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1. 发明授权

US08765614B2 Method of forming a metal pattern and method of manufacturing a display substrate including the metal pattern 有权
标题翻译：形成金属图案的方法和制造包括金属图案的显示基板的方法
公开(公告)号：US08765614B2
公开(公告)日：2014-07-01
申请号：US13406388
申请日：2012-02-27
申请人： Jong-Hyun Choung , Ji-Young Park , Seon-Il Kim , Sang-Gab Kim , In-Bae Kim , Jae-Woo Jeong
发明人： Jong-Hyun Choung , Ji-Young Park , Seon-Il Kim , Sang-Gab Kim , In-Bae Kim , Jae-Woo Jeong
IPC分类号： H01L21/302
CPC分类号： C23F1/18 , H01L21/32134 , H01L27/124 , H01L27/1288 , H01L29/458 , H01L29/66765
摘要： A method of forming a metal pattern on a display substrate includes blanket depositing a copper-based layer having a thickness between about 1,500 Å and about 5,500 Å on a base substrate, and forming a patterned photoresist layer on the copper-based layer. The copper-based layer is over-etched by an etching composition containing an oxidizing moderating agent where the over-etch factor is between about 40% and about 200% while using the patterned photoresist layer as an etch stopping layer, and where the etching composition includes ammonium persulfate between about 0.1% by weight and about 50% by weight, includes an azole-based compound between about 0.01% by weight and about 5% by weight and a remainder of water. Thus, reliability of the metal pattern and that of manufacturing a display substrate may be improved.
摘要翻译：在显示基板上形成金属图案的方法包括：在基底基板上铺设厚度在约至约为500埃之间的铜基层，并在铜基层上形成图案化的光致抗蚀剂层。通过含有氧化调节剂的蚀刻组合物对铜基层进行过蚀刻，其中过蚀刻因子在约40％至约200％之间，同时使用图案化的光致抗蚀剂层作为蚀刻停止层，并且其中蚀刻组合物包括约0.1重量％至约50重量％的过硫酸铵，包括约0.01重量％至约5重量％的唑类化合物和剩余的水。因此，可以提高金属图案的可靠性和制造显示基板的可靠性。

2. 发明申请

US20130180947A1 ETCHING COMPOSITION AND METHOD OF MANUFACTURING A DISPLAY SUBSTRATE USING THE SAME 审中-公开
标题翻译：蚀刻组合物和使用其制造显示基板的方法
公开(公告)号：US20130180947A1
公开(公告)日：2013-07-18
申请号：US13588825
申请日：2012-08-17
申请人： In-Bae KIM , Jae-Woo JEONG , Sang-Gab KIM , Ji-Young PARK , Jong-Hyun CHOUNG , Seon-il KIM , Yong-Sung SONG , Jong-Hyun OH
发明人： In-Bae KIM , Jae-Woo JEONG , Sang-Gab KIM , Ji-Young PARK , Jong-Hyun CHOUNG , Seon-il KIM , Yong-Sung SONG , Jong-Hyun OH
IPC分类号： C09K13/06 , H01B13/00 , C09K13/00
CPC分类号： C09K13/06 , H01L27/124 , H01L27/1259
摘要： An etching composition that includes, based on the total weight of the etching composition, from about 0.05% to about 15% by weight of a halogen-containing compound, from about 0.1% to about 20% by weight of a nitrate compound, from about 0.1% to about 10% by weight of an acetate compound, from about 0.1% to about 10% by weight of a cyclic amine compound, from about 0% to about 50% by weight of a polyhydric alcohol, and a remainder of water.
摘要翻译：一种蚀刻组合物，其基于蚀刻组合物的总重量计包含约0.05重量％至约15重量％的含卤素化合物，约0.1重量％至约20重量％的硝酸盐化合物，约为 0.1重量％至约10重量％的乙酸酯化合物，约0.1重量％至约10重量％的环胺化合物，约0重量％至约50重量％的多元醇，剩余的水。

