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1. 发明授权

US4395657A Magnetron unit with a magnetic field compensating means 失效
标题翻译：具有磁场补偿装置的磁控管单元
公开(公告)号：US4395657A
公开(公告)日：1983-07-26
申请号：US216677
申请日：1980-12-15
申请人： Isao Tada , Toshio Okamura , Akira Kousaka , Kaichiro Nakai
发明人： Isao Tada , Toshio Okamura , Akira Kousaka , Kaichiro Nakai
IPC分类号： H01J23/10 , H01J25/50
CPC分类号： H01J23/10
摘要： A magnetron unit has a magnetic flux path for magnetic flux supplied from a permanent magnet to the interaction space. A magnetic member is disposed outside the anode cylinder for providing a by-path for the magnetic flux supplied from the permanent magnet. This magnetic member is made of a magnetic compensating alloy whose magnetic permeability decreases with an increase in temperature.
摘要翻译：磁控管单元具有用于从永久磁铁供应到相互作用空间的磁通量的磁通量。磁性构件设置在阳极筒的外侧，用于为从永磁体供给的磁通提供旁路。该磁性部件由磁性补偿合金制成，其磁导率随着温度的升高而降低。

2. 发明申请

US20110091661A1 APPARATUS FOR PRODUCING MULTILAYER SHEET AND METHOD OF PRODUCING THE MULTILAYER SHEET 审中-公开
标题翻译：用于生产多层薄片的装置以及生产多层薄片的方法
公开(公告)号：US20110091661A1
公开(公告)日：2011-04-21
申请号：US12903455
申请日：2010-10-13
申请人： Kaoru Ito , Masumi Noguchi , Hideaki Tanaka , Hiroyuki Ikeda , Makoto Shimomura , Isao Tada , Nobuhiro Hayashi , Hagane Irikura
发明人： Kaoru Ito , Masumi Noguchi , Hideaki Tanaka , Hiroyuki Ikeda , Makoto Shimomura , Isao Tada , Nobuhiro Hayashi , Hagane Irikura
IPC分类号： H05H1/24 , C23C14/14
CPC分类号： C23C14/20 , B05D1/60 , B05D7/52 , C23C14/562 , H01G4/008 , H01G4/145 , H01G4/33 , H01G13/00
摘要： An apparatus for producing a multilayer sheet including a resin film, a vapor-deposited metal film and a vapor-deposited polymer film at a low cost and with excellent productivity is provided which comprises: a vacuum chamber which is made to be in a vacuum state by exhaust means; a feeding roller; a take up roller; a first to third rollers, first metal vapor deposition means for forming a first vapor-deposited metal film on one surface of a resin film at a periphery of the first roller; vapor deposition polymerization means for forming a vapor-deposited polymer film on the first vapor-deposited metal film by vapor deposition polymerization at a periphery of the second roller; and second metal vapor deposition means for forming the second vapor-deposited metal film on the other surface of the resin film at a periphery of the third roller.
摘要翻译：提供一种以低成本和优异的生产率制造包括树脂膜，气相沉积金属膜和气相沉积聚合物膜的多层片材的设备，其包括：真空室，其被制成真空状态用排气装置喂料辊; 卷取辊; 第一至第三辊，第一金属蒸镀装置，用于在第一辊的周围在树脂膜的一个表面上形成第一蒸镀金属膜; 气相沉积聚合装置，用于在第二辊的周围通过气相沉积聚合在第一气相沉积金属膜上形成气相沉积聚合物膜; 以及第二金属蒸镀装置，用于在第三辊的周围在树脂膜的另一个表面上形成第二蒸镀金属膜。

3. 发明申请

US20090320747A1 TAKE-UP TYPE VACUUM FILMING DEVICE 有权
标题翻译：真空型真空成膜装置
公开(公告)号：US20090320747A1
公开(公告)日：2009-12-31
申请号：US12374675
申请日：2007-07-26
申请人： Nobuhiro Hayashi , Tomoharu Fujii , Isao Tada , Atsushi Nakatsuka
发明人： Nobuhiro Hayashi , Tomoharu Fujii , Isao Tada , Atsushi Nakatsuka
IPC分类号： C23C14/56
CPC分类号： C23C14/042 , B05C1/0821 , B05C1/083 , B05C1/0834 , C23C14/562 , H01G13/00 , H01G13/006
摘要： [Object] To provide a roll-to-roll vacuum deposition apparatus capable of easily and speedily adjusting a pressing force between a printing roller and a backup roller.[Solving Means] In the present invention, by adjusting a pressing force between a printing roller and a backup roller through a relative movement of a mask forming unit including the printing roller and a transfer roller with respect to a vacuum chamber, individual adjustments of the printing roller and the transfer roller are eliminated and an adjustment of a pressing force on a unit basis is realized, thus achieving simplification of a structure, simplification and enhancement in precision of tasks, and a reduction in work time.
摘要翻译：本发明提供能够容易且快速地调整印刷辊和支承辊之间的按压力的卷对卷真空成膜装置。解决方案在本发明中，通过相对于真空室通过包括印刷辊和转印辊的掩模形成单元的相对运动调节印刷辊和支撑辊之间的按压力，可以对印刷辊和转印辊被消除，并且实现了基于单元的按压力的调节，从而实现了结构的简化，简化和提高了任务精度以及减少了工作时间。

