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1. 发明授权

US09117637B2 Redundant anode sputtering method and assembly 有权
标题翻译：冗余阳极溅射法和组装
公开(公告)号：US09117637B2
公开(公告)日：2015-08-25
申请号：US12092279
申请日：2006-11-06
申请人： Goetz Teschner , Falk Milde , Enno Mirring , Frank Meissner , Goetz Grosser
发明人： Goetz Teschner , Falk Milde , Enno Mirring , Frank Meissner , Goetz Grosser
IPC分类号： H01J37/34 , H01J37/32 , C23C14/35 , C23C14/56
CPC分类号： H01J37/3444 , C23C14/354 , C23C14/564 , H01J37/32532 , H01J37/3405 , H01J37/3408 , H01J37/3438
摘要： A method is provided for coating a substrate with the aid of a magnetron cathode and two electrodes which are alternately impinged upon by a positive potential and a negative potential. Also disclosed is an assembly for coating a substrate, comprising a vacuum chamber, a magnetron cathode, two electrodes, and a voltage source. A negative potential is generated at a level that is no greater than the level of the cathode potential, thus preventing the electrode that is to be cleaned from being stripped to a greater extent than the same was coated in the previous half-wave. The magnetron cathode and the electrodes are connected to the voltage source via switching elements without being galvanically such that a negative and a positive voltage generated from the voltage source can be alternatively applied to the electrodes, the level of said voltage being no greater than the cathode voltage.
摘要翻译：提供了一种借助于磁控管阴极和两个被正电位和负电位交替冲击的电极涂覆衬底的方法。还公开了一种用于涂覆基板的组件，包括真空室，磁控管阴极，两个电极和电压源。在不大于阴极电位的水平的水平下产生负电位，因此防止被清洗的电极被剥离的程度大于在前一半波中涂覆的电极的程度。磁控管阴极和电极通过开关元件而不是电流地连接到电压源，使得从电压源产生的负电压和正电压可以替代地施加到电极，所述电压的电平不大于阴极电压。

2. 发明申请

US20080308410A1 Redundant Anode Sputtering Method and Assembly 有权
标题翻译：冗余阳极溅射方法和装配
公开(公告)号：US20080308410A1
公开(公告)日：2008-12-18
申请号：US12092279
申请日：2006-11-06
申请人： Goetz Teschner , Falk Milde , Enno Mirring , Frank Meissner , Goetz Grosser
发明人： Goetz Teschner , Falk Milde , Enno Mirring , Frank Meissner , Goetz Grosser
IPC分类号： C23C14/00
CPC分类号： H01J37/3444 , C23C14/354 , C23C14/564 , H01J37/32532 , H01J37/3405 , H01J37/3408 , H01J37/3438
摘要： A method is provided for coating a substrate with the aid of a magnetron cathode and two electrodes which are alternately impinged upon by a positive potential and a negative potential. Also disclosed is an assembly for coating a substrate, comprising a vacuum chamber, a magnetron cathode, two electrodes, and a voltage source. A negative potential is generated at a level that is no greater than the level of the cathode potential, thus preventing the electrode that is to be cleaned from being stripped to a greater extent than the same was coated in the previous half-wave. The magnetron cathode and the electrodes are connected to the voltage source via switching elements without being galvanically such that a negative and a positive voltage generated from the voltage source can be alternatively applied to the electrodes, the level of said voltage being no greater than the cathode voltage.
摘要翻译：提供了一种借助于磁控管阴极和两个被正电位和负电位交替冲击的电极涂覆衬底的方法。还公开了一种用于涂覆基板的组件，包括真空室，磁控管阴极，两个电极和电压源。在不大于阴极电位的水平的水平下产生负电位，因此防止被清洗的电极被剥离的程度大于在前一半波中涂覆的电极的程度。磁控管阴极和电极通过开关元件而不是电流地连接到电压源，使得从电压源产生的负电压和正电压可以替代地施加到电极，所述电压的电平不大于阴极电压。

