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    • 1. 发明申请
    • METHOD AND INSTALLATION FOR PRODUCING DIRECT REDUCED IRON
    • 生产直接还原铁的方法和安装
    • US20120031236A1
    • 2012-02-09
    • US13262796
    • 2010-04-06
    • Jean-Luc RothDavid Rodriguez
    • Jean-Luc RothDavid Rodriguez
    • C21B13/02F27B1/10F27D17/00
    • C21B13/02C21B2100/22C21B2100/42C21B2100/64C21B2100/66C21B2200/00Y02P10/136Y02P10/212
    • “A method for producing direct reduced iron in a vertical reactor having an upper reducing zone and a lower cooling zone, the method including: feeding iron oxide feed material to an upper portion of the vertical reactor, the iron oxide feed material forming a burden flowing by gravity to a material outlet portion in a lower portion of the vertical reactor; feeding hot reducing gas to a lower portion of the reducing zone of the vertical reactor, the hot reducing gas flowing in a counter flow to the burden towards a gas outlet port in the upper portion of the vertical reactor; recovering direct reduced iron at the lower portion of the vertical reactor; recovering top gas at the upper portion of the vertical reactor; submitting at least a portion of the recovered top gas to a recycling process; and feeding the recycled top gas back into the vertical reactor, where the recycling process includes heating the recovered top gas in a preheating unit before feeding it to a reformer unit; feeding volatile carbon containing material to the reformer unit and allowing the volatile carbon containing material to devolatise and to react with the recovered top gas; feeding desulfurizing agent into the recovered top gas in or upstream of the reformer unit; heating the reformer unit; and feeding the reformed top gas recovered from the reformer unit through a particle separation device for removal of sulfur containing material.”
    • “在具有上部还原区和下部冷却区的立式反应器中生产直接还原铁的方法,该方法包括:将铁氧化物进料输送到垂直反应器的上部,氧化铁原料形成流动的负荷 通过重力引导到垂直反应器的下部的材料出口部分; 将热还原气体供给到垂直反应器的还原区域的下部,热还原气体逆流流向垂直反应器上部的气体出口的负荷; 在垂直反应器的下部回收直接还原铁; 在垂直反应器的上部回收顶部气体; 将回收的顶部气体的至少一部分提交到再循环过程; 并将再循环的顶部气体送回到垂直反应器中,其中回收过程包括在将其送入重整器单元之前将预热单元中回收的顶部气体加热; 将含挥发性碳的材料供给重整单元,并使含挥发性碳的材料脱挥发和与回收的顶部气体反应; 将脱硫剂进料到重整器单元内或上游的回收顶部气体中; 加热重整单元; 并通过用于除去含硫物质的颗粒分离装置将从重整单元回收的重整顶部气体进料。
    • 5. 发明授权
    • System and method for recovering from a power supply interruption
    • 从电源中断恢复的系统和方法
    • US06144569A
    • 2000-11-07
    • US514800
    • 2000-02-29
    • David RodriguezRichard S. Griffith
    • David RodriguezRichard S. Griffith
    • G06F1/30H04B1/16H02M1/00
    • G06F1/30H04B1/1607
    • A power cut detection and recovery system (36) provides for the recovery of an electronic apparatus (20) in response to a momentary interruption in the voltage level of a power supply (46) coupled to that apparatus. The system includes a level detecting circuit (80) coupled to the power supply (46) for monitoring the voltage supplied to the apparatus (20). The system further includes internal reference supply circuits (86) that provide voltage and current references to operate the apparatus (20). A power cut monitor and reference control circuit (84) is coupled to the level detecting circuit (80) and is capable of causing the internal reference supply circuits (86) to remain enabled upon the detection of a momentary cut in the externally supplied power (46). A second level detecting circuit (90), dependent on the internal reference supply circuits (86), and the power cut monitor and reference control circuit (84) are coupled to an under voltage monitor and recovery circuit (88) that can cause the apparatus (20) to restart upon the recovery of the voltage level to a value above a predetermined level. By maintaining the internal reference supply circuits (86) in an enabled state, the apparatus (20) is able to restart in its pre-interruption state if the voltage level remains above a POR level.
