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1. 发明申请

US20080316455A1 PROJECTION OBJECTIVE OF A MICROLITHOGRAPHIC PROJECTION EXPOSURE APPARATUS 审中-公开
标题翻译：微波投影曝光装置的投影目标
公开(公告)号：US20080316455A1
公开(公告)日：2008-12-25
申请号：US12180218
申请日：2008-07-25
申请人： Dirk Hellweg , Heiko Feldmann
发明人： Dirk Hellweg , Heiko Feldmann
IPC分类号： G03B27/54 , G02B9/00
CPC分类号： G03F7/70316
摘要： The disclosure relates a projection objective of a microlithographic projection exposure apparatus. In some embodiments, the apparatus is configured to project a mask which can positioned in an object plane onto a light-sensitive layer which can be positioned in an image plane. The projection objective can include a last optical element at the image plane side having a light entrance surface and a light exit surface. The projection objective can also include an immersion liquid is arranged in a region between the light exit surface and the image plane. At a working wavelength of the projection objective, the immersion liquid can have a refractive index of at least 1.5. At least one interface between the light entrance surface of the last optical element at the image plane side and the immersion liquid can have at least region-wise a microstructuring.
摘要翻译：本公开涉及微光刻投影曝光装置的投影物镜。在一些实施例中，该装置被配置为将可以定位在物平面中的掩模投影到可定位在图像平面中的光敏层上。投影物镜可以包括在具有光入射表面和光出射表面的图像平面侧上的最后一个光学元件。投影物镜还可以包括在光出射表面和图像平面之间的区域中设置浸没液体。在投影物镜的工作波长下，浸没液体的折射率可以至少为1.5。在图像平面侧的最后一个光学元件的光入射表面与浸没液体之间的至少一个界面可以至少具有区域性的微结构化。

2. 发明授权

US08319944B2 Projection lens system of a microlithographic projection exposure installation 有权
标题翻译：投影透镜系统的微光刻投影曝光装置
公开(公告)号：US08319944B2
公开(公告)日：2012-11-27
申请号：US12825001
申请日：2010-06-28
申请人： Helmut Beierl , Sascha Bleidistel , Wolfgang Singer , Toralf Gruner , Alexander Epple , Norbert Wabra , Susanne Beder , Jochen Weber , Heiko Feldmann , Baerbel Schwaer , Olaf Rogalsky , Ari Kazi
发明人： Helmut Beierl , Sascha Bleidistel , Wolfgang Singer , Toralf Gruner , Alexander Epple , Norbert Wabra , Susanne Beder , Jochen Weber , Heiko Feldmann , Baerbel Schwaer , Olaf Rogalsky , Ari Kazi
IPC分类号： G03B27/42 , G03B27/52
CPC分类号： G03F7/70341 , G03F7/70891
摘要： A microlithographic projection exposure apparatus comprises a projection objective which images an object onto an image plane and has a lens with a curved surface. In the projection objective there is a liquid or solid medium which directly adjoins the curved surface over a region which is usable for imaging the object. The projection exposure apparatus also has an adjustable manipulator for reducing an image field curvature which is caused by heating of the medium during the projection operation.
摘要翻译：微光刻投影曝光装置包括将物体成像到平面上并具有弯曲表面的透镜的投影物镜。在投影物镜中，存在液体或固体介质，其直接邻接可用于成像物体的区域上的曲面。投影曝光装置还具有可调节的操纵器，用于降低在投影操作期间由介质的加热引起的图像场曲率。

3. 发明申请

US20120134016A1 METHOD OF MANUFACTURING A PROJECTION OBJECTIVE AND PROJECTION OBJECTIVE 有权
标题翻译：制作投影目标和投影目标的方法
公开(公告)号：US20120134016A1
公开(公告)日：2012-05-31
申请号：US13364565
申请日：2012-02-02
申请人： Heiko Feldmann , Toralf Gruner , Alexander Epple
发明人： Heiko Feldmann , Toralf Gruner , Alexander Epple
IPC分类号： G02B17/08
CPC分类号： G03F7/70891 , G03F7/70225 , G03F7/70275 , G03F7/705 , G03F7/70983
摘要： The disclosure relates to a method of manufacturing a projection objective, and a projection objective, such as a projection objective configured to be used in a microlithographic process. The method can include defining an initial design for the projection objective and optimizing the design using a merit function. The method can be used in the manufacturing of projection objectives which may be used in a microlithographic process of manufacturing miniaturized devices.
摘要翻译：本公开涉及一种制造投影物镜的方法，以及投影物镜，例如被配置为在微光刻工艺中使用的投影物镜。该方法可以包括定义投影物镜的初始设计，并使用优值函数优化设计。该方法可用于制造可用于制造小型化装置的微光刻工艺中的投影物镜。