4. 外观设计

USD689534S1 Film-forming apparatus 有权
标题翻译：成膜装置
公开(公告)号：USD689534S1
公开(公告)日：2013-09-10
申请号：US29373100
申请日：2011-02-28
申请人： Shinya Fujimoto , Nobuhiro Hayashi , Takayoshi Hirono , Isao Tada , Shuji Saito
设计人： Shinya Fujimoto , Nobuhiro Hayashi , Takayoshi Hirono , Isao Tada , Shuji Saito

5. 发明申请

US20130168243A1 Vacuum Processing Apparatus 有权
标题翻译：真空处理设备
公开(公告)号：US20130168243A1
公开(公告)日：2013-07-04
申请号：US13823192
申请日：2011-09-07
申请人： Takayoshi Hirono , Isao Tada
发明人： Takayoshi Hirono , Isao Tada
IPC分类号： C23C14/34
CPC分类号： C23C14/34 , C23C14/50 , C23C14/562
摘要： Provided is a low-cost vacuum processing apparatus which enables the miniaturization of the apparatus and achieves good productivity. An elongated sheet base material is transported through a vacuum processing chamber, and predetermined processing is performed on the sheet base material in this vacuum processing chamber. The vacuum processing chamber is provided with a single processing unit, and has an auxiliary vacuum chamber provided in continuation with the vacuum processing chamber. The auxiliary vacuum chamber is provided with a feed roller and a take-up roller. The vacuum processing apparatus includes a pair of first roller units provided on opposite sides across the processing unit in the vacuum processing chamber. Each of the first roller units has multiple rollers disposed at regular distances. The rollers are deviated from each other in the axial direction and arranged in such a staggered manner that the sheet base material is helically wound around the rollers.
摘要翻译：提供一种低成本的真空处理装置，其能够使装置小型化并且实现良好的生产率。细长的片材基材通过真空处理室输送，在该真空处理室中对片材基材进行规定的处理。真空处理室设置有单个处理单元，并且具有与真空处理室连续设置的辅助真空室。辅助真空室设有进料辊和卷取辊。真空处理装置包括一对第一辊单元，设置在真空处理室中的处理单元的相对侧。每个第一辊单元具有以规则距离布置的多个辊。辊在轴向上彼此偏离并且以这样的交错方式布置，使得片状基材被螺旋缠绕在辊上。

6. 发明申请

US20100055311A1 Film Conveyor Apparatus and Roll-to-Roll Vacuum Deposition Method 审中-公开
标题翻译：薄膜输送设备和卷对卷真空沉积方法
公开(公告)号：US20100055311A1
公开(公告)日：2010-03-04
申请号：US12597916
申请日：2008-04-18
申请人： Takayoshi Hirono , Isao Tada , Atsushi Nakatsuka
发明人： Takayoshi Hirono , Isao Tada , Atsushi Nakatsuka
IPC分类号： C23C16/44 , C23C16/00 , B65G13/00
CPC分类号： C23C14/562 , B65H27/00 , B65H2701/1315
摘要： [Object] To enable a deposition area of a base film to be protected and realize stable film traveling performance.[Solving Means] A roll-to-roll vacuum deposition apparatus according to the present invention includes a guide unit including a guide roller and an auxiliary roller, the guide roller including a pair of annular guide portions that support side edge portions of a base film, the auxiliary roller being opposed to the guide roller and pressing the side edge portions of the base film against the pair of guide portions. As a result, a deposition area of the base film and roll surfaces of the guide roller and auxiliary roller of the guide unit can be prevented from being brought into contact with each other, and the deposition area) can thus be protected.
摘要翻译：为了使基膜的沉积区域得到保护并且实现稳定的膜行进性能。本发明的卷绕式真空蒸镀装置具备：引导部，其具有引导辊和辅助辊，所述引导辊包括一对环状的引导部，所述导向部支承基膜的侧缘部辅助辊与引导辊相对并将基膜的侧边缘部分压靠在一对引导部上。结果，可以防止基膜的沉积区域和引导单元的引导辊和辅助辊的辊表面彼此接触，从而可以保护沉积区域）。

