专利快速检索-快速检索全球专利，免费商用专利数据库-IPRDB

1. 发明授权

US08375891B2 Vacuum vapor processing apparatus 有权
标题翻译：真空蒸气处理装置
公开(公告)号：US08375891B2
公开(公告)日：2013-02-19
申请号：US12440635
申请日：2007-09-10
申请人： Hiroshi Nagata , Kyuzo Nakamura , Takeo Katou , Atsushi Nakatsuka , Ichirou Mukae , Masami Itou , Ryou Yoshiizumi , Yoshinori Shingaki
发明人： Hiroshi Nagata , Kyuzo Nakamura , Takeo Katou , Atsushi Nakatsuka , Ichirou Mukae , Masami Itou , Ryou Yoshiizumi , Yoshinori Shingaki
IPC分类号： C23C16/448 , C23C16/455 , C23C16/458 , C23C16/46 , C23F1/00 , H01L21/306 , C23C16/06 , C23C16/22
CPC分类号： C23C14/24 , H01F41/0293
摘要： There is provided a vacuum evaporating apparatus which is suitable for performing a process in which a metal vapor atmosphere is formed in a processing chamber, the metal atoms in this metal vapor atmosphere are caused to be adhered to the surface of an object to be processed, and the metal atoms adhered to the surface of the object to be processed are diffused into grain boundary phases thereof. The apparatus comprises: a processing furnace (11); at least one processing box (4) disposed inside the processing furnace; and a heating means (2) provided inside the processing furnace so as to enclose the processing box. An evacuating means is provided which, after housing the processing box inside the processing furnace in a state in which the object to be processed (S) and the metal evaporating material (V) are disposed in the processing box, reduces the processing furnace and the processing box to a predetermined pressure and keep them at that pressure. The heating means is operated in the reduced pressure to evaporate the metal evaporating material while increasing the object to be processed to a predetermined temperature. The evaporated metal atoms are supplied to the surface of the object to be processed.
摘要翻译：提供了一种真空蒸发装置，其适于进行在处理室中形成金属蒸汽气氛的过程，使金属蒸气气氛中的金属原子粘附到待处理物体的表面，并且附着在待处理物体表面的金属原子扩散到其晶界相。该装置包括：加工炉（11）; 设置在处理炉内的至少一个处理箱（4）以及设置在处理炉内部以包围处理盒的加热装置（2）。本发明提供一种排气装置，其特征在于，处理炉内处理箱内处理箱体（S）和金属蒸发材料（V）的状态被设置在处理箱内时，将加工炉和处理箱到预定的压力并保持在该压力下。加热装置在减压下操作以蒸发金属蒸发材料，同时将待处理物体增加到预定温度。蒸发的金属原子被供应到待处理物体的表面。

2. 发明授权

US08262808B2 Permanent magnet and method of manufacturing same 有权
标题翻译：永磁体及其制造方法
公开(公告)号：US08262808B2
公开(公告)日：2012-09-11
申请号：US12519878
申请日：2007-12-19
申请人： Hiroshi Nagata , Kyuzo Nakamura , Takeo Katou , Atsushi Nakatsuka , Ichirou Mukae , Masami Itou , Ryou Yoshiizumi , Yoshinori Shingaki
发明人： Hiroshi Nagata , Kyuzo Nakamura , Takeo Katou , Atsushi Nakatsuka , Ichirou Mukae , Masami Itou , Ryou Yoshiizumi , Yoshinori Shingaki
IPC分类号： H01F1/057
CPC分类号： C22C33/0242 , B22F2998/00 , B22F2998/10 , B22F2999/00 , C22C2202/02 , H01F41/0273 , H01F41/0293 , C22C33/0278 , B22F3/12 , B22F2201/40 , B22F2201/10 , B22F2201/20
摘要： There is provided a method of manufacturing a permanent magnet which has an extremely high coercive force and high magnetic properties is manufactured at high productivity. There are executed: a first step of causing at least one of Dy and Tb to adhere to at least part of a surface of iron-boron-rare-earth based sintered magnet; and a second step of diffusing, through heat-treatment at a predetermined temperature, at least one of Dy and Tb adhered to the surface of the sintered magnet into grain boundary phase of the sintered magnet. As the sintered magnet, there is used one which is manufactured by: mixing each powder of principal phase alloy (constituted primarily by R2T14B phase, where R is at least one rare earth element primarily including Nd and where T is a transition metal primarily including Fe), and a liquid phase alloy (having a higher content of R than R2T14B phase and primarily constituted by R-rich phase) in a predetermined mixing ratio; press-forming in magnetic field a mixed powder thus obtained; and sintering a press-formed body in vacuum or inert gas atmosphere.
摘要翻译：提供了一种制造具有极高矫顽力的永磁体的方法，并以高生产率制造高磁性。执行：使Dy和Tb中的至少一种附着在铁 - 硼 - 稀土类烧结磁体的表面的至少一部分上的第一步骤; 以及第二步骤，通过在预定温度下进行热处理，将附着在烧结磁体表面上的Dy和Tb中的至少一种扩散到烧结磁体的晶界相。作为烧结磁体，使用以下制造方法：将主相合金粉末（主要由R2T14B相构成，其中R为主要包含Nd的至少一种稀土元素，其中T为主要包含Fe的过渡金属））和预定混合比的液相合金（R含量比R2T14B相高，主要由富R相构成）; 在磁场中成形如此得到的混合粉末; 并在真空或惰性气体气氛中烧结压制成形体。

