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1. 发明申请

US20100203449A1 METHOD OF FABRICATING THIN FILM TRANSISTOR SUBSTRATE AND NEGATIVE PHOTORESIST COMPOSITION USED THEREIN 有权
标题翻译：制造薄膜晶体管基板的方法及其使用的负极光电组合物
公开(公告)号：US20100203449A1
公开(公告)日：2010-08-12
申请号：US12685545
申请日：2010-01-11
申请人： Yeong-Beom Lee , Hi-Kuk Lee , Byung-Uk Kim , Hyoc-Min Youn , Ki-Hyuk Koo
发明人： Yeong-Beom Lee , Hi-Kuk Lee , Byung-Uk Kim , Hyoc-Min Youn , Ki-Hyuk Koo
IPC分类号： G03F7/20 , G03F7/004
CPC分类号： H01L27/1288 , G03F7/0045 , G03F7/0382 , G03F7/40 , H01L27/1214
摘要： A method of fabricating a thin film transistor substrate and a negative photoresist composition used therein are provided, which can reduce pattern inferiority. The method of fabricating a thin film transistor substrate includes forming a conductive film composed of a conductive material on a substrate, forming an etch pattern composed of a negative photoresist composition on the conductive film, and forming a conductive pattern by etching the conductive film using the etch pattern as an etching mask, wherein the negative photoresist composition includes 10-50 parts by weight of novolak resin including a hydroxyl group that is soluble in an alkali developing solution, 0.5-10 parts by weight of a first photo acid generator represented by the following formula (1), 0.5-10 parts by weight of a second photo acid generator represented by the following formula (2), 1-20 parts by weight of a cross-linking agent, and 10-90 parts by weight of a solvent:
摘要翻译：提供了制造其中使用的薄膜晶体管基板和负型光致抗蚀剂组合物的方法，其可以降低图案劣化。制造薄膜晶体管基板的方法包括在基板上形成由导电材料构成的导电膜，在导电膜上形成由负性光致抗蚀剂组合物构成的蚀刻图案，并使用该导电膜蚀刻导电膜形成导电图案蚀刻图案作为蚀刻掩模，其中负性光致抗蚀剂组合物包含10-50重量份的包含可溶于碱显影液的羟基的酚醛清漆树脂，0.5-10重量份由按照下式（1），将0.5-10重量份由下式（2）表示的第二光酸反应产物，1-20重量份的交联剂和10-90重量份的溶剂：

2. 发明申请

US20070184293A1 RESIN COMPOSITION FOR ORGANIC INSULATING LAYER, METHOD OF MANUFACTURING RESIN COMPOSITION, AND DISPLAY PANEL INCLUDING RESIN COMPOSITION 有权
标题翻译：有机绝缘层用树脂组合物，树脂组合物的制造方法以及包含树脂组合物的显示面板
公开(公告)号：US20070184293A1
公开(公告)日：2007-08-09
申请号：US11670700
申请日：2007-02-02
申请人： Dong-Ki LEE , Byung-Uk KIM , Hyoc-Min YOUN
发明人： Dong-Ki LEE , Byung-Uk KIM , Hyoc-Min YOUN
IPC分类号： B32B27/30 , C08F24/00 , C08F36/22
CPC分类号： C08F220/06 , C08F212/08 , C08F220/18 , C08F220/28 , C08F220/32 , C08F220/40 , G02F1/136227 , H01L27/3244 , Y10T428/31855
摘要： Disclosed herein is a resin composition for an organic insulating layer, a method of manufacturing the same, and a display panel including an insulating layer formed using the resin composition. The resin composition for an organic insulating layer is produced by polymerizing about 5 to about 35 wt % of an unsaturated carboxylic acid, an unsaturated carboxylic acid anhydride, or a mixture of the unsaturated carboxylic acid and the unsaturated carboxylic acid anhydride, about 5 to about 40 wt % of a styrene compound, about 5 to about 40 wt % of an epoxy compound, about 0.1 to about 10 wt % of an isobornyl compound, and about 20 to about 40 wt % of a dicyclopentadiene compound, based on the total weight of unsaturated carboxylic acid, unsaturated carboxylic acid anhydride, styrene compound, isobornyl compound, and dicyclopentadiene compound.
摘要翻译：本发明公开了一种有机绝缘层用树脂组合物及其制造方法以及使用该树脂组合物形成的绝缘层的显示面板。用于有机绝缘层的树脂组合物通过将约5至约35重量％的不饱和羧酸，不饱和羧酸酐或不饱和羧酸和不饱和羧酸酐的混合物聚合为约5至约 40重量％的苯乙烯化合物，约5至约40重量％的环氧化合物，约0.1至约10重量％的异冰片基化合物和约20至约40重量％的二环戊二烯化合物，基于总重量的不饱和羧酸，不饱和羧酸酐，苯乙烯化合物，异冰片基化合物和二环戊二烯化合物。