7. 发明授权

US5759958A Triazole derivative, herbicidal compositions containing the derivatives and methods of their use 失效
标题翻译：三唑衍生物，含有衍生物的除草组合物及其使用方法
公开(公告)号：US5759958A
公开(公告)日：1998-06-02
申请号：US817916
申请日：1997-04-25
申请人： Yoshinori Endo , Hirofumi Nakagawa , Hiroshi Fujishima , Isao Tada , Minoru Motoki , Daisuke Yanase , Mitsuyuki Murakami , Tatsuya Akasaka
发明人： Yoshinori Endo , Hirofumi Nakagawa , Hiroshi Fujishima , Isao Tada , Minoru Motoki , Daisuke Yanase , Mitsuyuki Murakami , Tatsuya Akasaka
IPC分类号： A01N43/653 , C07D405/04
CPC分类号： C07D405/04 , A01N43/653
摘要： An object of the present invention is to provide a 1,2,4-triazole derivative which in a small amount exhibits high herbicidal activity against weeds in paddy fields, lawns or farmlands, the derivative being without injury to rice, turf grasses and crops. The 1,2,4-triazole derivative is represented by the formula ##STR1## wherein R.sup.1 and R.sup.2 are the same or different and independently represent hydrogen or methyl, R.sup.3 and R.sup.4 are the same or different and independently represent halogen, lower alkyl, lower alkoxy, lower haloalkyl, lower haloalkoxy or cyano, R.sup.5 represents methyl or ethyl and X represents oxygen or sulfur.
摘要翻译： PCT No.PCT / JP96 / 00003 Sec。 371日期1997年04月25日 102（e）日期1997年4月25日PCT提交1996年1月4日PCT公布。出版物WO97 / 09326 日本特开1997年3月13日本发明的目的是提供一种1,2,4-三唑衍生物，其在水田，草坪或农田中对杂草具有较高的除草活性，该衍生物不受大米伤害，草坪草和作物。 1,2,4-三唑衍生物由下式表示：其中R 1和R 2相同或不同并且独立地表示氢或甲基，R 3和R 4相同或不同并且独立地表示卤素，低级烷基，低级烷氧基，低级卤代烷基，低级卤代烷氧基或氰基，R5代表甲基或乙基，X代表氧或硫。

8. 发明授权

US07896968B2 Winding type plasma CVD apparatus 有权
标题翻译：卷绕式等离子体CVD装置
公开(公告)号：US07896968B2
公开(公告)日：2011-03-01
申请号：US11792810
申请日：2006-05-10
申请人： Takayoshi Hirono , Isao Tada , Atsushi Nakatsuka , Masashi Kikuchi , Hideyuki Ogata , Hiroaki Kawamura , Kazuya Saito , Masatoshi Sato
发明人： Takayoshi Hirono , Isao Tada , Atsushi Nakatsuka , Masashi Kikuchi , Hideyuki Ogata , Hiroaki Kawamura , Kazuya Saito , Masatoshi Sato
IPC分类号： C23C16/00 , C23F1/00 , H01L21/306
CPC分类号： H01J37/3277 , B08B7/00 , C23C16/4405 , C23C16/46 , C23C16/5096 , C23C16/545 , H01J37/32009
摘要： The object of this invention is to provide a winding type plasma CVD apparatus in which quality of a layer can be made uniform by supplying a reaction gas uniformly to a deposition area of a film, and can perform a self-cleaning process of a deposition portion in the path of deposition onto the film.A film (22) is supported between a pair of movable rollers (33, 34) arranged on the upstream side and downstream side of the deposition portion (25) with regard to the traveling direction of the film, and then the film (22) is made to travel substantially linearly at the deposition position. Consequently, the distance between a shower plate (37) and the film (22) is kept constant, and the quality of the layer is made homogeneous. The film is heated by means of a metal belt (40) traveling simultaneously on the back side of the film. The moveable rollers (33, 34) ascend from the deposition position to the self-cleaning position, and the film (22) can be separated from the shower plate (37). Self-cleaning can be carried out in the path of the deposition onto the film by closing the aperture of a mask (51) with a shutter (65), thereby preventing leakage of cleaning gas.
摘要翻译：本发明的目的是提供一种绕线式等离子体CVD装置，通过将反应气体均匀地供应到膜的沉积区域，可以使层的质量均匀，并且可以进行沉积部分的自清洁处理在沉积到膜上的路径。相对于膜的行进方向，膜（22）被支撑在布置在沉积部分（25）的上游侧和下游侧的一对可动辊（33,34）之间，然后，膜（22）使其在沉积位置大致线性地移动。因此，喷淋板（37）和膜（22）之间的距离保持恒定，并且使层的质量均匀。薄膜通过金属带（40）加热，同时在薄膜背面行进。可移动辊（33,34）从沉积位置上升到自清洁位置，并且膜（22）可以与喷淋板（37）分离。通过用挡板（65）封闭掩模（51）的孔径，可以在沉积到膜上的路径中进行自清洁，从而防止清洁气体的泄漏。

