专利快速检索-快速检索全球专利，免费商用专利数据库-IPRDB

1. 发明授权

US5150152A Exposure apparatus including device for determining movement of an object 失效
标题翻译：曝光装置包括用于确定物体的移动的装置
公开(公告)号：US5150152A
公开(公告)日：1992-09-22
申请号：US755619
申请日：1991-09-05
申请人： Junji Isohata , Shinji Tsutsui
发明人： Junji Isohata , Shinji Tsutsui
IPC分类号： G03F7/20 , H01L21/027 , H01L21/30
CPC分类号： G03F7/70358 , G03F7/70775
摘要： An exposure apparatus for exposing an exposure member or wafer to a pattern with radiation in a step-and-repeat manner thereby to transfer images of the pattern onto different regions on a surface of the exposure member. The apparatus includes an XY stage for moving the wafer in X- and Y-directions, a .theta. stage for moving the wafer in a rotational direction relative to the XY stage, laser interferometers for measuring an amount of movement of the wafer by the XY stage, in each of the X- and Y-directions, by use of a mirror member mounted on the .theta. stage, and a carriage for carrying the XY and .theta. stages and a portion of the interferometers to move the wafer relative to an exposing system for effecting the scan-exposure on the region of the wafer. The mirror member is placed on the .theta. stage, and another portion of the interferometers is mounted on a fixed system independent of the carriage. The inclination of the mirror member is detected at any desired time by moving the carriage and calculating the inclination from the amount of movement of the carriage and the amount of displacement of the mirror member measured by the interferometer mounted on the fixed system. Based on the thus detected inclination of the mirror member, the inclination is corrected and the stepwise movement of the XY stage can be performed with a higher accuracy, so that the transfer accuracy between the pattern images printed on the wafer in the case of the step-and-repeat exposure can be highly improved.
摘要翻译：一种用于以曝光部件或晶片以逐步重复的方式将辐射曝光到图案的曝光装置，从而将图案的图像转印到曝光部件的表面上的不同区域上。该装置包括用于在X方向和Y方向上移动晶片的XY平台，用于相对于XY平台沿旋转方向移动晶片的θ级，激光干涉仪，用于通过XY平台测量晶片的移动量在X和Y方向中的每一个中，通过使用安装在θ台上的反射镜部件和用于承载XY和θ级和一部分干涉仪的滑架相对于曝光系统移动晶片在晶片的区域上进行扫描曝光。镜构件放置在θ台上，另一部分干涉仪安装在独立于托架的固定系统上。通过移动滑架并根据滑架的移动量计算倾斜度和通过安装在固定系统上的干涉仪测量的反射镜部件的位移量来检测反射镜部件的倾斜度。基于这样检测到的镜构件的倾斜度，校正倾斜度，并且可以以更高的精度执行XY平台的逐步移动，从而在步骤的情况下打印在晶片上的图案图像之间的转印精度重复曝光可以大大提高。

2. 发明授权

US4749867A Exposure apparatus 失效
标题翻译：曝光装置
公开(公告)号：US4749867A
公开(公告)日：1988-06-07
申请号：US856221
申请日：1986-04-28
申请人： Koichi Matsushita , Junji Isohata , Hironori Yamamoto , Makoto Miyazaki , Kunitaka Ozawa , Hideki Yoshinari
发明人： Koichi Matsushita , Junji Isohata , Hironori Yamamoto , Makoto Miyazaki , Kunitaka Ozawa , Hideki Yoshinari
IPC分类号： G03F7/20 , G01B11/26
CPC分类号： G03F7/70691 , G03F7/70358
摘要： An exposure apparatus for exposing in a step-and-scan manner a plate-like member to a pattern with radiation so that images of the pattern are transferred onto different regions on the plate-like member. The apparatus includes a mirror imaging optical system for projecting the image of the pattern onto the plate-like member, a carriage for scanningly moving, at the time of exposure, the plate-like member relative to the mirror imaging system, and a stage movably mounted on the carriage for step-feeding the plate-like member at the time of non-exposure so as to sequentially place the different regions of the plate-like member at an exposure station under the mirror imaging system. A locking system is provided to lock the stage relative to the carriage by use of vacuum, at the time of exposure, whereby unwanted displacement of the plate-like member relative to the carriage at the time of scanning exposure is prevented. Also, any positional deviation which may be caused by the locking of the stage is compensated for, by controlling supply of air pressure to linear air-bearings supporting the carriage.
摘要翻译：一种用于以逐步扫描的方式将板状构件暴露于具有辐射的图案的曝光装置，使得图案的图像转印到板状构件上的不同区域上。该装置包括：镜像成像光学系统，用于将图案的图像投影到板状构件上;滑架，用于在曝光时相对于镜像成像系统扫描地移动板状构件;以及可移动的台安装在滑架上，用于在不曝光时对板状构件进行步进供给，以便将板状构件的不同区域依次放置在镜像摄像系统下的曝光站。提供锁定系统以在曝光时通过使用真空来相对于托架锁定台架，由此防止了在扫描曝光时板状构件相对于托架的不期望的移动。此外，通过控制对支撑滑架的线性空气轴承的空气压力的供给来补偿可能由级的锁定引起的任何位置偏差。

