专利快速检索-快速检索全球专利，免费商用专利数据库-IPRDB

1. 发明授权

US5829939A Treatment apparatus 失效
公开(公告)号：US5829939A
公开(公告)日：1998-11-03
申请号：US667584
申请日：1996-06-24
申请人： Hiroyuki Iwai , Tamotsu Tanifuji , Takanobu Asano , Ryoichi Okura
发明人： Hiroyuki Iwai , Tamotsu Tanifuji , Takanobu Asano , Ryoichi Okura
IPC分类号： H01L21/304 , H01L21/677 , H01L21/00
CPC分类号： H01L21/67769 , H01L21/67772 , Y10S414/137 , Y10S414/139 , Y10S414/14
摘要： A treatment apparatus comprises a treatment chamber for performing a treatment for a workpiece W, a loading chamber connected to the treatment chamber, for loading and unloading a holding member which contains the workpiece into and from the treatment chamber, and an input/output chamber for inputting and outputting the workpiece to and from the loading chamber. The input/output chamber includes a cassette accommodating vessel port which holds a cassette accommodating vessel. The vessel is filled with clean air or an inert gas, and is airtightly closed. A cassette receiving mechanism is disposed below the port and lowers only the cassette of the vessel so as to receive the cassette. Thus, when the cassette is input and output to and from the outside of the treatment apparatus, the workpiece contained within the cassette is not exposed to the atmosphere in a working region. Consequently, it is not necessary to improve the cleanliness level of the atmosphere in the working region. As a result, the construction cost of the clean room and the operation cost thereof can be reduced. A clean air blowing device is disposed below the port. The clean air blowing device blows a side flow of clean air. Thus, the atmosphere at a position below the port where air tends to stay is circulated. Thus, since the surface of the workpiece loaded in the treatment chamber is exposed to the side flow, particles and the like that adhere thereto are purged.

2. 发明授权

US5562383A Treatment apparatus 失效
标题翻译：治疗仪器
公开(公告)号：US5562383A
公开(公告)日：1996-10-08
申请号：US583669
申请日：1996-01-05
申请人： Hiroyuki Iwai , Tamotsu Tanifuji , Takanobu Asano , Ryoichi Okura
发明人： Hiroyuki Iwai , Tamotsu Tanifuji , Takanobu Asano , Ryoichi Okura
IPC分类号： H01L21/304 , H01L21/677 , H01L21/00
CPC分类号： H01L21/67769 , H01L21/67772 , Y10S414/137 , Y10S414/139 , Y10S414/14
摘要： A treatment apparatus comprises a treatment chamber for performing a treatment for a workpiece W, a loading chamber connected to the treatment chamber, for loading and unloading a holding member which contains the workpiece into and from the treatment chamber, and an input/output chamber for inputting and outputting the workpiece to and from the loading chamber. The input/output chamber includes a cassette accommodating vessel port which holds a cassette accommodating vessel. The vessel is filled with clean air or an inert gas, and is airtightly closed. A cassette receiving mechanism is disposed below the port and lowers only the cassette of the vessel so as to receive the cassette. Thus, when the cassette is input and output to and from the outside of the treatment apparatus, the workpiece contained within the cassette is not exposed to the atmosphere in a working region. Consequently, it is not necessary to improve the cleanliness level of the atmosphere in the working region. As a result, the construction cost of the clean room and the operation cost thereof can be reduced. A clean air blowing device is disposed below the port. The clean air blowing device blows a side flow of clean air. Thus, the atmosphere at a position below the port where air tends to stay is circulated. Thus, since the surface of the workpiece loaded in the treatment chamber is exposed to the side flow, particles and the like that adhere thereto are purged.
摘要翻译：处理装置包括：处理室，用于对工件W进行处理，连接到处理室的装载室，用于将包含工件的保持构件装载到处理室和从处理室中卸载;以及输入/输出室，将工件输入和输出到装载室。输入/输出室包括容纳容纳容器的盒式磁带容纳容器端口。容器内装有清洁空气或惰性气体，并且气密地关闭。盒接收机构设置在端口下方，并且仅降低容器的盒以便接收盒。因此，当盒子从处理设备的外部输入和输出时，包含在盒内的工件不会暴露在工作区域中的大气中。因此，不需要提高工作区域的气氛的清洁度。因此，能够降低洁净室的建筑成本及其运转成本。清洁吹风装置设置在端口下方。清洁吹风装置吹扫清洁空气的侧流。因此，空气倾向于停留的港口下方的气氛被循环。因此，由于装载在处理室中的工件的表面暴露于侧流，所以清除附着在其上的颗粒等。