3. 发明申请

US20100230275A1 METHOD AND ARRANGEMENT FOR REDUNDANT ANODE SPUTTERING HAVING A DUAL ANODE ARRANGEMENT 有权
标题翻译：具有双重阳极布置的冗余阳极溅射的方法和布置
公开(公告)号：US20100230275A1
公开(公告)日：2010-09-16
申请号：US12679736
申请日：2008-09-25
申请人： Goetz Teschner , Enno Mirring , Johannes Struempfel , Andreas Heisig
发明人： Goetz Teschner , Enno Mirring , Johannes Struempfel , Andreas Heisig
IPC分类号： C23F1/00 , C23F1/08
CPC分类号： H01J37/34 , C23C14/3407 , C23C14/564 , H01J37/3438 , H01J37/3444
摘要： In a method in which two anodes are operated alternately opposite each other as plasma discharge anodes and as cathodes for self-cleaning, and the cathodes of the plasma discharge are recurrently briefly reversed in polarity, and an arrangement comprising a cathode and a first and a second anode supplied with voltage by an H-bridge circuit, pole reversal of cathode voltage is effected by a pulse current supply, at least one anode is maintained at positive potential at all times and the other anode intermittently at negative potential during an etching time, and the H-bridge circuit is operationally connected to the pulse current supply, such that at least one anode is at positive potential at all times.
摘要翻译：在其中两个阳极彼此交替地相互作用的方法作为等离子体放电阳极和用于自清洁的阴极并且等离子体放电的阴极在极性上反复短暂地反转的方法中，并且包括阴极和第一和第二阴极通过H桥电路提供电压的第二阳极，通过脉冲电流供应来实现阴极电压的极反转，在蚀刻时间期间，至少一个阳极总是保持在正电位，另一个阳极间断地处于负电位，并且H桥电路可操作地连接到脉冲电流源，使得至少一个阳极始终处于正电位。

4. 发明授权

US08980072B2 Method and arrangement for redundant anode sputtering having a dual anode arrangement 有权
标题翻译：具有双重阳极布置的冗余阳极溅射的方法和装置
公开(公告)号：US08980072B2
公开(公告)日：2015-03-17
申请号：US12679736
申请日：2008-09-25
申请人： Goetz Teschner , Enno Mirring , Johannes Struempfel , Andreas Heisig
发明人： Goetz Teschner , Enno Mirring , Johannes Struempfel , Andreas Heisig
IPC分类号： C23C14/00 , H01J37/34 , C23C14/34 , C23C14/56
CPC分类号： H01J37/34 , C23C14/3407 , C23C14/564 , H01J37/3438 , H01J37/3444
摘要： In a method in which two anodes are operated alternately opposite each other as plasma discharge anodes and as cathodes for self-cleaning, and the cathodes of the plasma discharge are recurrently briefly reversed in polarity, and an arrangement comprising a cathode and a first and a second anode supplied with voltage by an H-bridge circuit, pole reversal of cathode voltage is effected by a pulse current supply, at least one anode is maintained at positive potential at all times and the other anode intermittently at negative potential during an etching time, and the H-bridge circuit is operationally connected to the pulse current supply, such that at least one anode is at positive potential at all times.
摘要翻译：在其中两个阳极彼此交替地相互作用的方法作为等离子体放电阳极和用于自清洁的阴极并且等离子体放电的阴极在极性上反复短暂地反转的方法中，并且包括阴极和第一和第二阴极通过H桥电路提供电压的第二阳极，通过脉冲电流供应来实现阴极电压的极反转，在蚀刻时间期间，至少一个阳极总是保持在正电位，另一个阳极间断地处于负电位，并且H桥电路可操作地连接到脉冲电流源，使得至少一个阳极始终处于正电位。

5. 发明授权

US5286360A Apparatus for coating a substrate, especially with electrically nonconductive coatings 失效
标题翻译：用于涂覆基材，特别是具有非导电涂层的装置
公开(公告)号：US5286360A
公开(公告)日：1994-02-15
申请号：US909591
申请日：1992-07-07
申请人： Joachim Szczyrbowski , Goetz Teschner , Siegfried Beisswenger
发明人： Joachim Szczyrbowski , Goetz Teschner , Siegfried Beisswenger
IPC分类号： C23C14/00 , C23C14/35 , C23C14/44 , C23C14/54 , H01J37/34 , C23C14/34
CPC分类号： H01J37/34 , C23C14/0036 , C23C14/35 , H01J2237/0206
摘要： In a method and an apparatus for coating a substrate (26) with electrically nonconductive coatings from an electrically conductive target (25) in a reactive (e.g., oxidizing) atmosphere, with a cathode (17) disposed in an evacuable coating chamber (16) and electrically cooperating with the target (25), the cathode (17), for the purpose of suppressing arcs, is connected to a DC power source and can be brought to a positive potential for brief time periods by means of an additional circuit (22, and 3 to 15, respectively), the frequency of this periodical polarity reversal being adjustable, depending on the coating to be deposited
摘要翻译：在用于将非导电层从具有反应性（例如，氧化性）气氛中的导电靶（25）涂覆的基底（26）的方法和装置的情况下，涉及阴极（17），其布置在可抽真空的涂敷室（16）并与目标物（25）电气相互作用，阴极（17）被连接，以便将电弧抑制到直流电源（21）并且可以周期性地设定，借助于匹配的附加电路（22和3至15）在短时间内处于正电位，所述周期性极性反转的频率可根据要沉积的层而被设定。

