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1. 发明申请

US20140027635A1 CHARGED PARTICLE BEAM APPARATUS 有权
标题翻译：充电颗粒光束装置
公开(公告)号：US20140027635A1
公开(公告)日：2014-01-30
申请号：US13981952
申请日：2011-11-30
申请人： Hiroyuki Matsui , Osamu Komuro , Makoto Nishihara , Zhaohui Cheng
发明人： Hiroyuki Matsui , Osamu Komuro , Makoto Nishihara , Zhaohui Cheng
IPC分类号： H01J37/02
CPC分类号： H01J37/026 , H01J37/28 , H01J2237/0044 , H01J2237/047
摘要： Provided is a charged particle beam apparatus adapted so that even when an additional device is not mounted in the charged particle beam apparatus, the apparatus rapidly removes, by neutralizing, a local charge developed on a region of a sample that has been irradiated with a charged particle beam.After charged particle beam irradiation for measurement of the sample, the apparatus controls a retarding voltage or/and an accelerating voltage at a stage previous to a next measurement, and then neutralizes an electric charge by reducing a difference between a value of the retarding voltage and that of the accelerating voltage to a value smaller than during the currently ongoing measurement.The charged particle beam achieves neutralizing without reducing throughput, since the local charge developed on the region of the sample that has been irradiated with the charged particle beam is removed, even without an additional device mounted in the apparatus.
摘要翻译：提供一种带电粒子束装置，其适于使得即使附加装置未安装在带电粒子束装置中，该装置通过中和在已经被充电的照射的样品的区域上产生的局部电荷，粒子束。在用于测量样品的带电粒子束照射之后，该装置在下一次测量之前的阶段控制延迟电压和/或加速电压，然后通过减小延迟电压的值和加速电压的值小于当前正在进行的测量中的值。带电粒子束实现中和而不降低生产量，因为即使没有安装在装置中的附加装置，在被带电粒子束照射的样品区域上产生的局部电荷被去除。

2. 发明授权

US09202665B2 Charged particle beam apparatus for removing charges developed on a region of a sample 有权
标题翻译：用于去除在样品区域上产生的电荷的带电粒子束装置
公开(公告)号：US09202665B2
公开(公告)日：2015-12-01
申请号：US13981952
申请日：2011-11-30
申请人： Hiroyuki Matsui , Osamu Komuro , Makoto Nishihara , Zhaohui Cheng
发明人： Hiroyuki Matsui , Osamu Komuro , Makoto Nishihara , Zhaohui Cheng
IPC分类号： H01J37/28 , H01J37/02
CPC分类号： H01J37/026 , H01J37/28 , H01J2237/0044 , H01J2237/047
摘要： Provided is a charged particle beam apparatus adapted so that even when an additional device is not mounted in the charged particle beam apparatus, the apparatus rapidly removes, by neutralizing, a local charge developed on a region of a sample that has been irradiated with a charged particle beam.After charged particle beam irradiation for measurement of the sample, the apparatus controls a retarding voltage or/and an accelerating voltage at a stage previous to a next measurement, and then neutralizes an electric charge by reducing a difference between a value of the retarding voltage and that of the accelerating voltage to a value smaller than during the currently ongoing measurement.The charged particle beam achieves neutralizing without reducing throughput, since the local charge developed on the region of the sample that has been irradiated with the charged particle beam is removed, even without an additional device mounted in the apparatus.
摘要翻译：提供一种带电粒子束装置，其适于使得即使附加装置未安装在带电粒子束装置中，该装置通过中和在已经被充电的照射的样品的区域上产生的局部电荷，粒子束。在用于测量样品的带电粒子束照射之后，该装置在下一次测量之前的阶段控制延迟电压和/或加速电压，然后通过减小延迟电压的值和加速电压的值小于当前正在进行的测量中的值。带电粒子束实现中和而不降低生产量，因为即使没有安装在装置中的附加装置，在被带电粒子束照射的样品区域上产生的局部电荷被去除。

