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1. 发明申请

US20050239272A1 Process for producing a multilayer arrangement having a metal layer 审中-公开
标题翻译：一种具有金属层的多层布置方法
公开(公告)号：US20050239272A1
公开(公告)日：2005-10-27
申请号：US10920043
申请日：2004-08-16
申请人： Eike Ruttkowski , Gurkan Ilicali , Richard Luyken , Franz Hofmann , Manuela Bueno
发明人： Eike Ruttkowski , Gurkan Ilicali , Richard Luyken , Franz Hofmann , Manuela Bueno
IPC分类号： B81C1/00 , H01L21/768 , H01L21/44
CPC分类号： H01L21/76838 , B81C1/00357 , B81C2201/019
摘要： Process for producing a multilayer arrangement having a metal layer, in which a metal layer is applied to a surface of a first wafer and at least one interlayer is applied to the metal layer. Furthermore, a second wafer is applied to the interlayer and then the first wafer is removed, so that the metal layer is uncovered.
摘要翻译：制造具有金属层的多层布置方法，其中将金属层施加到第一晶片和至少一层间的表面上施加金属层。此外，将第二晶片施加到中间层，然后移除第一晶片，使得金属层未被覆盖。

2. 发明申请

US20060035442A1 Layer arrangement and process for producing a layer arrangement 审中-公开
标题翻译：用于生产层布置的层布置和工艺
公开(公告)号：US20060035442A1
公开(公告)日：2006-02-16
申请号：US11175912
申请日：2005-07-05
申请人： Gurkan Ilicali , Erhard Landgraf , Wolfgang Roesner , Franz Hofmann
发明人： Gurkan Ilicali , Erhard Landgraf , Wolfgang Roesner , Franz Hofmann
IPC分类号： H01L21/30
CPC分类号： H01L29/66772 , H01L29/66628 , H01L29/78648 , H01L29/78654
摘要： In a process for producing a layer arrangement, a first layer is formed with a thickness on a first side of a substrate, which thickness is greater than a minimum thickness for epitaxial growth, a second layer is epitaxially grown on the first layer, and a third layer is formed on the second layer. Furthermore, a handling wafer is bonded to the third layer, the substrate is removed from a second side, which is the opposite side to the first side of the substrate, and the first layer is thinned in subregions from the second side, so that after the thinning the thickness of the first layer is lower than a minimum thickness for epitaxial growth.
摘要翻译：在制造层布置的方法中，第一层在衬底的第一侧上形成厚度，该厚度大于用于外延生长的最小厚度，第二层在第一层上外延生长，并且第三层形成在第二层上。此外，将处理晶片接合到第三层，从与衬底的第一侧相反的一侧的第二侧除去衬底，并且第二层在第二侧的次级区域中变薄，使得在使第一层的厚度变薄比外延生长的最小厚度低。

3. 发明申请

US20050029660A1 Adhesions of structures formed from materials of poor adhesion 审中-公开
标题翻译：由粘附性差的材料形成的结构的粘附
公开(公告)号：US20050029660A1
公开(公告)日：2005-02-10
申请号：US10899444
申请日：2004-07-26
申请人： Eike Ruttkowski , Franz Hofmann , Bjorn-Oliver Eversmann
发明人： Eike Ruttkowski , Franz Hofmann , Bjorn-Oliver Eversmann
IPC分类号： H01L21/768 , H01L23/528 , H01L23/532 , B05D5/12 , H01L21/4763 , H01L23/52
CPC分类号： H01L21/7685 , H01L21/76841 , H01L21/76867 , H01L23/5283 , H01L23/53295 , H01L2924/0002 , H01L2924/00
摘要： Semiconductor device having a substrate, at least one adhesion promoter core, which is deposited on a part of the substrate, and a deposit, which completely surrounds the adhesion promoter core, of a material of poor adhesion which is different than the adhesion promoter material and is in direct contact with the substrate, as well as methods-for the production thereof.
摘要翻译：具有衬底，沉积在基底的一部分上的至少一个粘合促进剂芯和完全包围粘合促进剂芯的沉积物，其粘附力不同于粘合促进剂材料和与基底直接接触，以及用于其生产的方法。

