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1. 发明授权

US08409328B2 Substrate transfer device and substrate transfer method 有权
标题翻译：基板转印装置和基板转印方法
公开(公告)号：US08409328B2
公开(公告)日：2013-04-02
申请号：US12726598
申请日：2010-03-18
申请人： Jun Yamawaku , Junji Oikawa , Hiroyuki Nakayama
发明人： Jun Yamawaku , Junji Oikawa , Hiroyuki Nakayama
IPC分类号： B03C3/016
CPC分类号： H01L21/67781 , H01L21/67017
摘要： A substrate transfer device includes an atmosphere introduction unit and an atmosphere exhaust unit provided at a top and a bottom portion of a main body of the device, respectively; and a substrate transfer mechanism provided between the atmosphere introduction unit and the atmosphere exhaust unit. The substrate transfer device further includes a downward flow forming unit provided, adjacent to the atmosphere introduction unit, to allow an atmosphere to be introduced through the atmosphere introduction unit and to downwardly flow through the substrate transfer mechanism and be exhausted through the atmosphere exhaust unit; and a gas ionizing unit for ionizing the atmosphere and a particle collecting unit for collecting particles included in the atmosphere, the gas ionizing unit and the particle collecting unit being sequentially provided in the direction in which the atmosphere downwardly flows, between the downward flow forming unit and the substrate transfer mechanism.
摘要翻译：基板转印装置包括分别设置在装置的主体的顶部和底部的气氛引入单元和气体排出单元; 以及设置在大气引入单元和大气排气单元之间的基板输送机构。基板转印装置还包括与大气引入单元相邻设置的向下流动形成单元，以允许气氛通过大气引入单元引入并向下流过基板传送机构并通过大气排气单元排出; 和用于使气氛离子化的气体离子化单元和用于收集包含在大气中的颗粒的颗粒收集单元，气体离子化单元和颗粒收集单元沿着大气向下流动的方向依次设置在下流形成单元和基板转印机构。

2. 发明授权

US08398745B2 Substrate processing apparatus and exhaust method therefor 有权
标题翻译：基板处理装置及其排气方法
公开(公告)号：US08398745B2
公开(公告)日：2013-03-19
申请号：US12726612
申请日：2010-03-18
申请人： Jun Yamawaku , Junji Oikawa , Hiroyuki Nakayama
发明人： Jun Yamawaku , Junji Oikawa , Hiroyuki Nakayama
IPC分类号： B03C3/019 , B03C3/36
CPC分类号： H01L21/67017
摘要： A substrate processing apparatus includes a processing chamber for accommodating therein a processing target substrate; a gas exhaust path through which a gas inside the processing chamber is exhausted; one or more exhaust pumps provided in the gas exhaust path; and a scrubber for collecting harmful components from an exhaust gas. The apparatus further includes an ionized gas supply unit for supplying to the gas exhaust path an ionized gas for neutralizing charged particles included in the exhaust gas flowing therethrough.
摘要翻译：基板处理装置包括：处理室，用于在其中容纳加工对象基板; 气体排出通道，处理室内的气体通过该排气路径排出; 设置在排气通道中的一个或多个排气泵; 以及用于从废气中收集有害成分的洗涤器。该装置还包括电离气体供应单元，用于向气体排出通道供应用于中和包含在流过其中的废气中的带电粒子的电离气体。

3. 发明申请

US20100236405A1 SUBSTRATE TRANSFER DEVICE AND SUBSTRATE TRANSFER METHOD 有权
标题翻译：基板传输设备和基板传输方法
公开(公告)号：US20100236405A1
公开(公告)日：2010-09-23
申请号：US12726598
申请日：2010-03-18
申请人： Jun Yamawaku , Junji Oikawa , Hiroyuki Nakayama
发明人： Jun Yamawaku , Junji Oikawa , Hiroyuki Nakayama
IPC分类号： B03C3/00 , B01J19/08 , B03C3/45
CPC分类号： H01L21/67781 , H01L21/67017
摘要： A substrate transfer device includes an atmosphere introduction unit and an atmosphere exhaust unit provided at a top and a bottom portion of a main body of the device, respectively; and a substrate transfer mechanism provided between the atmosphere introduction unit and the atmosphere exhaust unit. The substrate transfer device further includes a downward flow forming unit provided, adjacent to the atmosphere introduction unit, to allow an atmosphere to be introduced through the atmosphere introduction unit and to downwardly flow through the substrate transfer mechanism and be exhausted through the atmosphere exhaust unit; and a gas ionizing unit for ionizing the atmosphere and a particle collecting unit for collecting particles included in the atmosphere, the gas ionizing unit and the particle collecting unit being sequentially provided in the direction in which the atmosphere downwardly flows, between the downward flow forming unit and the substrate transfer mechanism.
摘要翻译：基板转印装置包括分别设置在装置的主体的顶部和底部的气氛引入单元和气体排出单元; 以及设置在大气引入单元和大气排气单元之间的基板输送机构。基板转印装置还包括与大气引入单元相邻设置的向下流动形成单元，以允许气氛通过大气引入单元引入并向下流过基板传送机构并通过大气排气单元排出; 和用于使气氛离子化的气体离子化单元和用于收集包含在大气中的颗粒的颗粒收集单元，气体离子化单元和颗粒收集单元沿着大气向下流动的方向依次设置在下流形成单元和基板转印机构。

