专利快速检索-快速检索全球专利，免费商用专利数据库-IPRDB

1. 发明授权

US08333841B2 Roll-to-roll vacuum deposition apparatus 有权
标题翻译：卷对卷真空沉积设备
公开(公告)号：US08333841B2
公开(公告)日：2012-12-18
申请号：US12374675
申请日：2007-07-26
申请人： Nobuhiro Hayashi , Tomoharu Fujii , Isao Tada , Atsushi Nakatsuka
发明人： Nobuhiro Hayashi , Tomoharu Fujii , Isao Tada , Atsushi Nakatsuka
IPC分类号： C23C16/00
CPC分类号： C23C14/042 , B05C1/0821 , B05C1/083 , B05C1/0834 , C23C14/562 , H01G13/00 , H01G13/006
摘要： [Object] To provide a roll-to-roll vacuum deposition apparatus capable of easily and speedily adjusting a pressing force between a printing roller and a backup roller.[Solving Means] In the present invention, by adjusting a pressing force between a printing roller and a backup roller through a relative movement of a mask forming unit including the printing roller and a transfer roller with respect to a vacuum chamber, individual adjustments of the printing roller and the transfer roller are eliminated and an adjustment of a pressing force on a unit basis is realized, thus achieving simplification of a structure, simplification and enhancement in precision of tasks, and a reduction in work time.
摘要翻译：本发明提供能够容易且快速地调整印刷辊和支承辊之间的按压力的卷对卷真空成膜装置。解决方案在本发明中，通过相对于真空室通过包括印刷辊和转印辊的掩模形成单元的相对运动调节印刷辊和支撑辊之间的按压力，可以对印刷辊和转印辊被消除，并且实现了基于单元的按压力的调节，从而实现了结构的简化，简化和提高了任务精度以及减少了工作时间。

2. 发明申请

US20120196977A1 URETHANE RESIN COMPOSITION, CURED OBJECT, AND PHOTOSEMICONDUCTOR DEVICE USING CURED OBJECT 审中-公开
标题翻译： URETHANE树脂组合物，固化物和使用固化物体的光电子器件
公开(公告)号：US20120196977A1
公开(公告)日：2012-08-02
申请号：US13500428
申请日：2010-04-13
申请人： Takeo Tomiyama , Kenji Suzuki , Makoto Mizutani , Shouko Tanaka , Akihiro Yoshida , Shingo Kobayashi , Hayato Kotani , Norihiro Fukuta , Isao Tada
发明人： Takeo Tomiyama , Kenji Suzuki , Makoto Mizutani , Shouko Tanaka , Akihiro Yoshida , Shingo Kobayashi , Hayato Kotani , Norihiro Fukuta , Isao Tada
IPC分类号： C08L75/04 , C08G18/75 , C08L83/10 , C08G18/73
CPC分类号： C08G18/4277 , C08G18/289 , C08G18/3876 , C08G18/664 , C08G18/758 , C08G18/792 , C08G18/8022 , C08G2120/00 , H01L23/293 , H01L23/3107 , H01L33/56 , H01L2224/48091 , H01L2224/48247 , H01L2224/73265 , H01L2924/00014
摘要： A urethane resin composition obtained by a method comprising the steps of: melt mixing an isocyanate (B), an antioxidant (C), a release agent (D) and a dispersing agent (E) to obtain a molten mixture, and mixing the molten mixture and a polyol (A): wherein the release agent (D) is a compound represented by the following formula (1): [Chemical Formula 1] R1—COOH (1) the dispersing agent (E) is a compound represented by the following formula (2) having a weight-average molecular weight Mw of no greater than 16000: and the content of the dispersing agent (E) in the urethane resin composition is 0.1 to 5.0 wt %.
摘要翻译：一种聚氨酯树脂组合物，该方法包括以下步骤：将异氰酸酯（B），抗氧化剂（C），脱模剂（D）和分散剂（E）熔融混合，得到熔融混合物，混合物和多元醇（A）：其中脱模剂（D）是由下式（1）表示的化合物：[化学式1] R 1 -COOH（1）分散剂（E）是由重均分子量Mw为16000以下的下述式（2）：聚氨酯树脂组合物中的分散剂（E）的含量为0.1〜5.0重量％。

