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1. 发明申请

US20070178704A1 Lithographic apparatus and device manufacturing method 失效
标题翻译：平版印刷设备和器件制造方法
公开(公告)号：US20070178704A1
公开(公告)日：2007-08-02
申请号：US11343219
申请日：2006-01-31
申请人： Erik Loopstra , Bernardus Luttikhuis , Herman Van Der Schoot , Fransicus Jacobs
发明人： Erik Loopstra , Bernardus Luttikhuis , Herman Van Der Schoot , Fransicus Jacobs
IPC分类号： H01L21/302
CPC分类号： G03F7/707
摘要： The invention provides a lithographic apparatus including an illumination system configured to condition a radiation beam, a patterning device support constructed to support a transmissive patterning device, the patterning device being capable of imparting the radiation beam with a pattern in its cross-section to form a patterned radiation beam, a substrate table constructed to hold a substrate, and a projection system configured to project the patterned radiation beam onto a target portion of the substrate, wherein the patterning device support is configured to hold a patterning device and wherein the lithographic apparatus includes a clamping device, the clamping device being configured to clamp the patterning device at the top side.
摘要翻译：本发明提供一种光刻设备，其包括配置成调节辐射束的照明系统，构造成支撑透射式图案形成装置的图案形成装置支撑件，所述图案形成装置能够在其横截面上赋予辐射束图案以形成图案化的辐射束，构造成保持衬底的衬底台，以及被配置为将图案化的辐射束投影到衬底的目标部分上的投影系统，其中，图案形成装置支撑件构造成保持图案形成装置，并且其中光刻装置包括夹持装置，夹持装置构造成将图案形成装置夹在顶侧。

2. 发明申请

US20060158634A1 Lithographic apparatus and device manufacturing method utilizing a substrate handler 有权
公开(公告)号：US20060158634A1
公开(公告)日：2006-07-20
申请号：US11320494
申请日：2005-12-29
申请人： Hernes Jacobs , Bernardus Luttikhuis , Harmen Van Der Schoot , Petrus Vosters
发明人： Hernes Jacobs , Bernardus Luttikhuis , Harmen Van Der Schoot , Petrus Vosters
IPC分类号： G03B27/54 , H01L21/84
CPC分类号： G03F7/7075 , G03F7/70691 , G03F7/70733 , G03F7/70791
摘要： A substrate handler for moving a substrate relative to a substrate table of a lithographic apparatus. The substrate handler comprises at least one support surface or platform adapted to carry a plurality of independent substrates simultaneously. The substrate handler adapted to load substrates onto and unload substrates from the substrate table before and after exposure.

3. 发明申请

US20060132735A1 Lithographic apparatus, device manufacturing method, and device manufactured thereby 有权
标题翻译：平版印刷设备，器件制造方法和由此制造的器件
公开(公告)号：US20060132735A1
公开(公告)日：2006-06-22
申请号：US11018930
申请日：2004-12-22
申请人： Joeri Lof , Jeroen Fluit , Bernardus Luttikhuis , Peter Spit
发明人： Joeri Lof , Jeroen Fluit , Bernardus Luttikhuis , Peter Spit
IPC分类号： G03B27/42
CPC分类号： G03F7/70791 , G03F7/70291
摘要： Substrate processing apparatus includes a lithographic apparatus which comprises an illumination system for supplying a projection beam of radiation, an array of individually controllable elements serving to impart the projection beam with a pattern in its cross-section, and a projection system for projecting the patterned beam onto a target portion of a substrate. The processing apparatus also includes a substrate supply arranged to output at least one unbroken length of substrate, and a substrate conveying system arranged to convey each outputted unbroken length of substrate from the substrate supply and past the projection system such that the projection system is able to project the patterned beam onto a series of target portions along each unbroken length of substrate. In certain embodiments, long lengths of substrate are supplied from a roll, but alternatively a series of separate sheets can be supplied.
摘要翻译：基板处理装置包括光刻设备，该光刻设备包括用于提供投射辐射束的照明系统，用于使投影光束在其横截面上具有图案的独立可控元件的阵列，以及投影系统，到基板的目标部分上。处理装置还包括布置成输出至少一个不间断长度的基板的基板供给源，以及基板输送系统，其布置成将基板的每个输出的不间断长度从基板供给输送并经过投影系统，使得投影系统能够沿着每个不间断长度的衬底将图案化的光束投影到一系列目标部分上。在某些实施例中，长的基底是从卷筒供应的，但也可以提供一系列单独的片材。