4. 发明申请

US20060022248A1 Electronic data memory device for a high read current 审中-公开
标题翻译：用于高读取电流的电子数据存储器件
公开(公告)号：US20060022248A1
公开(公告)日：2006-02-02
申请号：US11167386
申请日：2005-06-27
申请人： Bjorn Fischer , Franz Hofmann , Richard Luyken , Andreas Spitzer
发明人： Bjorn Fischer , Franz Hofmann , Richard Luyken , Andreas Spitzer
IPC分类号： H01L27/108
CPC分类号： H01L27/10873 , H01L29/7851
摘要： Electronic data memory device for a high read current The invention provides a memory device arranged on a substrate (401) and having at least one memory cell (100) The memory cell comprises a storage capacitor (200) for storing an electrical charge and a selection transistor (300) for selecting the memory cell (100). The selection transistor comprises a first conduction electrode (301), a second conduction electrode (302) and a control electrode (303) , the control electrode (303) being provided by a gate unit (400) having a fin (405) projecting from the substrate (401), which fin is surrounded by a gate oxide layer (406) and a gate electrode layer (403) in such a way that first and second gate elements (408a, 408b) are provided at opposite lateral areas of the fin (405), a third gate element (408c) being provided at an area of the fin (405) that is parallel to the surface of the substrate (401).
摘要翻译：用于高读取电流的电子数据存储器件本发明提供一种布置在衬底（401）上并具有至少一个存储单元（100）的存储器件。存储单元包括用于存储电荷的存储电容器（200）晶体管（300），用于选择存储单元（100）。选择晶体管包括第一导电电极（301），第二导电电极（302）和控制电极（303），控制电极（303）由栅极单元（400）提供，栅极单元（400）具有从基板（401），其被栅极氧化物层（406）和栅极电极层（403）包围，使得第一和第二栅极元件（408a，408b）设置在第一和第二栅极元件（408a，408b）的相对侧向区域所述翅片（405），第三栅极元件（408c）设置在所述鳍状物（405）的与所述基板（401）的表面平行的区域。

5. 发明申请

US20050224888A1 Integrated circuit array 审中-公开
标题翻译：集成电路阵列
公开(公告)号：US20050224888A1
公开(公告)日：2005-10-13
申请号：US11116139
申请日：2005-04-27
申请人： Andrew Graham , Franz Hofmann , Wolfgang Honlein , Johannes Kretz , Franz Kreupl , Erhard Landgraf , Richard Luyken , Wolfgang Roesner , Thomas Schulz , Michael Specht
发明人： Andrew Graham , Franz Hofmann , Wolfgang Honlein , Johannes Kretz , Franz Kreupl , Erhard Landgraf , Richard Luyken , Wolfgang Roesner , Thomas Schulz , Michael Specht
IPC分类号： G11C13/02 , H01L29/78 , H01L51/00 , H01L51/30 , H01L29/76
CPC分类号： G11C13/025 , B82Y10/00 , G11C2213/17 , H01L27/283 , H01L51/0048 , H01L51/0052 , H01L51/0512
摘要： Integrated circuit array having field effect transistors (FETs) formed next to and/or above one another. The array has a substrate, a planarized first wiring plane with interconnects and first source/drain regions of the FETs, a planarized first insulator layer on the first wiring plane, a planarized gate region layer, which has patterned gate regions made of electrically conductive material and insulator material introduced therebetween, on the first insulated layer, a planarized second insulator layer on the gate region layer, holes formed through the second insulator layer, the gate regions, and the first insulator layer, a vertical nanoelement serving as a channel region in each of the holes, a second wiring plane with interconnects and second source/drain regions of the FETs, each nanoelement being arranged between the first and second wiring planes, and a gate insulating layer between the respective vertical nanoelement and the electrically conductive material of the gate regions.
摘要翻译：集成电路阵列具有形成在彼此之上和/或彼此之上的场效应晶体管（FET）。阵列具有衬底，具有互连的平坦化的第一布线面和FET的第一源极/漏极区，在第一布线平面上的平坦化的第一绝缘体层，平坦化的栅极区域层，其具有由导电材料制成的图案化栅极区域和介于其间的绝缘体材料，在所述第一绝缘层上，在所述栅极区域层上的平坦化的第二绝缘体层，穿过所述第二绝缘体层，所述栅极区域和所述第一绝缘体层形成的空穴，用作所述沟道区域中的沟道区域的垂直纳米元件每个孔，具有互连的第二布线面和FET的第二源极/漏极区，每个纳米元件布置在第一和第二布线平面之间，并且在相应的垂直纳米元件和导电材料之间的栅极绝缘层门区域。