3. 发明授权

US07670433B2 Vacuum deposition apparatus of the winding type 有权
标题翻译：卷绕式真空沉积设备
公开(公告)号：US07670433B2
公开(公告)日：2010-03-02
申请号：US11630761
申请日：2006-02-14
申请人： Nobuhiro Hayashi , Shin Yokoi , Isao Tada , Atsushi Nakatsuka
发明人： Nobuhiro Hayashi , Shin Yokoi , Isao Tada , Atsushi Nakatsuka
IPC分类号： C23C16/00 , C23C14/00
CPC分类号： C23C14/042 , C23C14/54 , C23C14/562
摘要： The problem solved by this Invention is to provide a vacuum evaporation deposition method of the winding type and a vacuum evaporation deposition apparatus of the winding type which can form a metal film on a base film made of single layer plastic film without thermal deformation and with superior productivity. To solve the above problem, there are provided an electron beam irradiator 21 for irradiating an electron beam onto a film material 12 arranged between an unwinding roller 13 and a deposition source 16; an auxiliary roller 18 for guiding the film 12 in contact with the deposited metal layer and arranged between a can roller 14 and a winding roller 15; a DC bias power source 22 for applying a DC voltage between the auxiliary roller 18 and the can roller 14; electricity removing unit 23 for removing electricity from the film 12 and arranged between the can roller 14 and the winding roller 15. The electricity removing unit 23 is a plasma generating source of the DC dipolar discharge type wherein one of its electrodes is earthed.
摘要翻译：本发明解决的问题是提供一种绕线式真空蒸发沉积方法和一种可在无热变形的单层塑料薄膜制成的基膜上形成金属薄膜的卷绕型真空蒸镀装置，生产率。为了解决上述问题，提供了一种用于将电子束照射到布置在退绕辊13和沉积源16之间的薄膜材料12上的电子束照射器21; 用于引导与沉积的金属层接触并且布置在罐辊14和卷绕辊15之间的膜12的辅助辊18; 用于在辅助辊18和罐辊14之间施加DC电压的DC偏压电源22; 电力去除单元23，用于从膜12移除电力并且布置在罐辊14和卷绕辊15之间。除电单元23是其中一个电极接地的直流偶极放电类型的等离子体发生源。

4. 发明申请

US20070259105A1 Vacuum Deposition Apparatus of the Winding Type 有权
标题翻译：绕线式真空沉积设备
公开(公告)号：US20070259105A1
公开(公告)日：2007-11-08
申请号：US11630761
申请日：2006-02-14
申请人： Nobuhiro Hayashi , Shin Yoki , Isao Tada , Atsushi Nakatsuka
发明人： Nobuhiro Hayashi , Shin Yoki , Isao Tada , Atsushi Nakatsuka
IPC分类号： C23C14/56
CPC分类号： C23C14/042 , C23C14/54 , C23C14/562
摘要： The problem solved by this Invention is to provide a vacuum evaporation deposition method of the winding type and a vacuum evaporation deposition apparatus of the winding type which can form a metal film on a base film made of single layer plastic film without thermal deformation and with superior productivity. To solve the above problem, there are provided an electron beam irradiator 21 for irradiating an electron beam onto a film material 12 arranged between an unwinding roller 13 and a deposition source 16; an auxiliary roller 18 for guiding the film 12 in contact with the deposited metal layer and arranged between a can roller 14 and a winding roller 15; a DC bias power source 22 for applying a DC voltage between the auxiliary roller 18 and the can roller 14; electricity removing unit 23 for removing electricity from the film 12 and arranged between the can roller 14 and the winding roller 15. The electricity removing unit 23 is a plasma generating source of the DC dipolar discharge type wherein one of its electrodes is earthed.
摘要翻译：本发明解决的问题是提供一种绕线式真空蒸发沉积方法和一种可在无热变形的单层塑料薄膜制成的基膜上形成金属薄膜的卷绕型真空蒸镀装置，生产率。为了解决上述问题，提供了一种用于将电子束照射到布置在退绕辊13和沉积源16之间的薄膜材料12上的电子束照射器21; 用于引导与沉积的金属层接触并且布置在罐辊14和卷绕辊15之间的膜12的辅助辊18; 用于在辅助辊18和罐辊14之间施加DC电压的DC偏压电源22; 电除去单元23，用于从薄膜12移除电力并且布置在罐辊14和卷绕辊15之间。除电单元23是其中一个电极接地的直流偶极放电类型的等离子体发生源。

