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1. 发明授权

US4814829A Projection exposure apparatus 失效
标题翻译：投影曝光装置
公开(公告)号：US4814829A
公开(公告)日：1989-03-21
申请号：US60398
申请日：1987-06-10
申请人： Masao Kosugi , Akiyoshi Suzuki , Hideki Ina , Kazuhito Outsuka , Shigeki Ogawa , Masao Totsuka , Fumio Sakai
发明人： Masao Kosugi , Akiyoshi Suzuki , Hideki Ina , Kazuhito Outsuka , Shigeki Ogawa , Masao Totsuka , Fumio Sakai
IPC分类号： G03F9/00 , G03B27/52 , G03B27/70
CPC分类号： G03F9/7069 , G03F9/7023
摘要： A projection exposure apparatus for projecting a pattern of a reticle upon a wafer by use of a projection lens system, is disclosed. The apparatus is arranged so that a mark illuminating light is projected upon the wafer from between the projection lens system and the wafer and not by way of the projection lens system. The light diffracted by an edge of a wafer alignment mark is photoelectrically detected by way of the projection lens system, whereby an electrical signal corresponding to an image of the alignment mark is obtained. On the basis of the detected signal, the wafer is aligned with the reticle. This arrangement allows detection of the alignment mark without being affected by a photoresist applied to the wafer surface. Thus, the reticle-to-wafer alignment can be made accurately. Also, a novel and unique alignment method is disclosed. The disclosed method assures high-accuracy reticle-to-wafer alignment.
摘要翻译：公开了一种用于通过使用投影透镜系统将掩模版图案投影到晶片上的投影曝光装置。该装置被布置成使得标记照明光从投影透镜系统和晶片之间而不是通过投影透镜系统投射到晶片上。通过投影透镜系统对由晶片对准标记的边缘衍射的光进行光电检测，从而获得与对准标记的图像对应的电信号。基于检测到的信号，晶片与掩模版对准。这种布置允许检测对准标记而不受施加到晶片表面的光致抗蚀剂的影响。因此，可以准确地进行标线片到晶片对准。此外，公开了一种新颖且独特的对准方法。所公开的方法确保了高精度的光罩对晶片对准。

2. 发明授权

US5751404A Exposure apparatus and method wherein alignment is carried out by comparing marks which are incident on both reticle stage and wafer stage reference plates 失效
标题翻译：曝光装置和方法，其中通过比较入射在标线片台和晶片台参考板上的标记进行对准
公开(公告)号：US5751404A
公开(公告)日：1998-05-12
申请号：US684100
申请日：1996-07-22
申请人： Eiichi Murakami , Fumio Sakai , Shigeyuki Uzawa , Shigeki Ogawa , Tetsuya Mori
发明人： Eiichi Murakami , Fumio Sakai , Shigeyuki Uzawa , Shigeki Ogawa , Tetsuya Mori
IPC分类号： G03F7/20 , G03F9/00 , G03B27/42 , G02B11/00 , G03B27/32 , G03B27/52
CPC分类号： G03F7/70691 , G03F7/70358 , G03F9/7015
摘要： A scanning exposure apparatus includes a first movable stage being movable while carrying a first object thereon, a second movable stage being movable while carrying a second object thereon, a projection optical system for projecting a pattern, a control system serviceable to scan the first and second movable stages in a timed relation and relative to the projection optical system and to project a pattern of the first object onto the second object through the projection optical system, a first reference plate fixedly mounted on the first movable stage, a second reference plate fixedly mounted on the second movable stage, and a detecting system serviceable to scan at least one of the first and second movable stages to detect a relative positional relationship between alignment marks of the first and second reference plates to thereby determine a scan direction of one of the first and second movable stages.
摘要翻译：一种扫描曝光装置，包括：可移动的第一可移动台，其上携带有第一物体;可移动的第二可移动台，其上携带有第二物体;投影光学系统，用于投影图案;可控制的扫描第一和第二物体的控制系统以相对于投影光学系统的定时关系的可移动台阶，并且通过投影光学系统将第一物体的图案投射到第二物体上，固定地安装在第一可移动台上的第一参考板，固定地安装在第二参考板上的第二参考板在第二可移动台上，以及检测系统，其能够扫描第一和第二可移动台中的至少一个，以检测第一和第二参考板的对准标记之间的相对位置关系，从而确定第一和第二可移动台之一的扫描方向和第二可动台。