4. 发明申请

US20050151954A1 Lithographic apparatus and device manufacturing method 有权
标题翻译：平版印刷设备和器件制造方法
公开(公告)号：US20050151954A1
公开(公告)日：2005-07-14
申请号：US10986182
申请日：2004-11-12
申请人： Petrus Bartray , Wilhelmus Box , Carlo Luijten , Bernardus Luttikhuis , Michael Ten Bhomer , Ferdy Migchelbrink , Jan Kuit
发明人： Petrus Bartray , Wilhelmus Box , Carlo Luijten , Bernardus Luttikhuis , Michael Ten Bhomer , Ferdy Migchelbrink , Jan Kuit
IPC分类号： H01L21/027 , G02B7/02 , G03B27/42 , G03F7/20 , G03B27/58
CPC分类号： G03F7/7095 , G02B7/028 , G03F7/70833 , G03F7/70858 , G03F7/709
摘要： A lithographic apparatus is provided that includes an illumination system for conditioning a beam of radiation, and a support for supporting a patterning device. The patterning device serves to impart the beam of radiation with a pattern in its cross-section. The apparatus also includes a substrate table for holding a substrate, a projection system for projecting the patterned beam onto a target portion of the substrate, an isolated reference frame for providing a reference surface, and a measuring system for measuring the substrate with respect to the reference surface. The reference frame includes a material having a coefficient of thermal expansion of greater than about 2.9×10−6/K.
摘要翻译：提供了一种光刻设备，其包括用于调节辐射束的照明系统和用于支撑图案形成装置的支撑件。图案形成装置用于使辐射束在其横截面上具有图案。该装置还包括用于保持基板的基板台，用于将图案化的光束投影到基板的目标部分上的投影系统，用于提供参考表面的隔离参考框架，以及用于测量基板相对于基板的测量系统参考面。参考框架包括具有大于约2.9×10 -6 / K的热膨胀系数的材料。

5. 发明申请

US20070177122A1 Lithographic apparatus, device manufacturing method and exchangeable optical element 有权
标题翻译：光刻设备，器件制造方法和可交换光学元件
公开(公告)号：US20070177122A1
公开(公告)日：2007-08-02
申请号：US11341894
申请日：2006-01-30
申请人： Erik Loopstra , Adrianus Engelen , Bernardus Luttikhuis , Maria Rubingh , Johannes Hazenberg , Laurentius Jorritsma , Johannes Klerk , Bernhard Geuppert , Aart Van Beuzekom , Petrus Franciscus Mandigers , Franz Sorg , Peter Deufel
发明人： Erik Loopstra , Adrianus Engelen , Bernardus Luttikhuis , Maria Rubingh , Johannes Hazenberg , Laurentius Jorritsma , Johannes Klerk , Bernhard Geuppert , Aart Van Beuzekom , Petrus Franciscus Mandigers , Franz Sorg , Peter Deufel
IPC分类号： G03B27/54
CPC分类号： G03F7/70308 , G03F7/70825 , G03F7/70933
摘要： A lithographic apparatus has an assembly to exchange optical elements in a pupil plane of its projection system. The optical elements may be pupil filters and may conform to the physical dimensions specified for a reticle standard, e.g. having sides substantially equal to 5, 6 or 9 inches.
摘要翻译：光刻设备具有在其投影系统的光瞳平面中交换光学元件的组件。光学元件可以是光瞳滤光器，并且可以符合对于掩模版标准规定的物理尺寸，例如。侧面基本上等于5,6或9英寸。

6. 发明申请

US20070008512A1 Substrate handler, lithographic apparatus and device manufacturing method 有权
标题翻译：基板处理器，光刻设备和器件制造方法
公开(公告)号：US20070008512A1
公开(公告)日：2007-01-11
申请号：US11175037
申请日：2005-07-06
申请人： Harmen Van Der Schoot , Hernes Jacobs , Bernardus Luttikhuis , Petrus Vosters , Johannes Hazenberg , Aart Van Beuzekom
发明人： Harmen Van Der Schoot , Hernes Jacobs , Bernardus Luttikhuis , Petrus Vosters , Johannes Hazenberg , Aart Van Beuzekom
IPC分类号： G03B27/58
CPC分类号： G03F7/70875 , G03F7/7075
摘要： Embodiments of the invention relates to a substrate handler for handling a substrate, including a conditioning device for conditioning the substrate. In an embodiment, the substrate handler includes a displacing device configured to displace the substrate in a direction substantially parallel to the support surface, wherein the displacing device is configured to displace the substrate during the conditioning process from one conditioning position to one or more other conditioning positions. According to another embodiment of the invention, the substrate handler includes a float device for providing an air bed above a support surface of the substrate handler, the substrate handler being configured to support the substrate on an air bed during conditioning of the substrate.
摘要翻译：本发明的实施例涉及一种用于处理基板的基板处理器，包括用于调节基板的调节装置。在一个实施例中，衬底处理器包括移位装置，其配置成在基本上平行于支撑表面的方向上移动衬底，其中，移位装置构造成在调节过程期间将衬底从一个调节位置移位到一个或多个其他调节职位根据本发明的另一实施例，衬底处理器包括用于在衬底处理器的支撑表面上方提供空气床的浮动装置，衬底处理器被配置为在衬底调节期间将衬底支撑在空气床上。

7. 发明申请

US20060139616A1 Lithographic apparatus and device manufacturing method utilizing a substrate handler 有权
公开(公告)号：US20060139616A1
公开(公告)日：2006-06-29
申请号：US11157201
申请日：2005-06-21
申请人： Hernes Jacobs , Harmen Van Der Schoot , Petrus Vosters , Bernardus Luttikhuis
发明人： Hernes Jacobs , Harmen Van Der Schoot , Petrus Vosters , Bernardus Luttikhuis
IPC分类号： G03B27/32 , G03B27/62
CPC分类号： G03F7/7075 , G03F7/70691 , G03F7/70733 , G03F7/70791
摘要： A substrate handler for moving a substrate relative to a substrate table of a lithographic apparatus. The substrate handler comprises at least one support surface or platform adapted to carry a plurality of independent substrates simultaneously. The substrate handler adapted to load substrates onto and unload substrates from the substrate table before and after exposure.

