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1. 发明授权

US5540824A Plasma reactor with multi-section RF coil and isolated conducting lid 失效
标题翻译：具有多段RF线圈和隔离导电盖的等离子体反应器
公开(公告)号：US5540824A
公开(公告)日：1996-07-30
申请号：US277531
申请日：1994-07-18
申请人： Gerald Z. Yin , Hiroji Hanawa , Diana X. Ma , Donald Olgado
发明人： Gerald Z. Yin , Hiroji Hanawa , Diana X. Ma , Donald Olgado
IPC分类号： H05H1/46 , C23F4/00 , H01J37/32 , H01L21/203 , H01L21/205 , H01L21/302 , H01L21/3065 , C23F1/00 , C23C14/34 , C23C16/00
CPC分类号： H01J37/32458 , H01J37/321
摘要： Capacitive coupling and RF power dissipation is advantageously reduced in the present invention by employing an RF coil having plural coil sections, each coil section connected across an RF source, commonly tapped ones of the coil sections being wound in opposite directions. Capacitive coupling and RF power dissipation is further reduced by employing a top lid having an outer insulating annulus and an inner conducting disk portion, the conducting disk portion being displaced or spaced apart from the coil by the width of the annulus. This displacement significantly reduces the RF power dissipation or coupling from the top winding of the coil to the lid. Furthermore, the plural coil sections or mirror coil configuration reduces sputtering of insulative material induced by capacitive RF coupling.
摘要翻译：通过采用具有多个线圈部分的RF线圈，每个线圈部分连接在RF源上，通常在线圈部分中的一些线圈部分沿相反的方向缠绕，从而有利地减少了电容耦合和RF功率消耗。通过采用具有外绝缘环和内导电盘部分的顶盖进一步减小电容耦合和RF功率耗散，导电盘部分与线圈移位或间隔开环形宽度。这种位移显着降低了RF功率消耗或从线圈的顶部绕组到盖子的耦合。此外，多个线圈部分或镜面线圈构造减少了由电容RF耦合引起的绝缘材料的溅射。

2. 发明授权

US5817534A RF plasma reactor with cleaning electrode for cleaning during processing of semiconductor wafers 失效
标题翻译： RF等离子体反应器，其具有用于在半导体晶片的处理期间进行清洁的清洁电极
公开(公告)号：US5817534A
公开(公告)日：1998-10-06
申请号：US567376
申请日：1995-12-04
申请人： Yan Ye , Hiroji Hanawa , Diana Xiaobing Ma , Gerald Zheyao Yin , Peter Loewenhardt , Donald Olgado , James Papanu , Steven S.Y. Mak
发明人： Yan Ye , Hiroji Hanawa , Diana Xiaobing Ma , Gerald Zheyao Yin , Peter Loewenhardt , Donald Olgado , James Papanu , Steven S.Y. Mak
IPC分类号： H05H1/46 , H01J37/32 , H01L21/00 , H01L21/302 , H01L21/304 , H01L21/3065 , H05H1/00
CPC分类号： H01L21/67028 , H01J37/32862 , Y10S438/905
摘要： The invention is carried out in a plasma reactor for processing a semiconductor wafer, the plasma reactor having a chamber for containing a processing gas and having a conductor connected to an RF power source for coupling RF power into the reactor chamber to generate from the processing gas a plasma inside the chamber, the chamber containing at least one surface exposed toward the plasma and susceptible to contamination by particles produced during processing of the wafer, the invention being carried out by promoting, during processing of the wafer, bombarding of particles from the plasma onto the one surface to remove therefrom contaminants deposited during processing of the wafer. Such promoting of bombarding is carried out by providing an RF power supply and coupling, during processing of the wafer, RF power from the supply to the one surface. The coupling may be performed by a capacitive cleaning electrode adjacent the one surface, the capacitive cleaning electrode connected to the RF power supply. The capacitive cleaning electrode preferably is disposed on a side of the one surface opposite the plasma so as to be protected from contact with the plasma. Alternatively, the coupling may be carried out by a direct electrical connection from the RF power supply to the one surface.
摘要翻译：本发明在用于处理半导体晶片的等离子体反应器中进行，等离子体反应器具有用于容纳处理气体的室，并具有连接到RF电源的导体，用于将RF功率耦合到反应器室中以从处理气体产生腔室内的等离子体，该腔室包含至少一个暴露于等离子体的表面并容易受到在晶片加工期间产生的颗粒的污染，本发明通过在晶片加工期间促进从等离子体中轰击颗粒而进行在一个表面上去除在晶片加工期间沉积的污染物。通过在晶片的处理期间提供RF电源和耦合来进行轰击的这种促进是从电源到单个表面的RF功率。耦合可以通过与一个表面相邻的电容清洁电极，电容清洁电极连接到RF电源来进行。电容式清洁电极优选地设置在与等离子体相对的一个表面的一侧，以便被保护而不与等离子体接触。或者，耦合可以通过从RF电源到一个表面的直接电连接来执行。

