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1. 发明申请

US20080000495A1 APPARATUS AND METHOD FOR SINGLE SUBSTRATE PROCESSING 审中-公开
标题翻译：单基板加工的装置和方法
公开(公告)号：US20080000495A1
公开(公告)日：2008-01-03
申请号：US11460172
申请日：2006-07-26
申请人： Eric Hansen , Victor Mimken , Martin Bleck , M. Yalamanchili , John Rosato , Wyland Atkins , Yongqiang Lu
发明人： Eric Hansen , Victor Mimken , Martin Bleck , M. Yalamanchili , John Rosato , Wyland Atkins , Yongqiang Lu
IPC分类号： B08B3/12
CPC分类号： B08B3/12 , B08B3/048 , H01L21/67028 , H01L21/67057 , H01L21/67086 , H01L21/67253 , H01L21/67751 , H01L21/68707
摘要： In a method for treating a semiconductor substrate, a single substrate is positioned in a single-substrate process chamber and subjected to wet etching, cleaning and/or drying steps. The single substrate may be exposed to etch or clean chemistry in the single-substrate processing chamber as turbulence is induced in the etch or clean chemistry to thin the boundary layer of fluid attached to the substrate. Megasonic energy and/or disturbances in the chamber surfaces may provide the turbulence for boundary layer thinning. According to another aspect of a method according to the present invention, megasonic energy may be directed into a region within the single-substrate process chamber to create a zone of boundary layer thinning across the substrate surface, and a single substrate may be translated through the zone during a rinsing or cleaning process within the chamber to optimize cleaning/rinsing performance within the zone.
摘要翻译：在一种处理半导体衬底的方法中，将单个衬底放置在单衬底处理室中并进行湿蚀刻，清洁和/或干燥步骤。可以在单衬底处理室中暴露于单个衬底的蚀刻或清洁化学品，因为在蚀刻或清洁化学中引起湍流以使连接到衬底的流体的边界层变薄。超声波能量和/或室表面的扰动可能为边界层变薄提供湍流。根据根据本发明的方法的另一方面，兆声波能量可以被引导到单衬底处理室内的区域中以在衬底表面上产生边界层变薄的区域，并且单个衬底可以通过在室内的漂洗或清洁过程中，以优化区域内的清洁/漂洗性能。

2. 发明申请

US20070272657A1 APPARATUS AND METHOD FOR SINGLE SUBSTRATE PROCESSING 审中-公开
标题翻译：单基板加工的装置和方法
公开(公告)号：US20070272657A1
公开(公告)日：2007-11-29
申请号：US11460171
申请日：2006-07-26
申请人： Eric Hansen , Victor Mimken , Martin Bleck , M. Yalamanchili , John Rosato , Yongqiang Lu
发明人： Eric Hansen , Victor Mimken , Martin Bleck , M. Yalamanchili , John Rosato , Yongqiang Lu
IPC分类号： B08B3/12
CPC分类号： B08B3/12 , B08B3/048 , H01L21/67028 , H01L21/67086 , H01L21/67253 , H01L21/67751 , H01L21/68707
摘要： In a method for treating a semiconductor substrate, a single substrate is positioned in a single-substrate process chamber and subjected to wet etching, cleaning and/or drying steps. The single substrate may be exposed to etch or clean chemistry in the single-substrate processing chamber as turbulence is induced in the etch or clean chemistry to thin the boundary layer of fluid attached to the substrate. Megasonic energy and/or disturbances in the chamber surfaces may provide the turbulence for boundary layer thinning. According to another aspect of a method according to the present invention, megasonic energy may be directed into a region within the single-substrate process chamber to create a zone of boundary layer thinning across the substrate surface, and a single substrate may be translated through the zone during a rinsing or cleaning process within the chamber to optimize cleaning/rinsing performance within the zone.
摘要翻译：在一种处理半导体衬底的方法中，将单个衬底放置在单衬底处理室中并进行湿蚀刻，清洁和/或干燥步骤。可以在单衬底处理室中暴露于单个衬底的蚀刻或清洁化学品，因为在蚀刻或清洁化学中引起湍流以使连接到衬底的流体的边界层变薄。超声波能量和/或室表面的扰动可能为边界层变薄提供湍流。根据根据本发明的方法的另一方面，兆声波能量可以被引导到单衬底处理室内的区域中以在衬底表面上产生边界层变薄的区域，并且单个衬底可以通过在室内的漂洗或清洁过程中，以优化区域内的清洁/漂洗性能。

