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1. 发明申请

US20100123381A1 CATHODE DISCHARGE APPARATUS 有权
标题翻译：阴极放电装置
公开(公告)号：US20100123381A1
公开(公告)日：2010-05-20
申请号：US12411797
申请日：2009-03-26
申请人： FU-CHING TUNG , Tean-Mu Shen , Jung-Chen Ho , Pei-Shan Wu , Chia-Ming Chen , Kuan-Chou Chen , Jung-Chen Chien , Muh-Wang Liang
发明人： FU-CHING TUNG , Tean-Mu Shen , Jung-Chen Ho , Pei-Shan Wu , Chia-Ming Chen , Kuan-Chou Chen , Jung-Chen Chien , Muh-Wang Liang
IPC分类号： H01J17/26
CPC分类号： H01J37/32449 , H01J37/3244
摘要： A cathode discharge device is provided. The cathode discharge apparatus includes an anode, a cathode and plural cathode chambers. The cathode is located inside the anode, where the cathode has plural flow channels and at least one flow channel hole, and the plural flow channels are connected to one another through the flow channel hole. The plural cathode chambers are located inside the cathode, wherein each of the cathode chambers has a chamber outlet and a chamber inlet connected with at least one of the flow channels.
摘要翻译：提供阴极放电装置。阴极放电装置包括阳极，阴极和多个阴极室。阴极位于阳极的内部，其中阴极具有多个流动通道和至少一个流动通道孔，并且多个流动通道通过流动通道孔相互连接。多个阴极室位于阴极内，其中每个阴极室具有腔室出口和与至少一个流动通道连接的室入口。

2. 发明授权

US08198793B2 Cathode discharge apparatus 有权
标题翻译：阴极放电装置
公开(公告)号：US08198793B2
公开(公告)日：2012-06-12
申请号：US12411797
申请日：2009-03-26
申请人： Fu-Ching Tung , Tean-Mu Shen , Jung-Chen Ho , Pei-Shan Wu , Chia-Ming Chen , Kuan-Chou Chen , Jung-Chen Chien , Muh-Wang Liang
发明人： Fu-Ching Tung , Tean-Mu Shen , Jung-Chen Ho , Pei-Shan Wu , Chia-Ming Chen , Kuan-Chou Chen , Jung-Chen Chien , Muh-Wang Liang
IPC分类号： H01J17/26
CPC分类号： H01J37/32449 , H01J37/3244
摘要： A cathode discharge device is provided. The cathode discharge apparatus includes an anode, a cathode and plural cathode chambers. The cathode is located inside the anode, where the cathode has plural flow channels and at least one flow channel hole, and the plural flow channels are connected to one another through the flow channel hole. The plural cathode chambers are located inside the cathode, wherein each of the cathode chambers has a chamber outlet and a chamber inlet connected with at least one of the flow channels.
摘要翻译：提供阴极放电装置。阴极放电装置包括阳极，阴极和多个阴极室。阴极位于阳极的内部，其中阴极具有多个流动通道和至少一个流动通道孔，并且多个流动通道通过流动通道孔相互连接。多个阴极室位于阴极内，其中每个阴极室具有腔室出口和与至少一个流动通道连接的室入口。

3. 发明申请

US20110079963A1 VACUUM APPARATUS OF ROTARY MOTION ENTRY 有权
标题翻译：旋转运动入口的真空装置
公开(公告)号：US20110079963A1
公开(公告)日：2011-04-07
申请号：US12615811
申请日：2009-11-10
申请人： Kuan-Chou Chen , Fu-Ching Tung , Chia-Ming Chen , Pei-Shan Wu , Tean-Mu Shen , Jung-Chen Ho
发明人： Kuan-Chou Chen , Fu-Ching Tung , Chia-Ming Chen , Pei-Shan Wu , Tean-Mu Shen , Jung-Chen Ho
IPC分类号： F16C33/10 , F16J15/32
CPC分类号： F16C33/76 , F16C2300/62 , Y10S277/913
摘要： A vacuum apparatus of rotary motion entry is disclosed, which comprises: a shaft sleeve, disposed on a cavity wall of a vacuum system; a rotary shaft, ensheathed by the shaft sleeve; and a transmission set, connected to the rotary shaft for driving the same; wherein, the rotary shaft is disposed passing through a hole formed on the base of the shaft sleeve while there are a first bearing, a second bearing, a sealing ring and a shaft seal being arranged separately inside the hole. Moreover, the shaft seal has a flake-like lip flange formed extending toward the center of the hole, that is capable of being extended away from the vacuum system by the inserting of the rotary shaft into the hole, and thereby, enabling the lip flange to engage with the rotary shaft tightly by the atmospheric pressure and thus isolating the outside world from the vacuum system.
摘要翻译：公开了一种旋转运动进入的真空装置，其包括：设置在真空系统的空腔壁上的轴套; 旋转轴，由轴套套管; 以及与驱动该旋转轴的旋转轴连接的变速器组; 其特征在于，所述旋转轴设置成穿过形成在所述轴套的基部上的孔，同时在所述孔内分开设置有第一轴承，第二轴承，密封环和轴密封件。此外，轴密封件具有形成为朝向孔中心延伸的片状唇缘凸缘，其能够通过将旋转轴插入孔而远离真空系统延伸，从而使得唇缘凸缘与大气压力紧密地与旋转轴啮合，从而将外界与真空系统隔离开来。

