专利快速检索-快速检索全球专利，免费商用专利数据库-IPRDB

1. 发明申请

US20130171757A1 ADVANCED PLATFORM FOR PASSIVATING CRYSTALLINE SILICON SOLAR CELLS 审中-公开
标题翻译：用于封闭晶体硅太阳能电池的先进平台
公开(公告)号：US20130171757A1
公开(公告)日：2013-07-04
申请号：US13732662
申请日：2013-01-02
申请人： HARI K. PONNEKANTI , Alexander S. Polyak , James L'Heureux , Michael S. Cox , Christopher T. Lane , Edward P. Hammond, IV , Hemant P. Mungekar , Susanne Schlaefer , Wolfgang Buschbeck , Juergen Henrich , Andreas Lopp
发明人： HARI K. PONNEKANTI , Alexander S. Polyak , James L'Heureux , Michael S. Cox , Christopher T. Lane , Edward P. Hammond, IV , Hemant P. Mungekar , Susanne Schlaefer , Wolfgang Buschbeck , Juergen Henrich , Andreas Lopp
IPC分类号： H01L31/18
CPC分类号： H01L31/18 , C23C14/568 , C23C16/54 , H01L21/67115 , H01L21/67173 , H01L21/6776
摘要： The present invention generally provides a high throughput substrate processing system that is used to form one or more regions of a solar cell device. In one configuration of a processing system, one or more solar cell passivating or dielectric layers are deposited and further processed within one or more processing chambers contained within the high throughput substrate processing system. The processing chambers may be, for example, plasma enhanced chemical vapor deposition (PECVD) chambers, low pressure chemical vapor deposition (LPCVD) chambers, atomic layer deposition (ALD) chambers, physical vapor deposition (PVD) or sputtering chambers, thermal processing chambers (e.g., RTA or RTO chambers), substrate reorientation chambers (e.g., flipping chambers) and/or other similar processing chambers.
摘要翻译：本发明通常提供用于形成太阳能电池器件的一个或多个区域的高通量衬底处理系统。在处理系统的一种配置中，一个或多个太阳能电池钝化或电介质层被沉积并在包含在高通量衬底处理系统内的一个或多个处理室内进一步处理。处理室可以是例如等离子体增强化学气相沉积（PECVD）室，低压化学气相沉积（LPCVD）室，原子层沉积（ALD）室，物理气相沉积（PVD）或溅射室，热处理室（例如，RTA或RTO室），基板重新定向室（例如，翻转室）和/或其它类似的处理室。

2. 发明申请

US20130273262A1 STATIC DEPOSITION PROFILE MODULATION FOR LINEAR PLASMA SOURCE 审中-公开
标题翻译：线性等离子体源的静态沉积剖面调制
公开(公告)号：US20130273262A1
公开(公告)日：2013-10-17
申请号：US13447035
申请日：2012-04-13
申请人： Manoj Vellaikal , Michael S. Cox , Hemant P. Mungekar , Chikuang C. Wang , Lin Zhang , Hari K. Ponnekanti , Michael P. Stewart , Edward P. Hammond, IV , Alexander S. Polyak
发明人： Manoj Vellaikal , Michael S. Cox , Hemant P. Mungekar , Chikuang C. Wang , Lin Zhang , Hari K. Ponnekanti , Michael P. Stewart , Edward P. Hammond, IV , Alexander S. Polyak
IPC分类号： C23C16/50
CPC分类号： C23C16/45565 , C23C16/45589 , C23C16/50 , C23C16/54
摘要： Methods and apparatus for controlling film deposition using a linear plasma source are described herein. The apparatus include a showerhead having openings therein for flowing a gas therethrough, a conveyor to support one or more substrates thereon disposed adjacent to the showerhead, and a power source for ionizing the gas. The ionized gas can be a source gas used to deposit a material on the substrate. The deposition profile of the material on the substrate can be adjusted, for example, using a gas-shaping device included in the apparatus. Additionally or alternatively, the deposition profile may be adjusted by using an actuatable showerhead. The method includes exposing a substrate to an ionized gas to deposit a film on the substrate, wherein the ionized gas is influenced with a gas-shaping device to uniformly deposit the film on the substrate as the substrate is conveyed proximate to the showerhead.
摘要翻译：本文描述了使用线性等离子体源来控制膜沉积的方法和装置。该装置包括：喷嘴，其中具有用于使气体流过其中的开口;输送机，用于支撑其上邻近喷淋头设置的一个或多个基板;以及用于使气体离子化的电源。电离气体可以是用于在衬底上沉积材料的源气体。可以例如使用包括在该装置中的气体整形装置来调节衬底上的材料的沉积轮廓。附加地或替代地，沉积轮廓可以通过使用可启动喷头来调节。该方法包括将衬底暴露于电离气体以在衬底上沉积膜，其中当衬底被输送到靠近喷头时，电离气体受到气体整形装置的影响，从而将膜均匀地沉积在衬底上。