3. 发明授权

US5660708A Process for manufacturing a lead frame 失效
标题翻译：制造引线框架的工艺
公开(公告)号：US5660708A
公开(公告)日：1997-08-26
申请号：US561329
申请日：1995-11-21
申请人： Yoshimaro Tezuka , Katsuhisa Tokunaga , Mitsuyuki Kakimoto , Shigeki Ogawa , Miyuki Tani , Satoshi Kobayashi , Kiyotaka Sasaki , Motoyuki Tomizawa
发明人： Yoshimaro Tezuka , Katsuhisa Tokunaga , Mitsuyuki Kakimoto , Shigeki Ogawa , Miyuki Tani , Satoshi Kobayashi , Kiyotaka Sasaki , Motoyuki Tomizawa
IPC分类号： C25D5/34 , C25F3/16 , C25F7/00 , H01L21/48 , H01L23/495 , B05D3/00
CPC分类号： C25F7/00 , C25D5/34 , C25F3/16 , H01L21/4821 , H01L23/49582 , H01L2924/0002
摘要： It is an object of this invention to provide a process for manufacturing a lead frame by polishing a blank for a lead frame electrolytically and plating the electrolytically polished surface of the blank with a metal, which process enables the electrolytic polishing of the blank to be continued for a long time by employing a contactless electrolytic polishing apparatus, and can form an electrolytically polished surface which is sufficiently smooth to allow it to be plated with a very good metal coating.The contactless electrolytic polishing apparatus is employed for applying a direct current with ripples having a frequency of 40 to 120 Hz alternately to the anode and cathode in an electrolytic polishing tank filled with an electrolytic polishing solution, so that the time for which the blank positioned between both electrodes functions as the anode may be at least 3.3 times longer than that for which it functions as the cathode, and the blank is, then, plated with a metal by employing a customary method.
摘要翻译：本发明的一个目的是提供一种用于通过用电解抛光引线框架的坯料并用金属电镀该电解抛光表面来制造引线框架的方法，该方法能够使坯料的电解抛光继续通过使用非接触式电解抛光装置长时间地形成电解抛光表面，该表面足够光滑以使其能够镀有非常好的金属涂层。非接触电解抛光装置用于在填充有电解抛光溶液的电解抛光槽中向阳极和阴极交替施加具有40至120Hz频率的波纹的直流电流，使得坯料位于两个电极用作阳极可能比其用作阴极的电极的时间长至少3.3倍，然后通过采用常规方法将电镀金属。

4. 发明授权

US08927949B2 Measuring apparatus, drawing apparatus, and article manufacturing method 有权
标题翻译：测量装置，绘图装置和制品制造方法
公开(公告)号：US08927949B2
公开(公告)日：2015-01-06
申请号：US13547390
申请日：2012-07-12
申请人： Shigeki Ogawa
发明人： Shigeki Ogawa
IPC分类号： G21K5/02 , G03F7/20 , H01J37/244
CPC分类号： H01J37/244 , H01J2237/24514 , H01J2237/24521
摘要： The beam measuring apparatus of the present invention includes a detection device including a shield member that has an edge, and a detector configured to detect the beam of which at least a part is not shielded by the shield member; a relative movement mechanism configured to cause a relative movement between the shield member and the beam; and a controller configured to control the detection device and the relative movement mechanism so as to cause one of the edge and the beam to traverse the other with respect to each of a plurality of points on the edge, to sum a plurality of signals, respectively obtained by the detection device with respect to the plurality of points and with respect to relative positions of the relative movement corresponding to one another, so as to obtain a signal sequence, and to obtain the characteristic based on the signal sequence.
摘要翻译：本发明的光束测量装置包括检测装置，其包括具有边缘的屏蔽部件和检测器，该检测器被配置为检测至少一部分未被屏蔽部件屏蔽的光束; 相对运动机构，其构造成在所述屏蔽构件和所述梁之间引起相对移动; 以及控制器，其被配置为控制所述检测装置和所述相对移动机构，以使所述边缘和所述光束中的一个相对于所述边缘上的多个点中的每一个相对于所述边缘和所述波束中的每一个分别对多个信号求和通过检测装置相对于多个点获得并相对于彼此相对的相对运动的相对位置获得信号序列，并且基于信号序列获得特征。