4. 发明授权

US08031326B2 Illumination system or projection lens of a microlithographic exposure system 有权
标题翻译：微光曝光系统的照明系统或投影透镜
公开(公告)号：US08031326B2
公开(公告)日：2011-10-04
申请号：US12042621
申请日：2008-03-05
申请人： Michael Totzeck , Susanne Beder , Wilfried Clauss , Heiko Feldmann , Daniel Kraehmer , Aurelian Dodoc
发明人： Michael Totzeck , Susanne Beder , Wilfried Clauss , Heiko Feldmann , Daniel Kraehmer , Aurelian Dodoc
IPC分类号： G03B27/54 , G03B27/72
CPC分类号： G02B5/3083 , G02B27/286 , G03F7/70566 , G03F7/70966
摘要： In some embodiments, the disclosure provides an optical system, in particular an illumination system or a projection lens of a microlithographic exposure system, having an optical system axis and at least one element group including three birefringent elements each of which includes optically uniaxial material and having an aspheric surface, wherein a first birefringent element of the group has a first orientation of its optical crystal axis, a second birefringent element of the group has a second orientation of its optical crystal axis, wherein the second orientation can be described as emerging from a rotation of the first orientation, the rotation not corresponding to a rotation around the optical system axis by an angle of 90° or an integer multiple thereof, and a third birefringent element of the group has a third orientation of its optical crystal axis, wherein the third orientation can be described as emerging from a rotation of the second orientation, the rotation not corresponding to a rotation around the optical system axis by an angle of 90° or an integer multiple thereof.
摘要翻译：在一些实施例中，本公开提供了一种光学系统，特别是微光刻曝光系统的照明系统或投影透镜，其具有光学系统轴线和包括三个双折射元件的至少一个元件组，每个元件组包括光学单轴材料并具有非球面表面，其中该组的第一双折射元件具有其光学晶体轴的第一取向，该组的第二双折射元件具有其光学晶轴的第二取向，其中第二取向可被描述为从第一取向的旋转，旋转不对应于围绕光学系统轴的旋转90°的角度或其整数倍，并且该组的第三双折射元件具有其光学晶轴的第三取向，其中，可以将第三取向描述为从第二取向旋转而出现，旋转不对准以围绕光学系统轴旋转90°的角度或其整数倍。

5. 发明授权

US07965453B2 Projection objective and projection exposure apparatus including the same 有权
标题翻译：投影物镜与投影曝光装置相同
公开(公告)号：US07965453B2
公开(公告)日：2011-06-21
申请号：US12651829
申请日：2010-01-04
申请人： Wilhelm Ulrich , Aurelian Dodoc , Heiko Feldmann , Hans-Juergen Rostalski
发明人： Wilhelm Ulrich , Aurelian Dodoc , Heiko Feldmann , Hans-Juergen Rostalski
IPC分类号： G02B13/14 , G02B17/08
CPC分类号： G02B17/0812 , G02B13/143 , G03F7/70225
摘要： A reduction projection objective for projection lithography has a plurality of optical elements configured to image an effective object field arranged in an object surface of the projection objective into an effective image field arranged in an image surface of the projection objective at a reducing magnification ratio |β|
摘要翻译：用于投影光刻的缩小投影物镜具有多个光学元件，其被配置为将布置在投影物镜的物体表面中的有效物场成像为以缩小倍率|＆bgr布置在投影物镜的图像表面中的有效图像场 ; | <1。光学元件形成干燥物镜，其适用于具有折射率n'<1.01的气体介质的像差，填充投影物镜的出射表面和图像表面之间的有限厚度的图像空间。光学元件包括具有最大透镜直径Dmax的最大透镜，并且被配置为在具有最大图像场高度Y'的有效图像场中提供图像侧数值孔径NA <1。 COMP = Dmax /（Y'·（NA / n'）2）条件COMP <15.8成立。优选实施例具有相对较小的透镜总数，这允许以相对低的材料消耗制造尺寸相对较小的投影物镜，产生用于干式光刻的高性能，重量轻，紧凑的缩小投影物镜。

