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1. 发明授权

US07763870B2 Optical system for radiation in the EUV-wavelength range and method for measuring a contamination status of EUV-reflective elements 有权
标题翻译：用于EUV波长范围辐射的光学系统和用于测量EUV反射元件的污染状态的方法
公开(公告)号：US07763870B2
公开(公告)日：2010-07-27
申请号：US11855849
申请日：2007-09-14
申请人： Dirk Heinrich Ehm , Hermann Bieg , Hans-Juergen Mann , Stephan Muellender , Johannes Hubertus Josephina Moors , Bastiaan Theodoor Wolschrijn
发明人： Dirk Heinrich Ehm , Hermann Bieg , Hans-Juergen Mann , Stephan Muellender , Johannes Hubertus Josephina Moors , Bastiaan Theodoor Wolschrijn
IPC分类号： H05G2/00
CPC分类号： G03F7/70916 , G03F7/7085 , G03F7/70941
摘要： An optical system for radiation in the EUV wavelength range, in particular a projection exposure apparatus, having at least one vacuum vessel, including: at least one EUV-reflective optical element arranged in an optical path, and a holder which includes at least one sample element, the sample element having an optical surface which is exposed to incident EUV-radiation outside of the optical path, the sample element being sensitive to chemical alterations under influence of the incident EUV-radiation which also affect the optical element. The optical system further includes at least one detection unit for online detection of the contamination status of the sample element during exposure of the sample element to the incident EUV-radiation.
摘要翻译：一种用于EUV波长范围的辐射的光学系统，特别是具有至少一个真空容器的投影曝光装置，包括：至少一个设置在光路中的EUV反射光学元件，以及一个保持器，该保持器包括至少一个样品元件，样品元件具有暴露于光路外部的入射EUV辐射的光学表面，样品元件在影响光学元件的入射EUV辐射的影响下对化学变化敏感。光学系统还包括至少一个检测单元，用于在将样品元件暴露于入射的EUV辐射期间在线检测样品元件的污染状态。

2. 发明申请

US20080315134A1 OPTICAL SYSTEM FOR RADIATION IN THE EUV-WAVELENGTH RANGE AND METHOD FOR MEASURING A CONTAMINATION STATUS OF EUV-REFLECTIVE ELEMENTS 有权
标题翻译：用于辐射EUV波长范围的光学系统和测量EUV反射元件的污染状态的方法
公开(公告)号：US20080315134A1
公开(公告)日：2008-12-25
申请号：US11855849
申请日：2007-09-14
申请人： Dirk Heinrich EHM , Hermann Bieg , Hans-Juergen Mann , Stephan Muellender , Johannes Hubertus Josephina Moors , Bastian Theodor Wolschrijn
发明人： Dirk Heinrich EHM , Hermann Bieg , Hans-Juergen Mann , Stephan Muellender , Johannes Hubertus Josephina Moors , Bastian Theodor Wolschrijn
IPC分类号： A61N5/06 , G03B27/54
CPC分类号： G03F7/70916 , G03F7/7085 , G03F7/70941
摘要： An optical system for radiation in the EUV wavelength range, in particular a projection exposure apparatus, having at least one vacuum vessel, including: at least one EUV-reflective optical element arranged in an optical path, and a holder which includes at least one sample element, the sample element having an optical surface which is exposed to incident EUV-radiation outside of the optical path, the sample element being sensitive to chemical alterations under influence of the incident EUV-radiation which also affect the optical element. The optical system further includes at least one detection unit for online detection of the contamination status of the sample element during exposure of the sample element to the incident EUV-radiation.
摘要翻译：一种用于EUV波长范围的辐射的光学系统，特别是具有至少一个真空容器的投影曝光装置，包括：至少一个设置在光路中的EUV反射光学元件，以及一个保持器，该保持器包括至少一个样品元件，样品元件具有暴露于光路外部的入射EUV辐射的光学表面，样品元件在影响光学元件的入射EUV辐射的影响下对化学变化敏感。光学系统还包括至少一个检测单元，用于在将样品元件暴露于入射的EUV辐射期间在线检测样品元件的污染状态。

