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1. 发明申请

US20090015951A1 PROJECTION OBJECTIVE AND METHOD FOR ITS MANUFACTURE 审中-公开
标题翻译：投影目标及其制造方法
公开(公告)号：US20090015951A1
公开(公告)日：2009-01-15
申请号：US12196618
申请日：2008-08-22
申请人： Hans-Juergen Mann , Stephan Muellender , Johann Trenkler , Hartmut Enkisch
发明人： Hans-Juergen Mann , Stephan Muellender , Johann Trenkler , Hartmut Enkisch
IPC分类号： G02B7/182 , G03B27/54
CPC分类号： G03F7/706 , G02B5/0891 , G02B17/0663 , G03F7/70958 , G21K2201/067 , Y10S359/90
摘要： A method of manufacturing a projection objective (22) of a microlithographic projection exposure apparatus (10). The projection objective (22) comprises at least one mirror (M1 to M6) that each have a mirror support (241 to 246) and a reflective coating (26) applied thereon. First imaging aberrations of a pre-assembled projection objective are measured. Before the coating (26) is applied, the mirror supports (241 to 246) are provided with a desired surface deformation (34). If the mirrors (M1 to M6) are not reflective for projection light without the coating (26), measuring light is used that has another wavelength. Alternatively, two identical mirror supports (246) may be provided. One support having a reflective coating is part of the pre-assembled projection objective whose imaging aberrations are measured. The other support is provided with surface deformations before coating and mounting the support into the objective.
摘要翻译：一种制造微光刻投影曝光装置（10）的投影物镜（22）的方法。投影物镜（22）包括至少一个镜子（M1至M6），每个镜子具有镜支撑件（241至246）和反射涂层（26）。测量预组装的投影物镜的第一成像像差。在施加涂层（26）之前，反射镜支撑件（241至246）具有期望的表面变形（34）。如果反射镜（M1至M6）对于没有涂层（26）的投影光不反射，则使用具有另一波长的测量光。或者，可以提供两个相同的反射镜支撑件（246）。具有反射涂层的一个支撑件是预组装的投影物镜的一部分，其测量成像像差。另一个支撑件在涂覆和将支撑件安装到物镜之前提供了表面变形。

2. 发明申请

US20070114466A1 Optical element for radiation in the EUV and/or soft X-ray region and an optical system with at least on optical element 有权
标题翻译：用于EUV和/或软X射线区域中的辐射的光学元件以及至少具有光学元件的光学系统
公开(公告)号：US20070114466A1
公开(公告)日：2007-05-24
申请号：US11439854
申请日：2006-05-24
申请人： Marco Wedowski , Markus Weiss , Stephan Mullender , Johann Trenkler , Hartmut Enkisch , Gisela Sipos , H.A. van Mierlo , Michiel Nijkerk , Fokko Wieringa , Nadyeh Shariloo
发明人： Marco Wedowski , Markus Weiss , Stephan Mullender , Johann Trenkler , Hartmut Enkisch , Gisela Sipos , H.A. van Mierlo , Michiel Nijkerk , Fokko Wieringa , Nadyeh Shariloo
IPC分类号： G01J3/10
CPC分类号： G03F7/70958 , B82Y10/00 , G03F7/70175 , G03F7/70316 , G03F7/70916 , G21K1/00 , G21K1/062 , G21K2201/067
摘要： An optical element, especially a normal-incidence collector mirror, for radiation in the EUV and/or soft X-ray region of wavelengths is described. The element has a substrate, a multilayer coating with an optically active region, and a capacitor, having a first and a second capacitor electrode. At least one layer of the multilayer coating serves as the first capacitor electrode. At least one dielectric layer is provided between the two capacitor electrodes. Also described is an optical system with at least one optical element, having a first electrode arranged in the vicinity of the optical element.
摘要翻译：描述了用于EUV和/或波长的软X射线区域中的辐射的光学元件，特别是法向入射收集镜。元件具有基板，具有光学活性区域的多层涂层和具有第一和第二电容器电极的电容器。多层涂层的至少一层用作第一电容器电极。在两个电容器电极之间提供至少一个电介质层。还描述了具有至少一个光学元件的光学系统，其具有布置在光学元件附近的第一电极。