3. 发明授权

US08783674B2 Stage 有权
标题翻译：阶段
公开(公告)号：US08783674B2
公开(公告)日：2014-07-22
申请号：US12902496
申请日：2010-10-12
申请人： Yuya Inoue , Tamotsu Tanifuji , Hisato Tanaka , Makoto Takahashi , Kuniyoshi Sekine
发明人： Yuya Inoue , Tamotsu Tanifuji , Hisato Tanaka , Makoto Takahashi , Kuniyoshi Sekine
IPC分类号： B25B1/00
CPC分类号： B25B1/00 , B65G49/061 , B65G2249/02
摘要： Provided is a substrate stage which can transfer a substrate at a high speed. In the substrate stage of the present invention, auxiliary mounting tables are attached to a main mounting table, and lower rails are arranged over on the main mounting table and above the auxiliary mounting tables. When both ends of the lower rails are bent upwardly by a vertically adjusting unit in order to prevent the both ends of the lower rails to be bent downwardly, the lower rails are made straight. Since the lower rail is not divided, the linearity is ensured and the moving plate does not stutter so that transfer of the substrate at high speed can be performed.
摘要翻译：提供可以高速地传送基板的基板台。在本发明的基板台中，辅助安装台安装在主安装台上，下导轨布置在主安装台上并在辅助安装台上方。当下轨道的两端通过垂直调节单元向上弯曲，以防止下轨道的两端向下弯曲时，下导轨成直线。由于下轨道未被分割，所以确保了线性，并且移动板不会开口，从而可以高速地传送基板。

4. 发明申请

US20100276858A1 MOVABLE TABLE AND PROCESSING STAGE 有权
标题翻译：可移动表和处理阶段
公开(公告)号：US20100276858A1
公开(公告)日：2010-11-04
申请号：US12742177
申请日：2008-11-11
申请人： Yuya Inoue , Hisato Tanaka , Tamotsu Tanifuji
发明人： Yuya Inoue , Hisato Tanaka , Tamotsu Tanifuji
IPC分类号： B23Q1/25
CPC分类号： H01L21/67748 , B65G49/061 , B65G2249/04 , B65G2249/045 , H01L21/67103 , H01L21/68757 , Y10T483/10
摘要： A movable table, which has a substrate to be processed mounted thereon and moves, includes: a main plate formed of a metallic material; and a plurality of sub plates which is disposed on the main plate and is formed of a material with a hardness higher than the metallic material, and the top surfaces of the plurality of sub plates are mounting surfaces of the substrate to be processed.
摘要翻译：具有安装在其上并移动的待加工基板的可动台包括：由金属材料形成的主板; 以及多个副板，其设置在所述主板上并且由硬度高于所述金属材料的材料形成，并且所述多个副板的顶表面是所述被处理基板的安装面。

5. 发明授权

US08827254B2 Substrate transfer processing apparatus 有权
标题翻译：基板转印处理装置
公开(公告)号：US08827254B2
公开(公告)日：2014-09-09
申请号：US12877319
申请日：2010-09-08
申请人： Yuya Inoue , Tamotsu Tanifuji , Hisato Tanaka , Makoto Takahashi , Kuniyoshi Sekine
发明人： Yuya Inoue , Tamotsu Tanifuji , Hisato Tanaka , Makoto Takahashi , Kuniyoshi Sekine
IPC分类号： B23Q1/25 , B65G49/06 , H01L21/677 , G01N21/956
CPC分类号： B65G49/065 , B65G2249/04 , G01N21/956 , H01L21/67742 , Y10T29/53961
摘要： A substrate transfer processing apparatus capable of processing a substrate at high speed is provided. A mounting table on which a substrate is mounted includes a plate-shaped main body and a recessed part formed in a rear surface of the plate-shaped main body. Since the mounting table is lightweight as compared to the mounting table before the recessed part is formed therein, the load on a motor is small and the running cost is low even when the mounting table is moved at high speed. Because the plate-shaped main body is made of granite, the mounting surface can be made flat and smooth by polishing. Since the mounting surface is flat and smooth, the accuracy in positioning the substrate is high.
摘要翻译：提供能够高速处理基板的基板转印处理装置。其上安装有基板的安装台包括形成在板状主体的后表面上的板状主体和凹部。由于与在安装台形成凹部之前的安装台相比，由于安装台重量轻，所以即使在安装台高速移动的情况下，电动机的负荷也小，运行成本低。由于板状主体由花岗岩制成，因此可以通过抛光使安装面平坦平滑。由于安装面平坦光滑，因此基板的定位精度高。