3. 发明申请

US20130059092A1 METHOD AND APPARATUS FOR GAS DISTRIBUTION AND PLASMA APPLICATION IN A LINEAR DEPOSITION CHAMBER 审中-公开
标题翻译：气体分布和等离子体在线性沉积室应用中的方法与装置
公开(公告)号：US20130059092A1
公开(公告)日：2013-03-07
申请号：US13605449
申请日：2012-09-06
申请人： HEMANT P. MUNGEKAR , Alexander S. Polyak , Michael S. Cox
发明人： HEMANT P. MUNGEKAR , Alexander S. Polyak , Michael S. Cox
IPC分类号： C23C16/513 , H05H1/24
CPC分类号： H01J37/3244 , C23C16/45504 , C23C16/45557 , C23C16/45563 , C23C16/4584 , C23C16/50 , C23C16/52 , C23C16/54 , H01J37/32779
摘要： A method and apparatus for processing a substrate is described. One embodiment of the invention provides an apparatus for forming thin films. The apparatus comprises a chamber defining an internal volume, a plasma source disposed within the internal volume, and at least one gas injection source disposed adjacent the plasma source within the internal volume, wherein the at least one gas injection source comprises a first channel and a second channel for delivering gases to the internal volume, the first channel delivering a gas at a first pressure or a first density and the second channel delivering a gas at a second pressure or a second density, the first pressure or the first density being different than the second pressure or the second density.
摘要翻译：描述了用于处理衬底的方法和设备。本发明的一个实施例提供了一种用于形成薄膜的装置。该装置包括限定内部体积的室，设置在内部体积内的等离子体源以及在内部体积内与等离子体源相邻设置的至少一个气体注入源，其中至少一个气体注入源包括第一通道和用于将气体输送到内部容积的第二通道，所述第一通道以第一压力或第一密度输送气体，所述第二通道输送处于第二压力或第二密度的气体，所述第一压力或所述第一密度不同于第二压力或第二密度。

4. 发明申请

US20130104996A1 METHOD FOR BALANCING GAS FLOW SUPPLYING MULTIPLE CVD REACTORS 审中-公开
标题翻译：用于平衡气体供应多种CVD反应器的方法
公开(公告)号：US20130104996A1
公开(公告)日：2013-05-02
申请号：US13647160
申请日：2012-10-08
申请人： JEONGHOON OH , Michael S. Cox , Alexander S. Polyak
发明人： JEONGHOON OH , Michael S. Cox , Alexander S. Polyak
IPC分类号： F16K11/00
CPC分类号： F16K11/00 , C23C16/45561 , Y10T137/0324 , Y10T137/877
摘要： Gas supply systems and methods are disclosed for solar cell production using multiple parallel reactors. A first gas supply control system has a gas panel having a plurality of gas outlet lines, supplying a first main supply line having a main line mass flow meter measuring the combined total gas mass flow rate in the first main supply line. First, second and third branch lines supplied by the first main supply line each branch line having mass flow controller and one or more control loops established between the mass flow meter and the branch line mass flow controllers. The control loop determining a set point for each of the branch mass flow controllers based on dividing the flow rate of the total gas flow by the number of reactors in use. In addition, a second gas supply control system may be coupled to the first gas supply control system to avoid mixing certain gases before they enter the respective reactors to which they are supplied.
摘要翻译：公开了使用多个并联反应器的太阳能电池生产的气体供应系统和方法。第一气体供给控制系统具有具有多个气体出口管线的气体面板，供给具有测量第一主供应管线中的总气体质量流量的总线质量流量计的第一主供应管线。第一，第二和第三分支线由第一主供应线提供，每个分支线具有质量流量控制器和在质量流量计和分支线质量流量控制器之间建立的一个或多个控制回路。控制回路基于将总气体流量的流量除以使用的反应堆的数量来确定每个分支质量流量控制器的设定点。此外，第二气体供应控制系统可以耦合到第一气体供应控制系统，以避免在它们进入它们所供应的相应反应器之前混合某些气体。

