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1. 发明授权

US08765614B2 Method of forming a metal pattern and method of manufacturing a display substrate including the metal pattern 有权
标题翻译：形成金属图案的方法和制造包括金属图案的显示基板的方法
公开(公告)号：US08765614B2
公开(公告)日：2014-07-01
申请号：US13406388
申请日：2012-02-27
申请人： Jong-Hyun Choung , Ji-Young Park , Seon-Il Kim , Sang-Gab Kim , In-Bae Kim , Jae-Woo Jeong
发明人： Jong-Hyun Choung , Ji-Young Park , Seon-Il Kim , Sang-Gab Kim , In-Bae Kim , Jae-Woo Jeong
IPC分类号： H01L21/302
CPC分类号： C23F1/18 , H01L21/32134 , H01L27/124 , H01L27/1288 , H01L29/458 , H01L29/66765
摘要： A method of forming a metal pattern on a display substrate includes blanket depositing a copper-based layer having a thickness between about 1,500 Å and about 5,500 Å on a base substrate, and forming a patterned photoresist layer on the copper-based layer. The copper-based layer is over-etched by an etching composition containing an oxidizing moderating agent where the over-etch factor is between about 40% and about 200% while using the patterned photoresist layer as an etch stopping layer, and where the etching composition includes ammonium persulfate between about 0.1% by weight and about 50% by weight, includes an azole-based compound between about 0.01% by weight and about 5% by weight and a remainder of water. Thus, reliability of the metal pattern and that of manufacturing a display substrate may be improved.
摘要翻译：在显示基板上形成金属图案的方法包括：在基底基板上铺设厚度在约至约为500埃之间的铜基层，并在铜基层上形成图案化的光致抗蚀剂层。通过含有氧化调节剂的蚀刻组合物对铜基层进行过蚀刻，其中过蚀刻因子在约40％至约200％之间，同时使用图案化的光致抗蚀剂层作为蚀刻停止层，并且其中蚀刻组合物包括约0.1重量％至约50重量％的过硫酸铵，包括约0.01重量％至约5重量％的唑类化合物和剩余的水。因此，可以提高金属图案的可靠性和制造显示基板的可靠性。

2. 发明授权

US09133550B2 Etching composition, method of forming a metal pattern using the etching composition, and method of manufacturing a display substrate 有权
标题翻译：蚀刻组合物，使用蚀刻组合物形成金属图案的方法，以及制造显示基板的方法
公开(公告)号：US09133550B2
公开(公告)日：2015-09-15
申请号：US13433013
申请日：2012-03-28
申请人： In-Bae Kim , Jong-Hyun Choung , Ji-Young Park , Seon-Il Kim , Jae-Woo Jeong , Sang Gab Kim , Sang-Woo Kim , Ki-Beom Lee , Dae-Woo Lee , Sam-Young Cho
发明人： In-Bae Kim , Jong-Hyun Choung , Ji-Young Park , Seon-Il Kim , Jae-Woo Jeong , Sang Gab Kim , Sang-Woo Kim , Ki-Beom Lee , Dae-Woo Lee , Sam-Young Cho
IPC分类号： C09K13/00 , C23F1/18 , C23F1/26 , H01L21/3213 , C09K13/08 , H01L27/12
CPC分类号： C23F1/18 , C09K13/08 , C23F1/26 , H01L21/32134 , H01L27/124
摘要： An etching composition, a method of forming a metal pattern using the etching composition, and a method of manufacturing a display substrate are disclosed. The etching composition includes about 0.1% by weight to about 25% by weight of ammonium persulfate, about 0.1% by weight to about 25% by weight of an organic acid, about 0.01% by weight to about 5% by weight of a chelating agent, about 0.01% by weight to about 5% by weight of a fluoride compound, about 0.01% by weight to about 5% by weight of a chloride compound, about 0.01% by weight to about 2% by weight of an azole-based compound and a remainder of water. Thus, a copper layer may be stably etched to improve a reliability of manufacturing the metal pattern and the display substrate.
摘要翻译：公开了一种蚀刻组合物，使用该蚀刻组合物形成金属图案的方法以及一种制造显示衬底的方法。蚀刻组合物包含约0.1重量％至约25重量％的过硫酸铵，约0.1重量％至约25重量％的有机酸，约0.01重量％至约5重量％的螯合剂，约0.01重量％至约5重量％的氟化物，约0.01重量％至约5重量％的氯化物化合物，约0.01重量％至约2重量％的唑类化合物和余下的水。因此，可以稳定地蚀刻铜层以提高制造金属图案和显示基板的可靠性。

