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1. 发明申请

US20090176337A1 NEGATIVE PHOTORESIST COMPOSITION AND METHOD OF MANUFACTURING ARRAY SUBSTRATE USING THE SAME 有权
标题翻译：负极光电组合物及使用其制造阵列基板的方法
公开(公告)号：US20090176337A1
公开(公告)日：2009-07-09
申请号：US12345169
申请日：2008-12-29
申请人： Hoon KANG , Jae-Sung KIM , Yang-Ho JUNG , Hi-Kuk LEE , Yasuhiro KAMEYAMA , Yuuji MIZUHO , Jong-Cheol KIM , Se-Jin CHOI
发明人： Hoon KANG , Jae-Sung KIM , Yang-Ho JUNG , Hi-Kuk LEE , Yasuhiro KAMEYAMA , Yuuji MIZUHO , Jong-Cheol KIM , Se-Jin CHOI
IPC分类号： H01L21/336 , G03F7/004
CPC分类号： H01L27/1288 , G03F7/0007 , G03F7/027 , G03F7/033 , H01L27/1214 , Y10S430/111
摘要： A negative photoresist composition and a method of manufacturing an array substrate. The negative photoresist composition includes a photocurable composition including an ethylene unsaturated compound containing an ethylene unsaturated bond and a photopolymerization initiator, a thermosetting composition including an alkali-soluble resin crosslinked by heat and an organic solvent. The negative photoresist composition improves stability, photosensitivity, detachability after performing a developing operation and reduces residue to improve the reliability of an organic insulation layer. Furthermore, the negative photoresist composition improves the transmittance of an organic insulation layer and reduces the variation of color coordinates to improve the display quality of a display apparatus.
摘要翻译：负性光致抗蚀剂组合物和阵列基板的制造方法。负性光致抗蚀剂组合物包括含有乙烯不饱和键的乙烯不饱和化合物和光聚合引发剂的光固化性组合物，包含通过热交联的碱溶性树脂和有机溶剂的热固性组合物。负性光致抗蚀剂组合物提高了稳定性，光敏性，进行显影操作后的可剥离性，并且降低了残留物以提高有机绝缘层的可靠性。此外，负性光致抗蚀剂组合物提高了有机绝缘层的透射率，并且减少了颜色坐标的变化，从而提高了显示装置的显示质量。

2. 发明申请

US20090224259A1 DISPLAY SUBSTRATE AND METHOD FOR MANUFACTURING THE SAME 审中-公开
标题翻译：显示基板及其制造方法
公开(公告)号：US20090224259A1
公开(公告)日：2009-09-10
申请号：US12398555
申请日：2009-03-05
申请人： Yang-Ho JUNG , Hoon KANG , Jae-Sung KIM , Hi-Kuk LEE
发明人： Yang-Ho JUNG , Hoon KANG , Jae-Sung KIM , Hi-Kuk LEE
IPC分类号： H01L31/0216 , H01L21/04
CPC分类号： H01L27/1248 , H01L27/1288
摘要： A display substrate includes a gate wiring, a data wiring, a switching element, an organic layer, and a pixel electrode. The gate wiring contacts a first transparent conductive layer formed on the gate wiring. The data wiring crosses the gate wiring. The data wiring contacts a second transparent conductive layer formed on the data wiring. The switching element is connected to the gate and data wirings. The organic layer is formed on a base substrate having the switching element formed thereon. The organic layer has first and second trenches corresponding to the first and second transparent conductive layers, respectively. The pixel electrode is formed in a pixel area of the organic layer.
摘要翻译：显示基板包括栅极布线，数据布线，开关元件，有机层和像素电极。栅极布线接触形成在栅极布线上的第一透明导电层。数据线穿过栅极接线。数据布线接触形成在数据布线上的第二透明导电层。开关元件连接到栅极和数据布线。有机层形成在其上形成有开关元件的基底基板上。有机层分别具有对应于第一和第二透明导电层的第一和第二沟槽。像素电极形成在有机层的像素区域中。

