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1. 发明申请

US20100265481A1 IMAGING OPTICAL SYSTEM AND PROJECTION EXPOSURE INSTALLATION 有权
标题翻译：成像光学系统和投影曝光安装
公开(公告)号：US20100265481A1
公开(公告)日：2010-10-21
申请号：US12767627
申请日：2010-04-26
申请人： Hans-Juergen Mann , Wilhelm Ulrich , Stephan Muellender , Hartmut Enkisch
发明人： Hans-Juergen Mann , Wilhelm Ulrich , Stephan Muellender , Hartmut Enkisch
IPC分类号： G03F7/20 , G02B17/06 , G21K1/06 , G03B27/70
CPC分类号： G02B5/0891 , G02B13/143 , G02B17/06 , G03F7/70175 , G03F7/70233
摘要： An imaging optical system has a plurality of mirrors. These image an object field in an object plane into an image field in an image plane. In the imaging optical system, the ratio of a maximum angle of incidence of imaging light) on reflection surfaces of the mirrors and an image-side numerical aperture of the imaging optical system is less than 33.8°. This can result in an imaging optical system which offers good conditions for a reflective coating of the mirror, with which a low reflection loss can be achieved for imaging light when passing through the imaging optical system, in particular even at wavelengths in the EUV range of less than 10 nm.
摘要翻译：成像光学系统具有多个反射镜。这些图像将物体平面中的对象场映射成图像平面中的图像场。在成像光学系统中，成像光在镜面反射面上的最大入射角与成像光学系统的像侧数值孔径之比小于33.8°。这可以导致成像光学系统，其为反射镜的反射涂层提供了良好的条件，通过该成像光学系统可以实现低反射损失，用于在通过成像光学系统时成像光，特别是甚至在EUV范围的波长小于10nm。

2. 发明授权

US08605255B2 Imaging optical system and projection exposure system including the same 有权
标题翻译：成像光学系统和投影曝光系统包括相同的
公开(公告)号：US08605255B2
公开(公告)日：2013-12-10
申请号：US12767627
申请日：2010-04-26
申请人： Hans-Juergen Mann , Wilhelm Ulrich , Stephan Muellender , Hartmut Enkisch
发明人： Hans-Juergen Mann , Wilhelm Ulrich , Stephan Muellender , Hartmut Enkisch
IPC分类号： G03B27/54 , G03B27/32
CPC分类号： G02B5/0891 , G02B13/143 , G02B17/06 , G03F7/70175 , G03F7/70233
摘要： An imaging optical system has a plurality of mirrors. These image an object field in an object plane into an image field in an image plane. In the imaging optical system, the ratio of a maximum angle of incidence of imaging light) on reflection surfaces of the mirrors and an image-side numerical aperture of the imaging optical system is less than 33.8°. This can result in an imaging optical system which offers good conditions for a reflective coating of the mirror, with which a low reflection loss can be achieved for imaging light when passing through the imaging optical system, in particular even at wavelengths in the EUV range of less than 10 nm.
摘要翻译：成像光学系统具有多个反射镜。这些图像将物体平面中的对象场映射成图像平面中的图像场。在成像光学系统中，成像光在镜面反射面上的最大入射角与成像光学系统的像侧数值孔径之比小于33.8°。这可以导致成像光学系统，其为反射镜的反射涂层提供了良好的条件，通过该成像光学系统可以实现低反射损失，用于在通过成像光学系统时成像光，特别是甚至在EUV范围的波长小于10nm。