3. 发明申请

US20120318769A1 METHOD OF FORMING A METAL PATTERN AND METHOD OF MANUFACTURING A DISPLAY SUBSTRATE INCLUDING THE METAL PATTERN 有权
标题翻译：形成金属图案的方法和制造包括金属图案的显示基板的方法
公开(公告)号：US20120318769A1
公开(公告)日：2012-12-20
申请号：US13406388
申请日：2012-02-27
申请人： Jong-Hyun Choung , Ji-Young Park , Seon-Il Kim , Sang-Gab Kim , In-Bae Kim , Jae-Woo Jeong
发明人： Jong-Hyun Choung , Ji-Young Park , Seon-Il Kim , Sang-Gab Kim , In-Bae Kim , Jae-Woo Jeong
IPC分类号： C23F1/00 , H01B13/00
CPC分类号： C23F1/18 , H01L21/32134 , H01L27/124 , H01L27/1288 , H01L29/458 , H01L29/66765
摘要： A method of forming a metal pattern on a display substrate includes blanket depositing a copper-based layer having a thickness between about 1,500 Å and about 5,500 Å on a base substrate, and forming a patterned photoresist layer on the copper-based layer. The copper-based layer is over-etched by an etching composition containing an oxidizing moderating agent where the over-etch factor is between about 40% and about 200% while using the patterned photoresist layer as an etch stopping layer, and where the etching composition includes ammonium persulfate between about 0.1% by weight and about 50% by weight, includes an azole-based compound between about 0.01% by weight and about 5% by weight and a remainder of water. Thus, reliability of the metal pattern and that of manufacturing a display substrate may be improved.
摘要翻译：在显示基板上形成金属图案的方法包括：在基底基板上铺设厚度在约至约为500埃之间的铜基层，并在铜基层上形成图案化的光致抗蚀剂层。通过含有氧化调节剂的蚀刻组合物对铜基层进行过蚀刻，其中过蚀刻因子在约40％至约200％之间，同时使用图案化的光致抗蚀剂层作为蚀刻停止层，并且其中蚀刻组合物包括约0.1重量％至约50重量％的过硫酸铵，包括约0.01重量％至约5重量％的唑类化合物和剩余的水。因此，可以提高金属图案的可靠性和制造显示基板的可靠性。

4. 发明授权

US08383437B2 Echtant and method for manufacturing display device using the same 有权
标题翻译：用于制造使用该显示装置的显示装置的方法
公开(公告)号：US08383437B2
公开(公告)日：2013-02-26
申请号：US13223958
申请日：2011-09-01
申请人： Ji-Young Park , Shin-Il Choi , Jong-Hyun Choung , Sang Gab Kim , Seon-Il Kim , Sang-Tae Kim , Joon-Woo Lee , Young-Chul Park , Young-Jun Jin , Kyong-Min Kang , Suck-Jun Lee , O-Byoung Kwon , In-Ho Yu , Sang-Hoon Jang , Min-Ki Lim , Yu-Jin Lee
发明人： Ji-Young Park , Shin-Il Choi , Jong-Hyun Choung , Sang Gab Kim , Seon-Il Kim , Sang-Tae Kim , Joon-Woo Lee , Young-Chul Park , Young-Jun Jin , Kyong-Min Kang , Suck-Jun Lee , O-Byoung Kwon , In-Ho Yu , Sang-Hoon Jang , Min-Ki Lim , Yu-Jin Lee
IPC分类号： H01L21/00
CPC分类号： C09K13/08 , C23F1/18 , C23F1/26 , C23F1/44 , H01L21/32134 , H01L27/1259 , H01L29/41733
摘要： An etchant according to exemplary embodiments of the present invention includes about 0.5 wt % to about 20 wt % of persulfate, about 0.01 wt % to about 2 wt % of a fluorine compound, about 1 wt % to about 10 wt % of inorganic acid, about 0.5 wt % to about 5 wt % of a cyclic amine compound, about 0.1 wt % to about 5 wt % of a chlorine compound, about 0.05 wt % to about 3 wt % of copper salt, about 0.1 wt % to about 10 wt % of organic acid or organic acid salt, and water.
摘要翻译：根据本发明的示例性实施方案的蚀刻剂包括约0.5重量％至约20重量％的过硫酸盐，约0.01重量％至约2重量％的氟化合物，约1重量％至约10重量％的无机酸，约0.5重量％至约5重量％的环胺化合物，约0.1重量％至约5重量％的氯化合物，约0.05重量％至约3重量％的铜盐，约0.1重量％至约10重量％％的有机酸或有机酸盐，和水。