3. 发明申请

US20110199620A1 METHOD OF DETERMINING AN OVERLAP DISTANCE OF AN OPTICAL HEAD AND DIGITAL EXPOSURE DEVICE USING THE METHOD 有权
标题翻译：使用该方法确定光头和数字曝光装置的重叠距离的方法
公开(公告)号：US20110199620A1
公开(公告)日：2011-08-18
申请号：US12902745
申请日：2010-10-12
申请人： Sang-Hyun YUN , Hi-Kuk LEE , Sang-Woo BAE , Cha-Dong KIM , Jung-In PARK
发明人： Sang-Hyun YUN , Hi-Kuk LEE , Sang-Woo BAE , Cha-Dong KIM , Jung-In PARK
IPC分类号： G01B11/14
CPC分类号： G01B11/14 , G03F7/70291 , G03F7/70475
摘要： An apparatus and a method for determining an overlap distance of an optical head is disclosed. Positions and light amount distributions of each light spot can be measured, which may be provided from an optical head to a substrate. Gaussian distribution may be applied to the positions and the light amount distributions to calculate a compensation model of each of the light spots. A first accumulated light amount corresponding to each first area of the substrate may be calculated if the optical head is scanning along a first direction of the substrate using the compensation model. A second accumulated light amount corresponding to each second area overlapped with the each first area is calculated if the optical head is scanning along the first direction, which is moved in a second direction by a first distance using the compensation model. An overlap distance may be determined based on a uniformity of summations of the first and second accumulated light amount.
摘要翻译：公开了一种用于确定光学头的重叠距离的装置和方法。可以测量每个光点的位置和光量分布，其可以从光学头到基底提供。高斯分布可以应用于位置和光量分布，以计算每个光点的补偿模型。如果光头使用补偿模型沿着衬底的第一方向扫描，则可以计算对应于衬底的每个第一区域的第一累积光量。如果光头沿着使用补偿模型沿第二方向在第二方向上移动第一距离的第一方向进行扫描，则计算与每个第一区域重叠的每个第二区域对应的第二累积光量。可以基于第一和第二累积光量的相加的均匀性来确定重叠距离。

4. 发明申请

US20110171581A1 PHOTORESIST COMPOSTION AND METHOD OF MANUFACTURING ARRAY SUBSTRATE USING THE SAME 有权
标题翻译：光刻胶组合物及使用其制造阵列基板的方法
公开(公告)号：US20110171581A1
公开(公告)日：2011-07-14
申请号：US13050522
申请日：2011-03-17
申请人： Hi-Kuk LEE , Sang-Hyun YUN , Min-Soo LEE , Deok-Man KANG , Sae-Tae OH , Jae-Young CHOI
发明人： Hi-Kuk LEE , Sang-Hyun YUN , Min-Soo LEE , Deok-Man KANG , Sae-Tae OH , Jae-Young CHOI
IPC分类号： G03F7/004
CPC分类号： H01L27/1288 , G03F7/0233 , H01L27/1214
摘要： A photoresist composition includes a binder resin, a photo acid generator, an acryl resin having four different types of monomers, and a solvent.
摘要翻译：光致抗蚀剂组合物包括粘合剂树脂，光酸产生剂，具有四种不同类型的单体的丙烯酸树脂和溶剂。

5. 发明申请

US20070259272A1 PHOTORESIST COMPOSITION AND METHOD OF MANUFACTURING A THIN-FILM TRANSISTOR SUBSTRATE USING THE SAME 有权
标题翻译：光电组合物及其制造方法使用薄膜晶体管基板
公开(公告)号：US20070259272A1
公开(公告)日：2007-11-08
申请号：US11554194
申请日：2006-10-30
申请人： Hi-Kuk LEE , Woo-Seok JEON , Doo-Hee JUNG , Jeong-Min PARK , Deok-Man KANG , Si-Young JUNG , Jae-Young CHOI
发明人： Hi-Kuk LEE , Woo-Seok JEON , Doo-Hee JUNG , Jeong-Min PARK , Deok-Man KANG , Si-Young JUNG , Jae-Young CHOI
IPC分类号： G03C5/00
CPC分类号： H01L27/1288 , G03F7/0233 , G03F7/0236 , H01L27/1214
摘要： A photoresist composition includes about 100 parts by weight of resin mixture including novolak resin and acryl resin and about 10 parts to about 50 parts by weight of naphthoquinone diazosulfonic acid ester. A weight-average molecular weight of the novolak resin is no less than about 30,000. A weight-average molecular weight of the acryl resin is no less than about 20,000. A content of the acryl resin is about 1% to about 15% by weight based on a total weight of the resin mixture. When a photoresist film formed using the photoresist composition is heated, a profile variation of the photoresist composition is relatively small. Therefore, a residual photoresist film has a uniform thickness, and a short circuit and/or an open defect in a TFT substrate may be reduced.
摘要翻译：光致抗蚀剂组合物包括约100重量份的包括酚醛清漆树脂和丙烯酸树脂的树脂混合物和约10重量份至约50重量份的萘醌重氮磺酸酯。酚醛清漆树脂的重均分子量不小于约30,000。丙烯酸树脂的重均分子量不小于约20,000。基于树脂混合物的总重量，丙烯酸树脂的含量为约1重量％至约15重量％。当使用光致抗蚀剂组合物形成的光致抗蚀剂膜被加热时，光致抗蚀剂组合物的轮廓变化相对较小。因此，残留的光致抗蚀剂膜具有均匀的厚度，并且可能减小TFT基板中的短路和/或开路缺陷。