8. 发明申请

US20070002297A1 Lithographic apparatus and device manufacturing method utilizing movement of clean air to reduce contamination 有权
标题翻译：利用清洁空气的移动来减少污染的平版印刷设备和设备制造方法
公开(公告)号：US20070002297A1
公开(公告)日：2007-01-04
申请号：US11169305
申请日：2005-06-29
申请人： Bernardus Luttikhuis , Petrus Bartray , Wilhelmus Box , Marco Stavenga , Thijs Harink
发明人： Bernardus Luttikhuis , Petrus Bartray , Wilhelmus Box , Marco Stavenga , Thijs Harink
IPC分类号： G03B27/52
CPC分类号： G03F7/70916 , G03F7/7075 , G03F7/70791
摘要： A lithographic apparatus comprises a substrate table that supports a substrate and a substrate handler that moves the substrate relative to the substrate table. The substrate handler is adapted to load substrates on to and unload substrates from the substrate table before and after exposure. Also, a clean gas supply system supplies a clean gas to at least one location at which the substrate is located. The clean gas supply system is moveably mounted. A device manufacturing method utilizing the lithographic apparatus can be used to manufacture at least one of a flat panel display and an integrated circuit device.
摘要翻译：光刻设备包括支撑衬底的衬底台和相对于衬底台移动衬底的衬底处理器。衬底处理器适于在曝光之前和之后将衬底加载到衬底台上并从衬底台卸载衬底。此外，清洁气体供应系统将清洁气体提供到至少一个位置，在该位置处衬底被定位。清洁气体供应系统可移动安装。利用光刻设备的器件制造方法可用于制造平板显示器和集成电路器件中的至少一个。

9. 发明申请

US20070188723A1 Lithographic apparatus and device manufacturing method 失效
标题翻译：平版印刷设备和器件制造方法
公开(公告)号：US20070188723A1
公开(公告)日：2007-08-16
申请号：US11353232
申请日：2006-02-14
申请人： Bernardus Luttikhuis , Erik Loopstra , Harmen Schoot , Fransicus Jacobs
发明人： Bernardus Luttikhuis , Erik Loopstra , Harmen Schoot , Fransicus Jacobs
IPC分类号： G03B27/42
CPC分类号： G03B27/42 , G03F7/707 , G03F7/70783
摘要： The mask in a lithographic apparatus is clamped on a first side using a first clamping device and on a second side, different from the first side, using a second clamping device. The clamping forces are preferably applied using thin membranes. The first clamp clamps the substrate in directions parallel to the plane of the patterning device, perpendicular to the plane of the patterning device and rotationally. The second clamping device clamps the patterning device only in directions parallel to the plane of the substrate.
摘要翻译：光刻设备中的掩模使用第一夹紧装置夹紧在第一侧上，并使用第二夹紧装置夹紧在不同于第一侧的第二侧上。夹紧力优选使用薄膜施加。第一夹具将基板平行于图案形成装置的平面垂直于图案形成装置的平面并旋转夹紧基板。第二夹紧装置仅在平行于基板的平面的方向上夹持图案形成装置。

10. 发明申请

US20060132734A1 Lithographic apparatus and device manufacturing method 有权
标题翻译：平版印刷设备和器件制造方法
公开(公告)号：US20060132734A1
公开(公告)日：2006-06-22
申请号：US11018928
申请日：2004-12-22
申请人： Bernardus Luttikhuis , Harmen Van Der Schoot , Petrus Vosters
发明人： Bernardus Luttikhuis , Harmen Van Der Schoot , Petrus Vosters
IPC分类号： G03B27/42
CPC分类号： G03F7/70991 , G03F7/70616 , G03F7/70733
摘要： A lithographic method and apparatus comprises an illumination system that supplies a beam of radiation, a patterning device that patterns the beam, and a projection system that projects the patterned beam onto a target portion of a substrate. A metrology system is provided adjacent the projection system for aligning the substrate with the projection system. Two or more movable chucks are each arranged to support a substrate and move between a loading device and the projection system. The chucks are independently movable so that one substrate can be passed through the metrology system and patterned beam while the other substrates are moved between the loading system and projection system.
摘要翻译：光刻方法和装置包括提供辐射束的照明系统，对光束进行图案化的图案形成装置，以及将图案化光束投影到基板的目标部分上的投影系统。在投影系统附近提供了一种计量系统，用于将基板与投影系统对准。两个或更多个可移动卡盘分别布置成支撑基板并在加载装置和投影系统之间移动。卡盘可独立移动，使得一个基板可以通过计量系统和图案化梁，同时其它基板在装载系统和投影系统之间移动。

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