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1. 发明申请

US20130009192A1 NITRIDE SEMICONDUCTOR LIGHT EMITTING DEVICE 审中-公开
标题翻译：氮化物半导体发光器件
公开(公告)号：US20130009192A1
公开(公告)日：2013-01-10
申请号：US13368043
申请日：2012-02-07
申请人： Hyun Wook Shim , Dong Ju Lee , Dong Ik Shin , Young Sun Kim , Makoto Asai , Yu Ri Sohn
发明人： Hyun Wook Shim , Dong Ju Lee , Dong Ik Shin , Young Sun Kim , Makoto Asai , Yu Ri Sohn
IPC分类号： H01L33/30
CPC分类号： H01L33/025 , H01L29/452 , H01L33/32 , H01L33/40
摘要： Provided is a nitride semiconductor light emitting device including p-type nitride semiconductor layer, an n-type nitride semiconductor layer, and an active layer formed therebetween. A contact layer is positioned between the p-type nitride semiconductor layer and a p-side electrode. The contact layer includes a first p-type nitride layer having a first impurity concentration to form ohmic contact with the p-side electrode and a second p-type nitride layer having a second impurity concentration, the second impurity concentration having a concentration lower than the first impurity concentration.
摘要翻译：提供了包括p型氮化物半导体层，n型氮化物半导体层和在它们之间形成的有源层的氮化物半导体发光器件。接触层位于p型氮化物半导体层和p侧电极之间。接触层包括具有第一杂质浓度以与p侧电极欧姆接触的第一p型氮化物层和具有第二杂质浓度的第二p型氮化物层，第二杂质浓度的浓度低于第一杂质浓度。

2. 发明申请

US20120326121A1 VAPOR DEPOSITION SYSTEM, METHOD OF MANUFACTURING LIGHT EMITTING DEVICE AND LIGHT EMITTING DEVICE 审中-公开
标题翻译：蒸气沉积系统，制造发光装置和发光装置的方法
公开(公告)号：US20120326121A1
公开(公告)日：2012-12-27
申请号：US13603192
申请日：2012-09-04
申请人： Dong Ju LEE , Hyun Wook Shim , Heon Ho Lee , Young Sun Kim , Sung Tae Kim
发明人： Dong Ju LEE , Hyun Wook Shim , Heon Ho Lee , Young Sun Kim , Sung Tae Kim
IPC分类号： H01L33/04
CPC分类号： C23C16/54 , C23C16/45563 , C30B23/02 , C30B25/14 , C30B29/40 , H01L21/0254 , H01L21/0262 , H01L33/007
摘要： There are provided a vapor deposition system, a method of manufacturing a light emitting device, and a light emitting device. A vapor deposition system according to an aspect of the invention may include: a first chamber having a first susceptor and at least one gas distributor discharging a gas in a direction parallel to a substrate disposed on the first susceptor; and a second chamber having a second susceptor and at least one second gas distributor arranged above the second susceptor to discharge a gas downwards.When a vapor deposition system according to an aspect of the invention is used, a semiconductor layer being thereby grown has excellent crystalline quality, thereby improving the performance of a light emitting device. Furthermore, while the operational capability and productivity of the vapor deposition system are improved, deterioration in an apparatus can be prevented.
摘要翻译：提供了蒸镀系统，制造发光器件的方法和发光器件。根据本发明的一个方面的气相沉积系统可以包括：具有第一基座和至少一个气体分布器的第一腔室，其沿平行于设置在第一基座上的衬底的方向排放气体; 以及第二室，具有第二基座和布置在第二基座上方的至少一个第二气体分配器，以向下排放气体。当使用根据本发明的一个方面的气相沉积系统时，由此生长的半导体层具有优异的结晶质量，从而提高了发光器件的性能。此外，虽然改善了气相沉积系统的操作能力和生产率，但是可以防止装置的劣化。

