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    • 6. 发明授权
    • Getter pump and vacuum coating installation comprising a getter pump
    • 吸气泵和吸尘器安装包括吸气泵
    • US08197222B2
    • 2012-06-12
    • US12306956
    • 2007-07-04
    • Falk MildeHans-Christian HechtJoern Brueckner
    • Falk MildeHans-Christian HechtJoern Brueckner
    • F04B37/02
    • C23C14/56F04B37/02
    • A highly efficient getter pump with low maintenance requirements is applied to a vacuum coating installation, allowing a substrate to be coated to remain uncontaminated by a dusting of getter material. The getter pump comprises a pump housing with an exposure opening. The housing has a getter body, of getter material that essentially closes the exposure opening and can move in relation to the exposure opening. An inner sub-section of the surface of the getter body points towards the interior of the pump housing and an outer sub-section points towards the exterior of the pump housing through the exposure opening. The positions of the inner and outer sub-sections are interchangeable by movement of the getter body. The getter pump is equipped with a device for removing getter material from the inner sub-section.
    • 将具有低维护要求的高效吸气泵应用于真空涂布设备,使得可以通过吸气剂材料的除尘来涂覆基材以保持未被污染。 吸气泵包括具有曝光开口的泵壳体。 壳体具有吸气体,吸气剂材料基本上封闭曝光开口并且可以相对于曝光开口移动。 吸气体表面的内部子部分指向泵壳体的内部,并且外部子部分通过曝光开口指向泵壳体的外部。 内部和外部子部分的位置可以通过吸气体的移动而互换。 吸气泵配备有用于从内部子部分去除吸气剂材料的装置。
    • 7. 发明申请
    • GETTER PUMP AND VACUUM COATING INSTALLATION COMPRISING A GETTER PUMP
    • 进水泵和真空包装安装包括一个水泵
    • US20090202362A1
    • 2009-08-13
    • US12306956
    • 2007-07-04
    • Falk MildeHans-Christian HechtJoern Brueckner
    • Falk MildeHans-Christian HechtJoern Brueckner
    • F04B37/08F04B37/02
    • C23C14/56F04B37/02
    • A highly efficient getter pump with low maintenance requirements is applied to a vacuum coating installation, allowing a substrate to be coated to remain uncontaminated by a dusting of getter material. The getter pump comprises a pump housing with an exposure opening. The housing has a getter body, of getter material that essentially closes the exposure opening and can move in relation to the exposure opening. An inner sub-section of the surface of the getter body points towards the interior of the pump housing and an outer sub-section points towards the exterior of the pump housing through the exposure opening. The positions of the inner and outer sub-sections are interchangeable by movement of the getter body. The getter pump is equipped with a device for removing getter material from the inner sub-section.
    • 将具有低维护要求的高效吸气泵应用于真空涂布设备,使得可以通过吸气剂材料的除尘来涂覆基材以保持未被污染。 吸气泵包括具有曝光开口的泵壳体。 壳体具有吸气体,吸气剂材料基本上封闭曝光开口并且可以相对于曝光开口移动。 吸气体表面的内部子部分指向泵壳体的内部,并且外部子部分通过曝光开口指向泵壳体的外部。 内部和外部子部分的位置可以通过吸气体的移动而互换。 吸气泵配备有用于从内部子部分去除吸气剂材料的装置。
    • 9. 发明授权
    • Process for ion-supported vacuum coating
    • 离子支持真空镀膜工艺
    • US5846608A
    • 1998-12-08
    • US722024
    • 1996-10-11
    • Manfred NeumannKlaus GoedickeSiegfried SchillerJonathan ReschkeHenry MorgnerFalk MildeFred Fietzke
    • Manfred NeumannKlaus GoedickeSiegfried SchillerJonathan ReschkeHenry MorgnerFalk MildeFred Fietzke
    • H05H1/32C23C14/32C23C14/56H01J37/32H05H1/46C23C14/08
    • H01J37/32422C23C14/32C23C14/562H01J37/32706
    • A process an device for ion-supported vacuum coating. The process and the affiliated device is intended to permit the high-rate ating of large-surfaced, electrically conductive and electrically insulating substrates with electrically insulating and electrically conductive coatings with relatively low expenditure. The substrates are predominantly band-shaped, in particular plastic sheets with widths of over a meter. According to the invention, in an intrinsically known device for vacuum coating, alternating negative and positive voltage pulses are applied to the electrically conductive substrate or in electrically insulating substrates, to an electrode disposed directly behind them, e.g. the cooling roller, relative to the plasma or to an electrode that is disposed almost at plasma potential. The form, the voltage, and the duration of the pulses are adapted to the coating task and the material. The process is used particularly for depositing abrasion protection, corrosion protection, and barrier coatings. The user is the packaging industry, among others.
    • PCT No.PCT / DE95 / 00476 Sec。 371日期:1996年10月11日 102(e)日期1996年10月11日PCT提交1995年4月7日PCT公布。 公开号WO95 / 28508 日期:1995年10月26日一种用于离子支持真空涂层的装置。 该方法和附属装置旨在允许具有相对较低支出的具有电绝缘和导电涂层的大表面,导电和电绝缘基板的高速涂布。 基底主要是带状,特别是宽度超过一米的塑料片。 根据本发明,在本来已知的用于真空涂覆的装置中,将交替的负电压和正电压脉冲施加到导电衬底或电绝缘衬底,直接设置在其后面的电极,例如, 冷却辊相对于等离子体或几乎处于等离子体电位的电极。 脉冲的形式,电压和持续时间适用于涂层任务和材料。 该方法特别用于沉积磨损保护,防腐蚀和阻隔涂层。 用户是包装行业等。
    • 10. 发明授权
    • Annealable layer system
    • 可再生层系统
    • US08367226B2
    • 2013-02-05
    • US12842497
    • 2010-07-23
    • Joerg FiukowskiMatthias ListHans-Christian HechtFalk Milde
    • Joerg FiukowskiMatthias ListHans-Christian HechtFalk Milde
    • B32B15/04
    • C03C17/36C03C17/3618C03C17/3626C03C17/3644C03C17/366C03C17/3681C03C17/3694C23C14/027C23C14/08C23C14/352Y10T428/31504Y10T428/31663
    • A layer system that can be annealed comprises a transparent substrate, preferably a glass substrate, and a first layer sequence which is applied directly to the substrate or to one or more bottom layers that are deposited onto the substrate. The layer sequence includes a substrate-proximal blocking layer, a selective layer and a substrate-distal blocking layer. Also provided is a method for producing a layer system that can be annealed and has a sufficient quality even under critical climatic conditions and/or undefined conditions of the substrate. During the heat treatment (annealing, bending), the color location of the layer system is maintained substantially stable and the color location can be widely varied at a low emissivity of the layer system. For this purpose, a first dielectric intermediate layer is interposed between the substrate-proximal blocking layer and the selective layer and is configured as a substoichiometric gradient layer.
    • 可退火的层系统包括透明衬底,优选玻璃衬底,以及直接施加到衬底或沉积到衬底上的一个或多个底层的第一层序列。 层序列包括基底近端阻挡层,选择层和底物远侧阻断层。 还提供了即使在临界气候条件和/或基板的未定义条件下也可以进行退火并具有足够质量的层系统的制造方法。 在热处理(退火,弯曲)期间,层系统的颜色位置保持基本稳定,并且颜色位置可以在层系统的低发射率下广泛变化。 为此,第一电介质中间层介于基底近端阻挡层和选择层之间,并被构造为亚化学计量梯度层。