3. 发明申请

US20120270142A1 PHOTOSENSITIVE COMPOSITION AND METHOD OF MANUFACTURING A SUBSTRATE FOR A DISPLAY DEVICE USING THE SAME 审中-公开
标题翻译：感光性组合物及使用该显影装置制造基板的方法
公开(公告)号：US20120270142A1
公开(公告)日：2012-10-25
申请号：US13358385
申请日：2012-01-25
申请人： Hi-Kuk LEE , Su-Yeon SIM , Sang-Hyun YUN , Cha-Dong KIM , Jung-In PARK , Byung-Uk KIM , Jin-Sun KIM , Tae-Hoon YEO , Hyoc-Min YOUN , Sang-Hoon LEE
发明人： Hi-Kuk LEE , Su-Yeon SIM , Sang-Hyun YUN , Cha-Dong KIM , Jung-In PARK , Byung-Uk KIM , Jin-Sun KIM , Tae-Hoon YEO , Hyoc-Min YOUN , Sang-Hoon LEE
IPC分类号： G03F7/20 , G03F7/031
CPC分类号： G03F7/031 , G03F7/0007 , G03F7/033 , G03F7/105 , G03F7/2053
摘要： A photosensitive composition and a method of manufacturing a substrate used for a display device are disclosed. The photosensitive composition includes an acrylic based copolymer, a photo-initiator, a photo-sensitizer and a solvent. Thus, a photosensitivity of the photosensitive composition for ultra violet light of a long wavelength may be improved.
摘要翻译：公开了一种光敏组合物和用于显示装置的基板的制造方法。光敏组合物包括丙烯酸类共聚物，光引发剂，光敏剂和溶剂。因此，可以提高光敏组合物对长波长紫外线的光敏性。

4. 发明授权

US07713677B2 Photoresist composition, method of patterning thin film using the same, and method of manufacturing liquid crystal display panel using the same 有权
标题翻译：光刻胶组合物，使用其的薄膜构图方法，以及使用其制造液晶显示面板的方法
公开(公告)号：US07713677B2
公开(公告)日：2010-05-11
申请号：US11562714
申请日：2006-11-22
申请人： Hi Kuk Lee , Byung Uk Kim , Hyoc Min Youn , Joo Pyo Yun , Woo Seok Jeon
发明人： Hi Kuk Lee , Byung Uk Kim , Hyoc Min Youn , Joo Pyo Yun , Woo Seok Jeon
IPC分类号： G03F7/00 , G03F7/004
CPC分类号： G03F7/0392 , G03F7/0045 , Y10S430/106 , Y10S430/114 , Y10S430/118
摘要： A photoresist composition capable of forming a high resolution pattern without an additional heating process includes an alkali-soluble phenol polymer in an amount of 10 to 70 parts by weight, including at least one unit of Formula 1, a photo-acid generator in an amount of 0.5 to 10 parts by weight, a dissolution inhibitor in an amount of 5 to 50 parts by weight, including at least one unit of Formula 2, and a solvent in an amount of 10 to 90 parts by weight, wherein the amounts of the foregoing components is based on a total of 100 parts by weight of alkali-soluble phenol polymer, photo-acid generator, dissolution inhibitor, and solvent, and wherein Formulas 1 and 2 have the structures: wherein R is a methyl group, wherein R1, R2 and R3 are the same or different and are hydrogen or t-butyl vinyl ether protective groups.
摘要翻译：能够在没有附加加热方法的情况下形成高分辨率图案的光致抗蚀剂组合物包括10至70重量份的碱溶性苯酚聚合物，包括至少一个式1的单元，量的光酸产生剂为0.5〜10重量份，5〜50重量份的溶解抑制剂，包含至少1个单元的式2，溶剂的量为10〜90重量份，其中，前述组分基于总共100重量份的碱溶性酚聚合物，光酸发生剂，溶解抑制剂和溶剂，其中式1和式2具有以下结构：其中R是甲基，其中R1， R2和R3相同或不同，为氢或叔丁基乙烯基醚保护基。

