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1. 发明申请

US20060266639A1 Sputtering target tiles having structured edges separated by a gap 审中-公开
标题翻译：具有由间隙分隔的结构化边缘的溅射靶砖
公开(公告)号：US20060266639A1
公开(公告)日：2006-11-30
申请号：US11414016
申请日：2006-04-28
申请人： Hien-Minh Huu Le , Bradley Stimson , Akihiro Hosokawa
发明人： Hien-Minh Huu Le , Bradley Stimson , Akihiro Hosokawa
IPC分类号： C23C14/32 , C23C14/00
CPC分类号： C23C14/3407 , H01J37/3423 , H01J37/3435 , H01J37/3491
摘要： A target assembly composed of multiple target tiles bonded in an array to a backing plate of another material. The edges of the tile within the interior of the array are formed with complementary structure edges to form a gap between the tiles having at least a portion that is inclined to the target normal. The gap may be simply beveled and slant at an angle of between 10° and 55°, preferably 15° and 50°, with respect to the target normal or they may be convolute with one portion horizontal or otherwise inclined to prevent a line of sight from the bottom to top. The area of the backing plate underlying the gap may be coated or overlain with a foil of the material of the target, for both perpendicular and sloping gaps, and have a polymeric foil adjacent an elastomeric bonding layer to exclude bonding material from the gap.
摘要翻译：由多个靶阵列组成的目标组件，其以阵列的形式结合到另一材料的背板上。在阵列内部的瓦片的边缘形成有互补的结构边缘，以在具有至少一部分倾斜于目标法线的瓦片之间形成间隙。间隙可以简单地倾斜并相对于目标法线倾斜10°至55°，优选15°和50°之间的角度，或者它们可以与一部分水平或以其它方式倾斜以防止视线从下到上。在间隙下面的背板的区域可以对于垂直和倾斜的间隙进行涂覆或覆盖靶的材料的箔，并且具有邻近弹性体粘结层的聚合物箔，以从间隙排除粘合材料。

2. 发明申请

US20070151841A1 Flexible magnetron including partial rolling support and centering pins 审中-公开
标题翻译：柔性磁控管包括部分滚动支撑和定心销
公开(公告)号：US20070151841A1
公开(公告)日：2007-07-05
申请号：US11601576
申请日：2006-11-17
申请人： Makoto Inagawa , Akihiro Hosokawa , Hien-Minh Le , Ilya Lavitsky , John White , Todd Martin , Bradley Stimson
发明人： Makoto Inagawa , Akihiro Hosokawa , Hien-Minh Le , Ilya Lavitsky , John White , Todd Martin , Bradley Stimson
IPC分类号： C23C14/32 , C23C14/00
CPC分类号： C23C14/3407 , C23C14/35 , H01J37/3405 , H01J37/3408 , H01J37/3435 , H01J37/3452 , H01J37/3455
摘要： A magnetron scanning and support mechanism in which the magnetron is partially supported from an overhead scanning mechanism through multiple springs coupled to different horizontal locations on the magnetron and partially supported from below at multiple locations on the target, on which it slides or rolls. In one embodiment, the yoke plate is continuous and uniform. In another embodiment, the magnetron's magnetic yoke is divided into two flexible yokes, for example, of complementary serpentine shape and each supporting magnets of respective polarity. In another embodiment, the target and magnetron are divided into respective strips separated by other structure. Each magnetron strip is supported partially from above from a common scanning plate and partially on a respective target strip. A centering mechanism may align the different magnetron strips.
摘要翻译：一种磁控管扫描和支撑机构，其中磁控管通过耦合到磁控管上的不同水平位置的多个弹簧部分地从顶部扫描机构支撑，并且在靶上的多个位置处从其下方部分地支撑，在其上滑动或滚动。在一个实施例中，轭板是连续且均匀的。在另一个实施例中，磁控管的磁轭被分成两个柔性轭，例如互补的蛇形形状和各个极性的每个支撑磁体。在另一个实施例中，靶和磁控管被分成由其它结构分开的相应条。每个磁控管从上面部分地从普通扫描板支撑并部分地支撑在相应的目标条上。定心机构可以对准不同的磁控管条。