5. 发明授权

US4803389A Stepping motor, method of driving the same and drive circuit therefor 失效
标题翻译：步进电机，驱动方法及驱动电路
公开(公告)号：US4803389A
公开(公告)日：1989-02-07
申请号：US74823
申请日：1987-07-17
申请人： Shigeki Ogawa , Eiichi Tsukada
发明人： Shigeki Ogawa , Eiichi Tsukada
IPC分类号： H02P8/14 , H02K29/08 , H02K37/12 , H02K37/08
CPC分类号： H02K29/08 , H02K37/125
摘要： A stepping motor includes a first element including at least two permanent magnets each having a pair of N and S poles and a second element including a yoke arranged to be separated from the first element by a predetermined interval. The first and second elements can be moved relative to each other. The second element has a two-phase coil arranged on the yoke in association with a width of each pole in a moving direction of the permanent magnet and detent torque generating means for generating a static detent torque by relative movement. The detent torque generating means is arranged on the yoke such that a stable position of one of the first and second elements moved by a dynamic torque generated when one of the coils constituting the two-phase coil is energized is deviated from a stable position of a moving element caused by a detent torque generated from the detent torque generating means. A method of controlling the stepping motor is also disclosed.
摘要翻译：步进电机包括：第一元件，其包括至少两个永磁体，每个永磁体具有一对N极和S极;以及第二元件，其包括设置成与所述第一元件分开预定间隔的磁轭。第一和第二元件可以相对于彼此移动。第二元件具有与永磁体的移动方向上的每个极的宽度相关联的轭架上的两相线圈和用于通过相对运动产生静态制动力矩的制动力矩产生装置。定位转矩产生装置设置在磁轭上，使得当构成两相线圈的一个线圈通电时产生的动态转矩移动的第一和第二元件中的一个元件的稳定位置从一个稳定的位置偏离由所述止动扭矩产生装置产生的止动扭矩引起的移动元件。还公开了一种控制步进电动机的方法。

6. 发明授权

US5228420A Valve rocker cover 失效
标题翻译：阀门摇臂盖
公开(公告)号：US5228420A
公开(公告)日：1993-07-20
申请号：US950266
申请日：1992-09-25
申请人： Katsuji Furuya , Shigeki Ogawa , Kyoko Kishimoto
发明人： Katsuji Furuya , Shigeki Ogawa , Kyoko Kishimoto
IPC分类号： F01M13/04 , F02F7/00
CPC分类号： F01M13/0416 , F02F7/006
摘要： A valve rocker cover is securely mounted on a cylinder head of an internal combustion engine. The valve rocker cover includes a rocker cover main body made of a plastic and of a generally upturned vessel shape so as to be opened at its bottom end. The main body includes a roof section which is formed with a plurality of openings through which metal pipe members extending from the cylinder head are respectively disposed. A plurality of annular oil seal members are disposed coaxial respectively with the openings and made of an elastomeric material. The annular inward lip section of each seal member is in contact with the metal pipe member. A plurality of annular support members for the oil seal members are disposed coaxial respectively with the openings and made of a plastic. The annular outward section of the oil seal member is fixedly secured to the inner peripheral portion of each annular support member. The rocker cover main body is formed with a surface facing downward, forming part of the rocker cover main body. Each annular support member is welded at its top surface to the downward facing surface of the rocker cover main body.
摘要翻译：阀门摇杆盖牢固地安装在内燃机的气缸盖上。阀门摇杆盖包括由塑料制成并且大致向上翻转的容器形状的摇臂盖主体，以便在其底端处打开。主体包括屋顶部分，该屋顶部分形成有多个开口，通过该开口分别设置从气缸盖延伸的金属管构件。多个环形油封构件分别与开口共同设置并由弹性体材料制成。每个密封构件的环形内唇部分与金属管构件接触。多个用于油封构件的环形支撑构件分别与开口共同设置并由塑料制成。油封构件的环形外侧部分固定地固定在每个环形支撑构件的内周部分上。摇臂盖主体形成有面向下的表面，形成摇臂盖主体的一部分。每个环形支撑构件在其顶表面处焊接到摇臂盖主体的向下的表面。