5. 发明授权

US08257905B2 Method of fabricating thin film transistor substrate and negative photoresist composition used therein 有权
标题翻译：制造薄膜晶体管基板及其中使用的负型光致抗蚀剂组合物的方法
公开(公告)号：US08257905B2
公开(公告)日：2012-09-04
申请号：US12685545
申请日：2010-01-11
申请人： Yeong-Beom Lee , Hi-Kuk Lee , Byung-Uk Kim , Hyoc-Min Youn , Ki-Hyuk Koo
发明人： Yeong-Beom Lee , Hi-Kuk Lee , Byung-Uk Kim , Hyoc-Min Youn , Ki-Hyuk Koo
IPC分类号： G03F7/004 , G03F7/30
CPC分类号： H01L27/1288 , G03F7/0045 , G03F7/0382 , G03F7/40 , H01L27/1214
摘要： A method of fabricating a thin film transistor substrate and a negative photoresist composition used therein are provided, which can reduce pattern inferiority. The method of fabricating a thin film transistor substrate includes forming a conductive film composed of a conductive material on a substrate, forming an etch pattern composed of a negative photoresist composition on the conductive film, and forming a conductive pattern by etching the conductive film using the etch pattern as an etching mask, wherein the negative photoresist composition includes 10-50 parts by weight of novolak resin including a hydroxyl group that is soluble in an alkali developing solution, 0.5-10 parts by weight of a first photo acid generator represented by the following formula (1), 0.5-10 parts by weight of a second photo acid generator represented by the following formula (2), 1-20 parts by weight of a cross-linking agent, and 10-90 parts by weight of a solvent:
摘要翻译：提供了制造其中使用的薄膜晶体管基板和负型光致抗蚀剂组合物的方法，其可以降低图案劣化。制造薄膜晶体管基板的方法包括在基板上形成由导电材料构成的导电膜，在导电膜上形成由负性光致抗蚀剂组合物构成的蚀刻图案，并使用该导电膜蚀刻导电膜形成导电图案蚀刻图案作为蚀刻掩模，其中负性光致抗蚀剂组合物包含10-50重量份的包含可溶于碱显影液的羟基的酚醛清漆树脂，0.5-10重量份由按照下式（1），将0.5-10重量份由下式（2）表示的第二光酸反应产物，1-20重量份的交联剂和10-90重量份的溶剂：

6. 发明申请

US20090042127A1 PHOTORESIST COMPOSITION AND METHOD OF FORMING A PHOTORESIST PATTERN USING THE SAME 有权
标题翻译：光电组合物及其形成使用其的光电子图案的方法
公开(公告)号：US20090042127A1
公开(公告)日：2009-02-12
申请号：US12059113
申请日：2008-03-31
申请人： Jeong-Min PARK , Doo-Hee JUNG , Hi-Kuk LEE , Hyoc-Min YOUN , Ki-Hyuk KOO
发明人： Jeong-Min PARK , Doo-Hee JUNG , Hi-Kuk LEE , Hyoc-Min YOUN , Ki-Hyuk KOO
IPC分类号： G03F7/027
CPC分类号： G03F7/038 , Y10S430/121 , Y10S430/123 , Y10S430/128
摘要： A photoresist composition comprises about 0.5 to about 20 parts by weight of a photo-acid generator, about 10 to about 70 parts by weight of a novolac resin containing a hydroxyl group, about 1 to about 40 parts by weight of a cross-linker that comprises an alkoxymethylmelamine compound, and about 10 to about 150 parts by weight of a solvent.
摘要翻译：光致抗蚀剂组合物包含约0.5至约20重量份的光酸发生剂，约10至约70重量份的含有羟基的酚醛清漆树脂，约1至约40重量份的交联剂，包括烷氧基甲基蜜胺化合物和约10至约150重量份的溶剂。

