专利快速检索-快速检索全球专利，免费商用专利数据库-IPRDB

1. 发明授权

US5972570A Method of photolithographically defining three regions with one mask step and self aligned isolation structure formed thereby 失效
公开(公告)号：US5972570A
公开(公告)日：1999-10-26
申请号：US895748
申请日：1997-07-17
申请人： James A. Bruce , Steven J. Holmes , Robert K. Leidy , Walter E. Mlynko , Edward W. Sengle
发明人： James A. Bruce , Steven J. Holmes , Robert K. Leidy , Walter E. Mlynko , Edward W. Sengle
IPC分类号： G03F7/004 , G03F1/00 , G03F7/095 , G03F7/20 , H01L21/027 , H01L21/302 , H01L21/3065 , H01L21/76 , H01L21/762 , G03F7/26
CPC分类号： G03F7/70633 , G03F7/095 , G03F7/2022 , G03F7/2024 , H01L21/0274 , H01L21/762
摘要： The preferred embodiment of the present invention provides a method for defining three regions on a semiconductor substrate using a single masking step. The preferred embodiment uses a photoresist material having, simultaneously, both a positive tone and a negative tone response to exposure. This combination of materials can provide a new type of resist, which we call a hybrid resist. The hybrid resist comprises a positive tone component which acts at a first actinic energy level and a negative tone component which acts at a second actinic energy level, with the first and second actinic energy levels being separated by an intermediate range of actinic energy. When hybrid resist is exposed to actinic energy, areas of the resist which are subject to a full exposure cross link to form a negative tone line pattern, areas which are unexposed form remain photoactive and form a positive tone pattern, and areas which are exposed to intermediate amounts of radiation become soluble and wash away during development. This exposes a first region on the mask. By then blanket exposing the hybrid resist, the positive tone patterns become soluble and will wash away during development. This exposes a second region on the mask, with the third region still be covered by the hybrid resist. Thus, the preferred embodiment is able to define three regions using a single masking step, with no chance for overlay errors.

2. 发明授权

US6147394A Method of photolithographically defining three regions with one mask step and self aligned isolation structure formed thereby 失效
标题翻译：用一个掩模步骤和由此形成的自对准隔离结构光刻地限定三个区域的方法
公开(公告)号：US6147394A
公开(公告)日：2000-11-14
申请号：US172366
申请日：1998-10-14
申请人： James A. Bruce , Steven J. Holmes , Robert K. Leidy , Walter E. Mlynko , Edward W. Sengle
发明人： James A. Bruce , Steven J. Holmes , Robert K. Leidy , Walter E. Mlynko , Edward W. Sengle
IPC分类号： G03F7/004 , G03F1/00 , G03F7/095 , G03F7/20 , H01L21/027 , H01L21/302 , H01L21/3065 , H01L21/76 , H01L21/762 , H01L29/00
CPC分类号： G03F7/70633 , G03F7/095 , G03F7/2022 , G03F7/2024 , H01L21/0274 , H01L21/762
摘要： The preferred embodiment of the present invention provides a method for defining three regions on a semiconductor substrate using a single masking step. The preferred embodiment uses a photoresist material having, simultaneously, both a positive tone and a negative tone response to exposure. This combination of materials can provide a new type of resist, which we call a hybrid resist. The hybrid resist comprises a positive tone component which acts at a first actinic energy level and a negative tone component which acts at a second actinic energy level, with the first and second actinic energy levels being separated by an intermediate range of actinic energy. When hybrid resist is exposed to actinic energy, areas of the resist which are subject to a full exposure cross link to form a negative tone line pattern, areas which are unexposed form remain photoactive and form a positive tone pattern, and areas which are exposed to intermediate amounts of radiation become soluble and wash away during development. This exposes a first region on the mask. By then blanket exposing the hybrid resist, the positive tone patterns become soluble and will wash away during development. This exposes a second region on the mask, with the third region still be covered by the hybrid resist. Thus, the preferred embodiment is able to define three regions using a single masking step, with no chance for overlay errors.
摘要翻译：本发明的优选实施例提供了一种使用单个掩蔽步骤在半导体衬底上限定三个区域的方法。优选实施例使用光刻胶材料，同时具有曝光的正色调和负色调响应。这种材料的组合可以提供一种新型的抗蚀剂，我们称之为混合抗蚀剂。混合抗蚀剂包含作用于第一光化能级的正色调成分和以第二光化能级起作用的负色调成分，其中第一和第二光化能级被光化能的中间范围分隔。当混合抗蚀剂暴露于光化能时，受到完全曝光的抗蚀剂的区域交联以形成负色调线图案，未曝光形式的区域保持光活性并形成正色调图案，并且暴露于中间量的辐射在开发过程中变得可溶并被冲走。这暴露了掩码上的第一个区域。然后毯子暴露混合抗蚀剂，正色调图案变得可溶，并且在显影过程中将被洗掉。这掩盖了掩模上的第二区域，第三区域仍被混合抗蚀剂覆盖。因此，优选实施例能够使用单个掩蔽步骤来定义三个区域，而不会叠加错误。