3. 发明授权

US08436256B2 Fixing device for shield can 有权
标题翻译：屏蔽罐固定装置
公开(公告)号：US08436256B2
公开(公告)日：2013-05-07
申请号：US12912280
申请日：2010-10-26
申请人： Kun-Tak Kim , Soon-Wan Chung , Jae-Woo Jeong , Min-Young Park , Se-Young Jang
发明人： Kun-Tak Kim , Soon-Wan Chung , Jae-Woo Jeong , Min-Young Park , Se-Young Jang
IPC分类号： H05K9/00
CPC分类号： H05K9/0022
摘要： A shield can fixing device of an electronic device is provided. The fixing device includes a base having a specific length and attached to a shield can fixing line of the printed circuit board, a pair of panels, each of which is bent upwards and formed on the base to have a slit between them for inserting a lateral portion of the shield can, at least one opening portion formed in any one or both of the panels, and an insertion protrusion formed in the lateral portion located in a corresponding position to the opening portion in a protruding manner to ensure a fixing force of the shield can. The shield can fixing device is fixed by inserting a lateral portion of a shield can between double walls.
摘要翻译：提供电子装置的屏蔽可以固定装置。定影装置包括具有特定长度的基座并且附着到印刷电路板的屏蔽罐固定线上，一对面板，每个面板向上弯曲并形成在基座上以在它们之间具有狭缝以插入侧面屏蔽件的一部分可以形成在任何一个或两个面板中的至少一个开口部分和形成在侧面部分中的插入突起，该插入突起以突出的方式位于与开口部分相对应的位置，以确保所述屏蔽件的固定力盾可以。通过将屏蔽罐的侧面部分插入双壁之间来固定屏蔽件固定装置。

4. 发明申请

US20110094791A1 FIXING DEVICE FOR SHIELD CAN 有权
标题翻译：固定装置固定装置
公开(公告)号：US20110094791A1
公开(公告)日：2011-04-28
申请号：US12912280
申请日：2010-10-26
申请人： Kun-Tak KIM , Soon-Wan CHUNG , Jae-Woo JEONG , Min-Young PARK , Se-Young JANG
发明人： Kun-Tak KIM , Soon-Wan CHUNG , Jae-Woo JEONG , Min-Young PARK , Se-Young JANG
IPC分类号： H05K9/00
CPC分类号： H05K9/0022
摘要： A shield can fixing device of an electronic device is provided. The fixing device includes a base having a specific length and attached to a shield can fixing line of the printed circuit board, a pair of panels, each of which is bent upwards and formed on the base to have a slit between them for inserting a lateral portion of the shield can, at least one opening portion formed in any one or both of the panels, and an insertion protrusion formed in the lateral portion located in a corresponding position to the opening portion in a protruding manner to ensure a fixing force of the shield can. The shield can fixing device is fixed by inserting a lateral portion of a shield can between double walls.
摘要翻译：提供电子装置的屏蔽可以固定装置。定影装置包括具有特定长度的基座并且附着到印刷电路板的屏蔽罐固定线上，一对面板，每个面板向上弯曲并形成在基座上以在它们之间具有狭缝以插入侧面屏蔽件的一部分可以形成在任何一个或两个面板中的至少一个开口部分和形成在侧面部分中的插入突起，该突出部分以突出的方式位于与开口部分相对应的位置，以确保所述屏蔽件的固定力盾可以。通过将屏蔽罐的侧面部分插入双壁之间来固定屏蔽件固定装置。

5. 发明申请

US20130034923A1 ETCHING COMPOSITION, METHOD OF FORMING A METAL PATTERN USING THE ETCHING COMPOSITION, AND METHOD OF MANUFACTURING A DISPLAY SUBSTRATE 有权
标题翻译：蚀刻组合物，使用蚀刻组合物形成金属图案的方法，以及制造显示基板的方法
公开(公告)号：US20130034923A1
公开(公告)日：2013-02-07
申请号：US13433013
申请日：2012-03-28
申请人： In-Bae KIM , Jong-Hyun CHOUNG , Ji-Young PARK , Seon-Il KIM , Jae-Woo JEONG , Sang Gab KIM , Sang-Woo KIM , Ki-Beom LEE , Dae-Woo LEE , Sam-Young CHO
发明人： In-Bae KIM , Jong-Hyun CHOUNG , Ji-Young PARK , Seon-Il KIM , Jae-Woo JEONG , Sang Gab KIM , Sang-Woo KIM , Ki-Beom LEE , Dae-Woo LEE , Sam-Young CHO
IPC分类号： H01L33/08 , C09K13/08 , C23F1/02 , C09K13/00
CPC分类号： C23F1/18 , C09K13/08 , C23F1/26 , H01L21/32134 , H01L27/124
摘要： An etching composition, a method of forming a metal pattern using the etching composition, and a method of manufacturing a display substrate are disclosed. The etching composition includes about 0.1% by weight to about 25% by weight of ammonium persulfate, about 0.1% by weight to about 25% by weight of an organic acid, about 0.01% by weight to about 5% by weight of a chelating agent, about 0.01% by weight to about 5% by weight of a fluoride compound, about 0.01% by weight to about 5% by weight of a chloride compound, about 0.01% by weight to about 2% by weight of an azole-based compound and a remainder of water. Thus, a copper layer may be stably etched to improve a reliability of manufacturing the metal pattern and the display substrate.
摘要翻译：公开了一种蚀刻组合物，使用该蚀刻组合物形成金属图案的方法以及一种制造显示衬底的方法。蚀刻组合物包含约0.1重量％至约25重量％的过硫酸铵，约0.1重量％至约25重量％的有机酸，约0.01重量％至约5重量％的螯合剂，约0.01重量％至约5重量％的氟化物，约0.01重量％至约5重量％的氯化物化合物，约0.01重量％至约2重量％的唑类化合物和余下的水。因此，可以稳定地蚀刻铜层以提高制造金属图案和显示基板的可靠性。

