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1. 发明授权

US5336325A Enhanced vertical thermal reactor system 失效
标题翻译：增强立式热反应堆系统
公开(公告)号：US5336325A
公开(公告)日：1994-08-09
申请号：US644235
申请日：1991-01-18
申请人： John J. Devilbiss , Steve Lugosi , Robert G. Ozarski
发明人： John J. Devilbiss , Steve Lugosi , Robert G. Ozarski
IPC分类号： F27B17/00 , H01L21/00 , H01L21/677 , C23C16/00
CPC分类号： H01L21/67115 , F27B17/0025 , H01L21/67769 , H01L21/67778 , Y10S414/137
摘要： An enhanced vertical thermal reactor system provides three isolated chambers including a wafer handling chamber, a process chamber including an elevator, and a cool down chamber, each sealed from the other. The sealing of these individual chambers, each from the other, has the effect of minimizing processing delays associated with the cooling process and the loading and unloading process to thereby improve the productivity of the furnace. The process chamber includes non-metallic media such that it can be operated in oxidation systems so that corrosive acids will not affect the process chamber operation.
摘要翻译：增强的垂直热反应器系统提供三个隔离的室，包括晶片处理室，包括电梯的处理室和冷却室，每个冷却室彼此密封。这些各个腔室彼此的密封具有使与冷却过程和加载和卸载过程相关联的加工延迟最小化的效果，从而提高炉的生产率。处理室包括非金属介质，使得其可以在氧化系统中操作，使得腐蚀性酸不会影响处理室操作。

2. 发明授权

US06396062B1 Portable laser beam monitor 有权
标题翻译：便携式激光束监视器
公开(公告)号：US06396062B1
公开(公告)日：2002-05-28
申请号：US09454693
申请日：1999-12-03
申请人： Jesse D. Buck , Robert G. Ozarski
发明人： Jesse D. Buck , Robert G. Ozarski
IPC分类号： G01J142
CPC分类号： G03F7/70483 , G01J1/4257 , G01J1/58
摘要： A portable laser beam monitor utilizes a plurality of optical trains to monitor ultraviolet laser beam profiles at a plurality of positions along a laser beam path. A preferred embodiment useful for monitoring beam profiles of lithography lasers measures the beam profile at the front aperture, the rear aperture, the shutter plane and at infinity (the divergence plane). The beam profiles are imaged on a fluorescent screen which is monitored by a visible light camera. Images of the profiles may be discharged on the screen of a lap top computer.
摘要翻译：便携式激光束监视器利用多个光学列车来监视沿着激光束路径的多个位置处的紫外激光束轮廓。用于监测光刻激光器的光束轮廓的优选实施例测量前孔，后孔，快门平面和无限远（发散平面）处的光束轮廓。光束轮廓在由可见光相机监测的荧光屏上成像。配置文件的图像可能会在笔记本电脑的屏幕上放电。

3. 发明授权

US06229639B1 Multiplexer for laser lithography 失效
标题翻译：用于激光光刻的多路复用器
公开(公告)号：US06229639B1
公开(公告)日：2001-05-08
申请号：US09112631
申请日：1998-07-09
申请人： Robert G. Ozarski , Alexander I. Ershov
发明人： Robert G. Ozarski , Alexander I. Ershov
IPC分类号： G02B2608
CPC分类号： G03F7/7005 , G03F7/70991
摘要： A laser lithography system in which two or more lasers provide laser illumination for two or more lithography exposure tools through a laser beam multiplexer. The mulitplexer contain several mirror devices each having a multi-reflectance mirror with surfaces of different reflectance and an adjusting mechanism for positioning one of the surfaces to intersect a laser beam from at least one of the lasers and direct a portion of it to at least one of the exposure tools.
摘要翻译：激光光刻系统，其中两个或更多个激光器通过激光束多路复用器为两个或更多个光刻曝光工具提供激光照明。多路复用器包含多个反射镜装置，每个反射镜具有不同反射率的表面的多反射镜，以及调整机构，用于将一个表面定位成与来自至少一个激光器的激光束交叉，并将其一部分引导至至少一个的曝光工具。