3. 发明授权

US06255178B1 Method for forming transistors with raised source and drains and device formed thereby 有权
标题翻译：用于形成具有升高的源极和漏极的晶体管的方法以及由此形成的器件
公开(公告)号：US06255178B1
公开(公告)日：2001-07-03
申请号：US09368767
申请日：1999-08-05
申请人： Jeffrey S. Brown , James S. Dunn , Steven J. Holmes , David V. Horak , Robert K. Leidy , Steven H. Voldman
发明人： Jeffrey S. Brown , James S. Dunn , Steven J. Holmes , David V. Horak , Robert K. Leidy , Steven H. Voldman
IPC分类号： H01L21336
CPC分类号： H01L29/66492 , G03F7/095 , G03F7/38 , H01L21/0274 , H01L21/26586 , H01L21/31116 , H01L21/31144 , H01L29/6659
摘要： The preferred embodiment of the present invention provides a transistor structure and method for fabricating the same that overcomes the disadvantages of the prior art. In particular, the preferred structure and method results in lower leakage and junction capacitance by using raised source and drains which are partially isolated from the substrate by a dielectric layer. The raised source and drains are preferably fabricated from the same material layer used to form the transistor gate. The preferred method for fabricating the transistor uses hybrid resist to accurately pattern the gate material layer into regions for the gate, the source and the drain. The source and drain regions are then connected to the substrate by growing silicon. The preferred method thus results in an improved transistor structure while not requiring excessive fabrication steps.
摘要翻译：本发明的优选实施例提供了克服现有技术的缺点的晶体管结构及其制造方法。特别地，优选的结构和方法通过使用通过电介质层与衬底部分隔离的凸起源极和漏极导致较低的漏电和结电容。升高的源极和漏极优选由用于形成晶体管栅极的相同材料层制成。用于制造晶体管的优选方法使用混合抗蚀剂将栅极材料层精确地图案化成用于栅极，源极和漏极的区域。然后通过生长硅将源极区和漏极区连接到衬底。因此，优选的方法导致改进的晶体管结构，而不需要过多的制造步骤。

4. 发明授权

US6100013A Method for forming transistors with raised source and drains and device formed thereby 失效
标题翻译：用于形成具有升高的源极和漏极的晶体管的方法以及由此形成的器件
公开(公告)号：US6100013A
公开(公告)日：2000-08-08
申请号：US71207
申请日：1998-05-01
申请人： Jeffery S. Brown , James S. Dunn , Steven J. Holmes , David V. Horak , Robert K. Leidy , Steven H. Voldman
发明人： Jeffery S. Brown , James S. Dunn , Steven J. Holmes , David V. Horak , Robert K. Leidy , Steven H. Voldman
IPC分类号： H01L29/78 , G03F7/095 , G03F7/38 , H01L21/027 , H01L21/265 , H01L21/311 , H01L21/336 , G03F7/20
CPC分类号： H01L29/66492 , G03F7/38 , H01L21/0274 , H01L21/31116 , H01L21/31144 , H01L29/6659 , G03F7/095 , H01L21/26586
摘要： The preferred embodiment of the present invention provides a transistor structure and method for fabricating the same that overcomes the disadvantages of the prior art. In particular, the preferred structure and method results in lower leakage and junction capacitance by using raised source and drains which are partially isolated from the substrate by a dielectric layer. The raised source and drains are preferably fabricated from the same material layer used to form the transistor gate. The preferred method for fabricating the transistor uses hybrid resist to accurately pattern the gate material layer into regions for the gate, the source and the drain. The source and drain regions are then connected to the substrate by growing silicon. The preferred method thus results in an improved transistor structure while not requiring excessive fabrication steps.
摘要翻译：本发明的优选实施例提供了克服现有技术的缺点的晶体管结构及其制造方法。特别地，优选的结构和方法通过使用通过电介质层与衬底部分隔离的凸起源极和漏极导致较低的漏电和结电容。升高的源极和漏极优选由用于形成晶体管栅极的相同材料层制成。用于制造晶体管的优选方法使用混合抗蚀剂将栅极材料层精确地图案化成用于栅极，源极和漏极的区域。然后通过生长硅将源极区和漏极区连接到衬底。因此，优选的方法导致改进的晶体管结构，而不需要过多的制造步骤。