6. 发明申请

US20050201187A1 Integrated read-only memory, method for operating said read-only memory and corresponding production method 有权
标题翻译：集成只读存储器，用于操作所述只读存储器的方法和相应的制造方法
公开(公告)号：US20050201187A1
公开(公告)日：2005-09-15
申请号：US10505320
申请日：2003-02-17
申请人： Franz Hofmann , Richard Luyken , Till Schlosser
发明人： Franz Hofmann , Richard Luyken , Till Schlosser
IPC分类号： H01L27/10 , G11C8/02 , G11C16/02 , G11C16/10 , H01L21/8247 , H01L27/115 , H01L27/24 , H01L27/28
CPC分类号： H01L27/28 , H01L27/2436 , H01L27/2454 , H01L27/2472 , H01L45/04 , H01L45/06 , H01L45/1233 , H01L45/14 , H01L45/147
摘要： An integrated read-only memory having select transistors, each of which has a drain connection and an electrode connection for feeding an electrical signal such as a voltage or a current. A layer is provided between the drain connections and the electrode, whose electric resistance can be changed under the effect of a configuration voltage or current. The layer may be applied in a backend process.
摘要翻译：具有选择晶体管的集成只读存储器，每个具有漏极连接和用于馈送诸如电压或电流的电信号的电极连接。在漏极连接和电极之间设置一层，其电阻可以在配置电压或电流的作用下改变。该层可以应用在后端进程中。

7. 发明申请

US20050199942A1 Semiconductor memory with vertical memory transistors and method for fabricating it 有权
标题翻译：具有垂直存储晶体管的半导体存储器及其制造方法
公开(公告)号：US20050199942A1
公开(公告)日：2005-09-15
申请号：US11073205
申请日：2005-03-05
申请人： Franz Hofmann , Erhard Landgraf , Richard Luyken , Thomas Schulz , Michael Specht
发明人： Franz Hofmann , Erhard Landgraf , Richard Luyken , Thomas Schulz , Michael Specht
IPC分类号： H01L21/28 , H01L21/336 , H01L29/423 , H01L29/792
CPC分类号： H01L21/28282 , H01L29/66833 , H01L29/792 , H01L29/7923 , H01L29/7926
摘要： The invention relates to a semiconductor memory having a multiplicity of memory cells and a method for forming the memory cells. The semiconductor memory generally includes a semiconductor layer arranged on a substrate surface that includes a normally positioned step between a deeper region and a higher region. The semiconductor memory further includes doped contact regions, channel regions, a trapping layer arranged on a gate oxide layer, and at least one gate electrode. The method for forming the memory cells includes patterning a semiconductor layer to form a deeper semiconductor region and a higher semiconductor region having a step positioned between the regions. The method further includes forming a first oxide layer and a trapping layer, and then removing portions of the trapping layer and the first oxide layer and applying a second oxide layer at least regions of a doped region, the trapping layer, and the step area, and applying a gate electrode to the second oxide layer and doping, at least in regions, of the deeper semiconductor region and the higher semiconductor region to form a deeper contact region and a higher contact region.
摘要翻译：本发明涉及具有多个存储单元的半导体存储器和用于形成存储单元的方法。半导体存储器通常包括布置在衬底表面上的半导体层，其包括较深区域和较高区域之间的正常定位的台阶。半导体存储器还包括掺杂接触区域，沟道区域，布置在栅极氧化物层上的俘获层和至少一个栅电极。形成存储单元的方法包括图案化半导体层以形成较深的半导体区域和具有位于该区域之间的台阶的较高半导体区域。该方法还包括形成第一氧化物层和俘获层，然后去除俘获层和第一氧化物层的部分，并且至少在掺杂区域，俘获层和台阶区域的区域上施加第二氧化物层，以及向所述第二氧化物层施加栅电极，并且至少在所述较深半导体区域和所述较高半导体区域的区域中掺杂以形成更深的接触区域和更高的接触区域。

8. 发明申请

US20050100938A1 Vertical impedance sensor arrangement and method for producing a vertical impedance sensor arrangement 审中-公开
标题翻译：垂直阻抗传感器布置和垂直阻抗传感器布置方法
公开(公告)号：US20050100938A1
公开(公告)日：2005-05-12
申请号：US10939319
申请日：2004-09-09
申请人： Franz Hofmann , Richard Luyken , Wolfgang Roesner
发明人： Franz Hofmann , Richard Luyken , Wolfgang Roesner
IPC分类号： C12Q1/68 , G01N33/543
CPC分类号： G01N33/54386 , G01N27/3276
摘要： Vertical impedance sensor arrangement including a substrate, a first electrically conductive structure having a first uncovered surface and being arranged in and/or on the substrate, a spacer arranged above the substrate and/or at least partially on the first electrically conductive structure, a second electrically conductive structure having a second uncovered surface and being arranged on the spacer, and capture molecules, which are immobilized on the first and on the second uncovered surface, are set up such that particles to be detected hybridize with the capture molecules. The spacer is formed separately from the substrate, and the thickness of the spacer is defined by means of a deposition method.
摘要翻译：垂直阻抗传感器布置包括基底，具有第一未覆盖表面并布置在基底中和/或基底上的第一导电结构，布置在基底上和/或至少部分地在第一导电结构上的间隔物，第二具有第二未覆盖表面并布置在间隔物上的导电结构，并且被固定在第一和第二未覆盖表面上的捕获分子被设置成使得待检测的颗粒与捕获分子杂交。间隔物与衬底分开形成，并且通过沉积方法限定间隔物的厚度。

