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1. 发明授权

US08466431B2 Techniques for improving extracted ion beam quality using high-transparency electrodes 有权
标题翻译：使用高透明电极提高离子束质量的技术
公开(公告)号：US08466431B2
公开(公告)日：2013-06-18
申请号：US12370555
申请日：2009-02-12
申请人： James S. Buff , Svetlana Radovanov , Bon-Woong Koo , Wilhelm Platow , Frank Sinclair , D. Jeffrey Lischer , Craig R. Chaney , Steven Borichevsky , Eric R. Cobb , Mayur Jagtap , Kenneth H. Purser , Victor Benveniste , Shardul S. Patel
发明人： James S. Buff , Svetlana Radovanov , Bon-Woong Koo , Wilhelm Platow , Frank Sinclair , D. Jeffrey Lischer , Craig R. Chaney , Steven Borichevsky , Eric R. Cobb , Mayur Jagtap , Kenneth H. Purser , Victor Benveniste , Shardul S. Patel
IPC分类号： H01J37/15 , G21K5/10
CPC分类号： H01J37/3171 , H01J27/024 , H01J37/08 , H01J37/09 , H01J37/304 , H01J2237/0453 , H01J2237/0458 , H01J2237/083 , H01J2237/24542
摘要： Techniques for improving extracted ion beam quality using high-transparency electrodes are disclosed. In one particular exemplary embodiment, the techniques may be realized as an apparatus for ion implantation. The apparatus may comprise an ion source for generating an ion beam, wherein the ion source comprises a faceplate with an aperture for the ion beam to travel therethrough. The apparatus may also comprise a set of extraction electrodes comprising at least a suppression electrode and a high-transparency ground electrode, wherein the set of extraction electrodes may extract the ion beam from the ion source via the faceplate, and wherein the high-transparency ground electrode may be configured to optimize gas conductance between the suppression electrode and the high-transparency ground electrode for improved extracted ion beam quality.
摘要翻译：公开了使用高透明电极提高离子束质量的技术。在一个特定的示例性实施例中，技术可以被实现为用于离子注入的装置。该装置可以包括用于产生离子束的离子源，其中离子源包括具有离子束穿过其中的孔的面板。该装置还可以包括至少包括抑制电极和高透明度接地电极的一组提取电极，其中所述提取电极组可以经由面板从离子源提取离子束，并且其中高透明度接地电极可以被配置为优化抑制电极和高透明度接地电极之间的气体传导，以改善提取的离子束质量。

2. 发明授权

US08003956B2 Method and apparatus for controlling beam current uniformity in an ion implanter 有权
标题翻译：用于控制离子注入机中束流均匀性的方法和装置
公开(公告)号：US08003956B2
公开(公告)日：2011-08-23
申请号：US12244978
申请日：2008-10-03
申请人： D. Jeffrey Lischer , John (Bon-Woong) Koo , Peter F. Kurunczi , Shardul Patel , Wilhelm P. Platow
发明人： D. Jeffrey Lischer , John (Bon-Woong) Koo , Peter F. Kurunczi , Shardul Patel , Wilhelm P. Platow
IPC分类号： G21K5/10
CPC分类号： H01J37/3171 , H01J37/026 , H01J2237/004 , H01J2237/0041 , H01J2237/006 , H01J2237/047 , H01J2237/182 , H01J2237/188 , H01J2237/24535 , H01J2237/24542 , H01J2237/248 , H01J2237/30438 , H01J2237/30477 , H01J2237/31701 , H01J2237/31703
摘要： An ion implantation system for neutralizing the space charge effect associated with a high current low energy ion beam. The implantation system includes an ion source configured to receive a dopant gas and generate ions having a particular energy and mass from which ions are extracted through an aperture. A work piece positioned downstream of the ion source for receiving the extracted ions in the form of an ion beam. A bleed gas channel disposed between the ion source and the work piece. The bleed gas channel supplying a gas used to neutralize the space charge effect associated with the ion beam.
摘要翻译：一种用于中和与高电流低能量离子束相关的空间电荷效应的离子注入系统。植入系统包括被配置为接收掺杂剂气体并产生具有特定能量和质量的离子的离子源，离子通过孔提取离子。位于离子源下游的工件，用于接收离子束形式的提取的离子。排放气体通道，设置在离子源和工件之间。排出气体通道供应用于中和与离子束相关联的空间电荷效应的气体。