    • 断电检测和恢复系统(36)响应于耦合到该设备的电源(46)的电压电平的瞬时中断,提供电子设备(20)的恢复。 该系统包括耦合到电源(46)的电平检测电路(80),用于监视提供给设备(20)的电压。 该系统还包括提供电压和电流参考以便操作装置(20)的内部参考电源电路(86)。 断电监视器和参考控制电路(84)耦合到电平检测电路(80),并且能够使内部基准电源电路(86)在检测到外部供电电力瞬间切断时保持使能( 46)。 取决于内部参考电源电路(86)和断电监视器和参考控制电路(84)的第二电平检测电路(90)耦合到欠电压监视和恢复电路(88),所述欠电压监视和恢复电路能够使装置 (20)在将电压电平恢复到高于预定电平的值时重启。 通过将内部参考电源电路(86)保持在使能状态,如果电压电平保持高于POR电平,则装置(20)能够以其预中断状态重启。
    • 6. 发明申请
    • Pad ESD Spreading Technique
    • 垫ESD传播技术
    • US20080165459A1
    • 2008-07-10
    • US11621724
    • 2007-01-10
    • Patrick J. HollyDavid RodriguezDavid R. Rice
    • Patrick J. HollyDavid RodriguezDavid R. Rice
    • H02H9/04
    • H02H9/046
    • A system, e.g. an integrated circuit or part, may include a plurality of pads, e.g. digital I/O pads, each comprising a physical pad and associated pad circuit. In case of an ESD event affecting one or more of the digital I/O pads, PMOS devices configured in an output buffer section between an I/O pad supply rail and the physical output pad—within their respective pad circuits in the affected digital I/O pads—may all be turned on in response to the ESD event. This may allow the capacitance of each pad, in some cases approximately 3 pF capacitance per pad, to charge up, absorbing the energy of the ESD event and reducing the peak voltage the integrated circuit or part experiences as a result of the ESD event. The reduced peak voltage may be directly correlated with improved ESD performance of the product.
    • 系统,例如 集成电路或部件可以包括多个焊盘,例如, 数字I / O焊盘,每个包括物理焊盘和相关焊盘电路。 在影响一个或多个数字I / O焊盘的ESD事件的情况下,配置在I / O焊盘电源轨和物理输出焊盘之间的输出缓冲区中的PMOS器件在受影响的数字I的各自的焊盘电路内 / O焊盘 - 可能会响应于ESD事件而打开。 这可以允许每个焊盘的电容,在一些情况下,每个焊盘约为3pF的电容充电,吸收ESD事件的能量并降低集成电路或部件作为ESD事件的结果所经历的峰值电压。 降低的峰值电压可以直接与产品的ESD性能相关。
    • 8. 发明授权
    • System and method for reducing particles in epitaxial reactors
    • 用于还原外延反应器中的颗粒的系统和方法
    • US6161311A
    • 2000-12-19
    • US113934
    • 1998-07-10
    • Allan DoleyDennis GoodwinKenneth O'NeillGerben VrijburgDavid Rodriguez
    • Allan DoleyDennis GoodwinKenneth O'NeillGerben VrijburgDavid Rodriguez
    • C23C16/44C30B25/08C30B29/14H01L21/205H01L21/677F26B19/00
    • C30B29/14C23C16/4401C23C16/4408C30B25/08Y10S414/139
    • An apparatus and method for reducing particles in reactors. The apparatus includes an enclosure for processing the semiconductor wafers. The enclosure has a wafer handling chamber connected by an isolation gate valve to a processing chamber. Additionally, the apparatus includes pipes for delivering a purge gas into the wafer handling chamber. The purge gas is used to eliminates particles from the enclosure. The apparatus also includes a pilot operated back pressure regulator for regulating the delivery and removal of the purge gas from the enclosure. The apparatus actuates the isolation gate valve in a controlled rate to reduce disturbances from the purge gas entering into the enclosure. The apparatus also includes a Bernoulli wand for lifting and holding a single semiconductor wafer. A dome loaded regulator is used to control the ramp rates of the gas to the Bernoulli wand. The dome loaded regulator is actuated by a pilot gas. The ramp up and ramp down rates of the Bernoulli wand gas can be control by a multitude of restrictions and check valves in the pilot gas line. The apparatus also utilizes ionizers in the purge gas lines entering the wafer handling chamber and load locks. Through the use of an alpha particle emission source in the purge gas line prior to the load lock and wafer handling chamber, the purged gas molecules are ionized. The ionized gas is conductive and therefore discharges all static inside the semiconductor equipment. By removable of the static charge particle and wafers are no longer attracted to each other by electrostatic force. In addition, the apparatus includes means for reducing gas flow turbulence when switching valves within the reactor.