6. 发明申请

US20110134403A1 MICROLITHOGRAPHIC PROJECTION EXPOSURE APPARATUS 审中-公开
标题翻译：微波投影曝光装置
公开(公告)号：US20110134403A1
公开(公告)日：2011-06-09
申请号：US11573628
申请日：2005-09-16
申请人： Heiko Feldmann , Alexander Epple , Vladan Blahnik
发明人： Heiko Feldmann , Alexander Epple , Vladan Blahnik
IPC分类号： G03B27/52 , G03F7/20
CPC分类号： G03F7/70258 , G03F7/70341
摘要： A microlithographic projection exposure apparatus contains a projection objective, whose last optical element on the image side is a dry terminating element that has no refractive power and is designed for dry operation of the projection objective. According to the invention, the projection exposure apparatus furthermore contains an immersion terminating element that has no refractive power and is designed for immersed operation of the projection objective. The immersion terminating element is replaceable with the dry terminating element. Preferably, the dry terminating element and/or the immersion terminating element is composed of a plurality of plates, which are made of materials having different refractive indices.
摘要翻译：微光刻投影曝光装置包括投影物镜，其投影物镜的最后一个光学元件是干的终端元件，其不具有屈光力并被设计用于投射物镜的干燥操作。根据本发明，投影曝光装置还包含没有屈光力的浸没终端元件，并且被设计用于投影物镜的浸入操作。浸没终端元件可用干端接元件替换。优选地，干端接元件和/或浸没终端元件由多个由折射率不同的材料制成的板组成。

7. 发明申请

US20100188738A1 Optical imaging device and imaging method for microscopy 有权
标题翻译：光学成像装置及显微镜成像方法
公开(公告)号：US20100188738A1
公开(公告)日：2010-07-29
申请号：US12568483
申请日：2009-09-28
申请人： Alexander Epple , Ella Mizkewicz , Heiko Feldmann
发明人： Alexander Epple , Ella Mizkewicz , Heiko Feldmann
IPC分类号： G02B21/04
CPC分类号： G02B21/04 , G02B17/0631
摘要： The present invention relates to an optical imaging device, in particular for microscopy, with a first optical element group and a second optical element group, wherein the first optical element group and the second optical element group, on an image plane, form an image of an object point of an object plane. The first optical element group comprises a first optical element with a reflective first optical surface and a second optical element with a reflective second optical surface. The second optical element group comprises a third optical element with a reflective third optical surface. The first optical element and the second optical element are formed and arranged such that on formation of the image of the object point, in each case a multiple reflection of at least one imaging beam takes place on the first optical surface and the second optical surface.
摘要翻译：本发明涉及具有第一光学元件组和第二光学元件组的特别是显微镜的光学成像装置，其中第一光学元件组和第二光学元件组在图像平面上形成图像物体平面的物体点。第一光学元件组包括具有反射第一光学表面的第一光学元件和具有反射第二光学表面的第二光学元件。第二光学元件组包括具有反射第三光学表面的第三光学元件。第一光学元件和第二光学元件被形成和布置成使得在形成物点的图像时，在每种情况下，在第一光学表面和第二光学表面上都会发生至少一个成像光束的多次反射。

8. 发明授权

US07738188B2 Projection objective and projection exposure apparatus including the same 有权
标题翻译：投影物镜与投影曝光装置相同
公开(公告)号：US07738188B2
公开(公告)日：2010-06-15
申请号：US11727013
申请日：2007-03-23
申请人： Wilhelm Ulrich , Aurelian Dodoc , Heiko Feldmann , Hans-Juergen Rostalski
发明人： Wilhelm Ulrich , Aurelian Dodoc , Heiko Feldmann , Hans-Juergen Rostalski
IPC分类号： G02B13/14 , G02B17/08
CPC分类号： G02B17/0812 , G02B13/143 , G03F7/70225
摘要： A reduction projection objective for projection lithography has a plurality of optical elements configured to image an effective object field arranged in an object surface of the projection objective into an effective image field arranged in an image surface of the projection objective at a reducing magnification ratio |β|
摘要翻译：用于投影光刻的缩小投影物镜具有多个光学元件，其被配置为将布置在投影物镜的物体表面中的有效物场成像为以缩小倍率|＆bgr布置在投影物镜的图像表面中的有效图像场 ; | <1。光学元件形成干燥物镜，其适用于具有折射率n'<1.01的气体介质的像差，填充投影物镜的出射表面和图像表面之间的有限厚度的图像空间。光学元件包括具有最大透镜直径Dmax的最大透镜，并且被配置为在具有最大图像场高度Y'的有效图像场中提供图像侧数值孔径NA <1。 COMP = Dmax /（Y'·（NA / n'）2）条件COMP <15.8成立。