3. 发明授权

US08933335B2 Current lead with a configuration to reduce heat load transfer in an alternating electrical current environment 有权
标题翻译：电流引线，配置为减少交流电流环境中的热负荷传递
公开(公告)号：US08933335B2
公开(公告)日：2015-01-13
申请号：US13273927
申请日：2011-10-14
申请人： Gregory Citver , Frank Sinclair , D. Jeffrey Lischer , Nandishkumar Desai
发明人： Gregory Citver , Frank Sinclair , D. Jeffrey Lischer , Nandishkumar Desai
IPC分类号： H01B5/00 , H01F6/06
CPC分类号： H01F6/065 , Y10T29/49117
摘要： A current lead with a configuration to reduce heat load transfer in an alternating electrical current (AC) environment is disclosed. The current lead may comprise a conductive material having a configuration for reducing heat load transfer across the current lead when an alternating electrical current (AC) is applied to the current lead. A temperature gradient a may be exhibited along a length of the current lead.
摘要翻译：公开了一种具有在交流电流（AC）环境中减少热负荷传递的配置的电流引线。电流引线可以包括导电材料，其具有当将交流电流（AC）施加到电流引线时用于减少穿过电流引线的热负荷传递的构造。可以沿着电流引线的长度显示温度梯度a。

4. 发明申请

US20110291344A1 METHOD OF COOLING TEXTURED WORKPIECES WITH AN ELECTROSTATIC CHUCK 有权
标题翻译：用静电切片冷却纹理工件的方法
公开(公告)号：US20110291344A1
公开(公告)日：2011-12-01
申请号：US12791278
申请日：2010-06-01
申请人： Dale K. Stone , Julian G. Blake , D. Jeffrey Lischer
发明人： Dale K. Stone , Julian G. Blake , D. Jeffrey Lischer
IPC分类号： B23Q3/00
CPC分类号： H01L21/67109 , H01L21/6831 , H01L21/68742
摘要： A workpiece support, which more effectively cools a textured workpiece is disclosed. A layer is added on top of a workpiece support. This layer is sufficiently soft so as to conform to the textured workpiece. Furthermore, the layer has a dielectric constant such that it does not alter the normal operation of the underlying electrostatic clamp. In some embodiments, the locations of the ground and lift pins are moved to further reduce the leakage of backside gas.
摘要翻译：公开了一种更有效地冷却纹理工件的工件支撑件。在工件支架的顶部添加一层。该层足够柔软以符合纹理化的工件。此外，该层具有介电常数，使得其不会改变下面的静电夹的正常操作。在一些实施例中，移动地面和升降销的位置以进一步减少背侧气体的泄漏。

5. 发明授权

US06993973B2 Contaminant deposition control baffle for a capacitive pressure transducer 有权
标题翻译：用于电容式压力传感器的污染物沉积控制挡板
公开(公告)号：US06993973B2
公开(公告)日：2006-02-07
申请号：US10440391
申请日：2003-05-16
申请人： D. Jeffrey Lischer , Robert Traverso
发明人： D. Jeffrey Lischer , Robert Traverso
IPC分类号： G01L9/12
CPC分类号： G01L9/0075 , G01L19/0636
摘要： The disclosed transducer includes a housing, a diaphragm, an inner conductor, an outer conductor, and a first baffle. The housing defines an interior volume. The diaphragm is disposed in the housing and divides the interior volume into a first chamber and a second chamber. The diaphragm flexes in response to pressure differentials in the first and second chambers. The inner conductor is disposed in the first chamber. The outer conductor is disposed in the first chamber around the inner conductor. The first baffle is disposed in the second chamber and defines an inner region, a middle region, and an outer region. The inner region underlies the inner conductor. The middle region underlies the outer conductor. The outer region underlies neither the inner conductor nor the outer conductor. The first baffle defines apertures in at least two of the inner, middle, and outer regions.
摘要翻译：所公开的换能器包括壳体，隔膜，内导体，外导体和第一挡板。壳体限定内部容积。隔膜设置在壳体中并将内部容积分成第一室和第二室。隔膜响应于第一和第二腔室中的压差而弯曲。内部导体设置在第一室中。外部导体围绕内部导体设置在第一腔室中。第一挡板设置在第二室中并且限定内部区域，中间区域和外部区域。内部区域在内部导体之下。中间区域位于外部导体之下。外部区域既不是内部导体也不是外部导体。第一挡板限定内部，中部和外部区域中的至少两个中的孔。

