina , Kazuhito Outsuka , Shigeki Ogawa , Masao Totsuka , Fumio Sakai
IPC分类号： G03F9/00 , G03B27/52 , G03B27/70
CPC分类号： G03F9/7069 , G03F9/7023
摘要： A projection exposure apparatus for projecting a pattern of a reticle upon a wafer by use of a projection lens system, is disclosed. The apparatus is arranged so that a mark illuminating light is projected upon the wafer from between the projection lens system and the wafer and not by way of the projection lens system. The light diffracted by an edge of a wafer alignment mark is photoelectrically detected by way of the projection lens system, whereby an electrical signal corresponding to an image of the alignment mark is obtained. On the basis of the detected signal, the wafer is aligned with the reticle. This arrangement allows detection of the alignment mark without being affected by a photoresist applied to the wafer surface. Thus, the reticle-to-wafer alignment can be made accurately. Also, a novel and unique alignment method is disclosed. The disclosed method assures high-accuracy reticle-to-wafer alignment.
摘要翻译：公开了一种用于通过使用投影透镜系统将掩模版图案投影到晶片上的投影曝光装置。该装置被布置成使得标记照明光从投影透镜系统和晶片之间而不是通过投影透镜系统投射到晶片上。通过投影透镜系统对由晶片对准标记的边缘衍射的光进行光电检测，从而获得与对准标记的图像对应的电信号。基于检测到的信号，晶片与掩模版对准。这种布置允许检测对准标记而不受施加到晶片表面的光致抗蚀剂的影响。因此，可以准确地进行标线片到晶片对准。此外，公开了一种新颖且独特的对准方法。所公开的方法确保了高精度的光罩对晶片对准。

10. 发明授权

US4315201A Alignment apparatus for mask and wafer used in manufacturing semiconductor circuit elements 失效
标题翻译：用于制造半导体电路元件的掩模和晶片的对准装置
公开(公告)号：US4315201A
公开(公告)日：1982-02-09
申请号：US884534
申请日：1978-03-08
申请人： Akiyoshi Suzuki , Ryozo Hiraga , Ichiro Kano , Hideki Yoshinari , Masao Totsuka , Yuzo Kato , Yasuo Ogino
发明人： Akiyoshi Suzuki , Ryozo Hiraga , Ichiro Kano , Hideki Yoshinari , Masao Totsuka , Yuzo Kato , Yasuo Ogino
IPC分类号： H01L21/30 , G03F9/00 , H01L21/027 , H01L21/67 , H01L21/68 , G05B1/06
CPC分类号： G03F9/70
摘要： An alignment apparatus for mask and wafer each having alignment marks provided in a narrow strip like area between circuit patterns is disclosed, which mask and wafer are used in manufacturing semiconductor circuit elements. In the apparatus, the mask and wafer are scanned to obtain scan signals by means of which the amount of relative deviation between the alignment marks on mask and wafer is detected. By means of the detected signal, an alignment is effected between the mask and wafer in the apparatus. For this type of alignment apparatus, there is a problem that since the alignment marks are provided in the narrow strip like area, no coincidence between the scanning position and the strip area is attainable with pre-alignment accuracy. Improvement in the alignment apparatus according to the invention lies in that a reading of alignment marks is initiated after the coincidence is photoelectrically detected.
摘要翻译：公开了一种用于掩模和晶片的对准装置，每个具有设置在电路图案之间的窄带状区域中的对准标记，该掩模和晶片用于制造半导体电路元件。在该装置中，对掩模和晶片进行扫描以获得扫描信号，通过该扫描信号检测掩模和晶片上的对准标记之间的相对偏离量。通过检测到的信号，在设备中的掩模和晶片之间进行对准。对于这种对准装置，存在这样的问题，即由于将对准标记设置在窄条状区域中，所以在预定位精度下不能使扫描位置和条带区域之间重合。根据本发明的对准装置的改进在于，在光电检测一致之后开始对准标记的读取。

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