5. 发明申请

US20070134426A1 Vacuum evaporation deposition method of the winding type and vacuum evaporation deposition apparatus of the same 审中-公开
标题翻译：卷取式真空蒸镀法和真空蒸镀沉积装置相同
公开(公告)号：US20070134426A1
公开(公告)日：2007-06-14
申请号：US10574715
申请日：2004-11-12
申请人： Nobuhiro Hayashi , Takayoshi Hirono , Isao Tada , Atsushi Nakatsuka
发明人： Nobuhiro Hayashi , Takayoshi Hirono , Isao Tada , Atsushi Nakatsuka
IPC分类号： B05D3/00 , C23C8/00 , H05B6/02 , C23C16/00 , B29C71/04
CPC分类号： C23C14/562 , C23C14/022 , G11B5/85
摘要： The invention provides a vacuum evaporation deposition method of the winding type and a vacuum evaporation deposition apparatus of the winding type which can form a metal film on a base film made of a single layer of insulating material such as plastic film without thermal deformation, and which is superior in productivity. An electron beam irradiator 21 irradiates an electron beam onto an insulating material base film 12 before deposition of metal, and a DC bias power source 22 applies bias voltage between an auxiliary roller 18 for guiding the base film 12 with metal film deposited thereon and a can roller 14, whereby the base film 12 charged by the irradiation of the electron beam before the deposition of metal film, is made to be in close contact with the can roller 14. The base film 12 after deposition of metal film is made to be in close contact with the can roller 14 by the bias voltage applied between the auxiliary roller 18 connected electrically to the metal film and the can roller 14.
摘要翻译：本发明提供一种绕线式真空蒸发沉积方法和一种绕线式的真空蒸发沉积设备，该真空蒸镀沉积设备可以在由单层绝缘材料如塑料薄膜制成的基膜上形成金属膜而不会发生热变形，生产力优越。电子束照射器21在沉积金属之前将电子束照射到绝缘材料基膜12上，并且DC偏压电源22在用于引导基膜12的辅助辊18与其上沉积有金属膜的辅助辊18之间施加偏置电压，辊14，由此通过在沉积金属膜之前通过电子束的照射而充电的基膜12被制成与罐辊14紧密接触。通过施加在与金属膜电连接的辅助辊18和罐辊14之间的偏压施加金属膜沉积后的基膜12与罐辊14紧密接触。

6. 发明授权

US5527798A Pyridazinone derivatives, and insecticidal and miticidal composition 失效
标题翻译：哒嗪酮衍生物，杀虫和杀螨组合物
公开(公告)号：US5527798A
公开(公告)日：1996-06-18
申请号：US256732
申请日：1994-07-29
申请人： Isao Tada , Hisashi Takao
发明人： Isao Tada , Hisashi Takao
IPC分类号： A01N43/58 , C07D237/18
CPC分类号： A01N43/58 , C07D237/18
摘要： The invention provides a pyridazinone derivative having a high insecticidal and miticidal activity against agricultural noxious insects. The pyridazinone derivative of the invention is represented by the formula (1) ##STR1## wherein R is a hydrogen atom, an alkyl group, an alkoxyalkyl group, or a phenyl group which may have 1 or 2 substituents in an optional position.
摘要翻译： PCT No.PCT / JP93 / 01745 Sec。 371日期1994年7月29日第 102（e）日期1994年7月29日PCT 1993年12月1日PCT PCT。第WO / 9412479号公报日期：1994年6月9日。本发明提供了对农业有害昆虫具有高杀虫活性和杀螨活性的哒嗪酮衍生物。本发明的哒嗪酮衍生物由式（1）表示：其中R是氢原子，烷基，烷氧基烷基或在任选位置可以具有1或2个取代基的苯基。