3. 发明授权

US09991092B2 Scanning electron microscope and sample observation method 有权
公开(公告)号：US09991092B2
公开(公告)日：2018-06-05
申请号：US13387183
申请日：2010-07-30
申请人： Zhaohui Cheng , Hikaru Koyama , Yoshinobu Kimura , Hiroyuki Shinada , Osamu Komuro
发明人： Zhaohui Cheng , Hikaru Koyama , Yoshinobu Kimura , Hiroyuki Shinada , Osamu Komuro
IPC分类号： G01N23/00 , H01J37/28
CPC分类号： H01J37/28 , H01J2237/2803
摘要： A scanning electron microscope of the present invention performs scanning by changing a scanning line density in accordance with a sample when an image of a scanned region is formed by scanning a two-dimensional region on the sample with an electron beam or is provided with a GUI having sample information input means which inputs information relating to the sample and display means which displays a recommended scanning conditioHn according to the input and performs scanning with a scanning line density according to the sample by selecting the recommended scanning condition. As a result, in observation using a scanning electron microscope, a suitable scanning device which can improve contrast of a profile of a two-dimensional pattern and suppress shading by suppressing the influence of charging caused by primary charged particle radiation and by improving a detection rate of secondary electrons and a scanning method are provided.

4. 发明申请

US20120153145A1 SCANNING ELECTRON MICROSCOPE AND SAMPLE OBSERVATION METHOD 有权
标题翻译：扫描电子显微镜和样品观察方法
公开(公告)号：US20120153145A1
公开(公告)日：2012-06-21
申请号：US13387183
申请日：2010-07-30
申请人： Zhaohui Cheng , Hikaru Koyama , Yoshinobu Kimura , Hiroyuki Shinada , Osamu Komuro
发明人： Zhaohui Cheng , Hikaru Koyama , Yoshinobu Kimura , Hiroyuki Shinada , Osamu Komuro
IPC分类号： H01J37/28
CPC分类号： H01J37/28 , H01J2237/2803
摘要： A scanning electron microscope of the present invention performs scanning by changing a scanning line density in accordance with a sample when an image of a scanned region is formed by scanning a two-dimensional region on the sample with an electron beam or is provided with a GUI having sample information input means which inputs information relating to the sample and display means which displays a recommended scanning condition according to the input and performs scanning with a scanning line density according to the sample by selecting the recommended scanning condition. As a result, in observation using a scanning electron microscope, a suitable scanning device which can improve contrast of a profile of a two-dimensional pattern and suppress shading by suppressing the influence of charging caused by primary charged particle radiation and by improving a detection rate of secondary electrons and a scanning method are provided.
摘要翻译：本发明的扫描电子显微镜通过利用电子束扫描样品上的二维区域形成扫描区域的图像时，根据样品改变扫描线密度来进行扫描，或者设置有GUI 具有样本信息输入装置，其输入与样本有关的信息和根据输入显示推荐的扫描条件的显示装置，并通过选择推荐的扫描条件，根据样本以扫描线密度进行扫描。结果，在使用扫描电子显微镜观察的情况下，能够改善二维图案的轮廓的对比度并抑制由初级带电粒子辐射引起的充电的影响并抑制阴影的合适的扫描装置，并且通过提高检测率的二次电子和扫描方法。

5. 发明授权

US08309923B2 Sample observing method and scanning electron microscope 有权
标题翻译：样品观察法和扫描电子显微镜
公开(公告)号：US08309923B2
公开(公告)日：2012-11-13
申请号：US13148864
申请日：2010-02-09
申请人： Seiko Omori , Zhaohui Cheng , Hideyuki Kazumi
发明人： Seiko Omori , Zhaohui Cheng , Hideyuki Kazumi
IPC分类号： H01J37/28 , G01N23/04
CPC分类号： G01B15/04 , H01J37/222 , H01J37/28 , H01J2237/24592 , H01J2237/2817
摘要： Provided is a sample observing method wherein the effect on throughput is minimized, and a pattern profile can be obtained at high accuracy even in a complicated LSI pattern, regardless of the scanning direction of an electron beam. In the sample observing method, the presence or absence of an edge parallel to a scanning direction (707) of an electron beam is judged regarding an edge (708) of a pattern to be observed (S702); if the edge is present, an area in the vicinity of the pattern edge is designated as a local pre-dose area (709) (S703); a local pre-dose of an electron beam is performed, so that the initial charged state is controlled not to return secondary electrons generated by irradiation of an electron beam when an image is captured, to the surface of a sample.
摘要翻译：提供了一种对吞吐量的影响最小化的样本观察方法，即使在复杂的LSI图案中也可以以高精度获得图案轮廓，而与电子束的扫描方向无关。在样本观察方法中，关于要观察的图案的边缘（708）判断是否存在与电子束的扫描方向（707）平行的边缘（S702）。如果存在边缘，则将图案边缘附近的区域指定为局部剂量前区域（709）（S703）; 执行电子束的局部预先剂量，使得初始充电状态被控制为不将通过将图像捕获时的电子束的照射产生的二次电子返回到样品的表面。