3. 发明授权

US08685772B2 Method of manufacturing light emitting diode and light emitting diode manufactured thereby 有权
标题翻译：由此制造发光二极管和发光二极管的方法
公开(公告)号：US08685772B2
公开(公告)日：2014-04-01
申请号：US13344298
申请日：2012-01-05
申请人： Dong Ju Lee , Heon Ho Lee , Hyun Wook Shim , Young Sun Kim
发明人： Dong Ju Lee , Heon Ho Lee , Hyun Wook Shim , Young Sun Kim
IPC分类号： H01L33/02
CPC分类号： H01L33/0075 , H01L33/007 , H01L33/32
摘要： There is provided a method of manufacturing a light emitting diode and a light emitting diode manufactured by the same. The method includes growing a first conductivity type nitride semiconductor layer and an undoped nitride semiconductor layer on a substrate sequentially in a first reaction chamber; transferring the substrate having the first conductivity type nitride semiconductor layer and the undoped nitride semiconductor layer grown thereon to a second reaction chamber; growing an additional first conductivity type nitride semiconductor layer on the undoped nitride semiconductor layer in the second reaction chamber; growing an active layer on the additional first conductivity type nitride semiconductor layer; and growing a second conductivity type nitride semiconductor layer on the active layer.
摘要翻译：提供了一种制造发光二极管的方法和由其制造的发光二极管。该方法包括在第一反应室中顺序地在衬底上生长第一导电型氮化物半导体层和未掺杂的氮化物半导体层; 将具有第一导电型氮化物半导体层和其上生长的未掺杂氮化物半导体层的衬底转移到第二反应室; 在第二反应室中的未掺杂的氮化物半导体层上生长附加的第一导电型氮化物半导体层; 在附加的第一导电型氮化物半导体层上生长活性层; 以及在所述有源层上生长第二导电型氮化物半导体层。

4. 发明申请

US20110198667A1 VAPOR DEPOSITION SYSTEM, METHOD OF MANUFACTURING LIGHT EMITTING DEVICE AND LIGHT EMITTING DEVICE 审中-公开
标题翻译：蒸气沉积系统，制造发光装置和发光装置的方法
公开(公告)号：US20110198667A1
公开(公告)日：2011-08-18
申请号：US12940399
申请日：2010-11-05
申请人： Dong Ju LEE , Hyun Wook Shim , Heon Ho Lee , Young Sun Kim , Sung Tae Kim
发明人： Dong Ju LEE , Hyun Wook Shim , Heon Ho Lee , Young Sun Kim , Sung Tae Kim
IPC分类号： H01L33/30 , H01L33/00 , H01L33/02
CPC分类号： C23C16/54 , C23C16/45563 , C30B23/02 , C30B25/14 , C30B29/40 , H01L21/0254 , H01L21/0262 , H01L33/007
摘要： There are provided a vapor deposition system, a method of manufacturing a light emitting device, and a light emitting device. A vapor deposition system according to an aspect of the invention may include: a first chamber having a first susceptor and at least one gas distributor discharging a gas in a direction parallel to a substrate disposed on the first susceptor; and a second chamber having a second susceptor and at least one second gas distributor arranged above the second susceptor to discharge a gas downwards.When a vapor deposition system according to an aspect of the invention is used, a semiconductor layer being thereby grown has excellent crystalline quality, thereby improving the performance of a light emitting device. Furthermore, while the operational capability and productivity of the vapor deposition system are improved, deterioration in an apparatus can be prevented.
摘要翻译：提供了蒸镀系统，制造发光器件的方法和发光器件。根据本发明的一个方面的气相沉积系统可以包括：具有第一基座和至少一个气体分布器的第一腔室，其沿平行于设置在第一基座上的衬底的方向排放气体; 以及第二室，具有第二基座和布置在第二基座上方的至少一个第二气体分配器，以向下排放气体。当使用根据本发明的一个方面的气相沉积系统时，由此生长的半导体层具有优异的结晶质量，从而提高了发光器件的性能。此外，虽然改善了气相沉积系统的操作能力和生产率，但是可以防止装置的劣化。

5. 发明申请

US20120009697A1 CHEMICAL VAPOR DEPOSITION APPARATUS AND METHOD OF FORMING SEMICONDUCTOR EPITAXIAL THIN FILM USING THE SAME 有权
标题翻译：化学蒸气沉积装置及其形成使用其的半导体外延薄膜的方法
公开(公告)号：US20120009697A1
公开(公告)日：2012-01-12
申请号：US13173423
申请日：2011-06-30
申请人： Jong Sun Maeng , Young Sun Kim , Hyun Wook Shim , Sung Tae Kim
发明人： Jong Sun Maeng , Young Sun Kim , Hyun Wook Shim , Sung Tae Kim
IPC分类号： H01L33/48 , C23C16/458 , C23C16/44
CPC分类号： H01L33/0075 , C23C16/45502 , C23C16/45517 , C23C16/45563 , C23C16/45572 , C23C16/45574 , C23C16/45578 , C23C16/4558 , C23C16/45591 , C23C16/458 , C23C16/4584 , C23C16/4585 , H01L33/0066 , H01L2933/0016
摘要： A chemical vapor deposition apparatus includes: a reaction chamber including an inner tube having a predetermined volume of an inner space, and an outer tube tightly sealing the inner tube; a wafer holder disposed within the inner tube and on which a plurality of wafers are stacked at predetermined intervals; and a gas supply unit including at least one gas line supplying an external reaction gas to the reaction chamber, and a plurality of spray nozzles communicating with the gas line to spray the reaction gas to the wafers, whereby semiconductor epitaxial thin films are grown on the surfaces of the wafers, wherein the semiconductor epitaxial thin film grown on the surface of the wafer includes a light emitting structure in which a first-conductivity-type semiconductor layer, an active layer, and a second-conductivity-type semiconductor layer are sequentially formed.
摘要翻译：化学气相沉积装置包括：反应室，包括具有预定体积的内部空间的内管和紧密地密封内管的外管; 设置在所述内管内并且以预定间隔堆叠多个晶片的晶片保持架; 以及气体供给单元，其包括向反应室供给外部反应气体的至少一个气体管线，以及与气体管线连通的多个喷嘴，以将反应气体喷射到晶片，由此在其上生长半导体外延薄膜晶片的表面，其中在晶片表面上生长的半导体外延薄膜包括其中顺序形成第一导电型半导体层，有源层和第二导电型半导体层的发光结构。