3. 发明授权

US08221551B2 Apparatus for producing a reflector 有权
标题翻译：用于制造反射器的装置
公开(公告)号：US08221551B2
公开(公告)日：2012-07-17
申请号：US12307312
申请日：2007-06-07
申请人： Masayuki Iljima , Yosuke Kobayashi , Kouji Hirayama , Yusuke Hashimoto , Ryuji Hamada , Ken Momono , Atsushi Nakatsuka
发明人： Masayuki Iljima , Yosuke Kobayashi , Kouji Hirayama , Yusuke Hashimoto , Ryuji Hamada , Ken Momono , Atsushi Nakatsuka
IPC分类号： B01J19/08 , C23C16/54
CPC分类号： C23C28/00 , G02B5/0808
摘要： Provided is a deposition apparatus that has a metal evaporation source for depositing a reflective layer, a pigment evaporation source for depositing a coloring layer, and a plasma polymerization source (electrode) for depositing a protective layer disposed inside a single vacuum processing room. By carrying out a step of depositing the reflective layer, a step of depositing the coloring layer, and a step of depositing the protective layer in the common vacuum processing room, processes can be simplified and an operation time can be reduced.
摘要翻译：提供了一种沉积设备，其具有用于沉积反射层的金属蒸发源，用于沉积着色层的颜料蒸发源和用于沉积设置在单个真空处理室内的保护层的等离子体聚合源（电极）。通过进行沉积反射层的步骤，沉积着色层的步骤和在普通真空处理室中沉积保护层的步骤可以简化并且可以减少操作时间。

4. 发明授权

US08128760B2 Permanent magnet and method of manufacturing same 有权
标题翻译：永磁体及其制造方法
公开(公告)号：US08128760B2
公开(公告)日：2012-03-06
申请号：US12519884
申请日：2007-12-19
申请人： Hiroshi Nagata , Kyuzo Nakamura , Takeo Katou , Atsushi Nakatsuka , Ichirou Mukae , Masami Itou , Ryou Yoshiizumi , Yoshinori Shingaki
发明人： Hiroshi Nagata , Kyuzo Nakamura , Takeo Katou , Atsushi Nakatsuka , Ichirou Mukae , Masami Itou , Ryou Yoshiizumi , Yoshinori Shingaki
IPC分类号： H01F1/057
CPC分类号： H01F41/026 , H01F1/0577 , H01F7/02 , H01F41/0293
摘要： By eliminating the necessity of a prior step for cleaning a sintered magnet before adhering Dy and/or Tb to the surface of the sintered magnet S, the productivity of a permanent magnet having diffused Dy and/or Tb into grain boundary phase is improved. Iron-boron-rare earth based sintered magnet (S) disposed in a processing chamber (20) is heated to a predetermined temperature. An evaporating material (V) which is made of a hydride containing at least one of Dy and Tb is disposed in the same or in another processing chamber and is evaporated to cause the evaporated evaporating material to the surface of the sintered magnet. Metal atoms of Dy and/or Tb are diffused into grain boundary phase of the sintered magnet.
摘要翻译：通过消除在将Dy和/或Tb粘附到烧结磁体S的表面之前清洁烧结磁体的先前步骤的必要性，具有扩散的Dy和/或Tb的永磁体的生产率提高到晶界相。设置在处理室（20）中的铁 - 硼 - 稀土类烧结磁体（S）被加热到预定温度。将由含有Dy和Tb中的至少一种的氢化物制成的蒸发材料（V）设置在同一处理室中或在另一个处理室中，蒸发而使蒸发的蒸发材料到烧结磁体的表面。 Dy和/或Tb的金属原子扩散到烧结磁体的晶界相。