5. 发明授权

US5976768A Method for forming sidewall spacers using frequency doubling hybrid resist and device formed thereby 失效
标题翻译：使用倍频混合抗蚀剂和由此形成的器件形成侧壁间隔物的方法
公开(公告)号：US5976768A
公开(公告)日：1999-11-02
申请号：US140593
申请日：1998-08-26
申请人： Jeffrey S. Brown , James S. Dunn , Steven J. Holmes , Cuc K. Huynh , Robert K. Leidy , Paul W. Pastel
发明人： Jeffrey S. Brown , James S. Dunn , Steven J. Holmes , Cuc K. Huynh , Robert K. Leidy , Paul W. Pastel
IPC分类号： H01L29/78 , G03F7/095 , G03F7/38 , H01L21/027 , H01L21/265 , H01L21/311 , H01L21/336 , H01L21/76 , G03C5/00
CPC分类号： H01L29/66492 , G03F7/38 , H01L21/0274 , H01L21/31116 , H01L21/31144 , H01L29/6659 , G03F7/095 , H01L21/26586
摘要： The preferred embodiment of the present invention overcomes the disadvantages of the prior art by using hybrid resist to define a sidewall spacer region and form a new type of sidewall spacer. The preferred method allows for more controlled doping at the gate-source and gate-drain junctions by defining sidewall spacer troughs using hybrid resist. Implants can then be made through the troughs to precisely control the doping at the gate junctions. Additionally, sidewall spacers can then be formed in the sidewall spacer troughs. The dimensions of the sidewall spacers is determined by the hybrid resist and can thus be made smaller than traditional resist processes. Additionally, forming the sidewall spacers using hybrid resist allows for their width to be determined independent of the depth of the gate material.
摘要翻译：本发明的优选实施例通过使用混合抗蚀剂来限定侧壁间隔区并形成新型的侧壁间隔物来克服现有技术的缺点。优选的方法允许通过使用混合抗蚀剂限定侧壁间隔槽来在栅极源极和栅极 - 漏极结处施加更多的受控掺杂。然后可以通过槽制造植入物以精确地控制在浇口结处的掺杂。此外，然后可以在侧壁间隔槽中形成侧壁间隔物。侧壁间隔物的尺寸由混合抗蚀剂确定，因此可以制成比传统的抗蚀剂工艺更小。另外，使用混合抗蚀剂形成侧壁间隔物可以独立于栅极材料的深度确定其宽度。