3. 发明申请

US20090015951A1 PROJECTION OBJECTIVE AND METHOD FOR ITS MANUFACTURE 审中-公开
标题翻译：投影目标及其制造方法
公开(公告)号：US20090015951A1
公开(公告)日：2009-01-15
申请号：US12196618
申请日：2008-08-22
申请人： Hans-Juergen Mann , Stephan Muellender , Johann Trenkler , Hartmut Enkisch
发明人： Hans-Juergen Mann , Stephan Muellender , Johann Trenkler , Hartmut Enkisch
IPC分类号： G02B7/182 , G03B27/54
CPC分类号： G03F7/706 , G02B5/0891 , G02B17/0663 , G03F7/70958 , G21K2201/067 , Y10S359/90
摘要： A method of manufacturing a projection objective (22) of a microlithographic projection exposure apparatus (10). The projection objective (22) comprises at least one mirror (M1 to M6) that each have a mirror support (241 to 246) and a reflective coating (26) applied thereon. First imaging aberrations of a pre-assembled projection objective are measured. Before the coating (26) is applied, the mirror supports (241 to 246) are provided with a desired surface deformation (34). If the mirrors (M1 to M6) are not reflective for projection light without the coating (26), measuring light is used that has another wavelength. Alternatively, two identical mirror supports (246) may be provided. One support having a reflective coating is part of the pre-assembled projection objective whose imaging aberrations are measured. The other support is provided with surface deformations before coating and mounting the support into the objective.
摘要翻译：一种制造微光刻投影曝光装置（10）的投影物镜（22）的方法。投影物镜（22）包括至少一个镜子（M1至M6），每个镜子具有镜支撑件（241至246）和反射涂层（26）。测量预组装的投影物镜的第一成像像差。在施加涂层（26）之前，反射镜支撑件（241至246）具有期望的表面变形（34）。如果反射镜（M1至M6）对于没有涂层（26）的投影光不反射，则使用具有另一波长的测量光。或者，可以提供两个相同的反射镜支撑件（246）。具有反射涂层的一个支撑件是预组装的投影物镜的一部分，其测量成像像差。另一个支撑件在涂覆和将支撑件安装到物镜之前提供了表面变形。

4. 发明授权

US07429116B2 Projection objective and method for its manufacture 有权
标题翻译：投影目的及其制造方法
公开(公告)号：US07429116B2
公开(公告)日：2008-09-30
申请号：US11014537
申请日：2004-12-16
申请人： Hans-Juergen Mann , Stephan Muellender , Johann Trenkler , Hartmut Enkisch
发明人： Hans-Juergen Mann , Stephan Muellender , Johann Trenkler , Hartmut Enkisch
IPC分类号： G02B7/182
CPC分类号： G03F7/706 , G02B5/0891 , G02B17/0663 , G03F7/70958 , G21K2201/067 , Y10S359/90
摘要： A method of manufacturing a projection objective (22) of a microlithographic projection exposure apparatus (10). The projection objective (22) comprises at least one mirror (M1 to M6) that each have a mirror support (241 to 246) and a reflective coating (26) applied thereon. First imaging aberrations of a pre-assembled projection objective are measured. Before the coating (26) is applied, the mirror supports (241 to 246) are provided with a desired surface deformation (34). If the mirrors (M1 to M6) are not reflective for projection light without the coating (26), measuring light is used that has another wavelength. Alternatively, two identical mirror supports (246) may be provided. One support having a reflective coating is part of the pre-assembled projection objective whose imaging aberrations are measured. The other support is provided with surface deformations before coating and mounting the support into the objective.
摘要翻译：一种制造微光刻投影曝光装置（10）的投影物镜（22）的方法。投影物镜（22）包括至少一个镜子（M 1至M 6），每个镜子具有镜支撑件（241至246）和反射涂层（26）。测量预组装的投影物镜的第一成像像差。在施加涂层（26）之前，反射镜支撑件（241至246）具有期望的表面变形（34）。如果反射镜（M 1至M 6）对于没有涂层（26）的投射光不反射，则使用具有另一波长的测量光。或者，可以提供两个相同的反射镜支撑件（246）。具有反射涂层的一个支撑件是预组装的投影物镜的一部分，其测量成像像差。另一个支撑件在涂覆和将支撑件安装到物镜之前提供了表面变形。