    • 用于还原反应器中的颗粒的装置和方法。 该装置包括用于处理半导体晶片的外壳。 外壳具有通过隔离闸阀连接到处理室的晶片处理室。 此外,该装置包括用于将清洗气体输送到晶片处理室中的管道。 净化气体用于消除外壳中的颗粒。 该设备还包括用于调节从外壳传送和去除净化气体的先导操作的后部压力调节器。 该设备以受控的速率驱动隔离闸阀,以减少进入外壳的吹扫气体的干扰。 该装置还包括用于提升和保持单个半导体晶片的伯努利棒。 使用圆顶加载的调节器来控制气体对伯努利棒的斜坡率。 圆顶式调压器由先导气体驱动。 伯努利魔杖气的升高和降速率可以通过大量限制和先导气体管路中的止回阀来控制。 该设备还在进入晶片处理室的清洗气体管线和负载锁定中使用电离器。 通过在负载锁定和晶片处理室之前在吹扫气体管线中使用α粒子发射源,将净化的气体分子电离。 电离气体是导电的,因此将半导体设备内的所有静电放电。 通过可移除的静电荷颗粒和晶片不再被静电力彼此吸引。 另外,该装置包括当在反应器内切换阀时减少气流湍流的装置。
    • 10. 发明授权
    • Automotive finish protection and dent prevention system
    • 汽车整饰保护和防凹陷系统
    • US09180824B1
    • 2015-11-10
    • US14199403
    • 2014-03-06
    • David RodriguezOscar Merced
    • David RodriguezOscar Merced
    • B60R13/00B60R13/04B60R19/38
    • B60R13/04B60R19/38
    • A device and a system operative for protecting an automobile door from dent and damage to the finish. The device has a shield that stows in a chamber in an automobile frame below an automobile door, the shield deploying upwardly from the chamber to a position adjacent to the automobile door. The shield is deployed by a hydraulic system coupled to the shield through a plurality of linkages on a track that deploys the shield out the chamber opening and retracts the shield into the chamber. The system has an actuator for actuating the hydraulic system, the actuator selectively actuating the hydraulic system to deploy the shield when the door is locked and selectively actuating the hydraulic system to deploy the shield when is door is opening. A remote control device actuates the hydraulic system in one example embodiment. A sensor actuates the hydraulic system in another example embodiment.
    • 一种用于保护汽车门免受凹陷并损坏整饰件的装置和系统。 该装置具有一个屏蔽物,该屏蔽件收纳在汽车门框下方的汽车框架的腔室中,该屏蔽件从腔室向上展开到与汽车门相邻的位置。 屏蔽部分由液压系统部署,该液压系统通过轨道上的多个连杆耦合到屏蔽件上,该轨道将屏蔽件展开出腔室开口并将屏蔽件缩回到腔室中。 该系统具有用于致动液压系统的致动器,当门被锁定时,致动器选择性地启动液压系统以展开屏蔽,并且当门打开时选择性地启动液压系统以展开屏蔽。 在一个示例性实施例中,遥控装置致动液压系统。 在另一示例性实施例中,传感器致动液压系统。