6. 发明授权

US08672311B2 Method of cooling textured workpieces with an electrostatic chuck 有权
标题翻译：用静电卡盘冷却纹理工件的方法
公开(公告)号：US08672311B2
公开(公告)日：2014-03-18
申请号：US12791278
申请日：2010-06-01
申请人： Dale K. Stone , Julian G. Blake , D. Jeffrey Lischer
发明人： Dale K. Stone , Julian G. Blake , D. Jeffrey Lischer
IPC分类号： B23Q3/00
CPC分类号： H01L21/67109 , H01L21/6831 , H01L21/68742
摘要： A workpiece support, which more effectively cools a textured workpiece is disclosed. A layer is added on top of a workpiece support. This layer is sufficiently soft so as to conform to the textured workpiece. Furthermore, the layer has a dielectric constant such that it does not alter the normal operation of the underlying electrostatic clamp. In some embodiments, the locations of the ground and lift pins are moved to further reduce the leakage of backside gas.
摘要翻译：公开了一种更有效地冷却纹理工件的工件支撑件。在工件支架的顶部添加一层。该层足够柔软以符合纹理化的工件。此外，该层具有介电常数，使得其不会改变下面的静电夹的正常操作。在一些实施例中，移动地面和升降销的位置以进一步减少背侧气体的泄漏。

7. 发明申请

US20110094798A1 INTERFACING TWO INSULATION PARTS IN HIGH VOLTAGE ENVIRONMENT 有权
标题翻译：在高压环境中连接两个绝缘部件
公开(公告)号：US20110094798A1
公开(公告)日：2011-04-28
申请号：US12983706
申请日：2011-01-03
申请人： Russell J. Low , Kasegn D. Tekletsadik , Anthony Renau , Piotr R. Lubicki , D. Jeffrey Lischer , Steve Krause , Eric Hermanson , Doug E. May
发明人： Russell J. Low , Kasegn D. Tekletsadik , Anthony Renau , Piotr R. Lubicki , D. Jeffrey Lischer , Steve Krause , Eric Hermanson , Doug E. May
IPC分类号： H01R4/00
CPC分类号： H05H7/00 , H01B17/66 , H01J37/241 , H01J37/3171 , H01J2237/038
摘要： Methods of interfacing parts in a high voltage environment and related structures are disclosed. A method comprises: providing a first part and a second part; and interfacing the first part and the second part to create a first substantially zero electrical field area at a first outer extent of an interface between the first and second parts and a reduced electrical field area in a different portion of the interface.
摘要翻译：公开了在高电压环境中部分接口的相关结构的方法。一种方法包括：提供第一部分和第二部分; 以及接合所述第一部分和所述第二部分以在所述第一部分和所述第二部分之间的界面的第一外部范围处形成第一基本为零的电场区域，以及在所述界面的不同部分中的减小的电场区域。