5. 发明申请

US20100051140A1 PERMANENT MAGNET AND METHOD OF MANUFACTURING SAME 有权
标题翻译：永磁体及其制造方法
公开(公告)号：US20100051140A1
公开(公告)日：2010-03-04
申请号：US12519871
申请日：2007-12-19
申请人： Hiroshi Nagata , Kyuzo Nakamura , Takeo Katou , Atsushi Nakatsuka , Ichirou Mukae , Masami Itou , Ryou Yoshiizumi , Yoshinori Shingaki
发明人： Hiroshi Nagata , Kyuzo Nakamura , Takeo Katou , Atsushi Nakatsuka , Ichirou Mukae , Masami Itou , Ryou Yoshiizumi , Yoshinori Shingaki
IPC分类号： H01F41/02 , H01F1/053 , H01F1/08
CPC分类号： H01F1/0577 , H01F41/0293
摘要： By causing at least one of Dy and Tb to be adhered to the surface of an iron-boron-rare earth based sintered magnet of a predetermined shape, and is then to be diffused into grain boundary phase, a permanent magnet can be manufactured at high workability and low cost. An iron-boron-rare earth based sintered magnet is disposed in a processing chamber and is heated to a predetermined temperature. Also, an evaporating material made up of a fluoride containing at least one of Dy and Tb disposed in the same or another processing chamber is evaporated, and the evaporated evaporating material is caused to be adhered to the surface of the sintered magnet. The Dy and/or Tb metal atoms of the adhered evaporating material are diffused into the grain particle phase of the sintered magnet before a thin film made of the evaporated material is formed on the surface of the sintered magnet.
摘要翻译：通过使Dy和Tb中的至少一种粘附到具有预定形状的铁 - 硼 - 稀土类烧结磁体的表面上，然后被扩散到晶界相中，可以高度制造永久磁铁可操作性和低成本。将铁 - 硼 - 稀土类烧结磁体设置在处理室中并加热至预定温度。此外，由含有设置在相同或另一处理室中的Dy和Tb中的至少一种的氟化物构成的蒸发材料蒸发，使蒸发的蒸发材料附着在烧结磁体的表面。在烧结磁体的表面上形成由蒸发材料制成的薄膜之前，附着的蒸发材料的Dy和/或Tb金属原子扩散到烧结磁体的颗粒相。

6. 发明申请

US20090320747A1 TAKE-UP TYPE VACUUM FILMING DEVICE 有权
标题翻译：真空型真空成膜装置
公开(公告)号：US20090320747A1
公开(公告)日：2009-12-31
申请号：US12374675
申请日：2007-07-26
申请人： Nobuhiro Hayashi , Tomoharu Fujii , Isao Tada , Atsushi Nakatsuka
发明人： Nobuhiro Hayashi , Tomoharu Fujii , Isao Tada , Atsushi Nakatsuka
IPC分类号： C23C14/56
CPC分类号： C23C14/042 , B05C1/0821 , B05C1/083 , B05C1/0834 , C23C14/562 , H01G13/00 , H01G13/006
摘要： [Object] To provide a roll-to-roll vacuum deposition apparatus capable of easily and speedily adjusting a pressing force between a printing roller and a backup roller.[Solving Means] In the present invention, by adjusting a pressing force between a printing roller and a backup roller through a relative movement of a mask forming unit including the printing roller and a transfer roller with respect to a vacuum chamber, individual adjustments of the printing roller and the transfer roller are eliminated and an adjustment of a pressing force on a unit basis is realized, thus achieving simplification of a structure, simplification and enhancement in precision of tasks, and a reduction in work time.
摘要翻译：本发明提供能够容易且快速地调整印刷辊和支承辊之间的按压力的卷对卷真空成膜装置。解决方案在本发明中，通过相对于真空室通过包括印刷辊和转印辊的掩模形成单元的相对运动调节印刷辊和支撑辊之间的按压力，可以对印刷辊和转印辊被消除，并且实现了基于单元的按压力的调节，从而实现了结构的简化，简化和提高了任务精度以及减少了工作时间。