4. 发明授权

US08146923B2 Vacuum apparatus of rotary motion entry 有权
标题翻译：旋转运动进入真空装置
公开(公告)号：US08146923B2
公开(公告)日：2012-04-03
申请号：US12615811
申请日：2009-11-10
申请人： Kuan-Chou Chen , Fu-Ching Tung , Chia-Ming Chen , Pei-Shan Wu , Tean-Mu Shen , Jung-Chen Ho
发明人： Kuan-Chou Chen , Fu-Ching Tung , Chia-Ming Chen , Pei-Shan Wu , Tean-Mu Shen , Jung-Chen Ho
IPC分类号： F16J15/54
CPC分类号： F16C33/76 , F16C2300/62 , Y10S277/913
摘要： A vacuum apparatus of rotary motion entry is disclosed, which comprises: a shaft sleeve, disposed on a cavity wall of a vacuum system; a rotary shaft, ensheathed by the shaft sleeve; and a transmission set, connected to the rotary shaft for driving the same; wherein, the rotary shaft is disposed passing through a hole formed on the base of the shaft sleeve while there are a first bearing, a second bearing, a sealing ring and a shaft seal being arranged separately inside the hole. Moreover, the shaft seal has a flake-like lip flange formed extending toward the center of the hole, that is capable of being extended away from the vacuum system by the inserting of the rotary shaft into the hole, and thereby, enabling the lip flange to engage with the rotary shaft tightly by the atmospheric pressure and thus isolating the outside world from the vacuum system.
摘要翻译：公开了一种旋转运动进入的真空装置，其包括：设置在真空系统的空腔壁上的轴套; 旋转轴，由轴套套管; 以及与驱动该旋转轴的旋转轴连接的变速器组; 其特征在于，所述旋转轴设置成穿过形成在所述轴套的基部上的孔，同时在所述孔内分开设置有第一轴承，第二轴承，密封环和轴密封件。此外，轴密封件具有形成为朝向孔中心延伸的片状唇缘凸缘，其能够通过将旋转轴插入孔而远离真空系统延伸，从而使得唇缘凸缘与大气压力紧密地与旋转轴啮合，从而将外界与真空系统隔离开来。

5. 发明申请

US20120240855A1 TRANSMISSION MECHANISM AND THE DEPOSITION APPARATUS USING THE SAME 审中-公开
标题翻译：传输机制和使用它的沉积装置
公开(公告)号：US20120240855A1
公开(公告)日：2012-09-27
申请号：US13177006
申请日：2011-07-06
申请人： Chen-Chung Du , Ming-Tung Chiang , Muh-Wang Liang , Kuan-Chou Chen , Tean-Mu Shen , Jung-Chen Ho
发明人： Chen-Chung Du , Ming-Tung Chiang , Muh-Wang Liang , Kuan-Chou Chen , Tean-Mu Shen , Jung-Chen Ho
IPC分类号： C23C16/50 , F16H57/00
CPC分类号： C23C14/564 , C23C14/568 , C23C16/4401 , C23C16/54 , Y10T74/19642
摘要： The deposition apparatus has a plurality of said transmission mechanisms arranged therein in a symmetrical manner. Each transmission mechanism comprises: a drive shaft, formed with a tapered end; a driving wheel, configured with a shaft hole for the tapered end to bore coaxially therethrough; a plurality of slide pieces, radially mounted to the driving wheel; a first elastic member, mounted enabling the plural slide pieces to be ensheathed thereby; a second elastic member, disposed between the first elastic member and the first axial end of the drive shaft while being mounted to the periphery of the driving wheel; an enclosure, configured with an opening; wherein, the driving wheel that is moving in a reciprocating manner drives the sliding pieces to slide in radial directions, thereby, causing the outer diameter of the first elastic member to change accordingly and enabling the opening of the enclosure to open or close in consequence.
摘要翻译：沉积装置具有以对称的方式布置在其中的多个所述传动机构。每个传动机构包括：形成有锥形端的驱动轴; 驱动轮，其构造有用于锥形端轴同轴地穿过其中的轴孔; 多个滑动件，径向安装在驱动轮上; 第一弹性构件，其安装成使得能够使多个滑动件嵌套; 第二弹性构件，其安装在所述第一弹性构件和所述驱动轴的所述第一轴向端之间，同时安装到所述驱动轮的周边; 一个配有开口的外壳; 其中，以往复方式移动的驱动轮驱动滑动件在径向方向上滑动，从而使第一弹性构件的外径相应地变化，从而能够打开或关闭外壳。