6. 发明申请

US20070193719A1 COOLABLE CARRIER PLATE FOR TARGETS IN VACUUM ATOMIZATION SYSTEMS 审中-公开
标题翻译：真空真空系统中目标的冷却载体板
公开(公告)号：US20070193719A1
公开(公告)日：2007-08-23
申请号：US11676708
申请日：2007-02-20
申请人： Michael Huhn , Carsten Deus , Goetz Teschner , Erwin Zschieschang
发明人： Michael Huhn , Carsten Deus , Goetz Teschner , Erwin Zschieschang
IPC分类号： F28F3/14 , H05K7/20
CPC分类号： C23C14/3407
摘要： A coolable carrier plate for targets in vacuum atomization systems has a connection surface and at least one fastening support for connecting the carrier plate to a component provided for this purpose, at least one sealant for sealing the connection surface, at least one cavity for conveying a coolant with a coolant inlet and a coolant outlet, and a supporting surface for supporting a target. The cavity is formed by a coolant channel or network of coolant channels that runs inside the carrier plate.
摘要翻译：用于真空雾化系统中靶的可冷却载体板具有连接表面和用于将承载板连接到为此设置的部件的至少一个紧固支撑件，用于密封连接表面的至少一个密封剂，至少一个用于输送具有冷却剂入口和冷却剂出口的冷却剂和用于支撑靶的支撑表面。空腔由在载体板内延伸的冷却剂通道或冷却剂通道网络形成。

7. 发明授权

US5415757A Apparatus for coating a substrate with electrically nonconductive coatings 失效
标题翻译：用于非导电涂层涂覆基材的设备
公开(公告)号：US5415757A
公开(公告)日：1995-05-16
申请号：US161053
申请日：1993-12-01
申请人： Joachim Szcyrbowski , Goetz Teschner , Guenter Braeuer
发明人： Joachim Szcyrbowski , Goetz Teschner , Guenter Braeuer
IPC分类号： C23C14/00 , H01J37/34 , C23C14/34
CPC分类号： H01J37/3438 , C23C14/0036 , H01J37/34 , H01J37/3405 , H01J2237/0206
摘要： Method and an apparatus for coating a substrate from electrically conductive targets (3, 4) in a reactive atmosphere, comprising a power source (12, 13, 14) which is connected to cathodes (1, 2) disposed in an evacuable coating chamber (15) and cooperating electrically with the targets (3, 4), two anodes (5, 6) electrically separated from one another and from the sputtering chamber (15) being provided, which lie in a plane between the cathodes (1, 2) and the substrate (7), the two output terminals (12a, 12b) of the secondary winding of a transformer (12) connected, with interposition of a choke coil (14), to a medium frequency generator (13) being connected each to a cathode (1 and 2, respectively) via two supply lines (20, 21) and the two supply lines (20, 21) being connected via a branch line (22) into which a resonant circuit is inserted, and each of the two supply lines (20, 21) being coupled both via a first network (16 and 17, respectively) to the coating chamber and via a corresponding second network (8 and 9, respectively) to the particular anode (5 and 6, respectively).
摘要翻译：一种用于在反应性气氛中从导电靶（3,4）涂覆基底的方法和装置，包括连接到设置在可抽真空涂层室中的阴极（1,2）的电源（12,13,14） 15），并且与靶（3,4）电气配合，设置有彼此电隔离并且位于阴极（1,2）之间的平面中的溅射室（15）的两个阳极（5,6）和基板（7），将连接有扼流线圈（14）的变压器（12）的次级绕组的两个输出端子（12a，12b）连接到中频发生器（13），每个连接到分别经由两根供电线（20,21）和两根供电线（20,21）的阴极（1和2）经由分支线（22）连接，谐振电路插入其中，并且两个电源线供应管线（20,21）经由第一网络（16和17）分别耦合到涂覆室并经由孔将第二网络（分别为8和9）分别放置到特定阳极（分别为5和6）。