5. 发明申请

US20050134980A1 Projection objective and method for its manufacture 有权
标题翻译：投影目的及其制造方法
公开(公告)号：US20050134980A1
公开(公告)日：2005-06-23
申请号：US11014537
申请日：2004-12-16
申请人： Hans-Juergen Mann , Stephan Muellender , Johann Trenkler , Hartmut Enkisch
发明人： Hans-Juergen Mann , Stephan Muellender , Johann Trenkler , Hartmut Enkisch
IPC分类号： G02B1/10 , G02B5/08 , G02B17/06 , G03F7/20 , G02B26/08
CPC分类号： G03F7/706 , G02B5/0891 , G02B17/0663 , G03F7/70958 , G21K2201/067 , Y10S359/90
摘要： A method of manufacturing a projection objective (22) of a microlithographic projection exposure apparatus (10) is described. The projection objective (22) comprises at least one mirror (M1 to M6) that each have a mirror support (241 to 246) and a reflective coating (26) applied thereon. First imaging aberrations of a pre-assembled projection objective are measured. Before the coating (26) is applied, the mirror supports (241 to 246) are provided with a desired surface deformation (34). If the mirrors (M1 to M6) are not reflective for projection light without the coating (26), measuring light is used that has another wavelength. Alternatively, two identical mirror supports (246) may be provided. One support having a reflective coating is part of the pre-assembled projection objective whose imaging aberrations are measured. The other support is provided with surface deformations before coating and mounting the support into the objective.
摘要翻译：描述了制造微光刻投影曝光装置（10）的投影物镜（22）的方法。投影物镜（22）包括至少一个镜子（M 1至M 6），每个镜子具有镜支撑件（241至246）和反射涂层（26）。测量预组装的投影物镜的第一成像像差。在施加涂层（26）之前，反射镜支撑件（241至246）具有期望的表面变形（34）。如果反射镜（M 1至M 6）对于没有涂层（26）的投射光不反射，则使用具有另一波长的测量光。或者，可以提供两个相同的反射镜支撑件（246）。具有反射涂层的一个支撑件是预组装的投影物镜的一部分，其测量成像像差。另一个支撑件在涂覆和将支撑件安装到物镜之前提供了表面变形。

6. 发明申请

US20080315134A1 OPTICAL SYSTEM FOR RADIATION IN THE EUV-WAVELENGTH RANGE AND METHOD FOR MEASURING A CONTAMINATION STATUS OF EUV-REFLECTIVE ELEMENTS 有权
标题翻译：用于辐射EUV波长范围的光学系统和测量EUV反射元件的污染状态的方法
公开(公告)号：US20080315134A1
公开(公告)日：2008-12-25
申请号：US11855849
申请日：2007-09-14
申请人： Dirk Heinrich EHM , Hermann Bieg , Hans-Juergen Mann , Stephan Muellender , Johannes Hubertus Josephina Moors , Bastian Theodor Wolschrijn
发明人： Dirk Heinrich EHM , Hermann Bieg , Hans-Juergen Mann , Stephan Muellender , Johannes Hubertus Josephina Moors , Bastian Theodor Wolschrijn
IPC分类号： A61N5/06 , G03B27/54
CPC分类号： G03F7/70916 , G03F7/7085 , G03F7/70941
摘要： An optical system for radiation in the EUV wavelength range, in particular a projection exposure apparatus, having at least one vacuum vessel, including: at least one EUV-reflective optical element arranged in an optical path, and a holder which includes at least one sample element, the sample element having an optical surface which is exposed to incident EUV-radiation outside of the optical path, the sample element being sensitive to chemical alterations under influence of the incident EUV-radiation which also affect the optical element. The optical system further includes at least one detection unit for online detection of the contamination status of the sample element during exposure of the sample element to the incident EUV-radiation.
摘要翻译：一种用于EUV波长范围的辐射的光学系统，特别是具有至少一个真空容器的投影曝光装置，包括：至少一个设置在光路中的EUV反射光学元件，以及一个保持器，该保持器包括至少一个样品元件，样品元件具有暴露于光路外部的入射EUV辐射的光学表面，样品元件在影响光学元件的入射EUV辐射的影响下对化学变化敏感。光学系统还包括至少一个检测单元，用于在将样品元件暴露于入射的EUV辐射期间在线检测样品元件的污染状态。