4. 发明授权

US5991324A Reliable. modular, production quality narrow-band KRF excimer laser 失效
标题翻译：可靠。模块化，生产质量好的窄带KRF准分子激光器
公开(公告)号：US5991324A
公开(公告)日：1999-11-23
申请号：US41474
申请日：1998-03-11
申请人： David S. Knowles , James H. Azzola , Herve A. Besaucele , Palash P. Das , Alexander I. Ershov , Igor V. Fomenkov , Tibor Juhasz , Robert G. Ozarski , William N. Partlo , Daniel A. Rothweil , Richard L. Sandstrom , Richard C. Ujazdowski , Tom A. Watson , Richard M. Ness
发明人： David S. Knowles , James H. Azzola , Herve A. Besaucele , Palash P. Das , Alexander I. Ershov , Igor V. Fomenkov , Tibor Juhasz , Robert G. Ozarski , William N. Partlo , Daniel A. Rothweil , Richard L. Sandstrom , Richard C. Ujazdowski , Tom A. Watson , Richard M. Ness
IPC分类号： H01S3/038 , G03F7/20 , H01S3/02 , H01S3/03 , H01S3/036 , H01S3/0971 , H01S3/1055 , H01S3/139 , H01S3/225 , H01S3/22
CPC分类号： G01J9/0246 , G03F7/70025 , G03F7/70041 , G03F7/70358 , G03F7/70558 , G03F7/70575 , H01S3/02 , H01S3/03 , H01S3/036 , H01S3/0971 , H01S3/1055 , H01S3/225 , H01S3/1392
摘要： A reliable, modular, production quality narrow-band KrF excimer laser capable of producing 10 mJ laser pulses at 1000 Hz with a bandwidth of about 0.6 pm or less. The present invention is especially suited to long-term round-the-clock operation in the lithographic production of integrated circuits. Improvements over prior art lasers include a single upstream preionizer tube and acoustic baffles. A preferred embodiment includes reduced fluorine concentration, an anode support bar shaped to reduce aerodynamic reaction forces on blower bearings, a modified pulse power system providing faster pulse rise time, an output coupler with substantially increased reflectivity, a line narrowing module with CaF prism beam expanders, a more accurate wavemeter, a laser computer controller programmed with new and improved pulse energy control algorithm.
摘要翻译：一种可靠，模块化，生产质量好的窄带KrF准分子激光器，能够以1000Hz的频率产生10mJ的激光脉冲，带宽约为0.6μm或更小。本发明特别适用于集成电路的平版印刷生产中的长期全天候操作。现有技术的激光器的改进包括单个上游预分解器管和声学挡板。优选的实施例包括减少的氟浓度，阳极支撑杆形状以减小鼓风机轴承上的空气动力反作用力，改进的脉冲电源系统提供更快的脉冲上升时间，输出耦合器具有显着增加的反射率，具有CaF棱镜扩束器的线窄化模块，更准确的波长计，激光计算机控制器编程，具有新的改进的脉冲能量控制算法。

5. 发明授权

US4857738A Absorption measurements of materials 失效
标题翻译：材料的吸收测量
公开(公告)号：US4857738A
公开(公告)日：1989-08-15
申请号：US135119
申请日：1987-12-18
申请人： David W. Myers , Robert G. Ozarski , Thiloma I. Perera , John F. Schipper , Raul V. Tan , Michael P. C. Watts
发明人： David W. Myers , Robert G. Ozarski , Thiloma I. Perera , John F. Schipper , Raul V. Tan , Michael P. C. Watts
IPC分类号： G01N21/84 , G03F7/20
CPC分类号： G03F7/70483 , G01N21/8422
摘要： Two methods of determination of the chemical changes induced in a film of material such as photoresist that has been exposed to electromagnetic radiation. Two methods use measurement of polarized light reflected by the film mounted on a substrate to determine a real refractive index or a complex refractive index of the film. Two other methods use measurement of polarized light by the film mounted on a (partly) transparent substrate to determine a real refractive index or a complex refractive index of the film.
摘要翻译：确定在已经暴露于电磁辐射的光致抗蚀剂等材料的膜中引起的化学变化的两种方法。两种方法使用由安装在衬底上的膜反射的偏振光的测量来确定膜的实际折射率或复折射率。另外两种方法使用通过安装在（部分）透明衬底上的膜来测量偏振光，以确定膜的实际折射率或复合折射率。