6. 发明申请

US20110230019A1 METHOD OF MANUFACTURING A THIN-FILM TRANSISTOR AND METHOD OF MANUFACTURING A DISPLAY SUBSTRATE USING THE SAME 有权
标题翻译：制造薄膜晶体管的方法和使用其制造显示器基板的方法
公开(公告)号：US20110230019A1
公开(公告)日：2011-09-22
申请号：US12900936
申请日：2010-10-08
申请人： Sang-Hyun YUN , Cha-Dong KIM , Jung-In PARK , Hi-Kuk LEE
发明人： Sang-Hyun YUN , Cha-Dong KIM , Jung-In PARK , Hi-Kuk LEE
IPC分类号： H01L21/336
CPC分类号： H01L27/1288 , H01L27/1214
摘要： An approach for patterning and etching without a mask is provided in a manufacturing a thin-film transistor, a gate electrode, a gate insulating layer, a semiconductor layer, an ohmic contact layer and source metal layer of a substrate. A first photoresist pattern including a first photo pattern and a second photo pattern is formed using a digital exposure device by generating a plurality of spot beams, the first photo pattern is formed to a first region of the base substrate and has a first thickness, and the second photo pattern is formed to a second region adjacent to the first region, and has a second thickness and a width in a range of about 50% to about 60% of a diameter of the spot beam. The source metal layer is patterned to form a source electrode and a drain electrode, and the source electrode and the drain electrode are spaced apart from each other in the first region of an active pattern.
摘要翻译：在制造薄膜晶体管，栅极电极，栅极绝缘层，半导体层，欧姆接触层和源极金属层的衬底的制造中提供了用于没有掩模的图案化和蚀刻的方法。使用数字曝光装置通过产生多个点光来形成包括第一照片图案和第二照片图案的第一光致抗蚀剂图案，第一照片图案形成于基底基板的第一区域并具有第一厚度，并且第二照片图案形成在与第一区域相邻的第二区域上，并且具有第二厚度和在点光束直径的约50％至约60％的范围内的宽度。图案化源极金属层以形成源电极和漏电极，并且源电极和漏电极在活性图案的第一区域中彼此间隔开。

7. 发明申请

US20100167206A1 PHOTORESIST COMPOSITION AND METHOD FOR MANUFACTURING A DISPLAY SUBSTRATE USING THE PHOTORESIST COMPOSITION 审中-公开
标题翻译：光电组合物和使用光电组合物制造显示基板的方法
公开(公告)号：US20100167206A1
公开(公告)日：2010-07-01
申请号：US12557215
申请日：2009-09-10
申请人： Woo-Seok JEON , Sang-Hyun YUN , Hi-Kuk LEE , Deok-Man KANG , Sae-Tae OH
发明人： Woo-Seok JEON , Sang-Hyun YUN , Hi-Kuk LEE , Deok-Man KANG , Sae-Tae OH
IPC分类号： G03F7/20 , G03F7/004
CPC分类号： G02F1/13439 , G03F7/0007 , G03F7/0226 , H01L27/1288
摘要： A photoresist composition includes a novolac resin, a benzophenone photosensitizer and an ethylidyne tris phenol photosensitizer, and an organic solvent. Thus, a micropattern having a higher resolution than the resolution of an exposure apparatus is formed to decrease an amount of exposure and/or exposure time, thereby improving manufacturing reliability and productivity.
摘要翻译：光致抗蚀剂组合物包括酚醛清漆树脂，二苯甲酮光敏剂和乙基三苯酚光敏剂以及有机溶剂。因此，形成具有比曝光装置的分辨率高的分辨率的微图案，以减少曝光量和/或曝光时间，从而提高制造可靠性和生产率。