7. 发明授权

US08164077B2 Optical element for radiation in the EUV and/or soft X-ray region and an optical system with at least one optical element 有权
标题翻译：用于EUV和/或软X射线区域中的辐射的光学元件以及具有至少一个光学元件的光学系统
公开(公告)号：US08164077B2
公开(公告)日：2012-04-24
申请号：US12625336
申请日：2009-11-24
申请人： Marco Wedowski , Nadyeh Shariloo, legal representative , Markus Weiss , Stephan Muellender , Johann Trenkler , Hartmut Enkisch , Gisela Sipos , Hubert Adriaan van Mierlo , Michiel David Nijkerk , Fokko Pieter Wieringa
发明人： Marco Wedowski , Markus Weiss , Stephan Muellender , Johann Trenkler , Hartmut Enkisch , Gisela Sipos , Hubert Adriaan van Mierlo , Michiel David Nijkerk , Fokko Pieter Wieringa
IPC分类号： G01J3/10
CPC分类号： G03F7/70958 , B82Y10/00 , G03F7/70175 , G03F7/70316 , G03F7/70916 , G21K1/00 , G21K1/062 , G21K2201/067
摘要： An optical element, especially a normal-incidence collector mirror, for radiation in the EUV and/or soft X-ray region of wavelengths is described. The element has a substrate, a multilayer coating with an optically active region, and a capacitor, having a first and a second capacitor electrode. At least one layer of the multilayer coating serves as the first capacitor electrode. At least one dielectric layer is provided between the two capacitor electrodes. Also described is an optical system with at least one optical element, having a first electrode arranged in the vicinity of the optical element.
摘要翻译：描述了用于EUV和/或波长的软X射线区域中的辐射的光学元件，特别是法向入射收集镜。元件具有基板，具有光学活性区域的多层涂层和具有第一和第二电容器电极的电容器。多层涂层的至少一层用作第一电容器电极。在两个电容器电极之间提供至少一个电介质层。还描述了具有至少一个光学元件的光学系统，其具有布置在光学元件附近的第一电极。

8. 发明授权

US09304405B2 Microlithography illumination system and microlithography illumination optical unit 有权
标题翻译：微光刻照明系统和微光刻照明光学单元
公开(公告)号：US09304405B2
公开(公告)日：2016-04-05
申请号：US12974436
申请日：2010-12-21
申请人： Damian Fiolka , Michael Totzeck , Hartmut Enkisch , Stephan Muellender
发明人： Damian Fiolka , Michael Totzeck , Hartmut Enkisch , Stephan Muellender
IPC分类号： G03F7/20
CPC分类号： G03F7/70191 , G03F7/70075 , G03F7/70116 , G03F7/702 , G03F7/70566
摘要： An illumination optical unit for microlithography illuminates an object field with illumination light. The unit includes a first facet mirror that has a plurality of first facets, and a second facet mirror that has a plurality of second facets. The unit has facet pairs which include respectively a facet of the first facet mirror and a facet of the second facet mirror which predefine a plurality of illumination channels for illuminating the object field. At least some of the illumination channels have in each case an assigned polarization element for predefining an individual polarization state of the illumination light guided in the respective illumination channel.
摘要翻译：用于微光刻的照明光学单元用照明光照亮物场。该单元包括具有多个第一小面的第一小面镜和具有多个第二面的第二小面镜。该单元具有分面对，其分别包括第一分面反射镜的小平面和第二分面反射镜的小平面，其预定义用于照亮对象场的多个照明通道。至少一些照明通道在每种情况下都具有分配的偏振元件，用于预定义在各个照明通道中引导的照明光的单独偏振状态。