6. 发明授权

US6067306A Laser-illuminated stepper or scanner with energy sensor feedback 失效
标题翻译：具有能量传感器反馈的激光照明步进或扫描仪
公开(公告)号：US6067306A
公开(公告)日：2000-05-23
申请号：US81374
申请日：1998-05-19
申请人： Richard L. Sandstrom , Palash P. Das , Igor V. Fomenkov , Herve A. Besaucele , Robert G. Ozarski
发明人： Richard L. Sandstrom , Palash P. Das , Igor V. Fomenkov , Herve A. Besaucele , Robert G. Ozarski
IPC分类号： G03F7/20 , H01S3/03 , H01S3/036 , H01S3/08 , H01S3/134 , H01S3/225 , H01S3/00
CPC分类号： G03F7/70025 , G03F7/70041 , G03F7/70358 , G03F7/70558 , G03F7/70575 , H01S3/03 , H01S3/134 , H01S3/225 , H01S3/036 , H01S3/08009 , H01S3/2251 , H01S3/2256
摘要： A laser-illuminated wafer-exposing system such as a stepper or scanner having a first light intensity detector located within the exposing system near a mask and second light intensity detector located near the output of the laser. A feedback control system controls the output of the laser based on signals detected by at least one of the detectors. The feedback control system includes a processor programmed with an algorithm which is used to control the laser discharge voltage in order to provide light pulses having desired intensity at the mask with the laser operating in a burst mode. The algorithm utilizes at least the following parameters; a previously measured pulse energy, a calculated energy error, a calculated dose error, a value for the rate of change of pulse energy with voltage, and at least one reference voltage. In a preferred embodiment the algorithm uses the pulse energy measured with the light intensity detector located near the mark to provide the feedback control and uses the light intensity detector at the output of the laser to assure that the output of the laser is maintained within a predetermined range.
摘要翻译：激光照射的晶片曝光系统，例如步进器或扫描仪，其具有位于掩模附近的曝光系统内的第一光强度检测器和位于激光器输出附近的第二光强度检测器。反馈控制系统基于由至少一个检测器检测到的信号来控制激光器的输出。反馈控制系统包括用算法编程的处理器，该算法用于控制激光放电电压，以在激光器以突发模式工作的情况下在掩模处提供具有期望强度的光脉冲。该算法至少使用以下参数; 先前测量的脉冲能量，计算的能量误差，计算的剂量误差，脉冲能量随电压的变化率的值和至少一个参考电压。在优选实施例中，算法使用位于标记附近的光强度检测器测量的脉冲能量来提供反馈控制，并且在激光器的输出处使用光强度检测器，以确保激光器的输出保持在预定的范围。

7. 发明授权

US5978405A Laser chamber with minimized acoustic and shock wave disturbances 失效
标题翻译：激光室具有最小化的声波和冲击波干扰
公开(公告)号：US5978405A
公开(公告)日：1999-11-02
申请号：US36158
申请日：1998-03-06
申请人： Tibor Juhasz , Richard C. Ujazdowski , Herve A. Besaucele , Robert G. Ozarski , James H. Azzola
发明人： Tibor Juhasz , Richard C. Ujazdowski , Herve A. Besaucele , Robert G. Ozarski , James H. Azzola
IPC分类号： H01S3/038 , H01S3/032 , H01S3/036 , H01S3/225 , H01S3/22
CPC分类号： H01S3/036
摘要： A laser chamber has angled reflectors that reflect acoustic and shock waves away from the laser discharge area to minimize acoustic and shock wave disturbances. The angled reflector may have different configurations to assist in the dissipation of the acoustic and shock waves. For example, the angled reflector may have a modulated reflective surface, such as having grooves or holes defined within the surface. Further, the angled reflector may have a reflective surface with acoustic and shock wave absorbing properties. The reflective surface with absorbent properties may be a felt metal or have multiple layered porous surfaces. In addition, the walls of the laser chamber may be modulated to assist in the dissipation of the acoustic waves and shock waves through absorption, scattering, and by generating interference within the reflected waves. Multiple layered porous surfaces may be used along the walls to absorb and scatter incident waves. The walls of the laser chamber may also be covered with an acoustic and shock wave absorbing material, such as felt metal. In other embodiments, the walls of the laser chamber are modulated with grooves, such as triangular or rectangular horizontal grooves, which scatter incident waves and generate interference within reflected waves.
摘要翻译：激光室具有倾斜的反射器，其将声波和冲击波反射离开激光放电区域，以最小化声波和冲击波干扰。成角度的反射器可以具有不同的构造以辅助声波和冲击波的消散。例如，成角度的反射器可以具有调制的反射表面，例如在表面内限定有凹槽或孔。此外，成角度的反射器可以具有具有声波和冲击波吸收特性的反射表面。具有吸收性能的反射表面可以是毡状金属或具有多层多孔表面。此外，可以调制激光室的壁，以通过吸收，散射和在反射波内产生干涉来帮助消除声波和冲击波。沿着壁可以使用多层多孔表面来吸收和散射入射波。激光室的壁也可以用诸如毛毡金属的声波和冲击波吸收材料覆盖。在其他实施例中，激光室的壁由诸如三角形或矩形水平凹槽的凹槽调制，这些凹槽散射入射波并在反射波内产生干涉。