6. 发明授权

US08895356B2 Chemical vapor deposition apparatus and method of forming semiconductor epitaxial thin film using the same 有权
标题翻译：化学气相沉积装置及使用其形成半导体外延薄膜的方法
公开(公告)号：US08895356B2
公开(公告)日：2014-11-25
申请号：US13173423
申请日：2011-06-30
申请人： Jong Sun Maeng , Young Sun Kim , Hyun Wook Shim , Sung Tae Kim
发明人： Jong Sun Maeng , Young Sun Kim , Hyun Wook Shim , Sung Tae Kim
IPC分类号： H01L21/00 , H01L21/16 , C23C16/455 , C23C16/458
CPC分类号： H01L33/0075 , C23C16/45502 , C23C16/45517 , C23C16/45563 , C23C16/45572 , C23C16/45574 , C23C16/45578 , C23C16/4558 , C23C16/45591 , C23C16/458 , C23C16/4584 , C23C16/4585 , H01L33/0066 , H01L2933/0016
摘要： A chemical vapor deposition apparatus includes: a reaction chamber including an inner tube having a predetermined volume of an inner space, and an outer tube tightly sealing the inner tube; a wafer holder disposed within the inner tube and on which a plurality of wafers are stacked at predetermined intervals; and a gas supply unit including at least one gas line supplying an external reaction gas to the reaction chamber, and a plurality of spray nozzles communicating with the gas line to spray the reaction gas to the wafers, whereby semiconductor epitaxial thin films are grown on the surfaces of the wafers, wherein the semiconductor epitaxial thin film grown on the surface of the wafer includes a light emitting structure in which a first-conductivity-type semiconductor layer, an active layer, and a second-conductivity-type semiconductor layer are sequentially formed.
摘要翻译：化学气相沉积装置包括：反应室，包括具有预定体积的内部空间的内管和紧密地密封内管的外管; 设置在所述内管内并且以预定间隔堆叠多个晶片的晶片保持架; 以及气体供给单元，其包括向反应室供给外部反应气体的至少一个气体管线，以及与气体管线连通的多个喷嘴，以将反应气体喷射到晶片，由此在其上生长半导体外延薄膜晶片的表面，其中在晶片表面上生长的半导体外延薄膜包括其中顺序形成第一导电型半导体层，有源层和第二导电型半导体层的发光结构。

7. 发明申请

US20130026446A1 SEMICONDUCTOR LIGHT EMITTING DEVICE AND FABRICATION METHOD THEREOF 有权
标题翻译：半导体发光器件及其制造方法
公开(公告)号：US20130026446A1
公开(公告)日：2013-01-31
申请号：US13557915
申请日：2012-07-25
申请人： Sang Heon HAN , Jong Hyun Lee , Jin Young Lim , Dong Ju Lee , Heon Ho Lee , Young Sun Kim , Sung Tae Kim
发明人： Sang Heon HAN , Jong Hyun Lee , Jin Young Lim , Dong Ju Lee , Heon Ho Lee , Young Sun Kim , Sung Tae Kim
IPC分类号： H01L33/04 , H01L33/60
CPC分类号： H01L33/06 , H01L33/32
摘要： A semiconductor light emitting device and a fabrication method thereof are provided. The semiconductor light emitting device includes: first and second conductivity-type semiconductor layers; and an active layer disposed between the first and second conductivity-type semiconductor layers and having a structure in which a quantum barrier layer and a quantum well layer are alternately disposed, and the quantum barrier layer includes first and second regions disposed in order of proximity to the first conductivity-type semiconductor layer.
摘要翻译：提供了一种半导体发光器件及其制造方法。半导体发光器件包括：第一和第二导电型半导体层; 以及设置在第一和第二导电类型半导体层之间并且具有其中交替地设置量子势垒层和量子阱层的结构的有源层，并且量子势垒层包括按照接近于...的顺序设置的第一和第二区域第一导电型半导体层。