7. 发明授权

US06248267B1 Method for manufacturing fibril system fiber 失效
标题翻译：原纤系统纤维的制造方法
公开(公告)号：US06248267B1
公开(公告)日：2001-06-19
申请号：US09141032
申请日：1998-08-27
申请人： Yoshihiko Hosako , Teruyuki Yamada , Katsuhiko Shinada , Hideaki Habara , Shigeki Ogawa , Sadatoshi Nagamine , Keiji Hirota , Takashi Kozakura
发明人： Yoshihiko Hosako , Teruyuki Yamada , Katsuhiko Shinada , Hideaki Habara , Shigeki Ogawa , Sadatoshi Nagamine , Keiji Hirota , Takashi Kozakura
IPC分类号： D01D526
CPC分类号： D01D5/40
摘要： The present invention provides fibril system fibers which may be employed in filter applications and in artificial leather applications, and also provides an industrially superior manufacturing method for such fibril system fibers, and a spinning nozzle. The fibril fibers of the present invention include at least one macromolecular polymer having a film forming ability, and they have a structure in which fibrillated fibers having a diameter of 10 micrometers or less branch from main fibers having a width within a range of 0.1 micrometers-500 micrometers, and a length within a range of 10 micrometers-10 cm.
摘要翻译：本发明提供可用于过滤器应用和人造革应用中的原纤系统纤维，并且还提供了用于这种原纤系统纤维的工业上优良的制造方法和纺丝喷嘴。本发明的原纤维包括至少一种具有成膜能力的高分子聚合物，它们具有直径为10微米以下的原纤维纤维从主纤维分支的结构，宽度在0.1微米〜 500微米，长度在10微米-10厘米之间。

8. 发明授权

US5843290A Electrolytic polishing apparatus 失效
标题翻译：电解抛光装置
公开(公告)号：US5843290A
公开(公告)日：1998-12-01
申请号：US792224
申请日：1997-01-31
申请人： Yoshimaro Tezuka , Katsuhisa Tokunaga , Mitsuyuki Kakimoto , Shigeki Ogawa , Miyuki Tani , Satoshi Kobayashi , Kiyotaka Sasaki , Motoyuki Tomizawa
发明人： Yoshimaro Tezuka , Katsuhisa Tokunaga , Mitsuyuki Kakimoto , Shigeki Ogawa , Miyuki Tani , Satoshi Kobayashi , Kiyotaka Sasaki , Motoyuki Tomizawa
IPC分类号： C25D5/34 , C25F3/16 , C25F7/00 , H01L21/48 , H01L23/495
CPC分类号： C25F7/00 , C25D5/34 , C25F3/16 , H01L21/4821 , H01L23/49582 , H01L2924/0002
摘要： A contactless electrolytic polishing apparatus for manufacturing a lead frame having a smooth polished surface includes a polishing tank containing polishing solution and divided by partitions into a first cathode-containing vessel, a first solution-discharge vessel, a first anode-containing vessel, a second solution-discharge vessel, a second anode-containing vessel, a third solution-discharge vessel and a second cathode-containing vessel. A direct current is applied with ripples having a frequency of 40 to 120 Hz alternately to the anode and cathode in the electrolytic polishing tank filled with an electrolytic polishing solution so that the time for which the blank positioned between both electrodes functions as the anode may be at least 3.3 times longer than that for which it functions as the cathode. The blank is then plated with a metal by employing a customary method.
摘要翻译：一种用于制造具有光滑抛光表面的引线框架的非接触式电解抛光装置，包括：抛光槽，其包含抛光溶液，并由隔板分隔成第一阴极容纳容器，第一溶液 - 放电容器，第一含阳极容器，第二溶液 - 放电容器，第二阳极容器，第三溶液 - 放电容器和第二阴极容器。在电解抛光溶液的电解抛光槽中，直接电流施加频率为40〜120Hz的波纹，使得位于两电极之间的空白位置作为阳极的时间可以为比其作为阴极的时间长至少3.3倍。然后通过采用常规方法用金属镀该坯料。

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