3. 发明申请

US20060148267A1 Apparatus and method for single-or double-substrate processing 审中-公开
标题翻译：用于单面或双面基板加工的装置和方法
公开(公告)号：US20060148267A1
公开(公告)日：2006-07-06
申请号：US10492726
申请日：2002-12-06
申请人： Eric Hansen , Victor Mimken , Martin Bleck , M Yalamanchili , John Rosato
发明人： Eric Hansen , Victor Mimken , Martin Bleck , M Yalamanchili , John Rosato
IPC分类号： H01L21/306 , H01L21/302 , H01L21/461
CPC分类号： H01L21/02052 , B08B3/048 , B08B3/12 , H01L21/67028 , H01L21/67034 , H01L21/67057 , H01L21/67751
摘要： In a method for treating semiconductor substrates, one or two substrates are positioned in a substrate process chamber and subjected to wet etching, cleaning, rinsing and/or drying steps. During cleaning or rinsing a band of megasonic energy is created within the process chamber to create an active rinse or cleaning zone, and the substrate(s) are translated through the active zone during a rinsing or cleaning process within the chamber.
摘要翻译：在处理半导体衬底的方法中，将一个或两个衬底放置在衬底处理室中，并进行湿蚀刻，清洗，漂洗和/或干燥步骤。在清洁或漂洗期间，在处理室内产生一系列兆声波能量，以产生主动冲洗或清洗区域，并且在室内的漂洗或清洁过程中将基底平移通过活性区。

4. 发明申请

US20070119544A1 APPARATUS AND METHOD FOR SINGLE SUBSTRATE PROCESSING USING MEGASONIC-ASSISTED DRYING 审中-公开
标题翻译：使用MEGASONIC辅助干燥的单个基板处理的装置和方法
公开(公告)号：US20070119544A1
公开(公告)日：2007-05-31
申请号：US11534599
申请日：2006-09-22
申请人： Eric Hansen , VICTOR MIMKEN , MARTIN BLECK , M. YALAMANCHILI , JOHN ROSATO
发明人： Eric Hansen , VICTOR MIMKEN , MARTIN BLECK , M. YALAMANCHILI , JOHN ROSATO
IPC分类号： H01L21/306 , C23F1/00
CPC分类号： H01L21/02052 , B08B3/048 , B08B3/12 , H01L21/67028 , H01L21/67034 , H01L21/67057 , H01L21/67751
摘要： In a method for treating a semiconductor substrate, a single substrate is positioned in a single-substrate process chamber and subjected to wet etching, cleaning and/or drying steps. The single substrate may be exposed to etch or clean chemistry in the single-substrate processing chamber as turbulence is induced in the etch or clean chemistry to thin the boundary layer of fluid attached to the substrate. Megasonic energy and/or disturbances in the chamber surfaces may provide the turbulence for boundary layer thinning. According to another aspect of a method according to the present invention, megasonic energy may be directed into a region within the single-substrate process chamber to create a zone of boundary layer thinning across the substrate surface, and a single substrate may be translated through the zone during a rinsing or cleaning process within the chamber to optimize cleaning/rinsing performance within the zone.
摘要翻译：在一种处理半导体衬底的方法中，将单个衬底放置在单衬底处理室中并进行湿蚀刻，清洁和/或干燥步骤。可以在单衬底处理室中暴露于单个衬底的蚀刻或清洁化学品，因为在蚀刻或清洁化学中引起湍流以使连接到衬底的流体的边界层变薄。超声波能量和/或室表面的扰动可能为边界层变薄提供湍流。根据根据本发明的方法的另一方面，兆声波能量可以被引导到单衬底处理室内的区域中以在衬底表面上产生边界层变薄的区域，并且单个衬底可以通过在室内的漂洗或清洁过程中，以优化区域内的清洁/漂洗性能。

5. 发明授权

US06726848B2 Apparatus and method for single substrate processing 失效
标题翻译：单基板加工的装置和方法
公开(公告)号：US06726848B2
公开(公告)日：2004-04-27
申请号：US10010240
申请日：2001-12-07
申请人： Eric Hansen , Victor Mimken , Martin Bleck , M. Rao Yalamanchili , John Rosato
发明人： Eric Hansen , Victor Mimken , Martin Bleck , M. Rao Yalamanchili , John Rosato
IPC分类号： H01L2100
CPC分类号： H01L21/02052 , B08B3/048 , B08B3/12 , H01L21/67028 , H01L21/67034 , H01L21/67057 , H01L21/67751
摘要： In a method for treating a semiconductor substrate, a single substrate is positioned in a single-substrate process chamber and subjected to wet etching, cleaning and/or drying steps. The single substrate may be exposed to etch or clean chemistry in the single-substrate processing chamber as turbulence is induced in the etch or clean chemistry to thin the boundary layer of fluid attached to the substrate. Megasonic energy and/or disturbances in the chamber surfaces may provide the turbulence for boundary layer thinning. According to another aspect of a method according to the present invention, megasonic energy may be directed into a region within the single-substrate process chamber to create a zone of boundary layer thinning across the substrate surface, and a single substrate may be translated through the zone during a rinsing or cleaning process within the chamber to optimize cleaning/rinsing performance within the zone.
摘要翻译：在一种处理半导体衬底的方法中，将单个衬底放置在单衬底处理室中并进行湿蚀刻，清洁和/或干燥步骤。可以在单衬底处理室中暴露于单个衬底的蚀刻或清洁化学品，因为在蚀刻或清洁化学中引起湍流以使连接到衬底的流体的边界层变薄。超声波能量和/或室表面的扰动可能为边界层变薄提供湍流。根据根据本发明的方法的另一方面，兆声波能量可以被引导到单衬底处理室内的区域中以在衬底表面上产生边界层变薄的区域，并且单个衬底可以通过在室内的漂洗或清洁过程中，以优化区域内的清洁/漂洗性能。

