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1. 发明申请

US20060121209A1 Prewetting of substrate before immersion exposure 有权
标题翻译：浸渍前预浸底物
公开(公告)号：US20060121209A1
公开(公告)日：2006-06-08
申请号：US11005219
申请日：2004-12-07
申请人： Johannes Matheus Baselmans , Sjoerd Lambertus Donders , Christiaan Hoogendam , Jeroen Sophia Maria Mertens , Johannes Hubertus Mulkens , Bob Streefkerk
发明人： Johannes Matheus Baselmans , Sjoerd Lambertus Donders , Christiaan Hoogendam , Jeroen Sophia Maria Mertens , Johannes Hubertus Mulkens , Bob Streefkerk
IPC分类号： B05D1/36 , B05D3/00 , B29C71/04
CPC分类号： G03F7/70341
摘要： A lithographic projection apparatus includes a support structure configured to hold a patterning device. The patterning device is configured to pattern a beam of radiation according to a desired pattern. The lithographic apparatus further includes a substrate table configured to hold a substrate. The substrate has a surface coated at least partially with a layer of radiation sensitive material. The lithographic apparatus also includes a projection system configured to project the patterned beam onto a target portion of the substrate, and a liquid supply system. The liquid supply system is configured to supply a prewetting liquid on top of the layer of radiation sensitive material to prewet the substrate, and is configured to supply an immersion liquid in a space between the prewet substrate and at least a portion of the projection system.
摘要翻译：光刻投影装置包括构造成保持图案形成装置的支撑结构。图案形成装置被配置成根据期望的图案对辐射束进行图案化。光刻设备还包括被配置为保持衬底的衬底台。衬底具有至少部分地涂覆有辐射敏感材料层的表面。光刻设备还包括配置成将图案化的光束投影到基板的目标部分上的投影系统和液体供应系统。液体供应系统被配置为在辐射敏感材料层的顶部上提供预润湿液体以预润湿基底，并且被配置为在预润湿基底和至少一部分投影系统之间的空间中提供浸没液体。

2. 发明申请

US20070070329A1 Illumination beam measurement 失效
标题翻译：照明光束测量
公开(公告)号：US20070070329A1
公开(公告)日：2007-03-29
申请号：US11236850
申请日：2005-09-28
申请人： Johannes Matheus Baselmans , Henricus Lenders , Dilek Kaya
发明人： Johannes Matheus Baselmans , Henricus Lenders , Dilek Kaya
IPC分类号： G01J1/00
CPC分类号： G01J1/4257 , G01J1/04 , G01J1/0437 , G03F7/70133
摘要： A method of measuring the angular intensity distribution of an illumination beam produced by an illumination system of a lithographic apparatus includes measuring an angular intensity distribution, placing a first optical element above an object plane of the illumination system which causes light therefrom to be deflected in a first direction, and measuring the intensity distribution at said detector, placing a second optical element above said object plane which cases light from said illumination system to be deflected in a second direction, and measuring the intensity distribution at said detector, determining the change in intensity in said first and second directions, and the angular intensity distribution of said illumination beam from the measurements. There is also provided a mask for use in such a method, the mask comprising a plurality of modules, each module comprising a pinhole and an optical element mounted above the pinhole.
摘要翻译：测量由光刻设备的照明系统产生的照明光束的角度强度分布的方法包括测量角度强度分布，将第一光学元件放置在照明系统的物平面上方，从而使光从其偏转到并且测量所述检测器处的强度分布，将第二光学元件放置在所述物平面之上，所述第二光学元件将来自所述照明系统的光沿第二方向偏转，并且测量所述检测器处的强度分布，确定强度变化在所述第一和第二方向上，以及所述照明光束的所述测量的角度强度分布。还提供了一种用于这种方法的掩模，该掩模包括多个模块，每个模块包括针孔和安装在针孔上方的光学元件。

3. 发明申请

US20050006563A1 Lithographic apparatus, method of calibrating, and device manufacturing method 有权
标题翻译：光刻设备，校准方法和器件制造方法
公开(公告)号：US20050006563A1
公开(公告)日：2005-01-13
申请号：US10848583
申请日：2004-05-19
申请人： Johannes Matheus Baselmans , Arno Bleeker
发明人： Johannes Matheus Baselmans , Arno Bleeker
IPC分类号： G03F7/20 , H01L21/027 , G01N21/86
CPC分类号： G03F7/70516 , G03F7/70291 , G03F7/70591
摘要： To calibrate a lithographic apparatus having a programmable patterning means, a sensor, such as a CCD, CMOS sensor or photo-diode array, having detector elements larger than the size of a spot corresponding to a single pixel of the programmable patterning means is used. Pixels are selectively activated singly or in groups.
摘要翻译：为了校准具有可编程图案形成装置的光刻设备，使用具有大于对应于可编程图案形成装置的单个像素的点的尺寸的检测器元件的诸如CCD，CMOS传感器或光电二极管阵列的传感器。像素被单独或分组选择性地激活。