4. 发明申请

US20100236406A1 SUBSTRATE PROCESSING APPARATUS AND EXHAUST METHOD THEREFOR 有权
标题翻译：基板加工设备及其排气方法
公开(公告)号：US20100236406A1
公开(公告)日：2010-09-23
申请号：US12726612
申请日：2010-03-18
申请人： Jun Yamawaku , Junji Oikawa , Hiroyuki Nakayama
发明人： Jun Yamawaku , Junji Oikawa , Hiroyuki Nakayama
IPC分类号： B03C3/01 , B03C3/38
CPC分类号： H01L21/67017
摘要： A substrate processing apparatus includes a processing chamber for accommodating therein a processing target substrate; a gas exhaust path through which a gas inside the processing chamber is exhausted; one or more exhaust pumps provided in the gas exhaust path; and a scrubber for collecting harmful components from an exhaust gas. The apparatus further includes an ionized gas supply unit for supplying to the gas exhaust path an ionized gas for neutralizing charged particles included in the exhaust gas flowing therethrough.
摘要翻译：基板处理装置包括：处理室，用于在其中容纳加工对象基板; 气体排出通道，处理室内的气体通过该排气路径排出; 设置在排气通道中的一个或多个排气泵; 以及用于从废气中收集有害成分的洗涤器。该装置还包括电离气体供应单元，用于向气体排出通道供应用于中和包含在流过其中的废气中的带电粒子的电离气体。

5. 发明授权

US09385015B2 Transfer chamber and method for preventing adhesion of particle 有权
标题翻译：转移室和防止颗粒附着的方法
公开(公告)号：US09385015B2
公开(公告)日：2016-07-05
申请号：US12700771
申请日：2010-02-05
申请人： Jun Yamawaku , Junji Oikawa , Hiroyuki Nakayama
发明人： Jun Yamawaku , Junji Oikawa , Hiroyuki Nakayama
IPC分类号： H01L21/677 , H01L21/67
CPC分类号： H01L21/67184 , H01L21/67069 , H01L21/67196 , H01L21/67201 , H01L21/67213 , H01L21/67742 , H01L21/6831
摘要： A transfer chamber is provided between a processing unit for performing a predetermined process on a target substrate to be processed in a depressurized environment and an atmospheric maintaining unit for maintaining the target substrate in an atmospheric environment to transfer the target substrate therebetween. The transfer chamber includes a chamber main body for accommodating the target substrate, a gas exhaust unit for exhausting the chamber main body to set the chamber main body to the depressurized environment, and a gas supply unit for supplying a predetermined gas to the chamber main body to set the chamber main body in the atmospheric environment. Further, in the transfer chamber, an ionization unit is provided outside the chamber main body, for ionizing the predetermined gas and an ionized gas supply unit is provided to supply the ionized gas generated by the ionization unit to the chamber main body.
摘要翻译：传送室设置在用于在减压环境中对要处理的目标基板进行预定处理的处理单元和用于将目标基板保持在大气环境中以在其间传送目标基板的大气保持单元。传送室包括用于容纳目标基板的室主体，用于排出室主体以将室主体设置到减压环境的排气单元，以及用于将预定气体供应到室主体的气体供应单元将室主体设置在大气环境中。此外，在传送室中，离子化单元设置在室主体的外部，用于电离所述预定气体，并且提供电离气体供应单元以将由离子化单元产生的电离气体供应到室主体。