8. 发明申请

US20090227058A1 PHOTORESIST COMPOSITION AND METHOD OF MANUFACTURING ARRAY SUBSTRATE USING THE SAME 审中-公开
标题翻译：光电组合物及使用其制造阵列基板的方法
公开(公告)号：US20090227058A1
公开(公告)日：2009-09-10
申请号：US12347202
申请日：2008-12-31
申请人： Jeong-Min PARK , Doo-Hee JUNG , Hi-Kuk LEE , Byung-Uk KIM , Dong-Min KIM
发明人： Jeong-Min PARK , Doo-Hee JUNG , Hi-Kuk LEE , Byung-Uk KIM , Dong-Min KIM
IPC分类号： H01L21/027 , G03F7/004
CPC分类号： G03F7/0236
摘要： A photoresist composition includes; a novolac resin prepared from a phenol compound, wherein the m-cresol constitutes about 70% to about 85% by weight of the weight of the phenol compound, a diazide compound, and an organic solvent.
摘要翻译：光致抗蚀剂组合物包括：由酚化合物制备的酚醛清漆树脂，其中间甲酚构成酚化合物，重氮化合物和有机溶剂的重量的约70重量％至约85重量％。

9. 发明申请

US20090042127A1 PHOTORESIST COMPOSITION AND METHOD OF FORMING A PHOTORESIST PATTERN USING THE SAME 有权
标题翻译：光电组合物及其形成使用其的光电子图案的方法
公开(公告)号：US20090042127A1
公开(公告)日：2009-02-12
申请号：US12059113
申请日：2008-03-31
申请人： Jeong-Min PARK , Doo-Hee JUNG , Hi-Kuk LEE , Hyoc-Min YOUN , Ki-Hyuk KOO
发明人： Jeong-Min PARK , Doo-Hee JUNG , Hi-Kuk LEE , Hyoc-Min YOUN , Ki-Hyuk KOO
IPC分类号： G03F7/027
CPC分类号： G03F7/038 , Y10S430/121 , Y10S430/123 , Y10S430/128
摘要： A photoresist composition comprises about 0.5 to about 20 parts by weight of a photo-acid generator, about 10 to about 70 parts by weight of a novolac resin containing a hydroxyl group, about 1 to about 40 parts by weight of a cross-linker that comprises an alkoxymethylmelamine compound, and about 10 to about 150 parts by weight of a solvent.
摘要翻译：光致抗蚀剂组合物包含约0.5至约20重量份的光酸发生剂，约10至约70重量份的含有羟基的酚醛清漆树脂，约1至约40重量份的交联剂，包括烷氧基甲基蜜胺化合物和约10至约150重量份的溶剂。

10. 发明申请

US20130162965A1 EXPOSURE APPARATUS 有权
标题翻译：曝光装置
公开(公告)号：US20130162965A1
公开(公告)日：2013-06-27
申请号：US13565073
申请日：2012-08-02
申请人： Chang-Hoon KIM , Kab-Jong SEO , Hi-Kuk LEE , Tsunemitsu TORIGOE
发明人： Chang-Hoon KIM , Kab-Jong SEO , Hi-Kuk LEE , Tsunemitsu TORIGOE
IPC分类号： G03B27/54
CPC分类号： G03F7/70066 , G03F7/7035 , G03F7/70475
摘要： An exposure apparatus includes an irradiating part which irradiates light, a light blocking member including a light condensing part at a side of the light blocking member, where the light condensing part condenses the light, a mask which is spaced apart from the light blocking member by a first distance, and a transporting part which transports a target substrate in a first direction.
摘要翻译：曝光装置包括照射光的照射部分，在遮光部件的一侧包括聚光部分的遮光部件，其中聚光部分聚光，将与遮光部件间隔开的面罩通过第一距离，以及沿第一方向输送目标基板的输送部。

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