5. 发明授权

US07377002B2 Scrubber box 有权
标题翻译：洗衣盒
公开(公告)号：US07377002B2
公开(公告)日：2008-05-27
申请号：US10976012
申请日：2004-10-28
申请人： Joseph Yudovsky , Avi Tepman , Kenneth R. Reynolds , Younes Achkire , Dan A. Marohl , Steve G. Ghanayem , Alexander S. Polyak , Gary Ettinger , Haochuan Zhang , Hui Chen
发明人： Joseph Yudovsky , Avi Tepman , Kenneth R. Reynolds , Younes Achkire , Dan A. Marohl , Steve G. Ghanayem , Alexander S. Polyak , Gary Ettinger , Haochuan Zhang , Hui Chen
IPC分类号： B08B1/04
CPC分类号： H01L21/67046 , B08B1/04
摘要： A scrubber box is provided that includes a tank adapted to receive a substrate for cleaning, supports outside of the tank and adapted to couple to ends of scrubber brushes disposed within the tank, a motor mounted to each of the supports and adapted to rotate the scrubber brushes, a base to which the supports are pivotally mounted via spherical bearings adapted to permit toe-in of the scrubber brushes, a brush gap actuator adapted, via a crank and rocker mechanism, to substantially simultaneously pivot the supports toward or away from each other so as to permit the scrubber brushes to substantially simultaneously achieve or break contact with the substrate, and a toe-in actuator adapted to move two of the spherical bearings toward or away from each other so as to adjust a toe-in angle between the scrubber brushes.
摘要翻译：提供了一种洗涤器箱，其包括适于接收用于清洁的基底的罐，支撑在罐外部并且适于耦合到设置在罐内的洗涤器刷的端部;马达，其安装到每个支撑件上并适于旋转洗涤器电刷，支架通过适于允许洗涤器刷子进入的球面轴承可枢转地安装的基座，经由曲柄和摇臂机构适应的基本上同时地使支撑件朝向或远离彼此枢转的电刷间隙致动器以便允许洗涤器刷子基本上同时实现或断开与基板的接触，以及适于将两个球形轴承朝向或远离彼此移动的脚趾致动器，以便调节洗涤器之间的束缚角度刷子

