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    • 4. 发明授权
    • System and method for recovering from a power supply interruption
    • 从电源中断恢复的系统和方法
    • US06144569A
    • 2000-11-07
    • US514800
    • 2000-02-29
    • David RodriguezRichard S. Griffith
    • David RodriguezRichard S. Griffith
    • G06F1/30H04B1/16H02M1/00
    • G06F1/30H04B1/1607
    • A power cut detection and recovery system (36) provides for the recovery of an electronic apparatus (20) in response to a momentary interruption in the voltage level of a power supply (46) coupled to that apparatus. The system includes a level detecting circuit (80) coupled to the power supply (46) for monitoring the voltage supplied to the apparatus (20). The system further includes internal reference supply circuits (86) that provide voltage and current references to operate the apparatus (20). A power cut monitor and reference control circuit (84) is coupled to the level detecting circuit (80) and is capable of causing the internal reference supply circuits (86) to remain enabled upon the detection of a momentary cut in the externally supplied power (46). A second level detecting circuit (90), dependent on the internal reference supply circuits (86), and the power cut monitor and reference control circuit (84) are coupled to an under voltage monitor and recovery circuit (88) that can cause the apparatus (20) to restart upon the recovery of the voltage level to a value above a predetermined level. By maintaining the internal reference supply circuits (86) in an enabled state, the apparatus (20) is able to restart in its pre-interruption state if the voltage level remains above a POR level.
    • 断电检测和恢复系统(36)响应于耦合到该设备的电源(46)的电压电平的瞬时中断,提供电子设备(20)的恢复。 该系统包括耦合到电源(46)的电平检测电路(80),用于监视提供给设备(20)的电压。 该系统还包括提供电压和电流参考以便操作装置(20)的内部参考电源电路(86)。 断电监视器和参考控制电路(84)耦合到电平检测电路(80),并且能够使内部基准电源电路(86)在检测到外部供电电力瞬间切断时保持使能( 46)。 取决于内部参考电源电路(86)和断电监视器和参考控制电路(84)的第二电平检测电路(90)耦合到欠电压监视和恢复电路(88),所述欠电压监视和恢复电路能够使装置 (20)在将电压电平恢复到高于预定电平的值时重启。 通过将内部参考电源电路(86)保持在使能状态,如果电压电平保持高于POR电平,则装置(20)能够以其预中断状态重启。
    • 5. 发明申请
    • Pad ESD Spreading Technique
    • 垫ESD传播技术
    • US20080165459A1
    • 2008-07-10
    • US11621724
    • 2007-01-10
    • Patrick J. HollyDavid RodriguezDavid R. Rice
    • Patrick J. HollyDavid RodriguezDavid R. Rice
    • H02H9/04
    • H02H9/046
    • A system, e.g. an integrated circuit or part, may include a plurality of pads, e.g. digital I/O pads, each comprising a physical pad and associated pad circuit. In case of an ESD event affecting one or more of the digital I/O pads, PMOS devices configured in an output buffer section between an I/O pad supply rail and the physical output pad—within their respective pad circuits in the affected digital I/O pads—may all be turned on in response to the ESD event. This may allow the capacitance of each pad, in some cases approximately 3 pF capacitance per pad, to charge up, absorbing the energy of the ESD event and reducing the peak voltage the integrated circuit or part experiences as a result of the ESD event. The reduced peak voltage may be directly correlated with improved ESD performance of the product.
