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1. 发明申请

US20080096138A1 Method of reducing critical dimension bias during fabrication of a semiconductor device 有权
标题翻译：在半导体器件制造期间减小临界尺寸偏压的方法
公开(公告)号：US20080096138A1
公开(公告)日：2008-04-24
申请号：US11983450
申请日：2007-11-09
申请人： Christopher Bencher , Melvin Montgomery , Alexander Buxbaum , Yung-Hee Lee , Jian Ding , Gilad Almogy , Wendy Yeh
发明人： Christopher Bencher , Melvin Montgomery , Alexander Buxbaum , Yung-Hee Lee , Jian Ding , Gilad Almogy , Wendy Yeh
IPC分类号： G03F7/00
CPC分类号： G03F1/68 , G03F1/46 , G03F1/80
摘要： An anti-reflective hard mask layer left on a radiation-blocking layer during fabrication of a reticle provides functionality when the reticle is used in a semiconductor device manufacturing process.
摘要翻译：当在半导体器件制造工艺中使用掩模版时，在掩模版的制造期间留在辐射阻挡层上的抗反射硬掩模层提供了功能。

2. 发明申请

US20050170655A1 Reticle fabrication using a removable hard mask 有权
标题翻译：使用可移除的硬掩模的标线制造
公开(公告)号：US20050170655A1
公开(公告)日：2005-08-04
申请号：US10768919
申请日：2004-01-30
申请人： Christopher Bencher , Melvin Montgomery , Alexander Buxbaum , Yung-Hee Lee , Jian Ding , Gilad Almogy , Wendy Yeh
发明人： Christopher Bencher , Melvin Montgomery , Alexander Buxbaum , Yung-Hee Lee , Jian Ding , Gilad Almogy , Wendy Yeh
IPC分类号： G03F1/08 , G03F7/09 , H01L21/311
CPC分类号： G03F1/68 , G03F1/46 , G03F1/80
摘要： We have reduced the critical dimension bias for reticle fabrication. Pattern transfer to the radiation-blocking layer of the reticle substrate essentially depends upon use of a hard mask to which the pattern is transferred from a photoresist. The photoresist pull back which occurs during pattern transfer to the hard mask is minimalized. In addition, a hard mask material having anti-reflective properties which are matched to the reflective characteristics of the radiation-blocking layer enables a reduction in critical dimension size and an improvement in the pattern feature integrity in the hard mask itself. An anti-reflective hard mask layer left on the radiation-blocking layer provides functionality when the reticle is used in a semiconductor device manufacturing process.
摘要翻译：我们已经减少了标线制造的临界尺寸偏差。图案转印到掩模版基板的辐射阻挡层基本上取决于使用从光致抗蚀剂转移图案的硬掩模。在图案转印到硬掩模期间发生的光致抗蚀剂拉回最小化。此外，具有与防辐射层的反射特性相匹配的抗反射性能的硬掩模材料能够降低临界尺寸尺寸并改善硬掩模本身中图案特征的完整性。当在半导体器件制造工艺中使用掩模版时，留在辐射阻挡层上的抗反射硬掩模层提供功能。

3. 发明授权

US07365014B2 Reticle fabrication using a removable hard mask 有权
标题翻译：使用可移除的硬掩模的标线制造
公开(公告)号：US07365014B2
公开(公告)日：2008-04-29
申请号：US10768919
申请日：2004-01-30
申请人： Christopher Dennis Bencher , Melvin Warren Montgomery , Alexander Buxbaum , Yung-Hee Yvette Lee , Jian Ding , Gilad Almogy , Wendy H. Yeh
发明人： Christopher Dennis Bencher , Melvin Warren Montgomery , Alexander Buxbaum , Yung-Hee Yvette Lee , Jian Ding , Gilad Almogy , Wendy H. Yeh
IPC分类号： H01L21/66 , H01L21/311 , H01L21/302 , H01L21/44 , H01L21/461
CPC分类号： G03F1/68 , G03F1/46 , G03F1/80
摘要： We have reduced the critical dimension bias for reticle fabrication. Pattern transfer to the radiation-blocking layer of the reticle substrate essentially depends upon use of a hard mask to which the pattern is transferred from a photoresist. The photoresist pull back which occurs during pattern transfer to the hard mask is minimalized. In addition, a hard mask material having anti-reflective properties which are matched to the reflective characteristics of the radiation-blocking layer enables a reduction in critical dimension size and an improvement in the pattern feature integrity in the hard mask itself. An anti-reflective hard mask layer left on the radiation-blocking layer provides functionality when the reticle is used in a semiconductor device manufacturing process.
摘要翻译：我们已经减少了标线制造的临界尺寸偏差。图案转印到掩模版基板的辐射阻挡层基本上取决于使用从光致抗蚀剂转移图案的硬掩模。在图案转印到硬掩模期间发生的光致抗蚀剂拉回最小化。此外，具有与防辐射层的反射特性相匹配的抗反射性能的硬掩模材料能够降低临界尺寸尺寸，并改善硬掩模本身的图案特征完整性。当在半导体器件制造工艺中使用掩模版时，留在辐射阻挡层上的抗反射硬掩模层提供功能。