9. 发明申请

US20070096196A1 Fin field effect transistor arrangement and method for producing a fin field effect transistor arrangement 有权
标题翻译：翅片场效应晶体管布置及其制造方法
公开(公告)号：US20070096196A1
公开(公告)日：2007-05-03
申请号：US11588868
申请日：2006-10-27
申请人： Franz Hofmann , Erhard Landgraf , Richard Luyken
发明人： Franz Hofmann , Erhard Landgraf , Richard Luyken
IPC分类号： H01L29/788 , H01L21/84 , H01L21/8238 , H01L27/12 , H01L21/00 , H01L27/01 , H01L31/0392
CPC分类号： H01L21/845 , H01L27/1211 , H01L29/66795 , H01L29/785 , H01L29/78636
摘要： A fin field effect transistor arrangement comprises a substrate and a first fin field effect transistor on and/or in the substrate. The first fin field effect transistor includes a fin in which a channel region is formed between a first source/drain region and a second source/drain region and above which a gate region is formed. A second fin field effect transistor is provided on and/or in the substrate including a fin in which a channel region is formed between a first source/drain region and a second source/drain region and above which a gate region is formed. The second fin field effect transistor is arranged laterally alongside the first fin field effect transistor, wherein a height of the fin of the first fin field effect transistor is greater than a height of the fin of the second fin field effect transistor.
摘要翻译：鳍状场效应晶体管布置包括衬底和衬底上和/或衬底中的第一鳍状场效应晶体管。第一鳍状场效应晶体管包括鳍状物，其中在第一源极/漏极区域和第二源极/漏极区域之间形成沟道区域，并且在其上形成栅极区域。第二鳍状场效应晶体管设置在衬底上和/或衬底中，包括在第一源极/漏极区域和第二源极/漏极区域之间形成沟道区域的鳍片，并且在其上形成栅极区域。第二鳍状场效应晶体管沿第一鳍状场效应晶体管横向布置，其中第一鳍状场效应晶体管的鳍的高度大于第二鳍状场效应晶体管的鳍的高度。

10. 发明申请

US20050199912A1 Semiconductor memory with vertical memory transistors in a cell array arrangement with 1-2F2 cells 失效
标题翻译：具有垂直存储晶体管的半导体存储器，其具有1-2F2个单元阵列
公开(公告)号：US20050199912A1
公开(公告)日：2005-09-15
申请号：US11073214
申请日：2005-03-05
申请人： Franz Hofmann , Erhard Landgraf , Richard Luyken , Thomas Schulz , Michael Specht
发明人： Franz Hofmann , Erhard Landgraf , Richard Luyken , Thomas Schulz , Michael Specht
IPC分类号： H01L21/20 , H01L21/28 , H01L21/336 , H01L21/8246 , H01L27/10 , H01L27/115 , H01L29/73 , H01L29/76 , H01L29/792
CPC分类号： H01L29/7926 , H01L21/28282 , H01L27/115 , H01L27/11568 , H01L29/66833 , H01L29/792 , H01L29/7923
摘要： The invention relates to a semiconductor memory having a multiplicity of memory cells, each of the memory cells having N (e.g., four) vertical memory transistors with trapping layers. Higher contact regions are formed in higher semiconductor regions extending obliquely with respect to the rows and columns of the cell array, the gate electrode generally being led to the step side areas of the higher semiconductor region. A storage density of 1-2F2 per bit can thus be achieved.
摘要翻译：本发明涉及一种具有多个存储单元的半导体存储器，每个存储器单元具有N（例如四个）垂直存储晶体管，具有捕获层。在相对于单元阵列的行和列倾斜地延伸的较高半导体区域中形成更高的接触区域，栅电极通常被引导到较高半导体区域的台阶侧区域。因此可以实现每位1-2F 2的存储密度。

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