8. 发明授权

US07863520B2 Interfacing two insulation parts in high voltage environment 失效
标题翻译：在高压环境下接合两个绝缘部件
公开(公告)号：US07863520B2
公开(公告)日：2011-01-04
申请号：US11838360
申请日：2007-08-14
申请人： Russell J. Low , Kasegn D. Tekletsadik , Anthony Renau , Piotr R. Lubicki , D. Jeffrey Lischer , Steve Krause , Eric Hermanson , Doug E. May
发明人： Russell J. Low , Kasegn D. Tekletsadik , Anthony Renau , Piotr R. Lubicki , D. Jeffrey Lischer , Steve Krause , Eric Hermanson , Doug E. May
IPC分类号： H01R4/02
CPC分类号： H05H7/00 , H01B17/66 , H01J37/241 , H01J37/3171 , H01J2237/038
摘要： Methods of interfacing parts in a high voltage environment and related structures are disclosed. A method comprises: providing an insulation medium between a first part and a second part in a high voltage environment; and interfacing the first part and the second part by compressing the first part and the second part against the insulation medium.
摘要翻译：公开了在高压环境中部分接口的相关结构的方法。一种方法包括：在高压环境中在第一部分和第二部分之间提供绝缘介质; 并且通过将第一部分和第二部分压靠绝缘介质来将第一部分和第二部分接合。

9. 发明申请

US20090047801A1 INTERFACING TWO INSULATION PARTS IN HIGH VOLTAGE ENVIRONMENT 失效
标题翻译：在高压环境中连接两个绝缘部件
公开(公告)号：US20090047801A1
公开(公告)日：2009-02-19
申请号：US11838360
申请日：2007-08-14
申请人： Russell J. Low , Kasegn D. Tekletsadik , Anthony Renau , Piotr R. Lubicki , D. Jeffrey Lischer , Steve Krause , Eric Hermanson , Doug E. May
发明人： Russell J. Low , Kasegn D. Tekletsadik , Anthony Renau , Piotr R. Lubicki , D. Jeffrey Lischer , Steve Krause , Eric Hermanson , Doug E. May
IPC分类号： H01R29/00
CPC分类号： H05H7/00 , H01B17/66 , H01J37/241 , H01J37/3171 , H01J2237/038
摘要： Methods of interfacing parts in a high voltage environment and related structures are disclosed. A method comprises: providing an insulation medium between a first part and a second part in a high voltage environment; and interfacing the first part and the second part by compressing the first part and the second part against the insulation medium.
摘要翻译：公开了在高电压环境中部分接口的相关结构的方法。一种方法包括：在高压环境中在第一部分和第二部分之间提供绝缘介质; 并且通过将第一部分和第二部分压靠绝缘介质来将第一部分和第二部分接合。

10. 发明授权

US07528392B2 Techniques for low-temperature ion implantation 有权
标题翻译：低温离子注入技术
公开(公告)号：US07528392B2
公开(公告)日：2009-05-05
申请号：US11733445
申请日：2007-04-10
申请人： Jonathan Gerald England , Richard Stephen Muka , D. Jeffrey Lischer
发明人： Jonathan Gerald England , Richard Stephen Muka , D. Jeffrey Lischer
IPC分类号： H01J37/317 , H01J37/20 , H01L21/425
CPC分类号： H01J37/3171 , H01J2237/2001 , H01L21/67005
摘要： Techniques for low-temperature ion implantation are disclosed. In one particular exemplary embodiment, the techniques may be realized as an apparatus for low-temperature ion implantation. The apparatus may comprise a wafer support mechanism to hold a wafer during ion implantation and to facilitate movement of the wafer in at least one dimension. The apparatus may also comprise a cooling mechanism coupled to the wafer support mechanism. The cooling mechanism may comprise a refrigeration unit, a closed loop of rigid pipes to circulate at least one coolant from the refrigeration unit to the wafer support mechanism, and one or more rotary bearings to couple the rigid pipes to accommodate the movement of the wafer in the at least one dimension.
摘要翻译：公开了用于低温离子注入的技术。在一个特定的示例性实施例中，可以将技术实现为用于低温离子注入的装置。该装置可以包括晶片支撑机构，以在离子注入期间保持晶片，并且促进晶片在至少一个维度上的移动。该装置还可以包括联接到晶片支撑机构的冷却机构。冷却机构可以包括制冷单元，刚性管的闭环，以将来自制冷单元的至少一个冷却剂循环到晶片支撑机构，以及一个或多个旋转轴承，以连接刚性管以适应晶片的移动至少一个维度。

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