7. 发明授权

US07896968B2 Winding type plasma CVD apparatus 有权
标题翻译：卷绕式等离子体CVD装置
公开(公告)号：US07896968B2
公开(公告)日：2011-03-01
申请号：US11792810
申请日：2006-05-10
申请人： Takayoshi Hirono , Isao Tada , Atsushi Nakatsuka , Masashi Kikuchi , Hideyuki Ogata , Hiroaki Kawamura , Kazuya Saito , Masatoshi Sato
发明人： Takayoshi Hirono , Isao Tada , Atsushi Nakatsuka , Masashi Kikuchi , Hideyuki Ogata , Hiroaki Kawamura , Kazuya Saito , Masatoshi Sato
IPC分类号： C23C16/00 , C23F1/00 , H01L21/306
CPC分类号： H01J37/3277 , B08B7/00 , C23C16/4405 , C23C16/46 , C23C16/5096 , C23C16/545 , H01J37/32009
摘要： The object of this invention is to provide a winding type plasma CVD apparatus in which quality of a layer can be made uniform by supplying a reaction gas uniformly to a deposition area of a film, and can perform a self-cleaning process of a deposition portion in the path of deposition onto the film.A film (22) is supported between a pair of movable rollers (33, 34) arranged on the upstream side and downstream side of the deposition portion (25) with regard to the traveling direction of the film, and then the film (22) is made to travel substantially linearly at the deposition position. Consequently, the distance between a shower plate (37) and the film (22) is kept constant, and the quality of the layer is made homogeneous. The film is heated by means of a metal belt (40) traveling simultaneously on the back side of the film. The moveable rollers (33, 34) ascend from the deposition position to the self-cleaning position, and the film (22) can be separated from the shower plate (37). Self-cleaning can be carried out in the path of the deposition onto the film by closing the aperture of a mask (51) with a shutter (65), thereby preventing leakage of cleaning gas.
摘要翻译：本发明的目的是提供一种绕线式等离子体CVD装置，通过将反应气体均匀地供应到膜的沉积区域，可以使层的质量均匀，并且可以进行沉积部分的自清洁处理在沉积到膜上的路径。相对于膜的行进方向，膜（22）被支撑在布置在沉积部分（25）的上游侧和下游侧的一对可动辊（33,34）之间，然后，膜（22）使其在沉积位置大致线性地移动。因此，喷淋板（37）和膜（22）之间的距离保持恒定，并且使层的质量均匀。薄膜通过金属带（40）加热，同时在薄膜背面行进。可移动辊（33,34）从沉积位置上升到自清洁位置，并且膜（22）可以与喷淋板（37）分离。通过用挡板（65）封闭掩模（51）的孔径，可以在沉积到膜上的路径中进行自清洁，从而防止清洁气体的泄漏。

8. 发明申请

US20080006206A1 Winding Type Plasma Cvd Apparatus 有权
标题翻译：绕组式等离子体Cvd装置
公开(公告)号：US20080006206A1
公开(公告)日：2008-01-10
申请号：US11792810
申请日：2006-05-10
申请人： Takayoshi Hirono , Isao Tada , Atsushi Nakatsuka , Masashi Kikuchi , Hideyuki Ogata , Hiroaki Kawamura , Kazuya Saito , Masatoshi Sato
发明人： Takayoshi Hirono , Isao Tada , Atsushi Nakatsuka , Masashi Kikuchi , Hideyuki Ogata , Hiroaki Kawamura , Kazuya Saito , Masatoshi Sato
IPC分类号： C23C16/505 , C23C16/44 , H01L21/205
CPC分类号： H01J37/3277 , B08B7/00 , C23C16/4405 , C23C16/46 , C23C16/5096 , C23C16/545 , H01J37/32009
摘要： The object of this invention is to provide a winding type plasma CVD apparatus in which quality of a layer can be made uniform by supplying a reaction gas uniformly to a deposition area of a film, and can perform a self-cleaning process of a deposition portion in the path of deposition onto the film. A film (22) is supported between a pair of movable rollers (33, 34) arranged on the upstream side and downstream side of the deposition portion (25) with regard to the traveling direction of the film, and then the film (22) is made to travel substantially linearly at the deposition position. Consequently, the distance between a shower plate (37) and the film (22) is kept constant, and the quality of the layer is made homogeneous. The film is heated by means of a metal belt (40) traveling simultaneously on the back side of the film. The moveable rollers (33,34) ascend from the deposition position to the self-cleaning position, and the film (22) can be separated from the shower plate (37). Self-cleaning can be carried out in the path of the deposition onto the film by closing the aperture of a mask (51) with a shutter (65), thereby preventing leakage of cleaning gas.
摘要翻译：本发明的目的是提供一种绕线式等离子体CVD装置，通过将反应气体均匀地供应到膜的沉积区域，可以使层的质量均匀，并且可以进行沉积部分的自清洁处理在沉积到膜上的路径。相对于膜的行进方向，膜（22）被支撑在布置在沉积部分（25）的上游侧和下游侧的一对可动辊（33,34）之间，然后，膜（22）使其在沉积位置基本线性地行进。因此，喷淋板（37）和膜（22）之间的距离保持恒定，并且使层的质量均匀。薄膜通过金属带（40）加热，同时在薄膜背面行进。可移动辊（33,34）从沉积位置上升到自清洁位置，并且膜（22）可以与喷淋板（37）分离。通过用挡板（65）封闭掩模（51）的孔径，可以在沉积到膜上的路径中进行自清洁，从而防止清洁气体的泄漏。