6. 发明申请

US20090029560A1 Apparatus and method for single substrate processing 审中-公开
标题翻译：单基板加工的装置和方法
公开(公告)号：US20090029560A1
公开(公告)日：2009-01-29
申请号：US11445707
申请日：2006-06-02
申请人： Eric Hansen , Victor Mimken , Martin Bleck , R. Rao Yalamanchili , John Rosato , Wyland L. Atkins
发明人： Eric Hansen , Victor Mimken , Martin Bleck , R. Rao Yalamanchili , John Rosato , Wyland L. Atkins
IPC分类号： H01L21/306 , B08B3/04
CPC分类号： H01L21/67028 , B08B3/02 , B08B3/048 , B08B3/12 , B08B2203/0288 , H01L21/02052 , H01L21/67057 , H01L21/67751 , H01L21/68707
摘要： In a method for treating a semiconductor substrate, a single substrate is positioned in a single-substrate process chamber and subjected to wet etching, cleaning and/or drying steps. The single substrate may be exposed to etch or clean chemistry in the single-substrate processing chamber as turbulence is induced in the etch or clean chemistry to thin the boundary layer of fluid attached to the substrate. Megasonic energy and/or disturbances in the chamber surfaces may provide the turbulence for boundary layer thinning. According to another aspect of a method according to the present invention, megasonic energy may be directed into a region within the single-substrate process chamber to create a zone of boundary layer thinning across the substrate surface, and a single substrate may be translated through the zone during a rinsing or cleaning process within the chamber to optimize cleaning/rinsing performance within the zone.
摘要翻译：在一种处理半导体衬底的方法中，将单个衬底放置在单衬底处理室中并进行湿蚀刻，清洁和/或干燥步骤。可以在单衬底处理室中暴露于单个衬底的蚀刻或清洁化学品，因为在蚀刻或清洁化学中引起湍流以使连接到衬底的流体的边界层变薄。超声波能量和/或室表面的扰动可能为边界层变薄提供湍流。根据根据本发明的方法的另一方面，兆声波能量可以被引导到单衬底处理室内的区域中以在衬底表面上产生边界层变薄的区域，并且单个衬底可以通过在室内的漂洗或清洁过程中，以优化区域内的清洁/漂洗性能。

7. 发明授权

US06170703B2 Chemical Dispensing system and method 失效
标题翻译：化学分配系统和方法
公开(公告)号：US06170703B2
公开(公告)日：2001-01-09
申请号：US09227226
申请日：1999-01-08
申请人： Josh Butler , Tamer Elsawy , R. Mark Hall , Wyland Atkins , Eric Hansen
发明人： Josh Butler , Tamer Elsawy , R. Mark Hall , Wyland Atkins , Eric Hansen
IPC分类号： G01F1100
CPC分类号： B67D7/0272 , B67D1/0045 , B67D7/74 , G01F13/006
摘要： Described herein is a chemical injection system and method utilizing a chemical storage vessel coupled to a bulk source of chemical and proportioned to contain a volume of chemical useful for multiple applications for which the chemical is to be utilized. A dispense vessel proportioned to contain a volume of chemical useful for a single application is fluidly coupled to the chemical storage vessel. A controller controls operation of a system of valves and sensors, which operate to fill the chemical storage vessel, and to precisely dispense the volume required for a single application from the storage vessel into the dispense vessel and then ultimately into the vessel in which the chemical is needed.
摘要翻译：本文描述了一种化学注入系统和方法，该化学注入系统和方法利用耦合到大量化学物质并且成比例的化学存储容器来容纳可用于要使用该化学物质的多种应用的一定量的化学物质。成比例地分配用于单一应用的化学物质的分配容器流体地联接到化学品储存容器。控制器控制阀和传感器系统的操作，其操作以填充化学品储存容器，并且将单个应用所需的体积从储存容器精确地分配到分配容器中，然后最终进入容器中，其中化学品是需要的