6. 发明申请

US20100214712A1 METHOD FOR CHARGE-NEUTRALIZING TARGET SUBSTRATE AND SUBSTRATE PROCESSING APPARATUS 审中-公开
标题翻译：用于充电中和目标基板和基板处理装置的方法
公开(公告)号：US20100214712A1
公开(公告)日：2010-08-26
申请号：US12710816
申请日：2010-02-23
申请人： Jun YAMAWAKU , Junji Oikawa , Hiroyuki Nakayama
发明人： Jun YAMAWAKU , Junji Oikawa , Hiroyuki Nakayama
IPC分类号： H05F3/04
CPC分类号： H01L21/6833
摘要： A substrate processing apparatus includes a chamber; and a mounting table having an electrostatic attraction portion for electrostatically attracting a target substrate; a heat transfer gas supply system for injecting a heat transfer gas from the electrostatic attraction portion to the target substrate; and a separating unit by which the target substrate is separated from the electrostatic attraction portion. A method for charge-neutralizing a target substrate in the apparatus includes: supplying an ionized gas from the heat transfer gas supply system to the target substrate. The apparatus includes an irradiation unit for irradiating a soft X-ray or an UV beam toward the chamber. In the supplying of the ionized gas, the target substrate is separated from the electrostatic attraction portion by the separating unit, and a soft X-ray or an UV beam is irradiated from the irradiation unit toward a space between the target substrate and the electrostatic attraction portion.
摘要翻译：衬底处理设备包括：腔室; 以及具有用于静电吸引目标基板的静电吸引部的安装台; 用于将传热气体从静电吸引部分喷射到目标基板的传热气体供给系统; 以及分离单元，目标基板通过该分离单元与静电吸引部分分离。一种用于对设备中的目标衬底进行电荷中和的方法包括：将来自传热气体供应系统的电离气体供应到目标衬底。该装置包括用于向腔室照射软X射线或UV光束的照射单元。在供给电离气体时，目标基板通过分离单元与静电吸引部分分离，并且从照射单元向目标基板和静电引力之间的空间照射软X射线或UV光束一部分。

7. 发明申请

US20100202093A1 TRANSFER CHAMBER AND METHOD FOR PREVENTING ADHESION OF PARTICLE 有权
标题翻译：转移室和防止颗粒粘结的方法
公开(公告)号：US20100202093A1
公开(公告)日：2010-08-12
申请号：US12700771
申请日：2010-02-05
申请人： Jun YAMAWAKU , Junji Oikawa , Hiroyuki Nakayama
发明人： Jun YAMAWAKU , Junji Oikawa , Hiroyuki Nakayama
IPC分类号： H01L21/673 , H01L21/677 , H05F3/00
CPC分类号： H01L21/67184 , H01L21/67069 , H01L21/67196 , H01L21/67201 , H01L21/67213 , H01L21/67742 , H01L21/6831
摘要： A transfer chamber is provided between a processing unit for performing a predetermined process on a target substrate to be processed in a depressurized environment and an atmospheric maintaining unit for maintaining the target substrate in an atmospheric environment to transfer the target substrate therebetween. The transfer chamber includes a chamber main body for accommodating the target substrate, a gas exhaust unit for exhausting the chamber main body to set the chamber main body to the depressurized environment, and a gas supply unit for supplying a predetermined gas to the chamber main body to set the chamber main body in the atmospheric environment. Further, in the transfer chamber, an ionization unit is provided outside the chamber main body, for ionizing the predetermined gas and an ionized gas supply unit is provided to supply the ionized gas generated by the ionization unit to the chamber main body.
摘要翻译：传送室设置在用于在减压环境中对要处理的目标基板进行预定处理的处理单元和用于将目标基板保持在大气环境中以在其间传送目标基板的大气保持单元。传送室包括用于容纳目标基板的室主体，用于排出室主体以将室主体设置到减压环境的排气单元，以及用于将预定气体供应到室主体的气体供应单元将室主体设置在大气环境中。此外，在传送室中，离子化单元设置在室主体的外部，用于电离所述预定气体，并且提供电离气体供应单元以将由离子化单元产生的电离气体供应到室主体。