6. 发明授权

US06997664B1 Apparatus for loading/unloading wafers to and from semiconductor fabrication equipment 有权
标题翻译：用于从半导体制造设备加载/卸载晶片的装置
公开(公告)号：US06997664B1
公开(公告)日：2006-02-14
申请号：US09619388
申请日：2000-07-19
申请人： Muh-Wang Liang , Chun-Kai Huang , Jiann-Cherng Chen , Tzong-Ming Wu , Ping-Yu Hu , Kuan-Chou Chen
发明人： Muh-Wang Liang , Chun-Kai Huang , Jiann-Cherng Chen , Tzong-Ming Wu , Ping-Yu Hu , Kuan-Chou Chen
IPC分类号： B65G49/07
CPC分类号： H01L21/67775 , Y10S414/14
摘要： The present invention proposes an apparatus for loading and unloading wafers to and from the semiconductor fabrication equipment. The present invention uses two U-shaped port plate supporters of high rigidity to respectively join with drive devices such as lead screws, shaft bearings, and a lead device, and then join with components such as a port plate, a port door, and a base. The assembly is driven by a motor via timing pulleys, timing belts, idle wheels, a pair of lead screws, shaft bearings, and a lead device. An encoder is matched for feedback control. Thereby, accurate positioning of the main mechanism of the wafer pod responsible for upward and downward movement can be achieved so as to increase the accuracy and reliability of positioning transfer of wafers. Secondarily, the contamination of particles resulted from the motion of the main mechanism can be reduced by using an intake filtering system. Because the present invention adopts a modular design, the drive source of each unit is isolated and the circuit of each unit is hidden so that the whole structure is most compact and the assembling/disassembling and maintenance are easier.
摘要翻译：本发明提出了一种用于将晶片装载和从半导体制造设备卸载的装置。本发明使用两个具有高刚度的U形端口板支撑件分别与诸如导螺杆，轴轴承和引线装置的驱动装置接合，然后与诸如端口板，端口门和基础。组件由电机通过定时滑轮，同步皮带，惰轮，一对导螺杆，轴轴承和引导装置驱动。编码器匹配反馈控制。因此，可以实现负责向上和向下移动的晶片盒的主机构的精确定位，从而提高晶片定位传送的准确性和可靠性。其次，通过使用进气过滤系统可以减少由主机构的运动引起的颗粒污染。因为本发明采用模块化设计，每个单元的驱动源是隔离的，每个单元的电路都是隐藏的，使得整个结构最紧凑，组装/拆卸和维护更容易。

7. 发明授权

US06669185B2 Wafer loading system positioning method and device 有权
公开(公告)号：US06669185B2
公开(公告)日：2003-12-30
申请号：US09736664
申请日：2000-12-08
申请人： Wu-Lang Lin , Kuan-Chou Chen , Ping-Yu Hu , Muh-Wang Liang , Kuei-Jung Chen , Tzong-Ming Wu
发明人： Wu-Lang Lin , Kuan-Chou Chen , Ping-Yu Hu , Muh-Wang Liang , Kuei-Jung Chen , Tzong-Ming Wu
IPC分类号： B65G6534
CPC分类号： H01L21/67775 , Y10S269/903 , Y10S414/137
摘要： A wafer loading system positioning method and device, comprising a loading system, having a base and a rear plate for docking on a positioning frame of a production equipment. The main characteristic thereof is that the loading system in an upper part of the rear plate has a holding seat and the positioning frame in an upper part of a front side has an upward extending positioning element. Two eccentric cams on the holding seat and the positioning element allow to adjust a relative position of the holding seat with respect to the positioning element. A lifting mechanism enables raising of the loading system for lifting said holding seat above said positioning element, so as to enable said holding seat to engage with said positioning element.