7. 发明申请

US20070190454A1 PHOTORESIST COMPOSITION, METHOD OF PATTERNING THIN FILM USING THE SAME, AND METHOD OF MANUFACTURING LIQUID CRYSTAL DISPLAY PANEL USING THE SAME 有权
标题翻译：光电组合物，使用该薄膜的薄膜的方法以及使用其制造液晶显示面板的方法
公开(公告)号：US20070190454A1
公开(公告)日：2007-08-16
申请号：US11562714
申请日：2006-11-22
申请人： Hi Kuk LEE , Byung Uk KIM , Hyoc Min YOUN , Joo Pyo YUN , Woo Seok JEON
发明人： Hi Kuk LEE , Byung Uk KIM , Hyoc Min YOUN , Joo Pyo YUN , Woo Seok JEON
IPC分类号： G03C1/00
CPC分类号： G03F7/0392 , G03F7/0045 , Y10S430/106 , Y10S430/114 , Y10S430/118
摘要： A photoresist composition capable of forming a high resolution pattern without an additional heating process includes an alkali-soluble phenol polymer in an amount of 10 to 70 parts by weight, including at least one unit of Formula 1, a photo-acid generator in an amount of 0.5 to 10 parts by weight, a dissolution inhibitor in an amount of 5 to 50 parts by weight, including at least one unit of Formula 2, and a solvent in an amount of 10 to 90 parts by weight, wherein the amounts of the foregoing components is based on a total of 100 parts by weight of alkali-soluble phenol polymer, photo-acid generator, dissolution inhibitor, and solvent, and wherein Formulas 1 and 2 have the structures: wherein R is a methyl group, wherein R1, R2 and R3 are the same or different and are hydrogen or t-butyl vinyl ether protective groups.
摘要翻译：能够在没有附加加热方法的情况下形成高分辨率图案的光致抗蚀剂组合物包括10至70重量份的碱溶性苯酚聚合物，包括至少一个式1的单元，量的光酸产生剂为0.5〜10重量份，5〜50重量份的溶解抑制剂，包含至少1个单元的式2，溶剂的量为10〜90重量份，其中，前述组分基于总共100重量份的碱溶性酚聚合物，光酸发生剂，溶解抑制剂和溶剂，其中式1和式2具有以下结构：其中R是甲基，其中R“ R 1，R 2，R 3和R 3相同或不同，为氢或叔丁基乙烯基醚保护基。

8. 发明申请

US20110294243A1 PHOTORESIST COMPOSITION AND METHOD OF FORMING PHOTORESIST PATTERN USING THE SAME 审中-公开
标题翻译：光刻胶组合物和使用其形成光刻胶图案的方法
公开(公告)号：US20110294243A1
公开(公告)日：2011-12-01
申请号：US13092629
申请日：2011-04-22
申请人： Woo-Seok Jeon , Jeong-Min Park , Byung-Uk Kim , Hyoc-Min Youn , Ki-Hyuk Koo , Su-Youn Choi , Jin-Sun Kim
发明人： Woo-Seok Jeon , Jeong-Min Park , Byung-Uk Kim , Hyoc-Min Youn , Ki-Hyuk Koo , Su-Youn Choi , Jin-Sun Kim
IPC分类号： H01L33/08 , G03F7/20 , G03F7/004
CPC分类号： G03F7/0007 , G02F1/13439 , G03F7/0236 , G03F7/0382
摘要： A photoresist composition suitable for forming a high-resolution pattern, and a method of forming a photoresist pattern using the same. The photoresist composition includes about 10 to about 45 parts by weight of an alkali soluble binder resin including a hydroxyl group, about 0.1 to about 5 parts by weight of a photo-acid generator, about 1 to about 5 parts by weight of a cross-linker that cross-links the alkali-soluble binder resin including the hydroxyl group, about 0.3 to about 3 parts by weight of a quinone diazide compound, and a remainder of a solvent.
摘要翻译：适合于形成高分辨率图案的光致抗蚀剂组合物和使用其形成光致抗蚀剂图案的方法。光致抗蚀剂组合物包括约10至约45重量份的包含羟基的碱溶性粘合剂树脂，约0.1至约5重量份的光酸发生剂，约1至约5重量份的交联剂，使包含羟基的碱溶性粘合剂树脂交联的接头，约0.3至约3重量份的醌二叠氮化合物和剩余的溶剂。