6. 发明申请

US20080279672A1 BATCH EQUIPMENT ROBOTS AND METHODS OF STACK TO ARRAY WORK-PIECE TRANSFER FOR PHOTOVOLTAIC FACTORY 审中-公开
标题翻译：批量设备机器人和堆叠方式进行光伏工厂的工作转移
公开(公告)号：US20080279672A1
公开(公告)日：2008-11-13
申请号：US11747525
申请日：2007-05-11
申请人： ROBERT Z. BACHRACH , Avi Tepman , Alexander S. Polyak
发明人： ROBERT Z. BACHRACH , Avi Tepman , Alexander S. Polyak
IPC分类号： B65G59/00
CPC分类号： B65G65/00 , B65G37/02 , B65G2201/0297 , H01L21/67236 , H01L21/67276 , H01L21/67715 , H01L21/67721 , H01L21/67727 , H01L21/67733 , H01L21/67748 , H01L21/67769
摘要： The present invention generally comprises equipment for an automated high volume batch work-piece manufacturing factory comprising work-piece handling and work-piece processing in a high productivity factory architecture capable of producing 1,000 or more work-piece an hour. The work-pieces may be presented to the equipment from a stacked supply to a parallel array. Additionally, the work-pieces may be transferred between manufacturing architectures by an array to array batch transfer. The work-pieces may be transferred within the manufacturing architecture in a parallel to parallel batch transfer operation. The robotic operations may be between robotic devices, between robotic devices and processing equipment, and within processing equipment.
摘要翻译：本发明通常包括用于自动化大批量批量工件制造工厂的设备，其包括能够每小时生产1,000个或更多个工件的高生产率工厂结构中的工件处理和工件加工。工件可以从堆叠的供应提供给设备到并行阵列。另外，工件可以通过阵列在制造架构之间转移到阵列批量传输。工件可以在并行批量传输操作的同时在制造架构内转移。机器人操作可以在机器人设备之间，机器人设备和处理设备之间以及处理设备内。

7. 发明授权

US06939210B2 Slurry delivery arm 有权
标题翻译：泥浆输送臂
公开(公告)号：US06939210B2
公开(公告)日：2005-09-06
申请号：US10428914
申请日：2003-05-02
申请人： Alexander S. Polyak , Avi Tepman
发明人： Alexander S. Polyak , Avi Tepman
IPC分类号： B24B37/04 , B24B57/02 , B24B9/00
CPC分类号： B24B37/04 , B24B37/042 , B24B57/02
摘要： A polishing fluid delivery apparatus has been provided that in one embodiment includes a support member, a dispense arm, a polishing fluid delivery tube and a variable restricting device. The dispense arm extends from an upper portion of the support member and has an outlet of the delivery tube coupled thereto. The restricting device interfaces with the delivery tube and is adapted to provide a variable restriction to flow passing through the delivery tube. In another embodiment, the restricting device is a pinch valve and the tube in continuous from the outlet to beyond a portion that interfaces with the pinch valve. In yet another embodiment, the position of the delivery arm is controllable.
摘要翻译：已经提供了一种抛光流体输送装置，其在一个实施例中包括支撑构件，分配臂，抛光流体输送管和可变限制装置。分配臂从支撑构件的上部延伸并且具有与其连接的输送管的出口。限制装置与输送管接口并且适于对通过输送管的流动提供可变的限制。在另一个实施例中，限制装置是夹管阀，并且管从出口连续到超过与夹紧阀相接合的部分。在另一个实施例中，输送臂的位置是可控的。

8. 发明申请

US20110164955A1 PROCESSING CHAMBER WITH TRANSLATING WEAR PLATE FOR LIFT PIN 审中-公开
标题翻译：加工室用翻转式打码机
公开(公告)号：US20110164955A1
公开(公告)日：2011-07-07
申请号：US12835511
申请日：2010-07-13
申请人： John M. White , Jeonghoon Oh , Tom K. Cho , Silja James , Uday Pai , Oscar Lopez , Alexander S. Polyak
发明人： John M. White , Jeonghoon Oh , Tom K. Cho , Silja James , Uday Pai , Oscar Lopez , Alexander S. Polyak
IPC分类号： H01L21/683 , F16M11/00
CPC分类号： H01L21/68742
摘要： Embodiments of a method and apparatus for processing large area substrates including a translational wear plate and/or bushing assembly are provided for reducing the stress on a lift pin used to space substrates from a substrate support in a processing or other type of chamber. In another embodiment, an apparatus for processing substrates includes processing chamber comprising a substrate support disposed in a chamber body. A bushing assembly is disposed in the substrate support. A lift pin is disposed through the bushing assembly. A wear plate is provided that is coupled to the chamber body and aligned with the lift pin. The wear plate is movable laterally relative to a centerline of the chamber body to accommodate lateral motion of the lift pin when contacting the wear plate.
摘要翻译：提供了用于处理包括平移耐磨板和/或衬套组件的大面积衬底的方法和装置的实施例，用于减小用于将衬底从处理或其它类型的室中的衬底支撑件定位的升降销上的应力。在另一个实施例中，一种用于处理衬底的设备包括处理室，其包括设置在室主体中的衬底支撑件。衬套组件设置在衬底支撑件中。提升销设置穿过套管组件。提供了耐磨板，其连接到腔室主体并与提升销对准。耐磨板相对于室主体的中心线横向运动，以在接触耐磨板时适应提升销的横向运动。