4. 发明授权

US07737040B2 Method of reducing critical dimension bias during fabrication of a semiconductor device 有权
标题翻译：在半导体器件制造期间减小临界尺寸偏压的方法
公开(公告)号：US07737040B2
公开(公告)日：2010-06-15
申请号：US11983450
申请日：2007-11-09
申请人： Christopher Dennis Bencher , Melvin Warren Montgomery , Alexander Buxbaum , Yung-Hee Yvette Lee , Jian Ding , Gilad Almogy , Wendy H. Yeh
发明人： Christopher Dennis Bencher , Melvin Warren Montgomery , Alexander Buxbaum , Yung-Hee Yvette Lee , Jian Ding , Gilad Almogy , Wendy H. Yeh
IPC分类号： H01L21/00 , H01L21/311
CPC分类号： G03F1/68 , G03F1/46 , G03F1/80
摘要： An anti-reflective hard mask layer left on a radiation-blocking layer during fabrication of a reticle provides functionality when the reticle is used in a semiconductor device manufacturing process.
摘要翻译：当在半导体器件制造工艺中使用掩模版时，在掩模版的制造期间留在辐射阻挡层上的抗反射硬掩模层提供了功能。

5. 发明申请

US20170155012A1 MULTI-OPERATION TOOL FOR PHOTOVOLTAIC CELL PROCESSING 审中-公开
公开(公告)号：US20170155012A1
公开(公告)日：2017-06-01
申请号：US15365762
申请日：2016-11-30
申请人： Nathan Phillips Beckett , Gilad Almogy
发明人： Nathan Phillips Beckett , Gilad Almogy
IPC分类号： H01L31/18 , H01L21/677 , H01L21/67 , B41J2/01 , B41F15/14
摘要： Multi-operation tools for photovoltaic cell processing are described. In an example, a multi-operation tool includes a conveyor system to move a photovoltaic (PV) cell continuously along a conveyor path through a laser scribing station and an adhesive printing station. Furthermore, the PV cell may be aligned to a laser head of the laser scribing station and a printer head of the adhesive printing station in a single alignment operation prior to being laser scribed and printed with an adhesive in a continuous process.

6. 发明授权

US09075909B2 System and method to enable detection of viral infection by users of electronic communication devices 有权
标题翻译：用于电子通信设备的用户检测病毒感染的系统和方法
公开(公告)号：US09075909B2
公开(公告)日：2015-07-07
申请号：US13680289
申请日：2012-11-19
申请人： Gal Almogy , Gilad Almogy
发明人： Gal Almogy , Gilad Almogy
IPC分类号： G06F9/44 , G06N7/02 , G06N7/06 , G06F19/00
CPC分类号： G16H50/20 , G06F19/00 , G16H50/80 , Y02A90/24
摘要： A non-transitory computer readable medium that stores instructions for causing a computerized system to perform the following operations: determining, by the computerized system, that a first person is infected by a first infectious disease; wherein the determination is associated with a first person infection probability attribute; detecting, by the computerized system, based upon location information collected during at least a portion of a first infectious disease manifestation period, the location information being indicative of locations of the first person and other persons, a second person that was within an infection distance from the first person and is potentially infected by the first infectious disease; calculating, by the computerized system, a second person infection probability attribute; and updating, by the computerized system, the first person infection probability attribute in response to the second person infection probability attribute.
摘要翻译：存储用于使计算机化系统执行以下操作的指令的非暂时计算机可读介质：由计算机化系统确定第一人被第一感染性疾病感染; 其中所述确定与第一人感染概率属性相关联; 由所述计算机化系统基于在第一感染性疾病表现期间的至少一部分期间收集的位置信息来检测所述位置信息，所述位置信息指示所述第一人和其他人的位置，所述位置信息在距离第一个人并且可能被第一感染性疾病感染; 通过计算机化系统计算第二人感染概率属性; 并且由所述计算机化系统更新响应于所述第二人感染概率属性的所述第一人感染概率属性。