3. 发明申请

US20130068320A1 PROTECTIVE MATERIAL FOR GAS DELIVERY IN A PROCESSING SYSTEM 审中-公开
标题翻译：用于加工系统中气体输送的保护材料
公开(公告)号：US20130068320A1
公开(公告)日：2013-03-21
申请号：US13525200
申请日：2012-06-15
申请人： Son Nguyen , Donald Olgado
发明人： Son Nguyen , Donald Olgado
IPC分类号： F16L53/00
CPC分类号： F16L53/00 , C23C16/4404 , C23C16/4481 , C23C16/45502 , C23C16/45565 , C30B25/14 , C30B29/403 , Y10T137/6416
摘要： Apparatus and systems are disclosed for providing a protective material for a gas-delivery system of a processing system. In an embodiment, a processing system includes a processing chamber for processing substrates and a gas-delivery system for delivering processing gases to the processing chamber. The gas-delivery system includes a protective material to protect the gas-delivery system from processing gases including at least one processing gas heated to an elevated temperature. The protective material includes a tungsten plate or a tungsten plate coated with a tantalum alloy and tantalum
摘要翻译：公开了用于为处理系统的气体输送系统提供保护材料的装置和系统。在一个实施例中，处理系统包括用于处理基板的处理室和用于将处理气体输送到处理室的气体输送系统。气体输送系统包括保护气体输送系统免受处理气体（包括加热到高温的至少一种处理气体）的保护材料。保护材料包括涂有钽合金和钽的钨板或钨板

4. 发明申请

US20090036033A1 METHODS AND APPARATUS FOR PROCESSING A SUBSTRATE 审中-公开
标题翻译：用于处理基板的方法和装置
公开(公告)号：US20090036033A1
公开(公告)日：2009-02-05
申请号：US12245765
申请日：2008-10-05
申请人： Erik C. Wasinger , Gary C. Ettinger , Sen-Hou Ko , Wei-Yung Hsu , Liang-Yuh Chen , Ho Seon Shin , Donald Olgado
发明人： Erik C. Wasinger , Gary C. Ettinger , Sen-Hou Ko , Wei-Yung Hsu , Liang-Yuh Chen , Ho Seon Shin , Donald Olgado
IPC分类号： B24B1/04 , B24B9/00
CPC分类号： C03C19/00 , B24B1/04 , B24B9/065 , B24B21/004 , H01L21/02021
摘要： A method of cleaning an edge of a substrate is provided. The method comprises tensioning a first polishing film in a frame; contacting the first polishing film against an edge of a substrate; conforming the first polishing film to the edge of the substrate, the edge including an outer edge and at least one bevel; and rotating the substrate while the first polishing film remains in contact with the substrate. Numerous other aspects are provided.
摘要翻译：提供了清洁基板的边缘的方法。该方法包括在框架中张紧第一抛光膜; 使所述第一抛光膜与衬底的边缘接触; 使所述第一抛光膜与所述基板的边缘一致，所述边缘包括外边缘和至少一个斜面; 并且在第一研磨膜与基板保持接触的同时旋转基板。提供了许多其他方面。

5. 发明申请

US20070238393A1 METHODS AND APPARATUS FOR POLISHING AN EDGE OF A SUBSTRATE 审中-公开
标题翻译：用于抛光衬底边缘的方法和装置
公开(公告)号：US20070238393A1
公开(公告)日：2007-10-11
申请号：US11693695
申请日：2007-03-29
申请人： Ho Shin , Gary Ettinger , Donald Olgado , Erik Wasinger , Sen-Hou Ko , Charles Dodds , Yufei Chen , Wei-Yung Hsu
发明人： Ho Shin , Gary Ettinger , Donald Olgado , Erik Wasinger , Sen-Hou Ko , Charles Dodds , Yufei Chen , Wei-Yung Hsu
IPC分类号： B24B51/00 , B24B49/00 , B24B7/30
CPC分类号： B24B9/065 , B24B21/002 , B24B41/067 , B24B49/16 , B24B57/02
摘要： Methods of and systems for polishing an edge of a substrate are provided. The invention includes rotating a substrate against a polishing film so as to remove material from the edge of the substrate; and detecting an amount of one of energy and torque exerted in rotating the substrate against the polishing film. The invention may further include determining an amount of material removed from the edge of the substrate based on the detected energy or torque exerted in rotating the substrate against the polishing film; ascertaining a difference between the determined amount of material removed and a preset polish level; and determining an amount of energy or torque to be exerted in rotating the substrate adapted to attain the preset polish level based on the difference between the determined amount of material removed and the preset polish level. Numerous other aspects are provided.
摘要翻译：提供了抛光衬底边缘的方法和系统。本发明包括将衬底旋转抵靠抛光膜，以便从衬底的边缘去除材料; 并且检测在将衬底旋转抛光膜时施加的能量和扭矩中的一个的量。本发明还可以包括基于在将衬底旋转抛光膜时所检测到的能量或扭矩确定从衬底边缘去除的材料量; 确定确定的去除材料量与预设抛光水平之间的差异; 以及基于所确定的所移除的材料量与所述预设的抛光水平之间的差来确定在旋转所述基板时施加的能量或扭矩的量，所述能量或扭矩适于实现预设的抛光水平。提供了许多其他方面。