5. 发明授权

US09048430B2 Non-halogenated etchant and method of manufacturing a display substrate using the non-halogenated etchant 有权
标题翻译：非卤化蚀刻剂和使用非卤化蚀刻剂制造显示衬底的方法
公开(公告)号：US09048430B2
公开(公告)日：2015-06-02
申请号：US13330657
申请日：2011-12-19
申请人： Seon-Il Kim , Shin-Il Choi , Ji-Young Park , Sang-Gab Kim , O-Byoung Kwon , Dong-Ki Kim , Sang-Tae Kim , Young-Chul Park , In-Ho Yu , Young-Jin Yoon , Suck-Jun Lee , Joon-Woo Lee , Min-Ki Lim , Sang-Hoon Jang , Young-Jun Jin
发明人： Seon-Il Kim , Shin-Il Choi , Ji-Young Park , Sang-Gab Kim , O-Byoung Kwon , Dong-Ki Kim , Sang-Tae Kim , Young-Chul Park , In-Ho Yu , Young-Jin Yoon , Suck-Jun Lee , Joon-Woo Lee , Min-Ki Lim , Sang-Hoon Jang , Young-Jun Jin
IPC分类号： H01L21/00 , H01L51/00
CPC分类号： H01L51/0023 , H01L2251/308
摘要： Exemplary embodiments of the present invention disclose a non-halogenated etchant for etching an indium oxide layer and a method of manufacturing a display substrate using the non-halogenated etchant, the non-halogenated etchant including nitric acid, sulfuric acid, a corrosion inhibitor including ammonium, a cyclic amine-based compound, and water.
摘要翻译：本发明的示例性实施方案公开了用于蚀刻氧化铟层的非卤化蚀刻剂和使用非卤化蚀刻剂制造显示衬底的方法，非卤化蚀刻剂包括硝酸，硫酸，包括铵的腐蚀抑制剂，环胺类化合物和水。

6. 发明授权

US5506683A Non-contact measuring apparatus for the section profile of a tire and its method 失效
标题翻译：轮胎截面轮廓的非接触式测量装置及其方法
公开(公告)号：US5506683A
公开(公告)日：1996-04-09
申请号：US693297
申请日：1991-04-30
申请人： Yoon-Mo Yang , Jae-Moon Jeong , Seon-Il Kim , Ki-Jeon Kim
发明人： Yoon-Mo Yang , Jae-Moon Jeong , Seon-Il Kim , Ki-Jeon Kim
IPC分类号： G01B11/24 , B25J13/08 , B25J19/04 , G01B11/25 , G06T1/00
CPC分类号： G01B11/2504 , G01B11/2518 , G01M17/027
摘要： This invention comprises a sensor (40) having a slit-ray generator (41) and a camera (42), a calibration block (100) for calibrating 3-dimensional coordinate values, a computer (10) for processing 2-dimensional coordinate values of the calibration block (100) and the object (90) to obtain data of 3-dimensional space coordinate and output it to CRT (60), a robot hand (10) for moving the sensor (40) on multiple axes. Therefore, this invention can measure the section profile shape of a tire, etc. accurately and quickly.
摘要翻译：本发明包括具有狭缝射线发生器（41）和相机（42）的传感器（40），用于校准三维坐标值的校准块（100），用于处理二维坐标值的计算机（10）的校准块（100）和物体（90），以获得三维空间坐标的数据并将其输出到CRT（60），用于在多个轴上移动传感器（40）的机器人手（10）。因此，本发明可以精确而快速地测量轮胎等的截面形状。

7. 发明授权

US5243872A Robotic hand for controlling movement in multiple axes 失效
标题翻译：用于控制多轴运动的机器手
公开(公告)号：US5243872A
公开(公告)日：1993-09-14
申请号：US866631
申请日：1992-04-10
申请人： Yoon-Mo Yang , Jae-Moon Jeong , Seon-Il Kim , Ki-Jeon Kim
发明人： Yoon-Mo Yang , Jae-Moon Jeong , Seon-Il Kim , Ki-Jeon Kim
IPC分类号： B25J9/16 , G01B11/25
CPC分类号： B25J9/1612 , G01B11/2504 , G01B11/2518 , Y10T74/20207
摘要： A robotic hand controls movement of a workpiece relative to three longitudinal axes in response to three control signals and relative to mutually perpendicular rotational axes .alpha. and .beta. in response to two control signals. Two C-shaped holders carry two motors having mutually perpendicular rotating shafts. Each holder includes two parallel flanges connected together by a web. The first motor is mounted on the first holder so its shaft extends between the first holder flanges. A second holder flange is mounted on the first motor shaft between the first holder flanges. The second motor is mounted on the second holder other flange. A carrier for the first holder responds to three of the signals which control movement of the first holder relative to the longitudinal axes.
摘要翻译：响应于三个控制信号和相对于相互垂直的旋转轴α和β响应于两个控制信号，机器人手控制工件相对于三个纵轴的运动。两个C形支架带有两个具有相互垂直旋转轴的电动机。每个保持器包括通过腹板连接在一起的两个平行凸缘。第一电动机安装在第一保持器上，使其轴在第一保持器凸缘之间延伸。第二保持器法兰安装在第一电动机轴之间的第一保持器法兰之间。第二个电机安装在第二个保持架上的其他法兰上。用于第一保持器的载体响应于控制第一保持器相对于纵向轴线的运动的三个信号。

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