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1. 发明申请

US20070013890A1 Stage apparatus, lithographic apparatus and device manufacturing method 有权
公开(公告)号：US20070013890A1
公开(公告)日：2007-01-18
申请号：US11445466
申请日：2006-06-02
申请人： Erik Loopstra , Arno Bleeker , Heine Mulder , Oscar Franciscus Noordman , Timotheus Sengers , Laurentius Jorritsma , Mark Trentelman , Gerrit Streutker
发明人： Erik Loopstra , Arno Bleeker , Heine Mulder , Oscar Franciscus Noordman , Timotheus Sengers , Laurentius Jorritsma , Mark Trentelman , Gerrit Streutker
IPC分类号： G03B27/72
CPC分类号： G03F7/70733 , G03F7/70208 , G03F7/70283 , G03F7/70466
摘要： In order to improve the productivity of a lithographic apparatus, a stage apparatus for holding two patterning devices is described. The patterning devices are arranged such that the distance between the patterns in the scanning direction corresponds to the length of the pattern in the scanning direction. By doing so, an improved exposure sequence may be performed by exposing a first die with a first pattern, skipping a second die adjacent to the first die, and exposing a third die adjacent to the second die using a second pattern.

2. 发明申请

US20070013885A1 Stage apparatus, lithographic apparatus and device manufacturing method 有权
标题翻译：舞台装置，光刻装置及装置的制造方法
公开(公告)号：US20070013885A1
公开(公告)日：2007-01-18
申请号：US11486378
申请日：2006-07-14
申请人： Erik Loopstra , Arno Bleeker , Heine Mulder , Oscar Franciscus Noordman , Timotheus Sengers , Laurentius Jorritsma , Mark Trentelman , Gerrit Streutker
发明人： Erik Loopstra , Arno Bleeker , Heine Mulder , Oscar Franciscus Noordman , Timotheus Sengers , Laurentius Jorritsma , Mark Trentelman , Gerrit Streutker
IPC分类号： G03B27/42
CPC分类号： G03F7/70733 , G03F7/70208 , G03F7/70283 , G03F7/70466
摘要： In order to improve the productivity of a lithographic apparatus, a stage apparatus to hold two patterning devices is described. The patterning devices are arranged such that the distance between the patterns in the scanning direction corresponds to the length of the pattern in the scanning direction. By doing so, an improved exposure sequence may be performed by exposing a first die with a first pattern, skipping a second die adjacent to the first die, and exposing a third die adjacent to the second die using a second pattern.
摘要翻译：为了提高光刻设备的生产率，描述了用于保持两个图案形成装置的平台装置。图案形成装置被布置成使得扫描方向上的图案之间的距离对应于图案在扫描方向上的长度。通过这样做，可以通过用第一图案曝光第一模具，跳过与第一模具相邻的第二模具，以及使用第二图案露出与第二模具相邻的第三模具来执行改进的曝光顺序。

3. 发明申请

US20070013889A1 Lithographic apparatus, device manufacturing method and device manufactured thereby having an increase in depth of focus 审中-公开
标题翻译：制造的平版印刷设备，器件制造方法和器件具有增加的焦深
公开(公告)号：US20070013889A1
公开(公告)日：2007-01-18
申请号：US11179056
申请日：2005-07-12
申请人： Laurentius Jorritsma , Johannes Baselmans , Arno Bleeker , Jacob Klinkhamer
发明人： Laurentius Jorritsma , Johannes Baselmans , Arno Bleeker , Jacob Klinkhamer
IPC分类号： G03B27/54
CPC分类号： G03F7/70275 , G03F7/70575 , G03F7/70641
摘要： A lithographic apparatus comprises an illumination system for supplying a beam of radiation, an array of individually controllable elements serving to impart the beam with a pattern in its cross-section, a substrate table for supporting a substrate, and a projection system for projecting the patterned beam onto a target portion of the substrate. The beam of radiation comprises a plurality of beam components. The plurality of beam components includes a first beam component having a first frequency spectrum about a first frequency and at least a second beam component having a second frequency spectrum about a second frequency. The second frequency is different from the first frequency. The projection system focuses the first and second beam components at different heights with respect to the substrate table.
摘要翻译：光刻设备包括用于提供辐射束的照明系统，用于在其横截面中赋予光束的单独可控元件的阵列，用于支撑衬底的衬底台，以及用于将图案化的投影系统光束到基板的目标部分上。辐射束包括多个光束分量。多个光束分量包括具有关于第一频率的第一频谱的第一光束分量和具有关于第二频率的第二频谱的至少第二光束分量。第二频率与第一频率不同。投影系统将第一和第二光束分量相对于衬底台聚焦在不同的高度。