8. 发明授权

US08709839B2 Method of fabricating semiconductor light emitting device 有权
标题翻译：制造半导体发光器件的方法
公开(公告)号：US08709839B2
公开(公告)日：2014-04-29
申请号：US13493342
申请日：2012-06-11
申请人： Jong Hyun Lee , Dong Ju Lee , Young Sun Kim
发明人： Jong Hyun Lee , Dong Ju Lee , Young Sun Kim
IPC分类号： H01L21/00
CPC分类号： H01L33/0079
摘要： There is provided a method of fabricating a semiconductor light emitting device, including: forming a sacrificial layer having a plurality of nanostructures on a growth substrate; forming a protective layer to cover the sacrificial layer; forming a light emitting structure by allowing a first conductive semiconductor layer, an active layer and a second conductive semiconductor layer to be sequentially grown on the protective layer; etching the protective layer to expose the nanostructures; and separating the light emitting structure from the growth substrate by etching the exposed nanostructures, whereby damage and degradation of a light emitting structure at the time of the separation thereof may be prevented.
摘要翻译：提供一种制造半导体发光器件的方法，包括：在生长衬底上形成具有多个纳米结构的牺牲层; 形成保护层以覆盖牺牲层; 通过允许第一导电半导体层，有源层和第二导电半导体层在保护层上顺序生长来形成发光结构; 蚀刻保护层以暴露纳米结构; 并且通过蚀刻暴露的纳米结构将发光结构与生长衬底分离，从而可以防止发光结构在其分离时的损坏和劣化。

9. 发明授权

US08575593B2 Semiconductor light emitting device and fabrication method thereof 有权
标题翻译：半导体发光器件及其制造方法
公开(公告)号：US08575593B2
公开(公告)日：2013-11-05
申请号：US13557915
申请日：2012-07-25
申请人： Sang Heon Han , Jong Hyun Lee , Jin Young Lim , Dong Ju Lee , Heon Ho Lee , Young Sun Kim , Sung Tae Kim
发明人： Sang Heon Han , Jong Hyun Lee , Jin Young Lim , Dong Ju Lee , Heon Ho Lee , Young Sun Kim , Sung Tae Kim
IPC分类号： H01L33/32
CPC分类号： H01L33/06 , H01L33/32
摘要： A semiconductor light emitting device and a fabrication method thereof are provided. The semiconductor light emitting device includes: first and second conductivity-type semiconductor layers; and an active layer disposed between the first and second conductivity-type semiconductor layers and having a structure in which a quantum barrier layer and a quantum well layer are alternately disposed, and the quantum barrier layer includes first and second regions disposed in order of proximity to the first conductivity-type semiconductor layer.
摘要翻译：提供了一种半导体发光器件及其制造方法。半导体发光器件包括：第一和第二导电型半导体层; 以及设置在第一和第二导电类型半导体层之间并且具有其中交替地设置量子势垒层和量子阱层的结构的有源层，并且量子势垒层包括按照接近于...的顺序设置的第一和第二区域第一导电型半导体层。

10. 发明申请

US20120322191A1 METHOD OF FABRICATING SEMICONDUCTOR LIGHT EMITTING DEVICE 有权
标题翻译：制造半导体发光器件的方法
公开(公告)号：US20120322191A1
公开(公告)日：2012-12-20
申请号：US13493342
申请日：2012-06-11
申请人： Jong Hyun Lee , Dong Ju Lee , Young Sun Kim
发明人： Jong Hyun Lee , Dong Ju Lee , Young Sun Kim
IPC分类号： H01L33/06
CPC分类号： H01L33/0079
摘要： There is provided a method of fabricating a semiconductor light emitting device, including: forming a sacrificial layer having a plurality of nanostructures on a growth substrate; forming a protective layer to cover the sacrificial layer; forming a light emitting structure by allowing a first conductive semiconductor layer, an active layer and a second conductive semiconductor layer to be sequentially grown on the protective layer; etching the protective layer to expose the nanostructures; and separating the light emitting structure from the growth substrate by etching the exposed nanostructures, whereby damage and degradation of a light emitting structure at the time of the separation thereof may be prevented.
摘要翻译：提供一种制造半导体发光器件的方法，包括：在生长衬底上形成具有多个纳米结构的牺牲层; 形成保护层以覆盖牺牲层; 通过允许第一导电半导体层，有源层和第二导电半导体层在保护层上顺序生长来形成发光结构; 蚀刻保护层以暴露纳米结构; 并且通过蚀刻暴露的纳米结构将发光结构与生长衬底分离，从而可以防止发光结构在其分离时的损坏和劣化。

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