6. 发明授权

US6044167A Method for verifying the accuracy of an electronic map using an irregular unit object verification algorism 失效
标题翻译：使用不规则单元对象验证算法验证电子地图精度的方法
公开(公告)号：US6044167A
公开(公告)日：2000-03-28
申请号：US863319
申请日：1997-05-27
申请人： Sung Ryong Kim , Young Man Kim , Song Hoon Baik , Hyo Sil Kim , Jae Woo Jeong
发明人： Sung Ryong Kim , Young Man Kim , Song Hoon Baik , Hyo Sil Kim , Jae Woo Jeong
IPC分类号： G06K19/00 , H04N1/00 , G06K9/00
CPC分类号： H04N1/00005 , H04N1/00002 , H04N1/00034 , H04N1/00037
摘要： A method for automatically verifying the accuracy of an electronic map by an algorism which is adapted to verify irregular unit objects on the electronic map, thereby reducing the verification time and costs while obtaining improved verification accuracy. The method includes the steps of calculating a desired number of unit straight lines to be included in a broken line, overlapping an image, which is indicative of raster data transformed from vector data obtained based on original raster data of an original map, with an image indicative of the original raster data, thereby calculating the number of overlapping unit straight lines, and verifying the accuracy of the electronic map, based on the calculated results along with desired limitations associated with those results.
摘要翻译：一种用于通过适于验证电子地图上的不规则单元对象的算法来自动验证电子地图的精度的方法，从而在获得改进的验证精度的同时减少验证时间和成本。该方法包括以下步骤：计算要包括在虚线中的单位直线的期望数量，与图像重叠，该图像指示从基于原始地图的原始光栅数据获得的矢量数据变换的光栅数据与图像指示原始光栅数据，由此计算重叠单位直线的数量，并且基于所计算的结果以及与这些结果相关联的期望限制来验证电子地图的准确性。

7. 发明申请

US20080246692A1 FOLDABLE MULTI-DISPLAY APPARATUS 审中-公开
标题翻译：可折叠多画面设备
公开(公告)号：US20080246692A1
公开(公告)日：2008-10-09
申请号：US11954299
申请日：2007-12-12
申请人： Jae-Woo JEONG , In-seo KEE , Joong-kyung PARK , Young-gu LEE , Hong-shik SHIM
发明人： Jae-Woo JEONG , In-seo KEE , Joong-kyung PARK , Young-gu LEE , Hong-shik SHIM
IPC分类号： G09G5/00
CPC分类号： G06F1/1681 , G06F1/1618 , G06F1/1641 , H04M1/0216 , H04M1/0235 , H04M2250/16
摘要： Provided is a foldable multi-display apparatus that forms a foldable type large screen by connecting housings in which unit display panels are supported. The foldable multi-display apparatus includes a sliding member that moves the unit display panel supported by the housing towards the adjacent unit display panel when an unfolding operation is completed. The foldable multi-display apparatus can prevent scratching between the unit display panels during unfolding operations, thereby having increased reliability and lifespan.
摘要翻译：提供一种通过连接支撑单元显示面板的壳体形成折叠式大屏幕的可折叠多显示装置。可折叠多显示装置包括滑动构件，当展开操作完成时，滑动构件将由壳体支撑的单元显示面板朝向相邻单元显示面板移动。可折叠多显示装置可以防止在展开操作期间单元显示面板之间的划伤，从而具有增加的可靠性和寿命。