6. 发明授权

US07910884B2 Apparatus and method for inspection and measurement 有权
标题翻译：仪器和方法进行检查和测量
公开(公告)号：US07910884B2
公开(公告)日：2011-03-22
申请号：US12349059
申请日：2009-01-06
申请人： Zhaohui Cheng , Natsuki Tsuno
发明人： Zhaohui Cheng , Natsuki Tsuno
IPC分类号： G01N23/22 , G21K7/00 , H01J37/256
CPC分类号： H01J37/28 , H01J37/244 , H01J2237/24475 , H01J2237/2448 , H01J2237/24564 , H01J2237/24592 , H01J2237/2817
摘要： An electrification control electrode B is installed at a measured or inspected specimen side of an electrification control electrode A, and a constant voltage is applied from an electrification control electrode control portion of an electrification control electrode B according to an electrification state of a specimen, whereby a variation of an electrification state and a potential barrier of a specimen surface formed before an inspection is suppressed. A retarding potential is applied by an electrification control electrode, and the electrification control electrode B is disposed below the electrification control electrode A adjusted to equal potential to a specimen. As a result, it is possible to adjust the amount that secondary electrons emitted from a specimen such as a wafer to which a primary electron beam is irradiated return to a specimen, and thus it is possible to stably maintain an inspection condition of high sensitivity during an inspection.
摘要翻译：带电控制电极B安装在充电控制电极A的测量或检查样品侧，并根据试样的带电状态从充电控制电极B的带电控制电极控制部分施加恒定电压，由此在检查之前形成的试样表面的带电状态和势垒的变化被抑制。由充电控制电极施加延迟电位，并且通电控制电极B设置在调节到与试样相同电位的充电控制电极A的下方。结果，可以调节从诸如照射一次电子束的晶片等试样的二次电子返回到试样的量，从而可以稳定地维持高灵敏度的检查条件检查。

7. 发明授权

US07547884B2 Pattern defect inspection method and apparatus thereof 有权
标题翻译：图案缺陷检查方法及其装置
公开(公告)号：US07547884B2
公开(公告)日：2009-06-16
申请号：US11449650
申请日：2006-06-09
申请人： Masaki Hasegawa , Hiroshi Makino , Hikaru Koyama , Zhaohui Cheng , Hisaya Murakoshi
发明人： Masaki Hasegawa , Hiroshi Makino , Hikaru Koyama , Zhaohui Cheng , Hisaya Murakoshi
IPC分类号： G01N23/00 , G21K7/00
CPC分类号： H01J37/026 , G01R31/307 , H01J37/29 , H01J2237/0045 , H01J2237/0047 , H01J2237/045 , H01J2237/2594 , H01J2237/2817
摘要： In the present invention, the structure of an electrification control electrode is changed from a grid type to a slit type and thereby shadows are not formed when a wafer is irradiated with a beam. Further, a beam forming slit is disposed ahead of an electrification control slit, thus the electrification control slit is prevented from being irradiated with an electron beam for preliminary electrification, and thereby secondary electrons which disturb the control of the electrification are inhibited from being generated. The shape of the slit is designed so that the strength of an electron beam may gradually decrease toward both the ends of an electron beam irradiation region in the longitudinal direction thereof. Furthermore, a preliminary static eliminator to remove or reduce the unevenness in an electrification potential distribution which has undesirably been formed earlier is disposed.
摘要翻译：在本发明中，充电控制电极的结构从栅格型切换为狭缝型，从而在用光束照射晶片时不形成阴影。此外，在充电控制狭缝的前方设置有光束形成狭缝，防止了带电控制狭缝被用于预充电的电子束照射，从而抑制了妨碍电气控制的二次电子的产生。狭缝的形状被设计成使得电子束的强度可以朝着电子束照射区域的纵向的两端逐渐减小。此外，设置用于去除或减少不期望地形成的带电电位分布的不均匀性的初步除电器。