3. 发明授权

US08382301B2 Optical arrangement, in particular projection exposure apparatus for EUV lithography, as well as reflective optical element with reduced contamination 有权
公开(公告)号：US08382301B2
公开(公告)日：2013-02-26
申请号：US12403233
申请日：2009-03-12
申请人： Dirk Heinrich Ehm , Stephan Muellender , Thomas Stein , Johannes Hubertus Josephina Moors , Bastiaan Theodoor Wolschrijn , Dieter Kraus , Richard Versluis , Marcus Gerhardus Hendrikus Meijerink
发明人： Dirk Heinrich Ehm , Stephan Muellender , Thomas Stein , Johannes Hubertus Josephina Moors , Bastiaan Theodoor Wolschrijn , Dieter Kraus , Richard Versluis , Marcus Gerhardus Hendrikus Meijerink
IPC分类号： G02B5/08 , H01S3/22
CPC分类号： G03B27/16 , B82Y10/00 , G03F7/70841 , G03F7/70883 , G03F7/70916 , G21K2201/061
摘要： An optical arrangement, e.g. a projection exposure apparatus (1) for EUV lithography, includes: a housing (2) enclosing an interior space (15); at least one, preferably reflective optical element (4-10, 12, 14.1-14.6) arranged in the housing (2); at least one vacuum generating unit (3) for the interior space (15) of the housing (2); and at least one vacuum housing (18, 18.1-18.10) arranged in the interior space (15) and enclosing at least the optical surface (17, 17.1, 17.2) of the optical element (4-10, 12, 14.1-14.5). A contamination reduction unit is associated with the vacuum housing (18.1-18.10) and reduces the partial pressure of contaminating substances, in particular of water and/or hydrocarbons, at least in close proximity to the optical surface (17, 17.1, 17.2) in relation to the partial pressure of the contaminating substances in the interior space (15).

4. 发明申请

US20100265481A1 IMAGING OPTICAL SYSTEM AND PROJECTION EXPOSURE INSTALLATION 有权
标题翻译：成像光学系统和投影曝光安装
公开(公告)号：US20100265481A1
公开(公告)日：2010-10-21
申请号：US12767627
申请日：2010-04-26
申请人： Hans-Juergen Mann , Wilhelm Ulrich , Stephan Muellender , Hartmut Enkisch
发明人： Hans-Juergen Mann , Wilhelm Ulrich , Stephan Muellender , Hartmut Enkisch
IPC分类号： G03F7/20 , G02B17/06 , G21K1/06 , G03B27/70
CPC分类号： G02B5/0891 , G02B13/143 , G02B17/06 , G03F7/70175 , G03F7/70233
摘要： An imaging optical system has a plurality of mirrors. These image an object field in an object plane into an image field in an image plane. In the imaging optical system, the ratio of a maximum angle of incidence of imaging light) on reflection surfaces of the mirrors and an image-side numerical aperture of the imaging optical system is less than 33.8°. This can result in an imaging optical system which offers good conditions for a reflective coating of the mirror, with which a low reflection loss can be achieved for imaging light when passing through the imaging optical system, in particular even at wavelengths in the EUV range of less than 10 nm.
摘要翻译：成像光学系统具有多个反射镜。这些图像将物体平面中的对象场映射成图像平面中的图像场。在成像光学系统中，成像光在镜面反射面上的最大入射角与成像光学系统的像侧数值孔径之比小于33.8°。这可以导致成像光学系统，其为反射镜的反射涂层提供了良好的条件，通过该成像光学系统可以实现低反射损失，用于在通过成像光学系统时成像光，特别是甚至在EUV范围的波长小于10nm。