8. 发明申请

US20080128276A1 SUPPLY END BLOCK FOR ROTARY MAGNETRON 有权
标题翻译：用于旋转磁铁的供应端块
公开(公告)号：US20080128276A1
公开(公告)日：2008-06-05
申请号：US11873532
申请日：2007-10-17
申请人： Hans-Juergen Heinrich , Goetz Teschner , Thorsten Sander , Cornell Weidelt , Joern Brueckner
发明人： Hans-Juergen Heinrich , Goetz Teschner , Thorsten Sander , Cornell Weidelt , Joern Brueckner
IPC分类号： C23C14/00
CPC分类号： C23C14/3407 , H01J37/34 , H01J37/3435 , H01J37/3497
摘要： A supply end block to supply a sputter cathode with a coolant and electrical voltage, includes a housing with a coolant connection and a current connection as well as a support shaft mounted to rotate, on which a target tube is fastened. The coolant connection and current connection are brought together directly at a feed site so that the coolant is brought to the potential of the applied electric voltage on entering the housing of the end block. Optimal cooling of the current feed is achieved, and optimal potential equalization of the coolant simultaneously occurs.
摘要翻译：供给具有冷却剂和电压的溅射阴极的供应端块包括具有冷却剂连接和电流连接的壳体以及安装成旋转的支撑轴，目标管被紧固在该壳体上。冷却剂连接和电流连接直接在进料位置组合在一起，使得冷却剂在进入端块的壳体时被施加到施加电压的电位。实现电流进料的最佳冷却，同时发生冷却剂的最佳电位均衡。

9. 发明授权

US08828199B2 Supporting device for a magnetron assembly with a rotatable target 有权
标题翻译：用于具有可旋转靶的磁控管组件的支撑装置
公开(公告)号：US08828199B2
公开(公告)日：2014-09-09
申请号：US12956546
申请日：2010-11-30
申请人： Goetz Teschner , Hans-Jürgen Heinrich , Harald Grune , Sven Haehne
发明人： Goetz Teschner , Hans-Jürgen Heinrich , Harald Grune , Sven Haehne
IPC分类号： C23C14/34 , H01J37/34
CPC分类号： C23C14/3407 , H01J37/3405 , H01J37/3435
摘要： A support device for a magnetron arrangement with a rotating target includes a housing with a drive shaft mounted to rotate in the housing. An end of the drive shaft accessible from outside of the housing connects to the rotating target and another end lies within the housing for introduction of a torque. An electric motor with a stator and a rotor is arranged within the housing to generate a torque.
摘要翻译：用于具有旋转靶的磁控管装置的支撑装置包括具有安装成在壳体中旋转的驱动轴的壳体。从壳体外部接近的驱动轴的端部连接到旋转靶，另一端位于壳体内以引入扭矩。具有定子和转子的电动机布置在壳体内以产生转矩。

10. 发明授权

US08337681B2 Endblock for a magnetron device with a rotatable target 失效
标题翻译：具有可旋转靶的磁控管装置的端块
公开(公告)号：US08337681B2
公开(公告)日：2012-12-25
申请号：US12621144
申请日：2009-11-18
申请人： Hans-Juergen Heinrich , Ulf Seyfert , Goetz Teschner
发明人： Hans-Juergen Heinrich , Ulf Seyfert , Goetz Teschner
IPC分类号： C23C14/34
CPC分类号： H01J37/3405 , H01J37/3435 , H01J37/3444
摘要： To achieve an improved end block, in which heating by induction eddy currents, which may occur during AC sputtering, for example, is significantly reduced relative to known end blocks, an end block for a magnetron configuration having a rotating target comprises an end block housing having an attachment surface for attaching the end block on a support apparatus, a pivot bearing for rotatable mounting of the rotating target, and at least one current conduction apparatus which conducts current through the end block housing in operation of the end block. The end block housing is implemented so that each current path in the end block housing which encloses the current conduction apparatus has an interruption at least one point.
摘要翻译：为了实现改进的端块，其中例如在AC溅射期间可能发生的通过感应涡流的加热相对于已知的端块显着降低，具有旋转靶的磁控管构造的端块包括端块壳体具有用于将端块安装在支撑装置上的附接表面，用于旋转靶的可旋转安装的枢转轴承，以及至少一个导流装置，其在端块的操作中通过端块壳体传导电流。端块壳体被实现为使得包封电流传导装置的端块壳体中的每个电流路径具有至少一个点的中断。

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