3. 发明申请

US20060066940A1 Reflective optical element and EUV lithography appliance 审中-公开
标题翻译：反光光学元件和EUV光刻设备
公开(公告)号：US20060066940A1
公开(公告)日：2006-03-30
申请号：US11216560
申请日：2005-08-31
申请人： Johann Trenkler , Hans-Jurgen Mann , Udo Nothelfer
发明人： Johann Trenkler , Hans-Jurgen Mann , Udo Nothelfer
IPC分类号： F21V9/04 , G02B1/10
CPC分类号： G02B5/0891 , B82Y10/00 , G02B5/0816 , G02B5/085 , G03F7/7015 , G03F7/70916 , G03F7/70958 , G21K1/062
摘要： The invention relates to a reflective optical element and an EUV lithography appliance containing one such element, said appliance displaying a low propensity to contamination. According to the invention, the reflective optical element has a protective layer system consisting of at least one layer. The optical characteristics of the protective layer system are between those of a spacer and an absorber or correspond to those of a spacer. The selection of a material with the smallest possible imaginary part and a real part which is as close to 1 as possible in terms of the refractive index leads to a plateau-type reflectivity course according to the thickness of the protective layer system between two thicknesses d1 and d2. The thickness of the protective layer system is selected in such a way that it is less than d2.
摘要翻译：本发明涉及一种包含一种这样的元件的反射光学元件和EUV光刻器具，所述器具显示出低的污染倾向。根据本发明，反射型光学元件具有由至少一层构成的保护层系统。保护层系统的光学特性在间隔物和吸收体的光学特性之间，或对应于间隔物的光学特性。在折射率方面选择具有尽可能小的虚部和实部尽可能接近1的材料导致根据保护层系统的厚度在两个厚度d之间的平台型反射率过程 1和d 2。选择保护层系统的厚度使其小于d 2。

4. 发明授权

US07952797B2 Reflective optical element and EUV lithography appliance 有权
标题翻译：反光光学元件和EUV光刻设备
公开(公告)号：US07952797B2
公开(公告)日：2011-05-31
申请号：US12399775
申请日：2009-03-06
申请人： Johann Trenkler , Hans-Jürgen Mann , Udo Nothelfer
发明人： Johann Trenkler , Hans-Jürgen Mann , Udo Nothelfer
IPC分类号： F21V9/06
CPC分类号： G02B5/0891 , B82Y10/00 , G02B5/0816 , G02B5/085 , G03F7/7015 , G03F7/70916 , G03F7/70958 , G21K1/062
摘要： A reflective optical element and an EUV lithography appliance containing one such element are provided, the appliance displaying a low propensity to contamination. The reflective optical element has a protective layer system consisting of at least one layer. The optical characteristics of the protective layer system are between those of a spacer and an absorber, or correspond to those of a spacer. The selection of a material with the smallest possible imaginary part and a real part which is as close to 1 as possible in terms of the refractive index leads to a plateau-type reflectivity course according to the thickness of the protective layer system between two thicknesses d1 and d2. The thickness of the protective layer system is selected in such a way that it is less than d2.
摘要翻译：提供了包含一个这样的元件的反射光学元件和EUV光刻设备，该器具显示出低的污染倾向。反射光学元件具有由至少一层组成的保护层系统。保护层系统的光学特性在间隔物和吸收体的光学特性之间，或者对应于间隔物的光学特性。选择具有尽可能小的虚部的材料和在折射率方面尽可能接近1的实部导致根据两个厚度之间的保护层系统的厚度d1的平台型反射率过程和d2。保护层系统的厚度选择为小于d2。

5. 发明申请

US20130312918A1 Safety Device 有权
标题翻译：安全装置
公开(公告)号：US20130312918A1
公开(公告)日：2013-11-28
申请号：US13983634
申请日：2012-02-10
申请人： Johann Trenkler
发明人： Johann Trenkler
IPC分类号： E04B2/74
CPC分类号： E04B2/7401 , A62B33/00 , E04B2/7405 , E04H17/16 , E05D1/04 , E05D7/009 , Y10T29/49629
摘要： The present invention relates to a device for the protection of living beings and objects from being buried in bulk material, a method for assembling said device and uses employing this device.
摘要翻译：本发明涉及一种用于保护生物和物体不被埋在散装材料中的装置，一种用于组装所述装置的方法和使用该装置的用途。

6. 发明授权

US08537460B2 Reflective optical element and EUV lithography appliance 有权
标题翻译：反光光学元件和EUV光刻设备
公开(公告)号：US08537460B2
公开(公告)日：2013-09-17
申请号：US13530192
申请日：2012-06-22
申请人： Johann Trenkler , Hans-Jürgen Mann , Udo Nothelfer
发明人： Johann Trenkler , Hans-Jürgen Mann , Udo Nothelfer
IPC分类号： G02B5/08
CPC分类号： G02B5/0891 , B82Y10/00 , G02B5/0816 , G02B5/085 , G03F7/7015 , G03F7/70916 , G03F7/70958 , G21K1/062
摘要： A reflective optical element and an EUV lithography appliance containing one such element are provided, the appliance displaying a low propensity to contamination. The reflective optical element has a protective layer system includes at least two layers. The optical characteristics of the protective layer system are between those of a spacer and an absorber, or correspond to those of a spacer. The selection of a material with the smallest possible imaginary part and a real part which is as close to 1 as possible in terms of the refractive index leads to a plateau-type reflectivity course according to the thickness of the protective layer system between two thicknesses d1 and d2. The thickness of the protective layer system is selected in such a way that it is less than d2.
摘要翻译：提供了包含一个这样的元件的反射光学元件和EUV光刻设备，该器具显示出低的污染倾向。反射型光学元件具有包括至少两层的保护层系统。保护层系统的光学特性在间隔物和吸收体的光学特性之间，或者对应于间隔物的光学特性。选择具有尽可能小的虚部的材料和在折射率方面尽可能接近1的实部导致根据两个厚度之间的保护层系统的厚度d1的平台型反射率过程和d2。选择保护层系统的厚度小于d2。