4. 发明申请

US20070177122A1 Lithographic apparatus, device manufacturing method and exchangeable optical element 有权
标题翻译：光刻设备，器件制造方法和可交换光学元件
公开(公告)号：US20070177122A1
公开(公告)日：2007-08-02
申请号：US11341894
申请日：2006-01-30
申请人： Erik Loopstra , Adrianus Engelen , Bernardus Luttikhuis , Maria Rubingh , Johannes Hazenberg , Laurentius Jorritsma , Johannes Klerk , Bernhard Geuppert , Aart Van Beuzekom , Petrus Franciscus Mandigers , Franz Sorg , Peter Deufel
发明人： Erik Loopstra , Adrianus Engelen , Bernardus Luttikhuis , Maria Rubingh , Johannes Hazenberg , Laurentius Jorritsma , Johannes Klerk , Bernhard Geuppert , Aart Van Beuzekom , Petrus Franciscus Mandigers , Franz Sorg , Peter Deufel
IPC分类号： G03B27/54
CPC分类号： G03F7/70308 , G03F7/70825 , G03F7/70933
摘要： A lithographic apparatus has an assembly to exchange optical elements in a pupil plane of its projection system. The optical elements may be pupil filters and may conform to the physical dimensions specified for a reticle standard, e.g. having sides substantially equal to 5, 6 or 9 inches.
摘要翻译：光刻设备具有在其投影系统的光瞳平面中交换光学元件的组件。光学元件可以是光瞳滤光器，并且可以符合对于掩模版标准规定的物理尺寸，例如。侧面基本上等于5,6或9英寸。

5. 发明申请

US20070075278A1 System and method to correct for field curvature of multi lens array 有权
标题翻译：用于校正多透镜阵列的场曲率的系统和方法
公开(公告)号：US20070075278A1
公开(公告)日：2007-04-05
申请号：US11243180
申请日：2005-10-05
申请人： Laurentius Jorritsma , Johannes Baselmans
发明人： Laurentius Jorritsma , Johannes Baselmans
IPC分类号： G01N21/86
CPC分类号： G02B27/0025 , G02B3/0006 , G03F7/2008 , G03F7/70275 , G03F7/70308
摘要： Focal plane errors across the field of an array of focusing elements are reduced by using a non-planar correction surface, shaped such that focal points of the focusing elements lie closer to a single plane than they would if the correction surface were planar. For example, this can be used when an array of focusing elements is used in a projection system of a lithography system.
摘要翻译：通过使用非平面校正表面来减少聚焦元件阵列的焦平面误差，该非平面校正表面被成形为使得聚焦元件的焦点比如果校正表面是平面的那样更靠近单个平面。例如，当在光刻系统的投影系统中使用聚焦元件的阵列时，可以使用这一点。

6. 发明申请

US20070030470A1 Lithographic apparatus and device manufacturing method 有权
标题翻译：平版印刷设备和器件制造方法
公开(公告)号：US20070030470A1
公开(公告)日：2007-02-08
申请号：US11546394
申请日：2006-10-12
申请人： Patricius Tinnemans , Johannes Baselmans , Laurentius Jorritsma
发明人： Patricius Tinnemans , Johannes Baselmans , Laurentius Jorritsma
IPC分类号： G03B27/54
CPC分类号： G03F7/70558 , G03F7/70275 , G03F7/70291 , G03F7/70466 , G03F7/70475
摘要： A lithography apparatus including a projection system configured to project a beam of radiation onto a substrate as an array of sub-beams of radiation and an array of individually controllable elements configured to modulate the sub-beams of radiation. The apparatus also includes a data-path including at least one data manipulation device arranged to at least partly convert data defining a requested pattern to a control signal suitable for controlling the array of individually controllable elements to form substantially the requested pattern on the substrate. The data manipulation device is arranged to carry out the conversion by applying a pseudo-inverted form of a point-spread function matrix to a column vector representing the requested pattern. The point-spread function matrix includes information about the shape and relative position of the point-spread function of each spot to be exposed on the substrate by one of the sub-beams of radiation at a given time.
摘要翻译：一种光刻设备，包括投影系统，该投影系统被配置为将辐射束投射到衬底上作为辐射子束阵列和被配置成调制辐射子束的单独可控元件的阵列。该装置还包括数据路径，其包括至少一个数据操作装置，该至少一个数据操作装置被布置成至少部分地将定义所请求的模式的数据转换为适于控制独立可控元件的阵列的控制信号，以在基板上形成基本上所请求的图案。数据处理装置被配置为通过将点扩展函数矩阵的伪反转形式应用于表示所请求的图案的列向量来执行转换。点扩散函数矩阵包括在给定时间通过辐射子束之一在衬底上暴露于每个点的点扩散函数的形状和相对位置的信息。