8. 发明申请

US20110132758A1 STRUCTURE FOR INCREASING UTILIZATION RATE OF TARGET 审中-公开
标题翻译：增加目标利用率的结构
公开(公告)号：US20110132758A1
公开(公告)日：2011-06-09
申请号：US12717667
申请日：2010-03-04
申请人： Kang-Feng Lee , Kuan-Chou Chen , Muh-Wang Liang , Chian-Fu Huang
发明人： Kang-Feng Lee , Kuan-Chou Chen , Muh-Wang Liang , Chian-Fu Huang
IPC分类号： C23C14/35
CPC分类号： C23C14/35 , H01J37/3408 , H01J37/3455
摘要： A structure for increasing utilization rate of target is disclosed, which comprises: a magnetic base, capable of moving relative to a target in a reciprocating manner; and two magnetic conductors, disposed respectively at two motion limits with respect to the reciprocating range of the magnetic base. Thereby, when the magnetic base is moved to a position close to any one of magnetic conductors, the surface magnetic field intensity of the target that is caused by the magnetic base is reduced so that the ion bombardment happening at the two ends of the target will be eased off for increasing the utilization rate of the target.
摘要翻译：公开了一种用于提高目标的利用率的结构，其包括：能够以往复方式相对于目标移动的磁性基座; 和两个磁性导体，分别设置在相对于磁性基座的往复运动范围的两个运动极限。因此，当磁性体移动到靠近任何一个磁性导体的位置时，由磁性基底引起的靶的表面磁场强度降低，使得在靶的两端发生的离子轰击缓解目标的利用率。

9. 发明授权

US07927425B2 Power-delivery mechanism and apparatus of plasma-enhanced chemical vapor deposition using the same 有权
标题翻译：使用该等离子体增强化学气相沉积的动力输送机构和装置
公开(公告)号：US07927425B2
公开(公告)日：2011-04-19
申请号：US11847316
申请日：2007-08-29
申请人： Yuan-Yuan Chiang , Kuan-Chou Chen , Fu-Ching Tung
发明人： Yuan-Yuan Chiang , Kuan-Chou Chen , Fu-Ching Tung
IPC分类号： C23C16/00 , C23C16/458 , C23C16/509 , H01L21/3065
CPC分类号： H01L21/6719 , H01J37/32431 , H01J37/32568 , H01L21/67748 , H01L21/68792
摘要： A power-delivery mechanism is provided in the present invention, which utilizes an element with airtight and flexible characteristics coupled to a power-generating unit so as to generate a motion in a specific direction. Besides, an apparatus of plasma -enhanced chemical vapor deposition (PECVD) is also provided in the present invention, which comprises the power-delivery mechanism to load/unload a workpiece onto a stage for processing automatically. Meanwhile, the present invention also provides a height-adjusting unit and a position-indicating unit allowing the operator to adjust the distance between an upper electrode and a lower electrode of the PECVD so that the operator is capable of monitoring and adjusting the distance easily between the upper electrode and the lower electrode outside the chamber of the PECVD.
摘要翻译：在本发明中提供了一种动力输送机构，其利用与发电单元相耦合的气密和柔性特征的元件，以便产生沿特定方向的运动。此外，在本发明中还提供了等离子体化学气相沉积（PECVD）装置，其包括将工件装载/卸载到工作台上以自动处理的动力输送机构。同时，本发明还提供了一种高度调节单元和位置指示单元，其允许操作者调节PECVD的上电极和下电极之间的距离，使得操作者能够容易地监测和调整距离 PECVD室的上电极和下电极。

10. 发明申请

US20080295771A1 POWER-DELIVERY MECHANISM AND APPARATUS OF PLASMA-ENHANCED CHEMICAL VAPOR DEPOSITION USING THE SAME 有权
标题翻译：动力传递机理及其等离子体增强化学气相沉积的设备
公开(公告)号：US20080295771A1
公开(公告)日：2008-12-04
申请号：US11847316
申请日：2007-08-29
申请人： Yuan-Yuan Chiang , Kuan-Chou Chen , Fu-Ching Tung
发明人： Yuan-Yuan Chiang , Kuan-Chou Chen , Fu-Ching Tung
IPC分类号： C23C16/00
CPC分类号： H01L21/6719 , H01J37/32431 , H01J37/32568 , H01L21/67748 , H01L21/68792
摘要： A power-delivery mechanism is provided in the present invention, which utilizes an element with airtight and flexible characteristics coupled to a power-generating unit so as to generate a motion in a specific direction. Besides, an apparatus of plasma -enhanced chemical vapor deposition (PECVD) is also provided in the present invention, which comprises the power-delivery mechanism to load/unload a workpiece onto a stage for processing automatically. Meanwhile, the present invention also provides a height-adjusting unit and a position-indicating unit allowing the operator to adjust the distance between an upper electrode and a lower electrode of the PECVD so that the operator is capable of monitoring and adjusting the distance easily between the upper electrode and the lower electrode outside the chamber of the PECVD.
摘要翻译：在本发明中提供了一种动力输送机构，其利用与发电单元相耦合的气密和柔性特性的元件，以产生沿特定方向的运动。此外，在本发明中还提供了等离子体化学气相沉积（PECVD）装置，其包括将工件装载/卸载到工作台上以自动处理的动力输送机构。同时，本发明还提供了一种高度调节单元和位置指示单元，其允许操作者调节PECVD的上电极和下电极之间的距离，使得操作者能够容易地监测和调整距离 PECVD室的上电极和下电极。

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