3. 发明授权

US4748477A Exposure apparatus 失效
标题翻译：曝光装置
公开(公告)号：US4748477A
公开(公告)日：1988-05-31
申请号：US856222
申请日：1986-04-28
申请人： Junji Isohata , Koichi Matsushita , Hironori Yamamoto , Makoto Miyazaki , Kunitaka Ozawa , Hideki Yoshinari
发明人： Junji Isohata , Koichi Matsushita , Hironori Yamamoto , Makoto Miyazaki , Kunitaka Ozawa , Hideki Yoshinari
IPC分类号： G03F7/20 , G03B27/42 , G03B27/53
CPC分类号： G03F7/70691
摘要： An exposure apparatus for exposing in a step-and-scan manner a plate-like member to a pattern with radiation so that images of the pattern are transferred onto different regions on the plate-like member. The exposure apparatus includes a mirror imaging optical system for projecting the image of the pattern onto the plate-like member. Also, the exposure apparatus includes a carriage for scanningly moving, at the time of exposure, the plate-like member relative to the mirror imaging optical system and a stage for step-feeding the plate-like member at the time of non-exposure so as to sequentially place the different regions of the plate-like member at an exposure station under the mirror imaging system. The stage is mounted on the carriage, and the movement of the carriage is guided by linear air-bearings. The apparatus is arranged such that inclination of the carriage relative to the mirror imaging system to be caused by the movement of the stage is corrected by controlling the amount of air supply to the linear air-bearings, whereby occurrence of shift between the images to be transferred onto the plate-like member is prevented regardless of the change in position of the stage relative to the carriage. In another aspect, the amount of movement of the stage is corrected in accordance the amount of image shift which otherwise may be caused, whereby occurrence of such image shift is prevented.
摘要翻译：一种用于以逐步扫描的方式将板状构件暴露于具有辐射的图案的曝光装置，使得图案的图像转印到板状构件上的不同区域上。曝光装置包括用于将图案的图像投影到板状构件上的镜像成像光学系统。此外，曝光装置还包括在曝光时相对于镜面成像光学系统在板状部件上进行扫描移动的台架，以及在不曝光时使板状部件逐步进给的台阶以将该板状构件的不同区域依次放置在镜像摄像系统下方的曝光站。台架安装在滑架上，滑架的运动由线性空气轴承引导。该装置被布置成使得通过控制对线性空气轴承的空气供应量来校正由台架的运动引起的托架相对于镜像成像系统的倾斜，由此在图像之间发生偏移不管台架相对于托架的位置的变化如何，都能够防止转印到板状构件上。在另一方面，根据否则可能引起的图像偏移量校正舞台的移动量，从而防止了这种图像偏移的发生。

4. 发明授权

US4737824A Surface shape controlling device 失效
标题翻译：表面形状控制装置
公开(公告)号：US4737824A
公开(公告)日：1988-04-12
申请号：US786077
申请日：1985-10-10
申请人： Fumio Sakai , Junji Isohata
发明人： Fumio Sakai , Junji Isohata
IPC分类号： G03F7/20 , G03B27/42
CPC分类号： G03F7/707
摘要： A device for controlling the shape of a surface of a plate-like member such as a semiconductor wafer, includes support for supporting the plate-like member from a reverse surface thereof, a holding system for holding a portion of the reverse surface of the plate-like member on the support, and a control for controlling a pressure in a closed space which is related, when the plate-like member is supported by the support, to a portion of the reverse surface of the plate-like member other than the first-mentioned portion, such that the pressure in the closed space is changeable to be increased or decreased as compared with an initial pressure in the closed space when the plate-like member is supported by the support, to control deformation of the plate-like member to thereby control the surface shape of the plate-like member.
摘要翻译：用于控制诸如半导体晶片的板状构件的表面的形状的装置包括用于从其反面支撑板状构件的支撑件，用于保持板的反面的一部分的保持系统以及用于控制封闭空间中的压力的控制装置，该控制装置当板状构件被支撑件支撑时，与板状构件的反面的除了使得当板状构件被支撑件支撑时，与封闭空间中的初始压力相比，封闭空间中的压力可变化地增大或减小，以控制板状构件的变形从而控制板状构件的表面形状。