6. 发明授权

US5939767A Structure and process for buried diode formation in CMOS 失效
标题翻译： CMOS中埋地二极管形成的结构和工艺
公开(公告)号：US5939767A
公开(公告)日：1999-08-17
申请号：US052512
申请日：1998-03-31
申请人： Jeffrey S. Brown , Steven J. Holmes , Robert K. Leidy , Steven H. Voldman
发明人： Jeffrey S. Brown , Steven J. Holmes , Robert K. Leidy , Steven H. Voldman
IPC分类号： H01L21/8238 , H01L27/02 , H01L27/092 , H01L29/866 , H01L29/00 , H01L29/861 , H01L31/107
CPC分类号： H01L27/0255 , H01L21/8238
摘要： According to the present invention, an improved method for buried diode formation in CMOS processing is disclosed. Using a hybrid photoresist process, a self-aligning Zener diode is created using a two-step photolithography mask process. Since the process disclosed in the invention uses only the p-well and the n-well masks to create the Zener diode, photolithography alignment problems are reduced and Zener diodes can be create at the sub-micron scale.
摘要翻译：根据本发明，公开了一种用于CMOS处理中的埋二极管形成的改进方法。使用混合光刻胶工艺，使用两步光刻掩模工艺创建自对准齐纳二极管。由于本发明公开的方法仅使用p阱和n-阱掩模来产生齐纳二极管，所以减小了光刻对准问题，并且可以在亚微米级产生齐纳二极管。

7. 发明授权

US06184151B2 Method for forming cornered images on a substrate and photomask formed thereby 失效
标题翻译：在基板上形成圆角图像的方法和由此形成的光掩模
公开(公告)号：US06184151B2
公开(公告)日：2001-02-06
申请号：US09275541
申请日：1999-03-24
申请人： William J. Adair , Richard A. Ferguson , Mark C. Hakey , Steven J. Holmes , David V. Horak , Robert K. Leidy , William Hsioh-Lien Ma , Ronald M. Martino , Song Peng
发明人： William J. Adair , Richard A. Ferguson , Mark C. Hakey , Steven J. Holmes , David V. Horak , Robert K. Leidy , William Hsioh-Lien Ma , Ronald M. Martino , Song Peng
IPC分类号： H01L21461
CPC分类号： H01L27/10864 , H01L21/0332 , H01L21/0334 , Y10S438/942
摘要： A method for forming square shape images in a lithographic process is disclosed wherein a first plurality of lines running in a first direction is defined in a first, usually sacrificial, layer, and then a second resist is defined wherein the lines run in an intersecting pattern to those of the first layer, thereby creating cornered images wherever the first and second layer intersect and in the open areas between the lines. Methods are proposed for developing the square intersecting areas and the square angle areas defined by the openings. Additionally, a photomask is disclosed in which the length and width of the cornered images are independently patterned using the two-exposure process.
摘要翻译：公开了一种在光刻工艺中形成正方形形状图像的方法，其中沿第一方向延伸的第一多条线被限定在第一，通常是牺牲层中，然后定义第二抗蚀剂，其中线以相交图案到第一层的那些，从而在第一和第二层交叉的任何地方以及在线之间的开放区域中产生拐角图像。提出了用于显影方形交叉区域和由开口限定的方角区域的方法。此外，公开了一种光掩模，其中使用双曝光工艺独立地对角形图像的长度和宽度进行图案化。

8. 发明授权

US5981148A Method for forming sidewall spacers using frequency doubling hybrid resist and device formed thereby 失效
公开(公告)号：US5981148A
公开(公告)日：1999-11-09
申请号：US895749
申请日：1997-07-17
申请人： Jeffrey S. Brown , James S. Dunn , Steven J. Holmes , Cuc K. Huynh , Robert K. Leidy , Paul W. Pastel
发明人： Jeffrey S. Brown , James S. Dunn , Steven J. Holmes , Cuc K. Huynh , Robert K. Leidy , Paul W. Pastel
IPC分类号： H01L29/78 , G03F7/095 , G03F7/38 , H01L21/027 , H01L21/265 , H01L21/311 , H01L21/336 , G03C5/56 , H01L21/71
CPC分类号： H01L29/66492 , G03F7/38 , H01L21/0274 , H01L21/31116 , H01L21/31144 , H01L29/6659 , G03F7/095 , H01L21/26586
摘要： The preferred embodiment of the present invention overcomes the disadvantages of the prior art by using hybrid resist to define a sidewall spacer region and form a new type of sidewall spacer. The preferred method allows for more controlled doping at the gate-source and gate-drain junctions by defining sidewall spacer troughs using hybrid resist. Implants can then be made through the troughs to precisely control the doping at the gate junctions. Additionally, sidewall spacers can then be formed in the sidewall spacer troughs. The dimensions of the sidewall spacers is determined by the hybrid resist and can thus be made smaller than traditional resist processes. Additionally, forming the sidewall spacers using hybrid resist allows for their width to be determined independent of the depth of the gate material.