7. 发明申请

US20090208664A1 APPARATUS AND METHOD FOR PRODUCING A REFLECTOR 有权
标题翻译：用于制造反射器的装置和方法
公开(公告)号：US20090208664A1
公开(公告)日：2009-08-20
申请号：US12307312
申请日：2007-06-07
申请人： Masayuki Iijima , Yosuke Kobayashi , Kouji Hirayama , Yusuke Hashimoto , Ryuji Hamada , Ken Momono , Atsushi Nakatsuka
发明人： Masayuki Iijima , Yosuke Kobayashi , Kouji Hirayama , Yusuke Hashimoto , Ryuji Hamada , Ken Momono , Atsushi Nakatsuka
IPC分类号： B01J19/08 , C23C16/54
CPC分类号： C23C28/00 , G02B5/0808
摘要： Provided is a deposition apparatus that has a metal evaporation source for depositing a reflective layer, a pigment evaporation source for depositing a coloring layer, and a plasma polymerization source (electrode) for depositing a protective layer disposed inside a single vacuum processing room. By carrying out a step of depositing the reflective layer, a step of depositing the coloring layer, and a step of depositing the protective layer in the common vacuum processing room, processes can be simplified and an operation time can be reduced.
摘要翻译：提供了一种沉积设备，其具有用于沉积反射层的金属蒸发源，用于沉积着色层的颜料蒸发源和用于沉积设置在单个真空处理室内的保护层的等离子体聚合源（电极）。通过进行沉积反射层的步骤，沉积着色层的步骤和在普通真空处理室中沉积保护层的步骤可以简化并且可以减少操作时间。

8. 发明授权

US08333841B2 Roll-to-roll vacuum deposition apparatus 有权
标题翻译：卷对卷真空沉积设备
公开(公告)号：US08333841B2
公开(公告)日：2012-12-18
申请号：US12374675
申请日：2007-07-26
申请人： Nobuhiro Hayashi , Tomoharu Fujii , Isao Tada , Atsushi Nakatsuka
发明人： Nobuhiro Hayashi , Tomoharu Fujii , Isao Tada , Atsushi Nakatsuka
IPC分类号： C23C16/00
CPC分类号： C23C14/042 , B05C1/0821 , B05C1/083 , B05C1/0834 , C23C14/562 , H01G13/00 , H01G13/006
摘要： [Object] To provide a roll-to-roll vacuum deposition apparatus capable of easily and speedily adjusting a pressing force between a printing roller and a backup roller.[Solving Means] In the present invention, by adjusting a pressing force between a printing roller and a backup roller through a relative movement of a mask forming unit including the printing roller and a transfer roller with respect to a vacuum chamber, individual adjustments of the printing roller and the transfer roller are eliminated and an adjustment of a pressing force on a unit basis is realized, thus achieving simplification of a structure, simplification and enhancement in precision of tasks, and a reduction in work time.
摘要翻译：本发明提供能够容易且快速地调整印刷辊和支承辊之间的按压力的卷对卷真空成膜装置。解决方案在本发明中，通过相对于真空室通过包括印刷辊和转印辊的掩模形成单元的相对运动调节印刷辊和支撑辊之间的按压力，可以对印刷辊和转印辊被消除，并且实现了基于单元的按压力的调节，从而实现了结构的简化，简化和提高了任务精度以及减少了工作时间。