9. 发明申请

US20080279658A1 BATCH EQUIPMENT ROBOTS AND METHODS WITHIN EQUIPMENT WORK-PIECE TRANSFER FOR PHOTOVOLTAIC FACTORY 审中-公开
标题翻译：装配设备的工艺和方法在设备工作中转让光伏工厂
公开(公告)号：US20080279658A1
公开(公告)日：2008-11-13
申请号：US11747372
申请日：2007-05-11
申请人： Robert Z. Bachrach , Avi Tepman , Alexander S. Polyak
发明人： Robert Z. Bachrach , Avi Tepman , Alexander S. Polyak
IPC分类号： B65H1/00
CPC分类号： B25J15/0052 , B25J15/0226 , H01L21/67236 , H01L21/67276 , H01L21/67715 , H01L21/67721 , H01L21/67733 , H01L21/67736 , H01L21/67742 , H01L21/67748
摘要： The present invention generally comprises equipment for an automated high volume batch work-piece manufacturing factory comprising work-piece handling and work-piece processing in a high productivity factory architecture capable of producing 1,000 or more work-piece an hour. The work-pieces may be presented to the equipment from a stacked supply to a parallel array. Additionally, the work-pieces may be transferred between manufacturing architectures by an array to array batch transfer. The work-pieces may be transferred within the manufacturing architecture in a parallel to parallel batch transfer operation. The robotic operations may be between robotic devices, between robotic devices and processing equipment, and within processing equipment.
摘要翻译：本发明通常包括用于自动化大批量批量工件制造工厂的设备，其包括能够每小时生产1,000个或更多个工件的高生产率工厂结构中的工件处理和工件加工。工件可以从堆叠的供应提供给设备到并行阵列。另外，工件可以通过阵列在制造架构之间转移到阵列批量传输。工件可以在并行批量传输操作的同时在制造架构内转移。机器人操作可以在机器人设备之间，机器人设备和处理设备之间以及处理设备内。

10. 发明申请

US20110033620A1 COMPOUND LIFT PIN TIP WITH TEMPERATURE COMPENSATED ATTACHMENT FEATURE 审中-公开
标题翻译：具有温度补偿附件功能的复合提升针尖
公开(公告)号：US20110033620A1
公开(公告)日：2011-02-10
申请号：US12848782
申请日：2010-08-02
申请人： Alexander S. Polyak , Tom K. Cho , Oscar Gomez
发明人： Alexander S. Polyak , Tom K. Cho , Oscar Gomez
IPC分类号： C23C16/458 , C23C16/00
CPC分类号： C23C16/4586 , H01L21/68742
摘要： A method and apparatus for a lift pin is described. In one embodiment, a lift pin head is described. The lift pin head includes a base member having a body made of a first material having a first coefficient of thermal expansion, and a tip disposed on the base member, the base member having a body made of a second material that is flexible at room temperature and having a second coefficient of thermal expansion, the first coefficient of thermal expansion being less than the second coefficient of thermal expansion.
摘要翻译：描述了用于升降销的方法和装置。在一个实施例中，描述了提升销头。提升销头包括具有由具有第一热膨胀系数的第一材料制成的主体的基座构件和设置在基座构件上的尖端，所述基座构件具有由在室温下是柔性的第二材料制成的主体并且具有第二热膨胀系数，所述第一热膨胀系数小于所述第二热膨胀系数。

你已经成功收藏专利！

检索式保存成功!

IPRDB

热门服务

关于我们

友情链接

联系方式