4. 发明申请

US20080024745A1 Patterning device utilizing sets of stepped mirrors and method of using same 失效
标题翻译：利用台阶反射镜的图案化装置及其使用方法
公开(公告)号：US20080024745A1
公开(公告)日：2008-01-31
申请号：US11495881
申请日：2006-07-31
申请人： Johannes Matheus Baselmans , Patricius Aloysius Jacobus Tinnemans
发明人： Johannes Matheus Baselmans , Patricius Aloysius Jacobus Tinnemans
IPC分类号： G03B27/54
CPC分类号： G03F7/70291 , G03F7/70283
摘要： A system and method are used to independently control multiple parameters of a patterned beam. This can be performed using a patterning device configured to pattern a beam of radiation comprising a controller and an array of stepped mirrors. The array comprises a plurality of sets of four of the stepped mirrors that are controlled with respect to each other. Adjacent ones of the stepped mirrors in each of the sets have perpendicular axes of rotation and perpendicular steps. In one example, the patterning device is used to patterned the beam of radiation, which patterned beam is projected onto an object. For example, the object can be a substrate (e.g., semiconductor substrate or flat panel display substrate) or a display device.
摘要翻译：系统和方法用于独立控制图案化束的多个参数。这可以使用构造成对包括控制器和阶梯式反射镜阵列的辐射束进行图案化的图案形成装置来执行。阵列包括相对于彼此控制的多组四个阶梯式反射镜组。每组中相邻的阶梯式反射镜具有垂直的旋转轴线和垂直方向的轴线。在一个示例中，图案形成装置用于对辐射束进行图案化，该图案束被投影到物体上。例如，该物体可以是基板（例如，半导体基板或平板显示基板）或显示装置。

5. 发明申请

US20070002419A1 Method and system for maskless lithography real-time pattern rasterization and using computationally coupled mirrors to achieve optimum feature representation 有权
公开(公告)号：US20070002419A1
公开(公告)日：2007-01-04
申请号：US11170065
申请日：2005-06-30
申请人： Azat Latypov , Kars Troost , Johannes Matheus Baselmans
发明人： Azat Latypov , Kars Troost , Johannes Matheus Baselmans
IPC分类号： G02B26/00
CPC分类号： G03F7/70291
摘要： A method and system for determining specific pixel modulation states of a spatial light modulator (SLM) to print a desired pattern on a substrate are disclosed. The method includes selecting at least one super-pixel in an object plane of the desired pattern, the super-pixel being formed of at least two pixels. At least one edge of the desired pattern crosses a boundary within the super-pixel, the at least one edge being defined by specific slope and position parameters relative to the super-pixel. The method also includes (i) forming an interpolation table to tabulate pre-calculated pixel modulation states and (ii) determining the specific pixel modulation states for each of the pixels in accordance with the interpolation table. Disclosed also are a method and system for providing a spatial light modulator (SLM). The SLM includes a plurality of mirrors structured to form groups of super-pixels. Each super-pixel (i) includes two or more mirrors from the plurality of mirrors and (ii) is configured to switch only one pixel of light. Each of the two or more mirrors can be separately actuated.

6. 发明申请

US20060139600A1 Lithographic apparatus and device manufacturing method 有权
标题翻译：平版印刷设备和器件制造方法
公开(公告)号：US20060139600A1
公开(公告)日：2006-06-29
申请号：US11020642
申请日：2004-12-27
申请人： Patricius Jacobus Tinnemans , Johannes Matheus Baselmans , Laurentius Jorritsma
发明人： Patricius Jacobus Tinnemans , Johannes Matheus Baselmans , Laurentius Jorritsma
IPC分类号： G03B27/54
CPC分类号： G03F7/70558 , G03F7/70275 , G03F7/70291 , G03F7/70466 , G03F7/70475
摘要： A lithography apparatus including a projection system configured to project a beam of radiation onto a substrate as an array of sub-beams of radiation and an array of individually controllable elements configured to modulate the sub-beams of radiation. The apparatus also includes a data-path including at least one data manipulation device arranged to at least partly convert data defining a requested pattern to a control signal suitable for controlling the array of individually controllable elements to form substantially the requested pattern on the substrate. The data manipulation device is arranged to carry out the conversion by applying a pseudo-inverted form of a point-spread function matrix to a column vector representing the requested pattern. The point-spread function matrix includes information about the shape and relative position of the point-spread function of each spot to be exposed on the substrate by one of the sub-beams of radiation at a given time.
摘要翻译：一种光刻设备，包括投影系统，该投影系统被配置为将辐射束投射到衬底上作为辐射子束阵列和被配置成调制辐射子束的单独可控元件的阵列。该装置还包括数据路径，其包括至少一个数据操作装置，该至少一个数据操作装置被布置成至少部分地将定义所请求的模式的数据转换为适于控制独立可控元件的阵列的控制信号，以在基板上形成基本上所请求的图案。数据处理装置被配置为通过将点扩展函数矩阵的伪反转形式应用于表示所请求的图案的列向量来执行转换。点扩散函数矩阵包括在给定时间通过辐射子束之一在衬底上暴露于每个点的点扩散函数的形状和相对位置的信息。

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