7. 发明申请

US20060139600A1 Lithographic apparatus and device manufacturing method 有权
标题翻译：平版印刷设备和器件制造方法
公开(公告)号：US20060139600A1
公开(公告)日：2006-06-29
申请号：US11020642
申请日：2004-12-27
申请人： Patricius Jacobus Tinnemans , Johannes Matheus Baselmans , Laurentius Jorritsma
发明人： Patricius Jacobus Tinnemans , Johannes Matheus Baselmans , Laurentius Jorritsma
IPC分类号： G03B27/54
CPC分类号： G03F7/70558 , G03F7/70275 , G03F7/70291 , G03F7/70466 , G03F7/70475
摘要： A lithography apparatus including a projection system configured to project a beam of radiation onto a substrate as an array of sub-beams of radiation and an array of individually controllable elements configured to modulate the sub-beams of radiation. The apparatus also includes a data-path including at least one data manipulation device arranged to at least partly convert data defining a requested pattern to a control signal suitable for controlling the array of individually controllable elements to form substantially the requested pattern on the substrate. The data manipulation device is arranged to carry out the conversion by applying a pseudo-inverted form of a point-spread function matrix to a column vector representing the requested pattern. The point-spread function matrix includes information about the shape and relative position of the point-spread function of each spot to be exposed on the substrate by one of the sub-beams of radiation at a given time.
摘要翻译：一种光刻设备，包括投影系统，该投影系统被配置为将辐射束投射到衬底上作为辐射子束阵列和被配置成调制辐射子束的单独可控元件的阵列。该装置还包括数据路径，其包括至少一个数据操作装置，该至少一个数据操作装置被布置成至少部分地将定义所请求的模式的数据转换为适于控制独立可控元件的阵列的控制信号，以在基板上形成基本上所请求的图案。数据处理装置被配置为通过将点扩展函数矩阵的伪反转形式应用于表示所请求的图案的列向量来执行转换。点扩散函数矩阵包括在给定时间通过辐射子束之一在衬底上暴露于每个点的点扩散函数的形状和相对位置的信息。

8. 发明申请

US20050254024A1 Lithographic apparatus and device manufacturing method 有权
标题翻译：平版印刷设备和器件制造方法
公开(公告)号：US20050254024A1
公开(公告)日：2005-11-17
申请号：US10842634
申请日：2004-05-11
申请人： Hendrikus Marie Van Greevenbroek , Hendrikus Ludovicus Van Dijck , Christian Wagner , Laurentius Jorritsma
发明人： Hendrikus Marie Van Greevenbroek , Hendrikus Ludovicus Van Dijck , Christian Wagner , Laurentius Jorritsma
IPC分类号： G03F7/20 , G03B27/52 , H01L21/027
CPC分类号： G03F7/70891 , G03F7/70133
摘要： A lithographic apparatus includes an instrument for determining the radiation intensity distribution at a pupil plane of the projection system while a patterning device is imparting the projection beam with a pattern, a calculation apparatus for calculating the effect on the imaging by the projection system of heating resulting from the projection beam in the projection system having the determined intensity distribution and a controller for adjusting the lithographic apparatus to compensate for the calculated effect of heating.
摘要翻译：光刻设备包括用于确定投影系统的光瞳平面处的辐射强度分布的仪器，同时图案形成装置将投影光束赋予图案;计算装置，用于计算投影系统对成像的影响，从而产生加热从具有确定的强度分布的投影系统中的投影光束和用于调节光刻设备的控制器来补偿计算出的加热效果。

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