6. 发明授权

US08485507B2 Movable table and processing stage 有权
标题翻译：活动台和加工台
公开(公告)号：US08485507B2
公开(公告)日：2013-07-16
申请号：US12742177
申请日：2008-11-11
申请人： Yuya Inoue , Hisato Tanaka , Tamotsu Tanifuji
发明人： Yuya Inoue , Hisato Tanaka , Tamotsu Tanifuji
IPC分类号： B23B1/25
CPC分类号： H01L21/67748 , B65G49/061 , B65G2249/04 , B65G2249/045 , H01L21/67103 , H01L21/68757 , Y10T483/10
摘要： A movable table, which has a substrate to be processed mounted thereon and moves, includes: a main plate formed of a metallic material; and a plurality of sub plates which is disposed on the main plate and is formed of a material with a hardness higher than the metallic material, and the top surfaces of the plurality of sub plates are mounting surfaces of the substrate to be processed.
摘要翻译：具有安装在其上并移动的待加工基板的可动台包括：由金属材料形成的主板; 以及多个副板，其设置在所述主板上并且由硬度高于所述金属材料的材料形成，并且所述多个副板的顶表面是所述被处理基板的安装面。

7. 发明授权

US5951282A Vertical heat treatment apparatus 失效
标题翻译：立式热处理设备
公开(公告)号：US5951282A
公开(公告)日：1999-09-14
申请号：US91420
申请日：1998-06-24
申请人： Kazunari Sakata , Tamotsu Tanifuji , Akihiko Tsukada
发明人： Kazunari Sakata , Tamotsu Tanifuji , Akihiko Tsukada
IPC分类号： H01L21/00 , F27D3/12
CPC分类号： H01L21/67109
摘要： The vertical heat treatment apparatus for semiconductor wafers (W) includes a heat treatment furnace (19). In the heat treatment furnace (19), the wafers (W) are subjected to a batch treatment in a state mounted on a boat (16). To the lower side of the heat treatment furnace (19), a preparatory vacuum chamber (102) is airtightly connected through a manifold (33). The manifold (33) has first and second parts (33a and 33b) separably coupled to each other, which are connected to the heat treatment furnace (19) and the preparatory vacuum chamber (102), respectively. The second part (33b) defines a valve seat on which a lid (22) is seated to cut off the communication between the heat treatment furnace (19) and the preparatory vacuum chamber (102). In a state where the lid (22) is seated on the valve seat to maintain the preparatory vacuum chamber (102) airtight, the heat treatment furnace (19) can be separated together with the first part (33a) of the manifold from the preparatory vacuum chamber (102) and the second part (33b) of the manifold.
摘要翻译： PCT No.PCT / JP97 / 03791 Sec。 371日期：1998年6月24日 102（e）1998年6月24日PCT 1997年10月21日PCT PCT。第WO98 / 19335号公报日期1998年5月7日半导体晶片用立式热处理装置（W）包括热处理炉（19）。在热处理炉（19）中，在安装在船（16）上的状态下对晶片（W）进行批处理。在热处理炉（19）的下侧，准备真空室（102）通过歧管（33）气密连接。歧管（33）具有分别彼此分离地连接到热处理炉（19）和预备真空室（102）的第一和第二部分（33a和33b）。第二部分（33b）限定了一个阀座，在其上安置有盖（22）以截断热处理炉（19）和预备真空室（102）之间的连通。在将盖（22）安置在阀座上以保持预备真空室（102）气密的状态下，热处理炉（19）可与歧管的第一部分（33a）一起从预备真空室（102）和歧管的第二部分（33b）。

8. 发明申请

US20110042876A1 STAGE 有权
标题翻译：阶段
公开(公告)号：US20110042876A1
公开(公告)日：2011-02-24
申请号：US12902496
申请日：2010-10-12
申请人： Yuya INOUE , Tamotsu Tanifuji , Hisato Tanaka , Makoto Takahashi , Kuniyoshi Sekine
发明人： Yuya INOUE , Tamotsu Tanifuji , Hisato Tanaka , Makoto Takahashi , Kuniyoshi Sekine
IPC分类号： B23Q1/60 , H01L21/68
CPC分类号： B25B1/00 , B65G49/061 , B65G2249/02
摘要： Provided is a substrate stage which can transfer a substrate at a high speed. In the substrate stage of the present invention, auxiliary mounting tables are attached to a main mounting table, and lower rails are arranged over on the main mounting table and above the auxiliary mounting tables. When both ends of the lower rails are bent upwardly by a vertically adjusting unit in order to prevent the both ends of the lower rails to be bent downwardly, the lower rails are made straight. Since the lower rail is not divided, the linearity is ensured and the moving plate does not stutter so that transfer of the substrate at high speed can be performed.
摘要翻译：提供能够高速地转印基板的基板台。在本发明的基板台中，辅助安装台安装在主安装台上，下导轨布置在主安装台上并在辅助安装台上方。当下轨道的两端通过垂直调节单元向上弯曲，以防止下轨道的两端向下弯曲时，下导轨成直线。由于下轨道未被分割，所以确保了线性，并且移动板不会开口，从而可以高速地传送基板。