7. 发明申请

US20110228237A1 REFLECTIVE OPTICAL ELEMENT AND EUV LITHOGRAPHY APPLIANCE 有权
标题翻译：反射光学元件和EUV光刻设备
公开(公告)号：US20110228237A1
公开(公告)日：2011-09-22
申请号：US13118028
申请日：2011-05-27
申请人： Johann TRENKLER , Hans-Juergen MANN , Udo NOTHELFER
发明人： Johann TRENKLER , Hans-Juergen MANN , Udo NOTHELFER
IPC分类号： G03B27/00 , G02B5/08
CPC分类号： G02B5/0891 , B82Y10/00 , G02B5/0816 , G02B5/085 , G03F7/7015 , G03F7/70916 , G03F7/70958 , G21K1/062
摘要： A reflective optical element and an EUV lithography appliance containing one such element are provided, the appliance displaying a low propensity to contamination. The reflective optical element has a protective layer system includes at least two layers. The optical characteristics of the protective layer system are between those of a spacer and an absorber, or correspond to those of a spacer. The selection of a material with the smallest possible imaginary part and a real part which is as close to 1 as possible in terms of the refractive index leads to a plateau-type reflectivity course according to the thickness of the protective layer system between two thicknesses d1 and d2. The thickness of the protective layer system is selected in such a way that it is less than d2.
摘要翻译：提供了包含一个这样的元件的反射光学元件和EUV光刻设备，该器具显示出低的污染倾向。反射型光学元件具有包括至少两层的保护层系统。保护层系统的光学特性在间隔物和吸收体的光学特性之间，或者对应于间隔物的光学特性。选择具有尽可能小的虚部的材料和在折射率方面尽可能接近1的实部导致根据两个厚度之间的保护层系统的厚度d1的平台型反射率过程和d2。保护层系统的厚度选择为小于d2。

8. 发明授权

US08944615B2 Projection objective and method for its manufacture 有权
标题翻译：投影目的及其制造方法
公开(公告)号：US08944615B2
公开(公告)日：2015-02-03
申请号：US12710487
申请日：2010-02-23
申请人： Hans-Juergen Mann , Stephan Muellender , Johann Trenkler , Harmut Enkisch
发明人： Hans-Juergen Mann , Stephan Muellender , Johann Trenkler , Harmut Enkisch
IPC分类号： G02B7/182 , G03F7/20 , G02B5/08 , G02B17/06
CPC分类号： G03F7/706 , G02B5/0891 , G02B17/0663 , G03F7/70958 , G21K2201/067 , Y10S359/90
摘要： A method of manufacturing a projection objective (22) of a microlithographic projection exposure apparatus (10). The projection objective (22) comprises at least one mirror (M1 to M6) that each have a mirror support (241 to 246) and a reflective coating (26) applied thereon. First imaging aberrations of a pre-assembled projection objective are measured. Before the coating (26) is applied, the mirror supports (241 to 246) are provided with a desired surface deformation (34). If the mirrors (M1 to M6) are not reflective for projection light without the coating (26), measuring light is used that has another wavelength. Alternatively, two identical mirror supports (246) may be provided. One support having a reflective coating is part of the pre-assembled projection objective whose imaging aberrations are measured. The other support is provided with surface deformations before coating and mounting the support into the objective.
摘要翻译：一种制造微光刻投影曝光装置（10）的投影物镜（22）的方法。投影物镜（22）包括至少一个镜子（M1至M6），每个镜子具有镜支撑件（241至246）和反射涂层（26）。测量预组装的投影物镜的第一成像像差。在施加涂层（26）之前，反射镜支撑件（241至246）具有期望的表面变形（34）。如果反射镜（M1至M6）对于没有涂层（26）的投影光不反射，则使用具有另一波长的测量光。或者，可以提供两个相同的反射镜支撑件（246）。具有反射涂层的一个支撑件是预组装的投影物镜的一部分，其测量成像像差。另一个支撑件在涂覆和将支撑件安装到物镜之前提供了表面变形。

