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    • 1. 发明授权
    • Semiconductor photoelectric transducer
    • 半导体光电传感器
    • US4651180A
    • 1987-03-17
    • US559763
    • 1983-12-09
    • Jun-ichi NishizawaTakashige TamamushiKaoru Motoya
    • Jun-ichi NishizawaTakashige TamamushiKaoru Motoya
    • H01L31/10H01L27/146H01L31/112H01L31/113H01L29/80
    • H01L27/14679H01L31/1126H01L31/1136
    • The present invention relates to a semiconductor FET or SIT type photoelectric transducer comprising a source and a drain which are main electrode regions of high impurity density; a high resistivity or intrinsic semiconductor region of the same conductivity type as the main electrode regions and formed therebetween as a current path; and a plurality of gate regions formed by high impurity density regions reverse in conductivity from the main electrode regions and formed in the current path, for controlling a main current; wherein the distance W.sub.1 between a first one of the gate regions on both sides of the source and the source or the drain is greater than the distance W.sub.2 between the other gate region and the source or drain (W.sub.1 >W.sub.2), and wherein the size of the first gate region is smaller than the diffusion length of carriers to be stored in the first gate region. Briefly stated, the present invention is intended to enhance the function of the first gate by selecting the size of the first gate region for storing optical information within the diffusion length of the carriers stored therein, in addition to the selection of the aforementioned distances W.sub.1 and W.sub.2.
    • 本发明涉及包括源极和漏极的半导体FET或SIT型光电转换器,它们是高杂质密度的主电极区域; 与主电极区域相同导电类型的高电阻率或本征半导体区域,并作为电流路径形成; 以及多个栅极区域,其由与所述主电极区域的导电性相反的高杂质浓度区域形成,并形成在所述电流路径中,用于控制主电流; 其中源极和源极或漏极两侧的栅极区域中的第一栅极区域之间的距离W1大于另一栅极区域与源极或漏极之间的距离W2(W1> W2),并且其中尺寸 的第一栅极区域小于要存储在第一栅极区域中的载流子的扩散长度。 简要地说,本发明是为了通过选择用于存储存储在其中的载波的漫射长度内的光学信息的第一栅极区域的尺寸来增强第一栅极的功能,以及选择上述距离W1和 W2。
    • 3. 发明授权
    • Color image sensor
    • US4791396A
    • 1988-12-13
    • US772338
    • 1985-08-28
    • Jun-ichi NishizawaTakashige TamamushiIstvan Barsony
    • Jun-ichi NishizawaTakashige TamamushiIstvan Barsony
    • H01L27/146H01L31/112H04N5/335H04N5/355H04N5/357H01L29/80
    • H01L31/1126H01L27/14679
    • The present invention relates generally to a photodetector, and more particularly to a photodetector formed by a static induction transistor. The present invention includes the following constituent elements:In the photodetector formed by a static induction transistor, an n.sup.+ -type buried layer is provided, as a drain or source region of the photodetector, for limiting the thickness of a high resistivity i-type layer between a p.sup.+ -type region forming a gate and a substrate. Letting the wavelength of light incident to the surface of the photodetector and an absorption coefficient for the incident light be represented by .lambda..sub.i and .alpha..sub.i (.lambda..sub.i), respectively, the distance between the in junction of the abrupt pin junction and the surface of the photodetector x.sub.i is ##EQU1## the ratio between the area A(.lambda..sub.i) of each gate portion for selectively detecting light of the specified wavelength .lambda..sub.i and the total area A.sub.tot of the gate is selected as follows: where e=2.718, .eta.(.lambda..sub.i) is required quantum efficiency for the wavelength .lambda..sub.i and R(.lambda..sub.i) 15 a refractive index for the wavelength .lambda..sub.i, and the thickness Wi of a depletion layer and the maximum depth x.sub.i.sbsb.max of the depletion layer for detecting the specified wavelength .lambda..sub.i are selected as follows: ##EQU2## thereby providing selective spectral responsivity for the specified wavelength .lambda..sub.i. Letting three specified wavelengths of blue, green and red light be represented by .lambda..sub.1, .lambda..sub.2 and .lambda..sub.3, the total area of the gate is A.sub.tot =A(.lambda..sub.1)+A(.lambda..sub.2)+A(.lambda..sub.3). Pixels for detecting the three wavelengths are arranged in a honeycomb-like pattern, as shown in FIG. 8. For obtaining the maximum photodetection sensitivity for the three wavelengths, for example, 460, 550 and 660 nm, the diffusion depth x.sub.jp + of the gate portions and the depletion layer width Wi between the gate and the n.sup.+ -type buried source region are selected as given below in Table 1: TABLE 1 ______________________________________ x.sub.i.sbsb.max Wi x.sub.jp.spsb.+.sbsb.max -x.sub.jn.spsb.+ .lambda. ______________________________________ B 0.63 .mu.m 0.4 0.2 3.0 460 nm G 1.53 .mu.m 0.9 0.5 2.2 550 R 3.57 .mu.m 2.3 1.3 0 660 ______________________________________
    • 7. 发明授权
    • Two-dimensional solid-state image pickup device
    • 二维固态摄像装置
    • US4593320A
    • 1986-06-03
    • US714677
    • 1985-03-21
    • Jun-ichi NishizawaTakashige Tamamushi
    • Jun-ichi NishizawaTakashige Tamamushi
    • H01L27/146H04N5/335H04N5/341H04N5/355H04N5/372H04N5/374H04N3/12
    • H04N3/1512
    • A two-dimensional solid-state image pickup device wherein, in order to make it possible to have a high light detecting sensitivity even to feeble lights and to stably and uniformly detect picture images, picture elements each formed of a static induction transistor having an optical gain of 10.sup.6 to 10.sup.8 and able to detect even such feeble lights as of about 10.sup.-4 .mu.W/cm.sup.2 and a gate capacitor are arranged in a matrix to be a gate accumulating system capable of two-dimensional reading out, the source regions of the respective static induction transistors are connected to common source lines, the respective source lines are connected to the ground through parallelly connected source line selecting transistors and capacitors and the gates of the respective source line selecting transistors are connected respectively to vertical address lines so that, simultaneously with the selection of the vertical address lines, the source lines may be connected to the ground.
    • 一种二维固态摄像装置,其特征在于,为了使得即使是微弱的光也能够具有高的光检测灵敏度并且能够稳定和均匀地检测图像图像,每个由具有光学的静电感应晶体管形成的像素 增益为106到108,并且能够检测到即使是大约10-4μW/ cm2的微弱光,并且栅极电容器以矩阵形式排列成能够二维读出的门积存系统,源区域 各个静态感应晶体管连接到公共源极线,各个源极线通过并联连接的源极线选择晶体管和电容器连接到地,并且各个源极线选择晶体管的栅极分别连接到垂直地址线, 与垂直地址线的选择同时,源极线可以连接到地面。