8. 发明授权

US09133550B2 Etching composition, method of forming a metal pattern using the etching composition, and method of manufacturing a display substrate 有权
标题翻译：蚀刻组合物，使用蚀刻组合物形成金属图案的方法，以及制造显示基板的方法
公开(公告)号：US09133550B2
公开(公告)日：2015-09-15
申请号：US13433013
申请日：2012-03-28
申请人： In-Bae Kim , Jong-Hyun Choung , Ji-Young Park , Seon-Il Kim , Jae-Woo Jeong , Sang Gab Kim , Sang-Woo Kim , Ki-Beom Lee , Dae-Woo Lee , Sam-Young Cho
发明人： In-Bae Kim , Jong-Hyun Choung , Ji-Young Park , Seon-Il Kim , Jae-Woo Jeong , Sang Gab Kim , Sang-Woo Kim , Ki-Beom Lee , Dae-Woo Lee , Sam-Young Cho
IPC分类号： C09K13/00 , C23F1/18 , C23F1/26 , H01L21/3213 , C09K13/08 , H01L27/12
CPC分类号： C23F1/18 , C09K13/08 , C23F1/26 , H01L21/32134 , H01L27/124
摘要： An etching composition, a method of forming a metal pattern using the etching composition, and a method of manufacturing a display substrate are disclosed. The etching composition includes about 0.1% by weight to about 25% by weight of ammonium persulfate, about 0.1% by weight to about 25% by weight of an organic acid, about 0.01% by weight to about 5% by weight of a chelating agent, about 0.01% by weight to about 5% by weight of a fluoride compound, about 0.01% by weight to about 5% by weight of a chloride compound, about 0.01% by weight to about 2% by weight of an azole-based compound and a remainder of water. Thus, a copper layer may be stably etched to improve a reliability of manufacturing the metal pattern and the display substrate.
摘要翻译：公开了一种蚀刻组合物，使用该蚀刻组合物形成金属图案的方法以及一种制造显示衬底的方法。蚀刻组合物包含约0.1重量％至约25重量％的过硫酸铵，约0.1重量％至约25重量％的有机酸，约0.01重量％至约5重量％的螯合剂，约0.01重量％至约5重量％的氟化物，约0.01重量％至约5重量％的氯化物化合物，约0.01重量％至约2重量％的唑类化合物和余下的水。因此，可以稳定地蚀刻铜层以提高制造金属图案和显示基板的可靠性。

9. 发明申请

US20120318769A1 METHOD OF FORMING A METAL PATTERN AND METHOD OF MANUFACTURING A DISPLAY SUBSTRATE INCLUDING THE METAL PATTERN 有权
标题翻译：形成金属图案的方法和制造包括金属图案的显示基板的方法
公开(公告)号：US20120318769A1
公开(公告)日：2012-12-20
申请号：US13406388
申请日：2012-02-27
申请人： Jong-Hyun Choung , Ji-Young Park , Seon-Il Kim , Sang-Gab Kim , In-Bae Kim , Jae-Woo Jeong
发明人： Jong-Hyun Choung , Ji-Young Park , Seon-Il Kim , Sang-Gab Kim , In-Bae Kim , Jae-Woo Jeong
IPC分类号： C23F1/00 , H01B13/00
CPC分类号： C23F1/18 , H01L21/32134 , H01L27/124 , H01L27/1288 , H01L29/458 , H01L29/66765
摘要： A method of forming a metal pattern on a display substrate includes blanket depositing a copper-based layer having a thickness between about 1,500 Å and about 5,500 Å on a base substrate, and forming a patterned photoresist layer on the copper-based layer. The copper-based layer is over-etched by an etching composition containing an oxidizing moderating agent where the over-etch factor is between about 40% and about 200% while using the patterned photoresist layer as an etch stopping layer, and where the etching composition includes ammonium persulfate between about 0.1% by weight and about 50% by weight, includes an azole-based compound between about 0.01% by weight and about 5% by weight and a remainder of water. Thus, reliability of the metal pattern and that of manufacturing a display substrate may be improved.
摘要翻译：在显示基板上形成金属图案的方法包括：在基底基板上铺设厚度在约至约为500埃之间的铜基层，并在铜基层上形成图案化的光致抗蚀剂层。通过含有氧化调节剂的蚀刻组合物对铜基层进行过蚀刻，其中过蚀刻因子在约40％至约200％之间，同时使用图案化的光致抗蚀剂层作为蚀刻停止层，并且其中蚀刻组合物包括约0.1重量％至约50重量％的过硫酸铵，包括约0.01重量％至约5重量％的唑类化合物和剩余的水。因此，可以提高金属图案的可靠性和制造显示基板的可靠性。

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