8. 发明申请

US20060151698A1 Charged particle beam apparatus 审中-公开
标题翻译：带电粒子束装置
公开(公告)号：US20060151698A1
公开(公告)日：2006-07-13
申请号：US11311278
申请日：2005-12-20
申请人： Yuko Sasaki , Yasuhiro Gunji , Zhaohui Cheng
发明人： Yuko Sasaki , Yasuhiro Gunji , Zhaohui Cheng
IPC分类号： G21K7/00
CPC分类号： H01J37/28 , H01J37/153 , H01J37/21 , H01J37/222 , H01J37/265 , H01J2237/141 , H01J2237/1532 , H01J2237/21 , H01J2237/221 , H01J2237/2817
摘要： A charged particle beam apparatus is provided which has high resolving power and a wide scanning region (observation field of view). The apparatus has a unit for adjusting the focus, a unit for adjusting astigmatism, a unit for controlling and detecting scanning positions and a controller operative to control the focus adjustment and astigmatism adjustment at a time in interlocked relation to the scanning positions, thereby assuring compatibility between the high resolving power and the observation view field of a wide area.
摘要翻译：提供具有高分辨率和宽扫描区域（观察视场）的带电粒子束装置。该装置具有用于调节焦点的单元，用于调节散光的单元，用于控制和检测扫描位置的单元，以及控制器，用于与扫描位置互锁地控制焦点调节和像散调整，由此确保相容性在高分辨率和广域的观察视野之间。

9. 发明授权

US09830524B2 Method for estimating shape before shrink and CD-SEM apparatus 有权
公开(公告)号：US09830524B2
公开(公告)日：2017-11-28
申请号：US14239803
申请日：2012-05-24
申请人： Tomoko Sekiguchi , Takeyoshi Ohashi , Junichi Tanaka , Zhaohui Cheng , Ruriko Tsuneta , Hiroki Kawada , Seiko Hitomi
发明人： Tomoko Sekiguchi , Takeyoshi Ohashi , Junichi Tanaka , Zhaohui Cheng , Ruriko Tsuneta , Hiroki Kawada , Seiko Hitomi
IPC分类号： G01N23/22 , G06K9/46 , H01J37/317 , G01B15/04 , B82Y10/00 , B82Y40/00 , G06T7/00 , H01L21/66
CPC分类号： G06K9/4604 , B82Y10/00 , B82Y40/00 , G01B15/04 , G01N23/22 , G06T7/0004 , H01J37/3174 , H01J2237/221 , H01J2237/226 , H01J2237/2816 , H01J2237/31754 , H01J2237/31796 , H01L22/12 , H01L2924/0002 , H01L2924/00
摘要： In the present invention, at the time of measuring, using a CD-SEM, a length of a resist that shrinks when irradiated with an electron beam, in order to highly accurately estimate a shape and dimensions of the resist before shrink, a shrink database with respect to various patterns is previously prepared, said shrink database containing cross-sectional shape data obtained prior to electron beam irradiation, a cross-sectional shape data group and a CD-SEM image data group, which are obtained under various electron beam irradiation conditions, and models based on such data and data groups, and a CD-SEM image of a resist pattern to be measured is obtained (S102), then, the CD-SEM image and data in the shrink database are compared with each other (S103), and the shape and dimensions of the pattern before the shrink are estimated and outputted (S104).

10. 发明授权

US07928384B2 Localized static charge distribution precision measurement method and device 有权
标题翻译：局部静电分配精度测量方法及装置
公开(公告)号：US07928384B2
公开(公告)日：2011-04-19
申请号：US12222577
申请日：2008-08-12
申请人： Zhaohui Cheng , Tasuku Yano , Seiko Omori
发明人： Zhaohui Cheng , Tasuku Yano , Seiko Omori
IPC分类号： G01N23/00
CPC分类号： G01N23/04
摘要： A charged particle beam device including a function for measuring localized static charges on a sample. A primary charged particle beam scans a sample positioned in a mirror state to acquire an image. The acquired image may be an image of the sample or may be an image of a structural component in the charged particle optical system. The acquired image is compared with a standard sample image and the localized static charge is measured.
摘要翻译：一种带电粒子束装置，包括用于测量样品上的局部静电荷的功能。初级带电粒子束扫描以镜像状态定位的样本以获取图像。所获取的图像可以是样本的图像，或者可以是带电粒子光学系统中的结构成分的图像。将获取的图像与标准样品图像进行比较，并测量局部静电荷。

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