9. 发明授权

US07589903B2 Projection objective adapted for use with different immersion fluids or liquids, method of conversion of such and production method 失效
标题翻译：适用于不同浸入液体或液体的投影物镜，转换方法及生产方法
公开(公告)号：US07589903B2
公开(公告)日：2009-09-15
申请号：US11420103
申请日：2006-05-24
申请人： Susanne Beder , Wilhelm Ulrich , Heiko Feldmann , Wolfgang Singer , Toralf Gruner
发明人： Susanne Beder , Wilhelm Ulrich , Heiko Feldmann , Wolfgang Singer , Toralf Gruner
IPC分类号： G02B3/00 , G02B3/12
CPC分类号： G02B13/143 , G03F7/70341
摘要： The invention relates to a projection objective (6), in particular for applications in microlithography, serving to project an image of an object (3) arranged in an object plane (4) onto a substrate (18) arranged in an image plane (7). The projection objective (6) has an object-side-oriented part (10) which is arranged adjacent to the object plane (4) and includes a plurality of optical elements, and it also has an image-side-oriented part (11) of the objective which is arranged adjacent to the image plane (7) and includes a free space (16) serving to receive a fluid (13) and further includes at least a part of an optical end-position element (14) serving to delimit the free space (16) towards the object side. The projection objective (6) is operable in different modes of operation in which the free space (16) is filled with fluids (13) that differ in their respective indices of refraction.
摘要翻译：本发明涉及一种投影物镜（6），特别是用于微光刻中的用于将布置在物平面（4）中的物体（3）的图像投影到布置在图像平面（7）中的基底（18）上的投影物镜）。投影物镜（6）具有与物平面（4）相邻配置并具有多个光学元件的物体侧取向部（10），还具有图像侧取向部（11）所述物镜布置成邻近所述图像平面（7）并且包括用于接收流体（13）的自由空间（16），并且还包括用于界定光学终点位置元件（14）的至少一部分朝向物体侧的自由空间（16）。投影物镜（6）可在不同的操作模式中操作，其中自由空间（16）填充有各自折射率不同的流体（13）。

10. 发明申请

US20090080086A1 SYMMETRICAL OBJECTIVE HAVING FOUR LENS GROUPS FOR MICROLITHOGRAPHY 有权
标题翻译：具有四个用于微结构的镜片组的对称目标
公开(公告)号：US20090080086A1
公开(公告)日：2009-03-26
申请号：US12257156
申请日：2008-10-23
申请人： David R. Shafer , Aurelian Dodoc , Johannes Zellner , Heiko Feldmann , Wilhelm Ulrich , Holger Walter , Ulrich Loering , Daniel Kraehmer , Gerhard Fuerter
发明人： David R. Shafer , Aurelian Dodoc , Johannes Zellner , Heiko Feldmann , Wilhelm Ulrich , Holger Walter , Ulrich Loering , Daniel Kraehmer , Gerhard Fuerter
IPC分类号： G02B27/18 , G02B11/28 , G02B11/04
CPC分类号： G02B13/143 , G02B13/26 , G03F7/70241
摘要： The invention features a system for microlithography that includes a mercury light source configured to emit radiation at multiple mercury emission lines, a projection objective positioned to receive radiation emitted by the mercury light source, and a stage configured to position a wafer relative to the projection objective. During operation, the projection objective directs radiation from the light source to the wafer, where the radiation at the wafer includes energy from more than one of the emission lines. Optical lens systems for use in said projection objective comprise four lens groups, each having two lenses comprising silica, the first and second lens groups on one hand and the third and fourth lens groups on the other hand are positioned symmetrically with respect to a plane perpendicular to the optical axis of said lens system.
摘要翻译：本发明的特征在于一种用于微光刻的系统，其包括配置成在多个汞发射线处发射辐射的水银光源，设置成接收由水银光源发射的辐射的投影物镜，以及被配置为相对于投影物镜定位晶片的台。在操作期间，投影物镜将来自光源的辐射引导到晶片，其中晶片处的辐射包括来自多于一个发射线的能量。用于所述投影物镜的光学透镜系统包括四个透镜组，每个透镜组具有包括二氧化硅的两个透镜，另一方面，第一和第二透镜组以及第三透镜组和第四透镜组相对于垂直的平面对称地定位到所述透镜系统的光轴。

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