9. 发明授权

US5639776A 4, 5-dihydropyrazole-5-thione derivatives and miticides comprising the same 失效
标题翻译： 4,5-二氢吡唑-5-硫酮衍生物和包含它们的杀螨剂
公开(公告)号：US5639776A
公开(公告)日：1997-06-17
申请号：US702671
申请日：1996-09-11
申请人： Isao Tada , Minoru Motoki , Nobuyoshi Takahashi , Tetsuji Miyata
发明人： Isao Tada , Minoru Motoki , Nobuyoshi Takahashi , Tetsuji Miyata
IPC分类号： A01N43/56 , C07D231/18 , C07D401/04 , A01N43/40
CPC分类号： C07D401/04 , A01N43/56 , C07D231/18
摘要： The object of the present invention is to provide a novel 4, 5-dihydropyrazole-5-thione derivative which exerts remarkably potent miticidal activity. The 4, 5-dihydropyrazole-5-thione derivative of the present invention is represented by the general formula ##STR1## wherein R.sup.1 represents a straight- or branched-chain alkyl group having 1 to 12 carbon atoms or the like; R.sup.2 and R.sup.3 represent a lower alkyl group or the like; X represents a halogen atom or the like, n is 0 or an integer of 1 to 3; and A represents .paren open-st.C.paren close-st. or .paren open-st.N.paren close-st..
摘要翻译： PCT No.PCT / JP96 / 00044 Sec。 371日期：1996年9月11日 102（e）1996年9月11日PCT PCT 1996年1月12日PCT公布。出版物WO96 / 21651 日本1996年7月18日本发明的目的是提供一种具有显着效力的杀螨活性的新型4,5,5-二氢吡唑-5-硫酮衍生物。本发明的4,5-二氢吡唑-5-硫酮衍生物由通式“IMAGE”表示，其中R 1表示碳原子数1〜12的直链或支链烷基等; R2和R3表示低级烷基等; X表示卤原子等，n为0或1〜3的整数， A代表+545C + 546或+545N + 546。

10. 发明申请

US20110091661A1 APPARATUS FOR PRODUCING MULTILAYER SHEET AND METHOD OF PRODUCING THE MULTILAYER SHEET 审中-公开
标题翻译：用于生产多层薄片的装置以及生产多层薄片的方法
公开(公告)号：US20110091661A1
公开(公告)日：2011-04-21
申请号：US12903455
申请日：2010-10-13
申请人： Kaoru Ito , Masumi Noguchi , Hideaki Tanaka , Hiroyuki Ikeda , Makoto Shimomura , Isao Tada , Nobuhiro Hayashi , Hagane Irikura
发明人： Kaoru Ito , Masumi Noguchi , Hideaki Tanaka , Hiroyuki Ikeda , Makoto Shimomura , Isao Tada , Nobuhiro Hayashi , Hagane Irikura
IPC分类号： H05H1/24 , C23C14/14
CPC分类号： C23C14/20 , B05D1/60 , B05D7/52 , C23C14/562 , H01G4/008 , H01G4/145 , H01G4/33 , H01G13/00
摘要： An apparatus for producing a multilayer sheet including a resin film, a vapor-deposited metal film and a vapor-deposited polymer film at a low cost and with excellent productivity is provided which comprises: a vacuum chamber which is made to be in a vacuum state by exhaust means; a feeding roller; a take up roller; a first to third rollers, first metal vapor deposition means for forming a first vapor-deposited metal film on one surface of a resin film at a periphery of the first roller; vapor deposition polymerization means for forming a vapor-deposited polymer film on the first vapor-deposited metal film by vapor deposition polymerization at a periphery of the second roller; and second metal vapor deposition means for forming the second vapor-deposited metal film on the other surface of the resin film at a periphery of the third roller.
摘要翻译：提供一种以低成本和优异的生产率制造包括树脂膜，气相沉积金属膜和气相沉积聚合物膜的多层片材的设备，其包括：真空室，其被制成真空状态用排气装置喂料辊; 卷取辊; 第一至第三辊，第一金属蒸镀装置，用于在第一辊的周围在树脂膜的一个表面上形成第一蒸镀金属膜; 气相沉积聚合装置，用于在第二辊的周围通过气相沉积聚合在第一气相沉积金属膜上形成气相沉积聚合物膜; 以及第二金属蒸镀装置，用于在第三辊的周围在树脂膜的另一个表面上形成第二蒸镀金属膜。

你已经成功收藏专利！

检索式保存成功!

IPRDB

热门服务

关于我们

友情链接

联系方式