9. 发明授权

US6042372A Heat treatment apparatus 失效
标题翻译：热处理设备
公开(公告)号：US6042372A
公开(公告)日：2000-03-28
申请号：US91419
申请日：1998-06-24
申请人： Kazunari Sakata , Tamotsu Tanifuji , Akihiko Tsukada
发明人： Kazunari Sakata , Tamotsu Tanifuji , Akihiko Tsukada
IPC分类号： H01L21/22 , B65G49/07 , C23C16/54 , C30B25/08 , C30B31/10 , C30B31/12 , C30B35/00 , H01L21/00 , H01L21/205 , H01L21/31 , H01L21/324 , H01L21/677
CPC分类号： H01L21/67757 , C23C16/54 , C30B25/08 , C30B31/10 , C30B31/12 , C30B35/005 , H01L21/67109 , Y10S414/138 , Y10S414/139 , Y10S414/14
摘要： A vertical heat treatment apparatus for semiconductor wafers (W) including a heat treating furnace (19) which is heated to 600.degree. C. or higher. In the heat treating furnace (19), the wafers (W) are subjected to batch treatment while they are placed on a boat (16). A preparatory vacuum chamber (102) is airtightly connected to a lower side of the heat treating furnace (19). Disposed in the preparatory vacuum chamber (102) are a horizontal transfer mechanism (201) and a vertical transfer mechanism (202) for transferring the boat (16). The two transfer mechanisms (201 and 202) are supported by support members (29a and 33a) mounted on a mechanical base (28). The preparatory vacuum chamber (102) and the support members (29a and 33a) are airtightly connected to each other by means of bellows.
摘要翻译： PCT No.PCT / JP97 / 03772 Sec。 371日期：1998年6月24日 102（e）日期1998年6月24日PCT 1997年10月20日PCT公布。公开号WO98 / 19334 日期1998年5月7日一种用于半导体晶片（W）的立式热处理装置，其包括加热至600℃或更高的热处理炉（19）。在热处理炉（19）中，将晶片（W）放置在船（16）上进行批处理。准备真空室（102）与热处理炉（19）的下侧气密连接。在准备真空室（102）中设置有水平传送机构（201）和用于传送船（16）的垂直传送机构（202）。两个传送机构（201和202）由安装在机械基座（28）上的支撑构件（29a和33a）支撑。准备真空室（102）和支撑构件（29a和33a）通过波纹管彼此气密地连接。

10. 发明申请

US20110048319A1 SUBSTRATE TRANSFER PROCESSING APPARATUS 有权
标题翻译：基板传送处理装置
公开(公告)号：US20110048319A1
公开(公告)日：2011-03-03
申请号：US12877319
申请日：2010-09-08
申请人： Yuya Inoue , Tamotsu Tanifuji , Hisato Tanaka , Makoto Takahashi , Kuniyoshi Sekine
发明人： Yuya Inoue , Tamotsu Tanifuji , Hisato Tanaka , Makoto Takahashi , Kuniyoshi Sekine
IPC分类号： B05C13/00 , H01L21/677 , B05C5/00
CPC分类号： B65G49/065 , B65G2249/04 , G01N21/956 , H01L21/67742 , Y10T29/53961
摘要： A substrate transfer processing apparatus capable of processing a substrate at high speed is provided. A mounting table on which a substrate is mounted includes a plate-shaped main body and a recessed part formed in a rear surface of the plate-shaped main body. Since the mounting table is lightweight as compared to the mounting table before the recessed part is formed therein, the load on a motor is small and the running cost is low even when the mounting table is moved at high speed. Because the plate-shaped main body is made of granite, the mounting surface can be made flat and smooth by polishing. Since the mounting surface is flat and smooth, the accuracy in positioning the substrate is high.
摘要翻译：提供能够高速处理基板的基板转印处理装置。其上安装有基板的安装台包括形成在板状主体的后表面上的板状主体和凹部。由于与在安装台形成凹部之前的安装台相比，由于安装台重量轻，所以即使在安装台高速移动的情况下，电动机的负荷也小，运行成本低。由于板状主体由花岗岩制成，因此可以通过抛光使安装面平坦平滑。由于安装面平坦光滑，因此基板的定位精度高。

你已经成功收藏专利！

检索式保存成功!

IPRDB

热门服务

关于我们

友情链接

联系方式