6. 发明申请

US20070221256A1 Methods and apparatus for improving edge cleaning of a substrate 审中-公开
标题翻译：改善基材边缘清洁的方法和装置
公开(公告)号：US20070221256A1
公开(公告)日：2007-09-27
申请号：US11389528
申请日：2006-03-24
申请人： Hui Chen , Anne-Douce Coulin , Ho Shin , Donald Olgado
发明人： Hui Chen , Anne-Douce Coulin , Ho Shin , Donald Olgado
IPC分类号： B08B7/00 , B08B3/00
CPC分类号： B08B3/02 , H01L21/67046 , H01L21/67051
摘要： In a first aspect, an apparatus is provided that includes (1) an idler adapted to contact a substrate, to rotate therewith, and to sense rotation of the substrate; and (2) a driving mechanism coupled to the idler and adapted to drive the idler. Numerous other aspects are provided.
摘要翻译：在第一方面中，提供了一种装置，其包括：（1）适于接触衬底以与其一起旋转并且感测衬底的旋转的惰轮; 和（2）联接到惰轮并适于驱动惰轮的驱动机构。提供了许多其他方面。

7. 发明授权

US06935466B2 Lift pin alignment and operation methods and apparatus 失效
标题翻译：提升针对准和操作方法和装置
公开(公告)号：US06935466B2
公开(公告)日：2005-08-30
申请号：US09797459
申请日：2001-03-01
申请人： Dmitry Lubomirsky , Sheshraj Tulshibagwale , Donald Olgado , Avi Tepman
发明人： Dmitry Lubomirsky , Sheshraj Tulshibagwale , Donald Olgado , Avi Tepman
IPC分类号： H01L21/683 , H01L21/687 , H01L21/00
CPC分类号： H01L21/68742 , Y10S414/135
摘要： A lifting mechanism includes a plurality of lift pins which may be driven separately and independently upward to engage an alignment surface of the chamber using ambient atmospheric pressure as the chamber is evacuated by a pump. In the illustrated embodiment, each lift pin includes a piston which is exposed to the internal chamber pressure on one side of the piston, and is exposed to the external ambient pressure on the other side of the piston. As the pump evacuates the chamber, the internal chamber pressure decreases, causing each lift pin piston to drive the associated lift pin upward. Once all the lift pins have securely engaged the alignment surface, the lift pins may be clamped to a linking mechanism to permit a motor to actuate the lift pins during processing operations.
摘要翻译：提升机构包括多个提升销，所述提升销可以单独驱动并且独立地向上驱动，以便当所述室被泵排空时，使用环境大气压与室的对准表面接合。在所示的实施例中，每个提升销包括活塞，该活塞暴露于活塞的一侧上的内部室压力，并且暴露于活塞另一侧的外部环境压力。当泵排空室时，内部室压力降低，导致每个升降销活塞向上驱动相关联的升降销。一旦所有升降销牢固地接合到对准表面上，升降销可以被夹紧到连接机构，以允许马达在加工操作期间致动提升销。

8. 发明授权

US06516815B1 Edge bead removal/spin rinse dry (EBR/SRD) module 失效
标题翻译：边缘珠去除/旋转冲洗干燥（EBR / SRD）模块
公开(公告)号：US06516815B1
公开(公告)日：2003-02-11
申请号：US09350212
申请日：1999-07-09
申请人： Joe Stevens , Donald Olgado , Alex Ko , Yeuk-Fai Edwin Mok
发明人： Joe Stevens , Donald Olgado , Alex Ko , Yeuk-Fai Edwin Mok
IPC分类号： B08B302
CPC分类号： H01L21/6708 , Y10S134/902
摘要： The present invention provides an apparatus for etching a substrate, comprising: a container; a substrate support disposed in the container; a rotation actuator attached to the substrate support; and a fluid delivery assembly disposed in the container to deliver an etchant to a peripheral portion of a substrate disposed on the substrate support. Preferably, the substrate support comprises a vacuum chuck and the fluid delivery assembly comprises one or more nozzles. The invention also provide a method for etching a substrate, comprising: rotating a substrate positioned on a rotatable substrate support; and delivering an etchant to a peripheral portion of the substrate. Preferably, the substrate is rotated at between about 100 rpm and about 1000 rpm, and the etchant is delivered in a direction that is substantially tangent to the peripheral portion of the substrate at an incident angle between about 0 degrees and about 45 degrees from a surface of substrate.
摘要翻译：本发明提供了一种用于蚀刻基板的设备，包括：容器; 设置在所述容器中的基板支撑件; 附接到基板支撑件的旋转致动器; 以及设置在所述容器中以将蚀刻剂输送到设置在所述基板支撑件上的基板的周边部分的流体输送组件。优选地，衬底支撑件包括真空卡盘，并且流体输送组件包括一个或多个喷嘴。本发明还提供了一种用于蚀刻衬底的方法，包括：旋转位于可旋转衬底支架上的衬底; 以及向衬底的周边部分输送蚀刻剂。优选地，基板在约100rpm和约1000rpm之间旋转，并且蚀刻剂沿着与基板的周边部分基本相切的方向以距离表面大约0度至大约45度的入射角度被输送的底物。