    • 系统,例如 集成电路或部件可以包括多个焊盘,例如, 数字I / O焊盘,每个包括物理焊盘和相关焊盘电路。 在影响一个或多个数字I / O焊盘的ESD事件的情况下,配置在I / O焊盘电源轨和物理输出焊盘之间的输出缓冲区中的PMOS器件在受影响的数字I的各自的焊盘电路内 / O焊盘 - 可能会响应于ESD事件而打开。 这可以允许每个焊盘的电容,在一些情况下,每个焊盘约为3pF的电容充电,吸收ESD事件的能量并降低集成电路或部件作为ESD事件的结果所经历的峰值电压。 降低的峰值电压可以直接与产品的ESD性能相关。
    • 7. 发明授权
    • System and method for reducing particles in epitaxial reactors
    • 用于还原外延反应器中的颗粒的系统和方法
    • US6161311A
    • 2000-12-19
    • US113934
    • 1998-07-10
    • Allan DoleyDennis GoodwinKenneth O'NeillGerben VrijburgDavid Rodriguez
    • Allan DoleyDennis GoodwinKenneth O'NeillGerben VrijburgDavid Rodriguez
    • C23C16/44C30B25/08C30B29/14H01L21/205H01L21/677F26B19/00
    • C30B29/14C23C16/4401C23C16/4408C30B25/08Y10S414/139
    • An apparatus and method for reducing particles in reactors. The apparatus includes an enclosure for processing the semiconductor wafers. The enclosure has a wafer handling chamber connected by an isolation gate valve to a processing chamber. Additionally, the apparatus includes pipes for delivering a purge gas into the wafer handling chamber. The purge gas is used to eliminates particles from the enclosure. The apparatus also includes a pilot operated back pressure regulator for regulating the delivery and removal of the purge gas from the enclosure. The apparatus actuates the isolation gate valve in a controlled rate to reduce disturbances from the purge gas entering into the enclosure. The apparatus also includes a Bernoulli wand for lifting and holding a single semiconductor wafer. A dome loaded regulator is used to control the ramp rates of the gas to the Bernoulli wand. The dome loaded regulator is actuated by a pilot gas. The ramp up and ramp down rates of the Bernoulli wand gas can be control by a multitude of restrictions and check valves in the pilot gas line. The apparatus also utilizes ionizers in the purge gas lines entering the wafer handling chamber and load locks. Through the use of an alpha particle emission source in the purge gas line prior to the load lock and wafer handling chamber, the purged gas molecules are ionized. The ionized gas is conductive and therefore discharges all static inside the semiconductor equipment. By removable of the static charge particle and wafers are no longer attracted to each other by electrostatic force. In addition, the apparatus includes means for reducing gas flow turbulence when switching valves within the reactor.
    • 用于还原反应器中的颗粒的装置和方法。 该装置包括用于处理半导体晶片的外壳。 外壳具有通过隔离闸阀连接到处理室的晶片处理室。 此外,该装置包括用于将清洗气体输送到晶片处理室中的管道。 净化气体用于消除外壳中的颗粒。 该设备还包括用于调节从外壳传送和去除净化气体的先导操作的后部压力调节器。 该设备以受控的速率驱动隔离闸阀,以减少进入外壳的吹扫气体的干扰。 该装置还包括用于提升和保持单个半导体晶片的伯努利棒。 使用圆顶加载的调节器来控制气体对伯努利棒的斜坡率。 圆顶式调压器由先导气体驱动。 伯努利魔杖气的升高和降速率可以通过大量限制和先导气体管路中的止回阀来控制。 该设备还在进入晶片处理室的清洗气体管线和负载锁定中使用电离器。 通过在负载锁定和晶片处理室之前在吹扫气体管线中使用α粒子发射源,将净化的气体分子电离。 电离气体是导电的,因此将半导体设备内的所有静电放电。 通过可移除的静电荷颗粒和晶片不再被静电力彼此吸引。 另外,该装置包括当在反应器内切换阀时减少气流湍流的装置。
    • 9. 发明授权
    • Automotive finish protection and dent prevention system
    • 汽车整饰保护和防凹陷系统
    • US09180824B1
    • 2015-11-10
    • US14199403
    • 2014-03-06
    • David RodriguezOscar Merced
    • David RodriguezOscar Merced
    • B60R13/00B60R13/04B60R19/38
    • B60R13/04B60R19/38
    • A device and a system operative for protecting an automobile door from dent and damage to the finish. The device has a shield that stows in a chamber in an automobile frame below an automobile door, the shield deploying upwardly from the chamber to a position adjacent to the automobile door. The shield is deployed by a hydraulic system coupled to the shield through a plurality of linkages on a track that deploys the shield out the chamber opening and retracts the shield into the chamber. The system has an actuator for actuating the hydraulic system, the actuator selectively actuating the hydraulic system to deploy the shield when the door is locked and selectively actuating the hydraulic system to deploy the shield when is door is opening. A remote control device actuates the hydraulic system in one example embodiment. A sensor actuates the hydraulic system in another example embodiment.