9. 发明授权

US06420766B1 Transistor having raised source and drain 有权
标题翻译：晶体管升高源极和漏极
公开(公告)号：US06420766B1
公开(公告)日：2002-07-16
申请号：US09368843
申请日：1999-08-05
申请人： Jeffrey S. Brown , James S. Dunn , Steven J. Holmes , David V. Horak , Robert K. Leidy , Steven H. Voldman
发明人： Jeffrey S. Brown , James S. Dunn , Steven J. Holmes , David V. Horak , Robert K. Leidy , Steven H. Voldman
IPC分类号： H01L2976
CPC分类号： H01L29/66492 , G03F7/095 , G03F7/38 , H01L21/0274 , H01L21/26586 , H01L21/31116 , H01L21/31144 , H01L29/6659
摘要： The preferred embodiment of the present invention provides a transistor structure and method for fabricating the same that overcomes the disadvantages of the prior art. In particular, the preferred structure and method results in lower leakage and junction capacitance by using raised source and drains which are partially isolated from the substrate by a dielectric layer. The raised source and drains are preferably fabricated from the same material layer used to form the transistor gate. The preferred method for fabricating the transistor uses hybrid resist to accurately pattern the gate material layer into regions for the gate, the source and the drain. The source and drain regions are then connected to the substrate by growing silicon. The preferred method thus results in an improved transistor structure while not requiring excessive fabrication steps.
摘要翻译：本发明的优选实施例提供了克服现有技术的缺点的晶体管结构及其制造方法。特别地，优选的结构和方法通过使用通过电介质层与衬底部分隔离的凸起源极和漏极导致较低的漏电和结电容。升高的源极和漏极优选由用于形成晶体管栅极的相同材料层制成。用于制造晶体管的优选方法使用混合抗蚀剂将栅极材料层精确地图案化成用于栅极，源极和漏极的区域。然后通过生长硅将源极区和漏极区连接到衬底。因此，优选的方法导致改进的晶体管结构，而不需要过多的制造步骤。

10. 发明授权

US5959325A Method for forming cornered images on a substrate and photomask formed thereby 失效
标题翻译：在基板上形成圆角图像的方法和由此形成的光掩模
公开(公告)号：US5959325A
公开(公告)日：1999-09-28
申请号：US917009
申请日：1997-08-21
申请人： William J. Adair , Richard A. Ferguson , Mark C. Hakey , Steven J. Holmes , David V. Horak , Robert K. Leidy , William Hsioh-Lien Ma , Ronald M. Martino , Song Peng
发明人： William J. Adair , Richard A. Ferguson , Mark C. Hakey , Steven J. Holmes , David V. Horak , Robert K. Leidy , William Hsioh-Lien Ma , Ronald M. Martino , Song Peng
IPC分类号： H01L21/033 , H01L21/8242 , H01L27/108
CPC分类号： H01L27/10864 , H01L21/0332 , H01L21/0334 , Y10S438/942
摘要： A method for forming square shape images in a lithographic process is disclosed wherein a first plurality of lines running in a first direction is defined in a first, usually sacrificial, layer, and then a second resist is defined wherein the lines run in an intersecting pattern to those of the first layer, thereby creating cornered images wherever the first and second layer intersect and in the open areas between the lines. Methods are proposed for developing the square intersecting areas and the square angle areas defined by the openings. Additionally, a photomask is disclosed in which the length and width of the cornered images are independently patterned using the two-exposure process.
摘要翻译：公开了一种在光刻工艺中形成正方形形状图像的方法，其中沿第一方向延伸的第一多条线被限定在第一，通常是牺牲层中，然后定义第二抗蚀剂，其中线以相交图案到第一层的那些，从而在第一和第二层交叉的任何地方以及在线之间的开放区域中产生拐角图像。提出了用于显影方形交叉区域和由开口限定的方角区域的方法。此外，公开了一种光掩模，其中使用双曝光工艺独立地对角形图像的长度和宽度进行图案化。

你已经成功收藏专利！

检索式保存成功!

IPRDB

热门服务

关于我们

友情链接

联系方式