8. 发明授权

US5044752A Apparatus and process for positioning wafers in receiving devices 失效
标题翻译：将晶片定位在接收装置中的装置和方法
公开(公告)号：US5044752A
公开(公告)日：1991-09-03
申请号：US374410
申请日：1989-06-30
申请人： Henrik Thurfjell , Robert G. Ozarski
发明人： Henrik Thurfjell , Robert G. Ozarski
IPC分类号： H01L21/00 , H01L21/677 , H01L21/68 , H01L21/687
CPC分类号： H01L21/67259 , H01L21/67778 , H01L21/681 , H01L21/68707 , Y10S414/137
摘要： An apparatus is provided for loading and/or unloading wafers from a holding cassette to a quartz boat without scraping the wafer on the slots contained in the quartz boat; the apparatus comprising a robot and a paddle. The improvement resides in the main feature of wafer sensor means disposed on the surface of the paddle, the wafer sensor means being connected to a microprocessor which converts and digitizes an analog signal from the wafer sensor means, the analog signal indicating the position of a wafer disposed on the surface of the paddle. Further included is an arrangement for signaling the robot to compensate for the particular position of the wafer on the paddle by adjusting the position of the paddle with respect to the quartz boat. Another feature lies in the fact that sensing notches are disposed along the front, right-side and left-side edges of said paddle, each of the sensing notches having a sensor device and associated emitter means disposed on opposite sides of the sensing notches in such a manner as to permit detection of the position of the slots in the quartz boat stacking rods lying adjacent to respective sensing notches.
摘要翻译：提供了一种装置，用于将晶片从保持盒装载和/或卸载到石英舟皿，而不会在包含在石英舟皿中的槽上刮擦晶片; 所述装置包括机器人和桨叶。改进在于设置在桨表面上的晶片传感器装置的主要特征，晶片传感器装置连接到微处理器，微处理器将来自晶片传感器装置的模拟信号转换和数字化，表示晶片位置的模拟信号设置在桨的表面上。还包括一种用于通过调节桨相对于石英舟的位置来发信号通知机器人来补偿桨上的晶片的特定位置的装置。另一个特征在于，感测凹口沿着所述桨的前，右侧和左侧边缘设置，每个感测凹口具有传感器装置，并且相关的发射器装置设置在感测凹口的相对侧上允许检测位于相邻感测凹口附近的石英舟堆叠杆中的槽的位置的方式。

9. 发明授权

US4368169A Pyrochemical processes for the decomposition of water 失效
标题翻译：用于水解的热化学工艺
公开(公告)号：US4368169A
公开(公告)日：1983-01-11
申请号：US568661
申请日：1975-04-16
申请人： Ralph H. Kummler , Charles B. Leffert , Robert G. Ozarski , Robert A. Piccirelli , Theodor Teichmann
发明人： Ralph H. Kummler , Charles B. Leffert , Robert G. Ozarski , Robert A. Piccirelli , Theodor Teichmann
IPC分类号： C01B3/06 , G21B1/00
CPC分类号： C01B3/068 , Y02E60/36
摘要： Improved closed-loop pyrochemical processes for the decomposition of water in which at least one of the reaction steps in each process is carried out pyrochemically within the central reaction chamber of a thermonuclear reactor during and immediately after a thermonuclear reaction, and in which one of the reagents in or products of the chamber reaction is a metal having a boiling temperature which is higher than the decomposition temperature of the associated metal oxide. The product of the pyrochemical reaction which includes the metal element is in the condensed phase after completion of the reaction and may thus be easily separated from the remaining gaseous reaction products.The specific reaction processes disclosed include a two-step process in which the metal is reacted directly with water within the reaction chamber, and a three-step process in which the metal is reacted with carbon dioxide within the central chamber, the reaction products being thereafter used in later process steps for the actual decomposition of water. In either process, the initial chamber reaction yields a condensed metal oxide product which is thereafter split in a later process step, which also takes place within a central fusion reaction chamber, to yield oxygen and a condensed metal product. Tungsten (W) and Tantalum (Ta) are disclosed as exemplary metal reagents.
摘要翻译：用于水分解的改进的闭环热化学方法，其中每个方法中的至少一个反应步骤在热核反应期间和之后立即在热核反应室的中心反应室内热化学地进行，其中室反应物中的试剂或产物是具有比相关联的金属氧化物的分解温度高的沸点温度的金属。包含金属元素的化学反应的产物在反应完成后处于冷凝相，因此可以容易地与剩余的气态反应产物分离。所公开的具体反应方法包括其中金属与反应室内的水直接反应的两步法，以及其中金属与中心室内的二氧化碳反应的三步法，其后的反应产物用于后续工艺步骤中的水分的实际分解。在任一过程中，初始室反应产生冷凝的金属氧化物产物，其随后在后续工艺步骤中分离，其也在中心熔融反应室内进行，以产生氧和冷凝的金属产物。公开了钨（W）和钽（Ta）作为示例性金属试剂。