5. 发明申请

US20090015951A1 PROJECTION OBJECTIVE AND METHOD FOR ITS MANUFACTURE 审中-公开
标题翻译：投影目标及其制造方法
公开(公告)号：US20090015951A1
公开(公告)日：2009-01-15
申请号：US12196618
申请日：2008-08-22
申请人： Hans-Juergen Mann , Stephan Muellender , Johann Trenkler , Hartmut Enkisch
发明人： Hans-Juergen Mann , Stephan Muellender , Johann Trenkler , Hartmut Enkisch
IPC分类号： G02B7/182 , G03B27/54
CPC分类号： G03F7/706 , G02B5/0891 , G02B17/0663 , G03F7/70958 , G21K2201/067 , Y10S359/90
摘要： A method of manufacturing a projection objective (22) of a microlithographic projection exposure apparatus (10). The projection objective (22) comprises at least one mirror (M1 to M6) that each have a mirror support (241 to 246) and a reflective coating (26) applied thereon. First imaging aberrations of a pre-assembled projection objective are measured. Before the coating (26) is applied, the mirror supports (241 to 246) are provided with a desired surface deformation (34). If the mirrors (M1 to M6) are not reflective for projection light without the coating (26), measuring light is used that has another wavelength. Alternatively, two identical mirror supports (246) may be provided. One support having a reflective coating is part of the pre-assembled projection objective whose imaging aberrations are measured. The other support is provided with surface deformations before coating and mounting the support into the objective.
摘要翻译：一种制造微光刻投影曝光装置（10）的投影物镜（22）的方法。投影物镜（22）包括至少一个镜子（M1至M6），每个镜子具有镜支撑件（241至246）和反射涂层（26）。测量预组装的投影物镜的第一成像像差。在施加涂层（26）之前，反射镜支撑件（241至246）具有期望的表面变形（34）。如果反射镜（M1至M6）对于没有涂层（26）的投影光不反射，则使用具有另一波长的测量光。或者，可以提供两个相同的反射镜支撑件（246）。具有反射涂层的一个支撑件是预组装的投影物镜的一部分，其测量成像像差。另一个支撑件在涂覆和将支撑件安装到物镜之前提供了表面变形。

6. 发明申请

US20100149517A1 PROJECTION OBJECTIVE AND METHOD FOR ITS MANUFACTURE 有权
标题翻译：投影目标及其制造方法
公开(公告)号：US20100149517A1
公开(公告)日：2010-06-17
申请号：US12710487
申请日：2010-02-23
申请人： Hans-Juergen Mann , Stephan Muellender , Johann Trenkler , Harmut Enkisch
发明人： Hans-Juergen Mann , Stephan Muellender , Johann Trenkler , Harmut Enkisch
IPC分类号： G03B27/32
CPC分类号： G03F7/706 , G02B5/0891 , G02B17/0663 , G03F7/70958 , G21K2201/067 , Y10S359/90
摘要： A method of manufacturing a projection objective (22) of a microlithographic projection exposure apparatus (10). The projection objective (22) comprises at least one mirror (M1 to M6) that each have a mirror support (241 to 246) and a reflective coating (26) applied thereon. First imaging aberrations of a pre-assembled projection objective are measured. Before the coating (26) is applied, the mirror supports (241 to 246) are provided with a desired surface deformation (34). If the mirrors (M1 to M6) are not reflective for projection light without the coating (26), measuring light is used that has another wavelength. Alternatively, two identical mirror supports (246) may be provided. One support having a reflective coating is part of the pre-assembled projection objective whose imaging aberrations are measured. The other support is provided with surface deformations before coating and mounting the support into the objective.
摘要翻译：一种制造微光刻投影曝光装置（10）的投影物镜（22）的方法。投影物镜（22）包括至少一个镜子（M1至M6），每个镜子具有镜支撑件（241至246）和反射涂层（26）。测量预组装的投影物镜的第一成像像差。在施加涂层（26）之前，反射镜支撑件（241至246）具有期望的表面变形（34）。如果反射镜（M1至M6）对于没有涂层（26）的投影光不反射，则使用具有另一波长的测量光。或者，可以提供两个相同的反射镜支撑件（246）。具有反射涂层的一个支撑件是预组装的投影物镜的一部分，其测量成像像差。另一个支撑件在涂覆和将支撑件安装到物镜之前提供了表面变形。