5. 发明授权

US4878086A Flat panel display device and manufacturing of the same 失效
公开(公告)号：US4878086A
公开(公告)日：1989-10-31
申请号：US326108
申请日：1988-03-20
申请人： Junji Isohata , Masao Totsuka , Yoshiharu Nakamura
发明人： Junji Isohata , Masao Totsuka , Yoshiharu Nakamura
IPC分类号： G02F1/1362 , G03F7/20
CPC分类号： G03F7/70233 , G03F7/20 , G03F7/70475 , G03F7/707 , G03F7/70716 , G03F7/70733 , G03F7/70791 , G02F2001/13625
摘要： A flat panel display device, such as a liquid crystal panel display device, of large size and a method and apparatus of manufacture of the same. The display device may be provided by discrete or divided display sections. For the manufacture of the panel display device, a pattern for forming picture elements and a drive circuit therefor is photolithographically transferred onto the whole surface of a substrate or base plate in a step-and-repeat manner. In one aspect of the invention, different masks having patterns corresponding to portions of the first-mentioned pattern are used. After the pattern of one of the masks is transferred onto one portion of the substrate, the one mask is replaced by another which the substrate is moved stepwise so that the pattern of the other mask can be transferred onto another portion of the substrate. By repeating the pattern transfer, with different masks, and repeating the stepwise movement of the substrate, the whole of the first-mentioned pattern is transferred onto the whole surface of the substrate with a high resolving power.

6. 发明授权

US4864360A Exposure apparatus 失效
标题翻译：曝光装置
公开(公告)号：US4864360A
公开(公告)日：1989-09-05
申请号：US183317
申请日：1988-04-05
申请人： Junji Isohata , Koichi Matsushita , Hironori Yamamoto , Makoto Miyazaki , Kunitaka Ozawa , Hideki Yoshinari
发明人： Junji Isohata , Koichi Matsushita , Hironori Yamamoto , Makoto Miyazaki , Kunitaka Ozawa , Hideki Yoshinari
IPC分类号： G02F1/13 , G02F1/1362 , G03F7/20 , H01L21/027 , H01L21/30
CPC分类号： G03F7/70066 , G03F7/70358 , G03F7/70475 , G03F7/70691 , H01L21/30 , G02F2001/13625
摘要： An apparatus for photolithographically transferring, onto a plate-like member a pattern corresponding to picture elements of a liquid crystal display device and a pattern corresponding to driving circuits and so on, by use of a photomask. The surface of the plate-like member is divided into different areas and, each time one of the different areas of the plate-like member is subjected to the pattern transfer operation, the plate-like member is fed stepwise relative to an optical system provided to project an image of the photomask onto the plate-like member. At the same time, the range of the photomask pattern which is to be transferred onto the plate-like member is changed. By this, a portion of the picture-element pattern and a portion of the circuit pattern are transferred onto each of the different areas on the plate-like member, whereby a large-size pattern contributable to form a large-size display picture plane and a pattern contributable to form a control circuit for controlling the picture plane are transferred on the plate-like member.
摘要翻译：通过使用光掩模将与液晶显示装置的像素对应的图案和与驱动电路等对应的图案光刻地转印到板状构件上的装置。板状构件的表面被划分成不同的区域，并且每当片状构件的不同区域中的一个受到图案转印操作时，板状构件相对于所提供的光学系统逐步进给将光掩模的图像投影到板状构件上。同时，要转印到板状构件上的光掩模图案的范围被改变。由此，将图像元素图案的一部分和电路图案的一部分转印到板状构件上的各个不同区域中，由此形成大尺寸图案，形成大尺寸显示画面，形成用于控制画面的控制电路的图形被转印在板状构件上。

7. 发明授权

US4563820A Aligning system 失效
标题翻译：对齐系统
公开(公告)号：US4563820A
公开(公告)日：1986-01-14
申请号：US542978
申请日：1983-10-18
申请人： Junji Isohata
发明人： Junji Isohata
IPC分类号： G03B27/32 , B23Q1/38 , G03F7/20 , G03F9/00 , G05D3/00 , H01L21/027 , H01L21/30 , G01B5/24
CPC分类号： G03F7/70691 , B23Q1/385 , G03F9/70 , H01L21/30 , Y10S33/02
摘要： An aligning system for aligning a first object and second object with each other by moving them as a unit through a fluid bearing is adapted to accomplish a coarse alignment by displacing the first and second objects relative to each other and to attain a fine alignment by controlling the supply of pressure to the fluid bearing.
摘要翻译：通过使第一物体和第二物体通过流体轴承移动作为一个单元来对准第一物体和第二物体的对准系统适于通过相对于彼此移动第一和第二物体来实现粗略对准，并通过控制来获得精细对准向流体轴承供应压力。