9. 发明授权

US07670433B2 Vacuum deposition apparatus of the winding type 有权
标题翻译：卷绕式真空沉积设备
公开(公告)号：US07670433B2
公开(公告)日：2010-03-02
申请号：US11630761
申请日：2006-02-14
申请人： Nobuhiro Hayashi , Shin Yokoi , Isao Tada , Atsushi Nakatsuka
发明人： Nobuhiro Hayashi , Shin Yokoi , Isao Tada , Atsushi Nakatsuka
IPC分类号： C23C16/00 , C23C14/00
CPC分类号： C23C14/042 , C23C14/54 , C23C14/562
摘要： The problem solved by this Invention is to provide a vacuum evaporation deposition method of the winding type and a vacuum evaporation deposition apparatus of the winding type which can form a metal film on a base film made of single layer plastic film without thermal deformation and with superior productivity. To solve the above problem, there are provided an electron beam irradiator 21 for irradiating an electron beam onto a film material 12 arranged between an unwinding roller 13 and a deposition source 16; an auxiliary roller 18 for guiding the film 12 in contact with the deposited metal layer and arranged between a can roller 14 and a winding roller 15; a DC bias power source 22 for applying a DC voltage between the auxiliary roller 18 and the can roller 14; electricity removing unit 23 for removing electricity from the film 12 and arranged between the can roller 14 and the winding roller 15. The electricity removing unit 23 is a plasma generating source of the DC dipolar discharge type wherein one of its electrodes is earthed.
摘要翻译：本发明解决的问题是提供一种绕线式真空蒸发沉积方法和一种可在无热变形的单层塑料薄膜制成的基膜上形成金属薄膜的卷绕型真空蒸镀装置，生产率。为了解决上述问题，提供了一种用于将电子束照射到布置在退绕辊13和沉积源16之间的薄膜材料12上的电子束照射器21; 用于引导与沉积的金属层接触并且布置在罐辊14和卷绕辊15之间的膜12的辅助辊18; 用于在辅助辊18和罐辊14之间施加DC电压的DC偏压电源22; 电力去除单元23，用于从膜12移除电力并且布置在罐辊14和卷绕辊15之间。除电单元23是其中一个电极接地的直流偶极放电类型的等离子体发生源。

10. 发明申请

US20070259105A1 Vacuum Deposition Apparatus of the Winding Type 有权
标题翻译：绕线式真空沉积设备
公开(公告)号：US20070259105A1
公开(公告)日：2007-11-08
申请号：US11630761
申请日：2006-02-14
申请人： Nobuhiro Hayashi , Shin Yoki , Isao Tada , Atsushi Nakatsuka
发明人： Nobuhiro Hayashi , Shin Yoki , Isao Tada , Atsushi Nakatsuka
IPC分类号： C23C14/56
CPC分类号： C23C14/042 , C23C14/54 , C23C14/562
摘要： The problem solved by this Invention is to provide a vacuum evaporation deposition method of the winding type and a vacuum evaporation deposition apparatus of the winding type which can form a metal film on a base film made of single layer plastic film without thermal deformation and with superior productivity. To solve the above problem, there are provided an electron beam irradiator 21 for irradiating an electron beam onto a film material 12 arranged between an unwinding roller 13 and a deposition source 16; an auxiliary roller 18 for guiding the film 12 in contact with the deposited metal layer and arranged between a can roller 14 and a winding roller 15; a DC bias power source 22 for applying a DC voltage between the auxiliary roller 18 and the can roller 14; electricity removing unit 23 for removing electricity from the film 12 and arranged between the can roller 14 and the winding roller 15. The electricity removing unit 23 is a plasma generating source of the DC dipolar discharge type wherein one of its electrodes is earthed.
摘要翻译：本发明解决的问题是提供一种绕线式真空蒸发沉积方法和一种可在无热变形的单层塑料薄膜制成的基膜上形成金属薄膜的卷绕型真空蒸镀装置，生产率。为了解决上述问题，提供了一种用于将电子束照射到布置在退绕辊13和沉积源16之间的薄膜材料12上的电子束照射器21; 用于引导与沉积的金属层接触并且布置在罐辊14和卷绕辊15之间的膜12的辅助辊18; 用于在辅助辊18和罐辊14之间施加DC电压的DC偏压电源22; 电除去单元23，用于从薄膜12移除电力并且布置在罐辊14和卷绕辊15之间。除电单元23是其中一个电极接地的直流偶极放电类型的等离子体发生源。

你已经成功收藏专利！

检索式保存成功!

IPRDB

热门服务

关于我们

友情链接

联系方式