9. 发明申请

US20100222473A1 PHOTOSENSITIVE RESIN COMPOSITION 有权
标题翻译：感光树脂组合物
公开(公告)号：US20100222473A1
公开(公告)日：2010-09-02
申请号：US12714837
申请日：2010-03-01
申请人： Hyoc-min YOUN , Byung-uk KIM , Ki-hyuk KOO , Tae-hoon YEO , Joo-pyo YUN , Hong-dae SHIN , Sang Hoon LEE , Dong-myung KIM , Su-youn CHOI , Jin Sun KIM , Chang-Min WOO , Hong-Suk KIM
发明人： Hyoc-min YOUN , Byung-uk KIM , Ki-hyuk KOO , Tae-hoon YEO , Joo-pyo YUN , Hong-dae SHIN , Sang Hoon LEE , Dong-myung KIM , Su-youn CHOI , Jin Sun KIM , Chang-Min WOO , Hong-Suk KIM
IPC分类号： C08K5/3447 , C08K5/3492 , C08K5/3435
CPC分类号： G03F7/031 , G02F1/133345
摘要： The present invention relates to a photosensitive resin composition, particularly to a photosensitive resin composition for forming an interlayer organic insulating film for TFT-LCD, comprising 0.01 to 20 wt % of UV stabilizer or radical scavenger. The photosensitive resin composition of the present invention can be used for forming an interlayer organic insulating film for TFT-LCD to improve active unfilled area upon over exposure in liquid crystal photo-alignment process, can easily control resolution of pattern, and is particularly suitable for forming a planarization layer of an interlayer organic insulating film.
摘要翻译：本发明涉及一种感光性树脂组合物，特别涉及用于形成TFT-LCD用层间有机绝缘膜的感光性树脂组合物，其含有0.01〜20重量％的UV稳定剂或自由基清除剂。本发明的感光性树脂组合物可用于形成用于TFT-LCD的层间有机绝缘膜，以在液晶光取向过程中过度曝光时改善活性未填充区域，可以容易地控制图案的分辨率，并且特别适用于形成层间有机绝缘膜的平坦化层。

10. 发明授权

US07595143B2 Photoresist composition and method of manufacturing a thin-film transistor substrate using the same 有权
标题翻译：光刻胶组合物及使用其制造薄膜晶体管基板的方法
公开(公告)号：US07595143B2
公开(公告)日：2009-09-29
申请号：US11508079
申请日：2006-08-22
申请人： Jeong-Min Park , Hi-Kuk Lee , Hyoc-Min Youn , Ki-Hyuk Koo , Byung-Uk Kim
发明人： Jeong-Min Park , Hi-Kuk Lee , Hyoc-Min Youn , Ki-Hyuk Koo , Byung-Uk Kim
IPC分类号： G03F7/00 , G03F7/004
CPC分类号： G03F7/0382 , G03F7/105 , H01L21/32139 , H01L29/66765 , H01L29/78669 , Y10S430/106 , Y10S430/114
摘要： A photoresist composition includes about 10 to about 70% by weight of a binder resin including a phenol-based polymer, about 0.5 to about 10% by weight of a photo-acid generator, about 1 to about 20% by weight of a cross-linker, about 0.1 to about 5% by weight of a dye and about 10 to about 80% by weight of a solvent. The photoresist composition may be applied to, for example, a method of manufacturing a TFT substrate.
摘要翻译：光致抗蚀剂组合物包括约10至约70重量％的包含酚类聚合物的粘合剂树脂，约0.5至约10重量％的光酸产生剂，约1至约20重量％的交联剂，接头，约0.1至约5重量％的染料和约10至约80重量％的溶剂。光致抗蚀剂组合物可以应用于例如制造TFT基板的方法。

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