8. 发明申请

US20160045326A1 INTERBODY SPACER SYSTEM 审中-公开
标题翻译： INTERBODY SPACER系统
公开(公告)号：US20160045326A1
公开(公告)日：2016-02-18
申请号：US14461448
申请日：2014-08-18
申请人： Eric Hansen , Scott Hay
发明人： Eric Hansen , Scott Hay
IPC分类号： A61F2/44 , A61F2/46
CPC分类号： A61F2/447 , A61F2/4455 , A61F2/4611 , A61F2002/30112 , A61F2002/30579 , A61F2002/30904 , A61F2002/4475
摘要： A device, system, and method are disclosed that supplements a human spinal column's structure by replacing a damaged intervertebral disc with a machined spacer comprising a movable pair of blades that rotate to expand from the spacer in-situ to interlock with a patient's vertebras, and a locking system that provides secondary protection from blade movement within the spacer.
摘要翻译：公开了一种装置，系统和方法，其通过用加工的间隔件替换损伤的椎间盘来补充人脊柱的结构，所述间隔件包括可移动的一对刀片，所述可移动的一对刀片从现场的间隔件原位旋转以与患者的脊椎骨互锁，以及一种锁定系统，其提供了在间隔件内的叶片运动的二次保护。

9. 发明授权

US08998278B2 Striker concealment mechanism and method 有权
标题翻译：前锋隐蔽机制与方法
公开(公告)号：US08998278B2
公开(公告)日：2015-04-07
申请号：US13546844
申请日：2012-07-11
申请人： Ronald J. Wilde , Jeffrey S. Hamminga , Eric Hansen
发明人： Ronald J. Wilde , Jeffrey S. Hamminga , Eric Hansen
IPC分类号： E05B15/02 , E05B79/20 , E05B81/00 , E05B85/04 , E05C1/06
CPC分类号： E05B79/20 , E05B15/029 , E05B81/00 , E05B85/045 , Y10T292/1021 , Y10T292/694 , Y10T292/696 , Y10T292/699
摘要： A vehicle closure assembly includes a closure movable relative to a vehicle opening between closed and open positions. A latch is coupled to one of a threshold of the vehicle opening and the closure, and a striker is coupled to the other of the threshold of the vehicle opening and the closure. The striker and latch are engageable to secure the closure in the closed position. A striker cover is movable relative to the striker between a concealing position in which the striker is substantially concealed from the latch, and an exposing position in which the striker is substantially exposed to the latch. An actuator is coupled to the striker cover and is operable to move the striker cover to the concealing position or the exposing position from the other position in response to movement of the closure relative to the vehicle opening.
摘要翻译：车辆闭合组件包括可相对于闭合位置和打开位置之间的车辆开口移动的闭合件。闩锁联接到车辆开口和关闭件的阈值之一，并且撞针联接到车辆开口和闭合件的阈值中的另一个。撞针和闩锁可接合以将闭合件固定在关闭位置。撞击器盖可相对于撞针移动，其中撞击器基本上从闩锁中隐藏在该隐藏位置以及撞击器基本上暴露于闩锁的暴露位置。致动器联接到撞针盖并且可操作以响应于闭合件相对于车辆开口的移动而将撞针盖移动到隐藏位置或从另一位置的暴露位置。

10. 发明申请

US20130283668A1 FISHING LURE WITH SEMICONDUCTOR INTEGRATED CIRCUIT BODY 审中-公开
标题翻译：具有半导体集成电路体的捕鱼
公开(公告)号：US20130283668A1
公开(公告)日：2013-10-31
申请号：US13458073
申请日：2012-04-27
申请人： Eric Hansen
发明人： Eric Hansen
IPC分类号： A01K85/00
CPC分类号： A01K85/00
摘要： A fishing lure including an elongate body in the shape of a semiconductor integrated circuit having prongs extending from the body, the prongs being arranged in two generally parallel rows on opposite surfaces of the elongate body. The fishing lure also includes a hook coupled to a distal end of the elongate body, and an eyelet assembly coupled to a proximal end of the elongate body. Various flash materials (e.g., beads, a spoon, etc.) in combination with the prongs of the semiconductor integrated circuit shaped body stimulate the fish's natural instinct to strike. In one embodiment, the body actually comprises a semiconductor integrated circuit.
摘要翻译：钓鱼诱饵包括具有从主体延伸的尖头的半导体集成电路形状的细长主体，所述插脚在细长主体的相对表面上布置成两个大致平行的行。钓鱼诱饵还包括联接到细长主体的远端的钩和耦合到细长主体的近端的孔眼组件。与半导体集成电路成形体的尖头组合的各种闪光材料（例如，珠，勺子等）刺激鱼的自然本能。在一个实施例中，身体实际上包括半导体集成电路。

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