9. 发明申请

US20100195070A1 PROJECTION OBJECTIVE FOR MICROLITHOGRAPHY, PROJECTION EXPOSURE APPARATUS, PROJECTION EXPOSURE METHOD AND OPTICAL CORRECTION PLATE 有权
标题翻译：投影曝光法，投影曝光法和光学校正板投影目标
公开(公告)号：US20100195070A1
公开(公告)日：2010-08-05
申请号：US12698242
申请日：2010-02-02
申请人： Ulrich Loering , Gerd Reisinger , Franz-Josef Stickel , Sonja Schneider , Johann Trenkler , Stefan Kraus , Gordon Doering , Aksel Goehnermeier
发明人： Ulrich Loering , Gerd Reisinger , Franz-Josef Stickel , Sonja Schneider , Johann Trenkler , Stefan Kraus , Gordon Doering , Aksel Goehnermeier
IPC分类号： G03B27/68 , G02B9/00 , B32B3/00
CPC分类号： G03F7/70983 , G03F1/62 , G03F7/70308 , Y10T428/24612
摘要： A projection objective is disclosed. The projection objective can include a plurality of optical elements arranged to image a pattern from an object field in an object surface of the projection objective to an image field in an image surface of the projection objective with electromagnetic operating radiation from a wavelength band around an operating wavelength λ. The plurality of optical elements can include an optical correction plate that includes a body comprising a material transparent to the operating radiation, the body having a first optical surface, a second optical surface, a plate normal substantially perpendicular to the first and second optical surfaces, and a thickness profile defined as a distance between the first and second optical surfaces measured parallel to the plate normal. The first optical surface can have a non-rotationally symmetric aspheric first surface profile with a first peak-to-valley value PV1>λ. The second optical surface can have a non-rotationally symmetric aspheric second surface profile with a second peak-to-valley value PV2>λ. A thickness of the optical correction plate can vary by less than 0.1*(PV1+PV2)/2 across the optical correction plate.
摘要翻译：公开了一种投影物镜。投影物镜可以包括多个光学元件，其布置成将图案从投影物镜的物体表面中的物场映射到投影物镜的图像表面中的图像场，其中电磁操作辐射来自围绕操作的波长带波长λ。多个光学元件可以包括光学校正板，其包括主体，该主体包括对操作辐射透明的材料，该主体具有第一光学表面，第二光学表面，基本上垂直于第一和第二光学表面的板法线，以及限定为平行于板法线测量的第一和第二光学表面之间的距离的厚度分布。第一光学表面可以具有第一峰谷值PV1>λ的非旋转对称非球面第一表面轮廓。第二光学表面可以具有非旋转对称的非球面第二表面轮廓，具有第二峰谷值PV2>λ。光学校正板的厚度可以在光学校正板上变化小于0.1 *（PV1 + PV2）/ 2。

10. 发明授权

US07429116B2 Projection objective and method for its manufacture 有权
标题翻译：投影目的及其制造方法
公开(公告)号：US07429116B2
公开(公告)日：2008-09-30
申请号：US11014537
申请日：2004-12-16
申请人： Hans-Juergen Mann , Stephan Muellender , Johann Trenkler , Hartmut Enkisch
发明人： Hans-Juergen Mann , Stephan Muellender , Johann Trenkler , Hartmut Enkisch
IPC分类号： G02B7/182
CPC分类号： G03F7/706 , G02B5/0891 , G02B17/0663 , G03F7/70958 , G21K2201/067 , Y10S359/90
摘要： A method of manufacturing a projection objective (22) of a microlithographic projection exposure apparatus (10). The projection objective (22) comprises at least one mirror (M1 to M6) that each have a mirror support (241 to 246) and a reflective coating (26) applied thereon. First imaging aberrations of a pre-assembled projection objective are measured. Before the coating (26) is applied, the mirror supports (241 to 246) are provided with a desired surface deformation (34). If the mirrors (M1 to M6) are not reflective for projection light without the coating (26), measuring light is used that has another wavelength. Alternatively, two identical mirror supports (246) may be provided. One support having a reflective coating is part of the pre-assembled projection objective whose imaging aberrations are measured. The other support is provided with surface deformations before coating and mounting the support into the objective.
摘要翻译：一种制造微光刻投影曝光装置（10）的投影物镜（22）的方法。投影物镜（22）包括至少一个镜子（M 1至M 6），每个镜子具有镜支撑件（241至246）和反射涂层（26）。测量预组装的投影物镜的第一成像像差。在施加涂层（26）之前，反射镜支撑件（241至246）具有期望的表面变形（34）。如果反射镜（M 1至M 6）对于没有涂层（26）的投射光不反射，则使用具有另一波长的测量光。或者，可以提供两个相同的反射镜支撑件（246）。具有反射涂层的一个支撑件是预组装的投影物镜的一部分，其测量成像像差。另一个支撑件在涂覆和将支撑件安装到物镜之前提供了表面变形。

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