9. 发明授权

US08457281B2 Method for producing a multilayer coating, optical element and optical arrangement 有权
标题翻译：制造多层涂层，光学元件和光学布置的方法
公开(公告)号：US08457281B2
公开(公告)日：2013-06-04
申请号：US12965280
申请日：2010-12-10
申请人： Hartmut Enkisch , Stephan Muellender , Martin Endres
发明人： Hartmut Enkisch , Stephan Muellender , Martin Endres
IPC分类号： G21K1/06
CPC分类号： G21K1/062 , B82Y10/00 , G02B5/0891 , G03F7/70958
摘要： A method for producing a multilayer coating (17) for reflecting radiation in the soft X-ray or EUV wavelength range on an optical element (8, 9) operated at an operating temperature (TOP) of 30° C. or more, including: determining an optical design for the multilayer coating (17) which defines an optical desired layer thickness (nOP dOP) of the layers (17.1, 17.2) of the multilayer coating (17) at the operating temperature (TOP), and applying the layers (17.1, 17.2) of the multilayer coating (17) with an optical actual layer thickness (nB dB) chosen such that a layer thickness change(nOP dOP−nB dB) caused by thermal expansion of the layers (17.1, 17.2) between the coating temperature (TB) and the operating temperature (TOP) is compensated for. Also provided are an associated optical element (8, 9) and a projection exposure apparatus having at least one such optical element (8, 9).
摘要翻译：一种制造用于在操作温度（TOP）为30℃以上的光学元件（8,9）上反射软X射线或EUV波长范围内的辐射的多层涂层（17）的方法，包括：确定多层涂层（17）的光学设计，其在工作温度（TOP）下限定多层涂层（17）的层（17.1,17.2）的光学期望层厚度（nOP dOP），并施加层选择具有光学实际层厚度（nB dB）的多层涂层（17）的17.1,17.2），使得由涂层（17.1,17.2）之间的层（17.1,17.2）的热膨胀引起的层厚度变化（nOP dOP-nB dB）温度（TB）和工作温度（TOP）得到补偿。还提供有相关联的光学元件（8,9）和具有至少一个这种光学元件（8,9）的投影曝光设备。

10. 发明申请

US20100149517A1 PROJECTION OBJECTIVE AND METHOD FOR ITS MANUFACTURE 有权
标题翻译：投影目标及其制造方法
公开(公告)号：US20100149517A1
公开(公告)日：2010-06-17
申请号：US12710487
申请日：2010-02-23
申请人： Hans-Juergen Mann , Stephan Muellender , Johann Trenkler , Harmut Enkisch
发明人： Hans-Juergen Mann , Stephan Muellender , Johann Trenkler , Harmut Enkisch
IPC分类号： G03B27/32
CPC分类号： G03F7/706 , G02B5/0891 , G02B17/0663 , G03F7/70958 , G21K2201/067 , Y10S359/90
摘要： A method of manufacturing a projection objective (22) of a microlithographic projection exposure apparatus (10). The projection objective (22) comprises at least one mirror (M1 to M6) that each have a mirror support (241 to 246) and a reflective coating (26) applied thereon. First imaging aberrations of a pre-assembled projection objective are measured. Before the coating (26) is applied, the mirror supports (241 to 246) are provided with a desired surface deformation (34). If the mirrors (M1 to M6) are not reflective for projection light without the coating (26), measuring light is used that has another wavelength. Alternatively, two identical mirror supports (246) may be provided. One support having a reflective coating is part of the pre-assembled projection objective whose imaging aberrations are measured. The other support is provided with surface deformations before coating and mounting the support into the objective.
摘要翻译：一种制造微光刻投影曝光装置（10）的投影物镜（22）的方法。投影物镜（22）包括至少一个镜子（M1至M6），每个镜子具有镜支撑件（241至246）和反射涂层（26）。测量预组装的投影物镜的第一成像像差。在施加涂层（26）之前，反射镜支撑件（241至246）具有期望的表面变形（34）。如果反射镜（M1至M6）对于没有涂层（26）的投影光不反射，则使用具有另一波长的测量光。或者，可以提供两个相同的反射镜支撑件（246）。具有反射涂层的一个支撑件是预组装的投影物镜的一部分，其测量成像像差。另一个支撑件在涂覆和将支撑件安装到物镜之前提供了表面变形。

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