7. 发明申请

US20140053557A1 MAXIMIZING VALUE FROM A CONCENTRATING SOLAR ENERGY SYSTEM 审中-公开
标题翻译：从浓度太阳能系统最大化价值
公开(公告)号：US20140053557A1
公开(公告)日：2014-02-27
申请号：US13590525
申请日：2012-08-21
申请人： Gilad Almogy , Ratson Morad , Mani Thothadri
发明人： Gilad Almogy , Ratson Morad , Mani Thothadri
IPC分类号： F03G6/00
CPC分类号： F03G6/065 , Y02B10/20 , Y02E10/46
摘要： Systems, methods, and apparatus by which solar energy may be collected to provide electricity, heat, and/or cold are disclosed herein.
摘要翻译：本文公开了可以收集太阳能以提供电，热和/或冷的系统，方法和装置。

8. 发明申请

US20110114154A1 RECEIVER FOR CONCENTRATING PHOTOVOLTAIC-THERMAL SYSTEM 审中-公开
公开(公告)号：US20110114154A1
公开(公告)日：2011-05-19
申请号：US12887958
申请日：2010-09-22
申请人： Joseph Isaac LICHY , Brian Edward Atchley , Ratson Morad , Gilad Almogy , Adam Brian Reich , John Lawler , Nathan Phillips Beckett
发明人： Joseph Isaac LICHY , Brian Edward Atchley , Ratson Morad , Gilad Almogy , Adam Brian Reich , John Lawler , Nathan Phillips Beckett
IPC分类号： H01L31/052 , H01L31/042
CPC分类号： H01L31/0521 , H01L31/02013 , H01L31/02021 , H01L31/048 , H01L31/0547 , H02S40/34 , Y02E10/52
摘要： Systems, methods, and apparatus by which solar energy may be collected to provide electricity or a combination of heat and electricity are disclosed herein. Examples of solar energy receivers are disclosed that may be used to collect concentrated solar radiation.

9. 发明申请

US20080191134A1 CHARGED PARTICLE DETECTOR ASSEMBLY, CHARGED PARTICLE BEAM APPARATUS AND METHOD FOR GENERATING AN IMAGE 有权
标题翻译：充电颗粒检测器组件，充电颗粒光束装置和用于产生图像的方法
公开(公告)号：US20080191134A1
公开(公告)日：2008-08-14
申请号：US11923421
申请日：2007-10-24
申请人： Gilad Almogy , Dror Shemesh , Pavel Adamec
发明人： Gilad Almogy , Dror Shemesh , Pavel Adamec
IPC分类号： G01N23/00 , G01T1/00
CPC分类号： H01J37/244 , H01J2237/2443 , H01J2237/24455 , H01J2237/2446 , H01J2237/24465 , H01J2237/2802 , H01J2237/2804
摘要： A charged particle detector assembly comprises a particle detector, which has at least one particle sensitive region for detecting at least a portion of the spatial distribution of charged particles and for generating a two-dimensional optical signal which correlates to the detected spatial distribution. Further, an image conduit has an input coupled to the particle sensitive region of the particle detector for transmitting the two-dimensional optical signal to at least one optical detector. Further, a selecting means is adapted for selecting at least a portion of the two-dimensional optical signal.
摘要翻译：带电粒子检测器组件包括粒子检测器，该粒子检测器具有至少一个用于检测带电粒子的空间分布的至少一部分的粒子敏感区域，并用于产生与检测到的空间分布相关的二维光信号。此外，图像导管具有耦合到粒子检测器的粒子敏感区域的输入端，用于将二维光信号传输到至少一个光学检测器。此外，选择装置适于选择二维光信号的至少一部分。

10. 发明申请

US20080186556A1 AUTOMATIC OPTICAL INSPECTION USING MULTIPLE OBJECTIVES 有权
标题翻译：自动光学检测使用多个目标
公开(公告)号：US20080186556A1
公开(公告)日：2008-08-07
申请号：US12099709
申请日：2008-04-08
申请人： Gilad Almogy , Bryan C. Bolt , Oded Arnon , Boaz Kenan , Ehud Tirosh , Michael Corliss
发明人： Gilad Almogy , Bryan C. Bolt , Oded Arnon , Boaz Kenan , Ehud Tirosh , Michael Corliss
IPC分类号： G02B26/08
CPC分类号： G01N21/8903
摘要： Apparatus and techniques for automated optical inspection (AOI) utilizing image scanning modules with multiple objectives for each camera are provided. A scanning mechanism includes optical components to sequentially steer optical signals from each of the multiple objectives to the corresponding camera.
摘要翻译：提供了利用每个摄像机具有多个目标的图像扫描模块的自动光学检测（AOI）的装置和技术。扫描机构包括光学部件，以顺序地将来自多个目标中的每一个的光学信号转向对应的相机。

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