8. 发明授权

US08768644B2 Particle distribution analysis method for computer readable storage medium for storing program for executing the method 有权
标题翻译：用于存储用于执行该方法的程序的计算机可读存储介质的粒子分布分析方法
公开(公告)号：US08768644B2
公开(公告)日：2014-07-01
申请号：US13175219
申请日：2011-07-01
申请人： Kunio Miyauchi , Hiroyuki Nakayama
发明人： Kunio Miyauchi , Hiroyuki Nakayama
IPC分类号： G01N31/00
CPC分类号： G01N15/0625 , G01N15/0227 , G06K9/6212 , G06K9/6218 , H01L22/20
摘要： There is provided a support method for a particle distribution analysis for a substrate. In the support method, histogram data of inter-particle distances are created for all particles on a target substrate subjected to the particle distribution analysis from particle coordinate data of the target substrate. Further, histogram data of inter-particle distances are created for multiple virtual substrates each having the same number of randomly distributed particles as the particles on the target substrate. Based on a difference between the histogram data of the target substrate and the histogram data of each of the virtual substrates, determination data are created by quantifying a distance between the histogram data of the target substrate and the histogram data of the multiple virtual substrates, and the determination data are displayed on a display unit.
摘要翻译：提供了用于衬底的粒子分布分析的支持方法。在支持方法中，通过目标基板的粒子坐标数据，对经过粒子分布分析的目标基板上的所有粒子产生粒子间距离的直方图数据。此外，针对每个具有与目标衬底上的粒子相同数量的随机分布的粒子的多个虚拟衬底创建颗粒间距离的直方图数据。基于目标基板的直方图数据和每个虚拟基板的直方图数据之间的差异，通过量化目标基板的直方图数据与多个虚拟基板的直方图数据之间的距离来创建确定数据，以及确定数据显示在显示单元上。

9. 发明授权

US08337629B2 Method for cleaning elements in vacuum chamber and apparatus for processing substrates 有权
公开(公告)号：US08337629B2
公开(公告)日：2012-12-25
申请号：US13495404
申请日：2012-06-13
申请人： Tsuyoshi Moriya , Hiroshi Nagaike , Hiroyuki Nakayama
发明人： Tsuyoshi Moriya , Hiroshi Nagaike , Hiroyuki Nakayama
IPC分类号： B08B5/00 , B08B7/00
CPC分类号： H01L21/67028 , B08B3/12 , H01J37/32862 , H01L21/6831
摘要： To clean an element in a vacuum chamber by causing particles sticking to the element to scatter, the present invention uses a means for applying a voltage to the element and causing the particles to scatter by utilizing Maxwell's stress, a means for electrically charging the particles and causing the particles to scatter by utilizing the Coulomb force, a means for introducing a gas into the vacuum chamber and causing the particles sticking to the element to scatter by causing a gas shock wave to hit the element, a means for heating the element and causing the particles to scatter by utilizing the thermal stress and thermophoretic force, or a means for causing the particles to scatter by applying mechanical vibrations to the element. The thus scattered particles are removed by carrying them in a gas flow in a relatively high pressure atmosphere.

10. 发明授权

US08330454B2 Position detection magnet and position detection apparatus 有权
标题翻译：位置检测磁铁和位置检测装置
公开(公告)号：US08330454B2
公开(公告)日：2012-12-11
申请号：US12578083
申请日：2009-10-13
申请人： Shigeru Furuki , Satoru Sunada , Hiroyuki Nakayama , Kenji Okamoto
发明人： Shigeru Furuki , Satoru Sunada , Hiroyuki Nakayama , Kenji Okamoto
IPC分类号： G01B7/14
CPC分类号： G01D5/145 , F16H59/0204 , F16H59/105
摘要： A position detection apparatus includes a position detection target member, a magnet that moves in accordance with movement of the position detection target member, and a plurality of magnetic detectors provided on a surface opposite a movement plane of the magnet. A flat yoke is provided on the reverse face of the magnet. The magnetic polarity of a peripheral side part of the magnet is opposite to the magnetic polarity of a center part thereof. The peripheral side part is formed at a regional range that can be defined on the basis of a predetermined distance(s) measured from a side edge of the yoke.
摘要翻译：位置检测装置包括位置检测对象部件，根据位置检测对象部件的移动而移动的磁体以及设置在与磁体的移动面相反的面的多个磁检测器。在磁铁的背面设置有扁平磁轭。磁体的周边侧部分的磁极性与其中心部分的磁极性相反。周边部分形成在可以基于从轭的侧边缘测量的预定距离来限定的区域范围。

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