9. 发明申请

US20080006206A1 Winding Type Plasma Cvd Apparatus 有权
标题翻译：绕组式等离子体Cvd装置
公开(公告)号：US20080006206A1
公开(公告)日：2008-01-10
申请号：US11792810
申请日：2006-05-10
申请人： Takayoshi Hirono , Isao Tada , Atsushi Nakatsuka , Masashi Kikuchi , Hideyuki Ogata , Hiroaki Kawamura , Kazuya Saito , Masatoshi Sato
发明人： Takayoshi Hirono , Isao Tada , Atsushi Nakatsuka , Masashi Kikuchi , Hideyuki Ogata , Hiroaki Kawamura , Kazuya Saito , Masatoshi Sato
IPC分类号： C23C16/505 , C23C16/44 , H01L21/205
CPC分类号： H01J37/3277 , B08B7/00 , C23C16/4405 , C23C16/46 , C23C16/5096 , C23C16/545 , H01J37/32009
摘要： The object of this invention is to provide a winding type plasma CVD apparatus in which quality of a layer can be made uniform by supplying a reaction gas uniformly to a deposition area of a film, and can perform a self-cleaning process of a deposition portion in the path of deposition onto the film. A film (22) is supported between a pair of movable rollers (33, 34) arranged on the upstream side and downstream side of the deposition portion (25) with regard to the traveling direction of the film, and then the film (22) is made to travel substantially linearly at the deposition position. Consequently, the distance between a shower plate (37) and the film (22) is kept constant, and the quality of the layer is made homogeneous. The film is heated by means of a metal belt (40) traveling simultaneously on the back side of the film. The moveable rollers (33,34) ascend from the deposition position to the self-cleaning position, and the film (22) can be separated from the shower plate (37). Self-cleaning can be carried out in the path of the deposition onto the film by closing the aperture of a mask (51) with a shutter (65), thereby preventing leakage of cleaning gas.
摘要翻译：本发明的目的是提供一种绕线式等离子体CVD装置，通过将反应气体均匀地供应到膜的沉积区域，可以使层的质量均匀，并且可以进行沉积部分的自清洁处理在沉积到膜上的路径。相对于膜的行进方向，膜（22）被支撑在布置在沉积部分（25）的上游侧和下游侧的一对可动辊（33,34）之间，然后，膜（22）使其在沉积位置基本线性地行进。因此，喷淋板（37）和膜（22）之间的距离保持恒定，并且使层的质量均匀。薄膜通过金属带（40）加热，同时在薄膜背面行进。可移动辊（33,34）从沉积位置上升到自清洁位置，并且膜（22）可以与喷淋板（37）分离。通过用挡板（65）封闭掩模（51）的孔径，可以在沉积到膜上的路径中进行自清洁，从而防止清洁气体的泄漏。

10. 发明授权

US5639776A 4, 5-dihydropyrazole-5-thione derivatives and miticides comprising the same 失效
标题翻译： 4,5-二氢吡唑-5-硫酮衍生物和包含它们的杀螨剂
公开(公告)号：US5639776A
公开(公告)日：1997-06-17
申请号：US702671
申请日：1996-09-11
申请人： Isao Tada , Minoru Motoki , Nobuyoshi Takahashi , Tetsuji Miyata
发明人： Isao Tada , Minoru Motoki , Nobuyoshi Takahashi , Tetsuji Miyata
IPC分类号： A01N43/56 , C07D231/18 , C07D401/04 , A01N43/40
CPC分类号： C07D401/04 , A01N43/56 , C07D231/18
摘要： The object of the present invention is to provide a novel 4, 5-dihydropyrazole-5-thione derivative which exerts remarkably potent miticidal activity. The 4, 5-dihydropyrazole-5-thione derivative of the present invention is represented by the general formula ##STR1## wherein R.sup.1 represents a straight- or branched-chain alkyl group having 1 to 12 carbon atoms or the like; R.sup.2 and R.sup.3 represent a lower alkyl group or the like; X represents a halogen atom or the like, n is 0 or an integer of 1 to 3; and A represents .paren open-st.C.paren close-st. or .paren open-st.N.paren close-st..
摘要翻译： PCT No.PCT / JP96 / 00044 Sec。 371日期：1996年9月11日 102（e）1996年9月11日PCT PCT 1996年1月12日PCT公布。出版物WO96 / 21651 日本1996年7月18日本发明的目的是提供一种具有显着效力的杀螨活性的新型4,5,5-二氢吡唑-5-硫酮衍生物。本发明的4,5-二氢吡唑-5-硫酮衍生物由通式“IMAGE”表示，其中R 1表示碳原子数1〜12的直链或支链烷基等; R2和R3表示低级烷基等; X表示卤原子等，n为0或1〜3的整数， A代表+545C + 546或+545N + 546。

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