    • 一种用于保护汽车门免受凹陷并损坏整饰件的装置和系统。 该装置具有一个屏蔽物,该屏蔽件收纳在汽车门框下方的汽车框架的腔室中,该屏蔽件从腔室向上展开到与汽车门相邻的位置。 屏蔽部分由液压系统部署,该液压系统通过轨道上的多个连杆耦合到屏蔽件上,该轨道将屏蔽件展开出腔室开口并将屏蔽件缩回到腔室中。 该系统具有用于致动液压系统的致动器,当门被锁定时,致动器选择性地启动液压系统以展开屏蔽,并且当门打开时选择性地启动液压系统以展开屏蔽。 在一个示例性实施例中,遥控装置致动液压系统。 在另一示例性实施例中,传感器致动液压系统。
    • 10. 发明授权
    • Substrate handling chamber
    • 基板处理室
    • US06550158B2
    • 2003-04-22
    • US09727736
    • 2000-12-01
    • Allan DoleyDennis GoodwinKenneth O'NeillGerben VrijburgDavid RodriguezRavinder Aggarwal
    • Allan DoleyDennis GoodwinKenneth O'NeillGerben VrijburgDavid RodriguezRavinder Aggarwal
    • F26B300
    • C30B29/14C23C16/4401C23C16/4408C30B25/08Y10S414/139
    • An apparatus and method for reducing particles in reactors. The apparatus includes an enclosure with a wafer handling chamber connected by an isolation gate valve to a processing chamber. Pipes deliver purge gas into the wafer handling chamber to eliminate particles from the enclosure. A pilot operated back pressure regulator regulates the delivery and removal of the purge gas. The apparatus actuates the isolation gate valve in a controlled rate to reduce disturbances from the purge gas entering into the enclosure. A Bernoulli wand is provided for lifting and holding a single semiconductor wafer. A dome loaded regulator actuated by a pilot gas is used to control the ramp rates of gas to the Bernoulli wand. The ramping rates of the Bernoulli wand gas can be controlled by restrictions and check valves in the pilot gas line. The apparatus also utilizes ionizers in the purge gas lines entering the wafer handling chamber and load locks. Through the use of an alpha particle emission source in the purge gas line prior to the load lock and wafer handling chamber, the purged gas molecules are ionized. The ionized gas is conductive and therefore discharges static so that wafers are no longer attracted to each other by electrostatic force. In addition, the apparatus includes means for reducing gas flow turbulence when switching valves within the reactor.
    • 用于还原反应器中的颗粒的装置和方法。 该装置包括具有通过隔离闸阀连接到处理室的晶片处理室的外壳。 管道将净化气体输送到晶片处理室中以消除外壳中的颗粒。 先导操作的背压调节器调节吹扫气体的输送和去除。 该设备以受控的速率驱动隔离闸阀,以减少进入外壳的吹扫气体的干扰。 提供伯努利棒用于提升和保持单个半导体晶片。 使用由先导气体驱动的圆顶加载式调节器来控制伯努利魔杖的气体斜坡速率。 伯努利魔杖气体的斜率可以通过先导气体管线中的限制和止回阀来控制。 该设备还在进入晶片处理室的清洗气体管线和负载锁定中使用电离器。 通过在负载锁定和晶片处理室之前在吹扫气体管线中使用α粒子发射源,将净化的气体分子电离。 电离气体是导电的,因此放电静电,使得晶片不再被静电力彼此吸引。 另外,该设备包括当在反应器内切换阀时减少气流湍流的装置。