9. 发明授权

US06267853B1 Electro-chemical deposition system 失效
标题翻译：电化学沉积系统
公开(公告)号：US06267853B1
公开(公告)日：2001-07-31
申请号：US09350210
申请日：1999-07-09
申请人： Yezdi Dordi , Muhammad Atif Malik , Henan Hao , Timothy H. Franklin , Joe Stevens , Donald Olgado
发明人： Yezdi Dordi , Muhammad Atif Malik , Henan Hao , Timothy H. Franklin , Joe Stevens , Donald Olgado
IPC分类号： C25B1500
CPC分类号： C25D17/001 , C25D7/123 , H01L21/2885 , H05K3/241
摘要： The present invention provides an electro-chemical deposition system that is designed with a flexible architecture that is expandable to accommodate future designs and gap fill requirements and provides satisfactory throughput to meet the demands of other processing systems. The electro-chemical deposition system generally comprises a mainframe having a mainframe wafer transfer robot, a loading station disposed in connection with the mainframe, one or more processing cells disposed in connection with the mainframe, and an electrolyte supply fluidly connected to the one or more electrical processing cells. Preferably, the electro-chemical deposition system includes an edge bead removal/spin-rinse-dry (EBR/SRD) station disposed on the mainframe adjacent the loading station, a rapid thermal anneal chamber attached to the loading station, a seed layer repair station disposed on the mainframe, and a system controller for controlling the electro-chemical deposition process and the components of the electro-chemical deposition system.
摘要翻译：本发明提供了一种电化学沉积系统，其被设计成具有可扩展以适应未来设计和间隙填充要求的柔性结构，并提供令人满意的生产量以满足其它处理系统的需求。电化学沉积系统通常包括具有主机晶片传送机器人的主机，与主机连接设置的加载站，与主机连接设置的一个或多个处理单元，以及流体连接到该主机的一个或多个电加工电池。优选地，电化学沉积系统包括设置在与装载站相邻的主机上的边缘珠去除/旋转干燥（EBR / SRD）站，附接到装载站的快速热退火室，种子层修复站设置在主机上，以及用于控制电化学沉积过程和电化学沉积系统的部件的系统控制器。

10. 发明授权

US08967076B2 Hydrothermal synthesis of active materials and in situ spraying deposition for lithium ion battery 有权
标题翻译：水热合成活性物质和原位喷涂沉积锂离子电池
公开(公告)号：US08967076B2
公开(公告)日：2015-03-03
申请号：US13098924
申请日：2011-05-02
申请人： Lu Yang , Hooman Bolandi , Karl Brown , Victor Pebenito , Donald Olgado
发明人： Lu Yang , Hooman Bolandi , Karl Brown , Victor Pebenito , Donald Olgado
IPC分类号： C23C4/12 , C23C26/02 , H01M4/04 , H01M4/139 , H01M4/62
CPC分类号： C23C4/121 , C23C4/123 , C23C26/02 , H01M4/0419 , H01M4/0421 , H01M4/139 , H01M4/625 , Y02E60/122 , Y02P70/54
摘要： A method and apparatus for forming an electrochemical layer of a lithium ion battery is provided. A precursor mixture in a carrying medium is activated in a reactor chamber by application of energy to synthesize active materials. The activated precursor mixture is then spray deposited on a substrate. A binder and conductive materials may be blended, or sprayed separately, with the nano- or micro-crystals as they deposit on the surface to enhance adhesion and conductivity.
摘要翻译：提供了一种用于形成锂离子电池的电化学层的方法和装置。携带介质中的前体混合物通过施加能量在反应器室中活化以合成活性材料。然后将活化的前体混合物喷雾沉积在基底上。当粘合剂和导电材料沉积在表面上时，粘合剂和导电材料可以与纳米或微晶分别共混或喷涂，以增强粘合性和导电性。

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