3. 发明申请

US20070261951A1 REACTIVE SPUTTERING ZINC OXIDE TRANSPARENT CONDUCTIVE OXIDES ONTO LARGE AREA SUBSTRATES 审中-公开
标题翻译：氧化锌氧化物透明导电氧化物在大面积基材上的反应性溅射
公开(公告)号：US20070261951A1
公开(公告)日：2007-11-15
申请号：US11697476
申请日：2007-04-06
申请人： Yan Ye , Ankur Kadam , Yanping Li , Allen Lau , Makoto Inagawa , Bradley Stimson , Akihiro Hosokawa
发明人： Yan Ye , Ankur Kadam , Yanping Li , Allen Lau , Makoto Inagawa , Bradley Stimson , Akihiro Hosokawa
IPC分类号： C23C14/00
CPC分类号： C23C14/564 , C23C14/0063 , C23C14/35 , H01J37/3244 , H01J37/34 , H01J37/3438
摘要： The present invention generally comprises one or more cooled anodes shadowing one or more gas introduction tubes where both the cooled anodes and the gas introduction tubes span a processing space defined between one or more sputtering targets and one or more substrates within a sputtering chamber. The gas introduction tubes may have gas outlets that direct the gas introduced away from the one or more substrates. The gas introduction tubes may introduce reactive gas, such as oxygen, into the sputtering chamber for depositing TCO films by reactive sputtering. During a multiple step sputtering process, the gas flows (i.e., the amount of gas and the type of gas), the spacing between the target and the substrate, and the DC power may be changed to achieve a desired result.
摘要翻译：本发明通常包括一个或多个冷却的阳极，其遮蔽一个或多个气体导入管，其中冷却的阳极和气体引入管都跨越在溅射室内的一个或多个溅射靶和一个或多个衬底之间限定的处理空间。气体导入管可以具有引导从一个或多个基底引入的气体的气体出口。气体引入管可以将诸如氧的反应性气体引入到用于通过反应溅射沉积TCO膜的溅射室中。在多步骤溅射处理中，可以改变气体流动（即，气体的量和气体的类型），靶和基板之间的间隔以及DC功率以实现期望的结果。

4. 发明申请

US20070056845A1 Multiple zone sputtering target created through conductive and insulation bonding 审中-公开
标题翻译：通过导电和绝缘结合产生多区域溅射靶
公开(公告)号：US20070056845A1
公开(公告)日：2007-03-15
申请号：US11399122
申请日：2006-04-06
申请人： Yan Ye , John White , Akihiro Hosokawa , Hien Le , Elpidio Nisperos , Bradley Stimson
发明人： Yan Ye , John White , Akihiro Hosokawa , Hien Le , Elpidio Nisperos , Bradley Stimson
IPC分类号： C23C14/32 , C23C14/00
CPC分类号： C23C14/3407 , H01J37/3408 , H01J37/3423 , H01J37/3435 , H01J37/3438 , H01J37/3441
摘要： The present invention generally provides a sputtering apparatus and method in which a sputtering target has a plurality of target sections bonded to a common backing plate. Each segment can be bonded to the common backing plate using a different bonding material. One target segment can be bonded to the backing plate using electrically conductive bonding material while another section is bonded to the backing plate using electrically insulating bonding material. Additionally, each different target section can be separately biased.
摘要翻译：本发明通常提供一种溅射装置和方法，其中溅射靶具有多个目标部分结合到共同的背板上。可以使用不同的接合材料将每个段结合到公共背板上。可以使用导电接合材料将一个目标段结合到背板上，而使用电绝缘接合材料将另一部分结合到背板上。此外，每个不同的目标部分可以单独偏置。

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