10. 发明授权

US6128323A Reliable modular production quality narrow-band high REP rate excimer laser 有权
标题翻译：可靠的模块化生产质量窄带高REP率准分子激光器
公开(公告)号：US6128323A
公开(公告)日：2000-10-03
申请号：US157067
申请日：1998-09-18
申请人： David W. Myers , Herve A. Besaucele , Palash P. Das , Thomas P. Duffey , Alexander I. Ershov , Igor V. Fomenkov , Thomas Hofmann , Richard G. Morton , Richard M. Ness , Peter C. Newman , Robert G. Ozarski , Gamaralalage G. Padmabandu , William N. Partlo , Daniel A. Rothweil , Richard L. Sandstrom , Paul S. Thompson , Richard C. Ujazdowski , Tom A. Watson , R. Kyle Webb , Paolo Zambon
发明人： David W. Myers , Herve A. Besaucele , Palash P. Das , Thomas P. Duffey , Alexander I. Ershov , Igor V. Fomenkov , Thomas Hofmann , Richard G. Morton , Richard M. Ness , Peter C. Newman , Robert G. Ozarski , Gamaralalage G. Padmabandu , William N. Partlo , Daniel A. Rothweil , Richard L. Sandstrom , Paul S. Thompson , Richard C. Ujazdowski , Tom A. Watson , R. Kyle Webb , Paolo Zambon
IPC分类号： G03F7/20 , H01S3/02 , H01S3/03 , H01S3/036 , H01S3/041 , H01S3/08 , H01S3/081 , H01S3/097 , H01S3/0971 , H01S3/1055 , H01S3/134 , H01S3/139 , H01S3/225 , H03K3/57 , H03K17/80 , H01S3/00
CPC分类号： G03F7/70025 , G03F7/70041 , G03F7/70358 , G03F7/70558 , G03F7/70575 , H01S3/02 , H01S3/03 , H01S3/036 , H01S3/041 , H01S3/097 , H01S3/0971 , H01S3/1055 , H01S3/134 , H01S3/225 , H03K17/80 , H03K3/57 , H01S3/08009 , H01S3/0812 , H01S3/1392 , H01S3/2251 , H01S3/2256
摘要： The present invention provides a reliable modular production quality excimer laser capable of producing 10 mJ laser pulses at 2000 Hz with a full width half, maximum bandwidth of about 0.6 pm or less. Replaceable modules include a laser chamber; a pulse power system comprised of three modules; an optical resonator comprised of a line narrowing module and an output coupler module; a wavemeter module, an electrical control module, a cooling water module and a gas control module. Improvements in the laser chamber permitting the higher pulse rates and improved bandwidth performance include a single upstream preionizer tube and a high efficiency chamber. The chamber is designed for operation at lower fluorine concentration. Important improvements have been provided in the pulse power unit to produce faster rise time and improved pulse energy control. These improvements include an increased capacity high voltage power supply with a voltage bleed-down circuit for precise voltage trimming, an improved commutation module that generates a high voltage pulse from the capacitors charged by the high voltage power supply and amplifies the pulse voltage 23 times with a very fast voltage transformer having a secondary winding consisting of a single four-segment stainless steel rod. A novel design for the compression head saturable inductor greatly reduces the quantity of transformer oil required and virtually eliminates the possibility of oil leakage which in the past has posed a hazard.
摘要翻译：本发明提供了一种可靠的模块化生产质量准分子激光器，其能够在2000Hz下产生10mJ激光脉冲，全宽度为一半，最大带宽为约0.6μm或更小。可更换模块包括激光室; 由三个模块组成的脉冲电源系统; 光学谐振器，包括线窄模块和输出耦合器模块; 波形计模块，电气控制模块，冷却水模块和气体控制模块。允许更高脉冲速率和改进的带宽性能的激光室的改进包括单个上游预分解器管和高效室。该室设计用于在较低的氟浓度下运行。在脉冲功率单元中已经提供了重要的改进，以产生更快的上升时间和改进的脉冲能量控制。这些改进包括增加容量的高压电源，具有用于精确电压调整的电压降低电路，改进的换向模块，其从由高压电源充电的电容器产生高电压脉冲，并用脉冲电压放大23次具有由单个四段不锈钢棒组成的次级绕组的非常快速的电压互感器。用于压缩头可饱和电感器的新颖设计大大减少了所需的变压器油的数量，并且几乎消除了过去漏油的可能性。

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