7. 发明授权

US08944615B2 Projection objective and method for its manufacture 有权
标题翻译：投影目的及其制造方法
公开(公告)号：US08944615B2
公开(公告)日：2015-02-03
申请号：US12710487
申请日：2010-02-23
申请人： Hans-Juergen Mann , Stephan Muellender , Johann Trenkler , Harmut Enkisch
发明人： Hans-Juergen Mann , Stephan Muellender , Johann Trenkler , Harmut Enkisch
IPC分类号： G02B7/182 , G03F7/20 , G02B5/08 , G02B17/06
CPC分类号： G03F7/706 , G02B5/0891 , G02B17/0663 , G03F7/70958 , G21K2201/067 , Y10S359/90
摘要： A method of manufacturing a projection objective (22) of a microlithographic projection exposure apparatus (10). The projection objective (22) comprises at least one mirror (M1 to M6) that each have a mirror support (241 to 246) and a reflective coating (26) applied thereon. First imaging aberrations of a pre-assembled projection objective are measured. Before the coating (26) is applied, the mirror supports (241 to 246) are provided with a desired surface deformation (34). If the mirrors (M1 to M6) are not reflective for projection light without the coating (26), measuring light is used that has another wavelength. Alternatively, two identical mirror supports (246) may be provided. One support having a reflective coating is part of the pre-assembled projection objective whose imaging aberrations are measured. The other support is provided with surface deformations before coating and mounting the support into the objective.
摘要翻译：一种制造微光刻投影曝光装置（10）的投影物镜（22）的方法。投影物镜（22）包括至少一个镜子（M1至M6），每个镜子具有镜支撑件（241至246）和反射涂层（26）。测量预组装的投影物镜的第一成像像差。在施加涂层（26）之前，反射镜支撑件（241至246）具有期望的表面变形（34）。如果反射镜（M1至M6）对于没有涂层（26）的投影光不反射，则使用具有另一波长的测量光。或者，可以提供两个相同的反射镜支撑件（246）。具有反射涂层的一个支撑件是预组装的投影物镜的一部分，其测量成像像差。另一个支撑件在涂覆和将支撑件安装到物镜之前提供了表面变形。

8. 发明授权

US08605255B2 Imaging optical system and projection exposure system including the same 有权
标题翻译：成像光学系统和投影曝光系统包括相同的
公开(公告)号：US08605255B2
公开(公告)日：2013-12-10
申请号：US12767627
申请日：2010-04-26
申请人： Hans-Juergen Mann , Wilhelm Ulrich , Stephan Muellender , Hartmut Enkisch
发明人： Hans-Juergen Mann , Wilhelm Ulrich , Stephan Muellender , Hartmut Enkisch
IPC分类号： G03B27/54 , G03B27/32
CPC分类号： G02B5/0891 , G02B13/143 , G02B17/06 , G03F7/70175 , G03F7/70233
摘要： An imaging optical system has a plurality of mirrors. These image an object field in an object plane into an image field in an image plane. In the imaging optical system, the ratio of a maximum angle of incidence of imaging light) on reflection surfaces of the mirrors and an image-side numerical aperture of the imaging optical system is less than 33.8°. This can result in an imaging optical system which offers good conditions for a reflective coating of the mirror, with which a low reflection loss can be achieved for imaging light when passing through the imaging optical system, in particular even at wavelengths in the EUV range of less than 10 nm.
摘要翻译：成像光学系统具有多个反射镜。这些图像将物体平面中的对象场映射成图像平面中的图像场。在成像光学系统中，成像光在镜面反射面上的最大入射角与成像光学系统的像侧数值孔径之比小于33.8°。这可以导致成像光学系统，其为反射镜的反射涂层提供了良好的条件，通过该成像光学系统可以实现低反射损失，用于在通过成像光学系统时成像光，特别是甚至在EUV范围的波长小于10nm。