8. 发明授权

US4422754A Projection-printing apparatus 失效
标题翻译：投影印刷设备
公开(公告)号：US4422754A
公开(公告)日：1983-12-27
申请号：US340843
申请日：1982-01-20
申请人： Junji Isohata , Hironori Yamamoto
发明人： Junji Isohata , Hironori Yamamoto
IPC分类号： G03B27/32 , G03F7/20 , G12B5/00 , H01L21/027 , H01L21/30 , H01L21/68 , G03B27/52 , G03B27/70
CPC分类号： G03F7/70691 , G03F7/70358
摘要： A projection-printing apparatus moves at least one of a mask and a wafer with precise rectilinearity along a guide relative to an optical system for projecting the image of the mask upon the wafer, and in a plane perpendicular to the optical axis of the optical system whereby the image of the mask is printed on the wafer.
摘要翻译：投影印刷装置相对于光学系统沿导向器精确地直线移动掩模和晶片中的至少一个，用于将掩模的图像投影到晶片上，并且在垂直于光学系统的光轴的平面中由此将掩模的图像印刷在晶片上。

9. 发明授权

US4370054A Projection exposure apparatus 失效
标题翻译：投影曝光装置
公开(公告)号：US4370054A
公开(公告)日：1983-01-25
申请号：US260387
申请日：1981-05-04
申请人： Junji Isohata , Hironori Yamamoto
发明人： Junji Isohata , Hironori Yamamoto
IPC分类号： G03F7/20 , G03B27/42
CPC分类号： G03F7/70358
摘要： A projection exposure apparatus in which a mask and a wafer are displaced in a plane perpendicular to the optical axis of the projection optical system to form circuit patterns on the entire surface of the wafer. The mask and wafer are displaced along guides having two guide rails between which are provided means for compensating for non-linearity of one of the guide rails.
摘要翻译：一种投影曝光装置，其中掩模和晶片在垂直于投影光学系统的光轴的平面中移位，以在晶片的整个表面上形成电路图案。掩模和晶片沿着具有两个导轨的引导件移位，在其之间设置有用于补偿导轨之一的非线性的装置。

10. 发明授权

US5359389A Exposure apparatus including two illuminating systems and exposure process using the same 失效
标题翻译：曝光装置包括两个照明系统和使用其的曝光过程
公开(公告)号：US5359389A
公开(公告)日：1994-10-25
申请号：US134857
申请日：1993-10-13
申请人： Junji Isohata
发明人： Junji Isohata
IPC分类号： G02F1/1343 , G02F1/13 , G03F7/20 , H01L21/027 , H01L21/30 , G03B27/42
CPC分类号： G03F7/70466 , G03F7/2028 , G03F7/70233 , G03F7/70358
摘要： Disclosed are an exposure apparatus and process, including a holding unit for holding first and second objects such as a mask and a substrate, a first illumination system for illuminating the first object with an exposure light, a projection optical system for forming an image of a portion such as a pattern portion of the first object illuminated with the exposure light onto the second object and a second illumination system for illuminating a portion such as peripheral portion of the second object held by the holding unit outside of a portion of the second object illuminated with the exposure light from the first illumination system. The exposure apparatus or process may further include a moving unit or step for moving the first and second objects as a unit relative to the projection optical system and a control unit or step for causing the moving unit to move the first and second objects as a unit relative to the projection optical system while causing the first illumination system and the second illumination system to illuminate the first object and the second object, respectively, so that the image of the pattern on the first object is tranferred onto the second object through the projection optical system.
摘要翻译：公开了一种曝光装置和处理方法，其包括用于保持第一和第二物体（例如掩模和基板）的保持单元，用曝光灯照亮第一物体的第一照明系统，用于形成曝光光的图像的投影光学系统将第一物体的图案部分的部分用曝光光照射到第二物体上的第二照明系统和用于照亮由第二物体的周边部分的部分（例如被保持单元所保持的第二物体的外围部分照射到第二物体的一部分的部分）与来自第一照明系统的曝光光。曝光装置或处理可以进一步包括用于相对于投影光学系统移动作为一个单元的第一和第二物体的移动单元或步骤，以及用于使移动单元作为一个单元移动第一和第二物体的控制单元或步骤相对于投影光学系统，同时使第一照明系统和第二照明系统分别照亮第一物体和第二物体，使得第一物体上的图案的图像通过投影光学传递到第二物体上系统。

你已经成功收藏专利！

检索式保存成功!

IPRDB

热门服务

关于我们

友情链接

联系方式