9. 发明授权

US07429116B2 Projection objective and method for its manufacture 有权
标题翻译：投影目的及其制造方法
公开(公告)号：US07429116B2
公开(公告)日：2008-09-30
申请号：US11014537
申请日：2004-12-16
申请人： Hans-Juergen Mann , Stephan Muellender , Johann Trenkler , Hartmut Enkisch
发明人： Hans-Juergen Mann , Stephan Muellender , Johann Trenkler , Hartmut Enkisch
IPC分类号： G02B7/182
CPC分类号： G03F7/706 , G02B5/0891 , G02B17/0663 , G03F7/70958 , G21K2201/067 , Y10S359/90
摘要： A method of manufacturing a projection objective (22) of a microlithographic projection exposure apparatus (10). The projection objective (22) comprises at least one mirror (M1 to M6) that each have a mirror support (241 to 246) and a reflective coating (26) applied thereon. First imaging aberrations of a pre-assembled projection objective are measured. Before the coating (26) is applied, the mirror supports (241 to 246) are provided with a desired surface deformation (34). If the mirrors (M1 to M6) are not reflective for projection light without the coating (26), measuring light is used that has another wavelength. Alternatively, two identical mirror supports (246) may be provided. One support having a reflective coating is part of the pre-assembled projection objective whose imaging aberrations are measured. The other support is provided with surface deformations before coating and mounting the support into the objective.
摘要翻译：一种制造微光刻投影曝光装置（10）的投影物镜（22）的方法。投影物镜（22）包括至少一个镜子（M 1至M 6），每个镜子具有镜支撑件（241至246）和反射涂层（26）。测量预组装的投影物镜的第一成像像差。在施加涂层（26）之前，反射镜支撑件（241至246）具有期望的表面变形（34）。如果反射镜（M 1至M 6）对于没有涂层（26）的投射光不反射，则使用具有另一波长的测量光。或者，可以提供两个相同的反射镜支撑件（246）。具有反射涂层的一个支撑件是预组装的投影物镜的一部分，其测量成像像差。另一个支撑件在涂覆和将支撑件安装到物镜之前提供了表面变形。

10. 发明申请

US20050134980A1 Projection objective and method for its manufacture 有权
标题翻译：投影目的及其制造方法
公开(公告)号：US20050134980A1
公开(公告)日：2005-06-23
申请号：US11014537
申请日：2004-12-16
申请人： Hans-Juergen Mann , Stephan Muellender , Johann Trenkler , Hartmut Enkisch
发明人： Hans-Juergen Mann , Stephan Muellender , Johann Trenkler , Hartmut Enkisch
IPC分类号： G02B1/10 , G02B5/08 , G02B17/06 , G03F7/20 , G02B26/08
CPC分类号： G03F7/706 , G02B5/0891 , G02B17/0663 , G03F7/70958 , G21K2201/067 , Y10S359/90
摘要： A method of manufacturing a projection objective (22) of a microlithographic projection exposure apparatus (10) is described. The projection objective (22) comprises at least one mirror (M1 to M6) that each have a mirror support (241 to 246) and a reflective coating (26) applied thereon. First imaging aberrations of a pre-assembled projection objective are measured. Before the coating (26) is applied, the mirror supports (241 to 246) are provided with a desired surface deformation (34). If the mirrors (M1 to M6) are not reflective for projection light without the coating (26), measuring light is used that has another wavelength. Alternatively, two identical mirror supports (246) may be provided. One support having a reflective coating is part of the pre-assembled projection objective whose imaging aberrations are measured. The other support is provided with surface deformations before coating and mounting the support into the objective.
摘要翻译：描述了制造微光刻投影曝光装置（10）的投影物镜（22）的方法。投影物镜（22）包括至少一个镜子（M 1至M 6），每个镜子具有镜支撑件（241至246）和反射涂层（26）。测量预组装的投影物镜的第一成像像差。在施加涂层（26）之前，反射镜支撑件（241至246）具有期望的表面变形（34）。如果反射镜（M 1至M 6）对于没有涂层（26）的投射光不反射，则使用具有另一波长的测量光。或者，可以提供两个相同的反射镜支撑件（246）。具有反射涂层的一个支撑件是预组装的投影物镜的一部分，其测量成像像差。另一个支撑件在涂覆和将支撑件安装到物镜之前提供了表面变形。

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