专利快速检索-快速检索全球专利，免费商用专利数据库-IPRDB

1. 发明申请

US20050250023A1 Apparatus used in reshaping a surface of a photoresist 有权
标题翻译：用于重塑光刻胶表面的装置
公开(公告)号：US20050250023A1
公开(公告)日：2005-11-10
申请号：US11183045
申请日：2005-07-15
申请人： Alex Buxbaum , Melvin Montgomery
发明人： Alex Buxbaum , Melvin Montgomery
IPC分类号： G03F7/00 , G03F7/09 , G03F7/40 , G03F9/00
CPC分类号： G03F7/40 , G03F7/091
摘要： The invention relates to a method of improving control over the dimensions of a patterned photoresist, which enables better control of the critical dimensions of a photomask or reticle which is fabricated using the patterned photoresist. In addition, the method may be used to enable improved control over the dimensions of a semiconductor device fabricated using a patterned photoresist. In particular, a patterned photoresist is treated with an etchant plasma to reshape the surface of the patterned photoresist, where reshaping includes the removal of “t”-topping at the upper surface of the patterned resist, the removal of standing waves present on patterned surfaces, and the removal of feet which may be present at the base of the patterned photoresist, where the photoresist contacts an underlying layer such as an ARC layer. The method is particularly useful for chemically amplified DUV photoresists, where the presence of “t”-topping, standing waves and foot formation is accentuated in the patterned photoresist as developed.
摘要翻译：本发明涉及一种改进对图案化光致抗蚀剂的尺寸的控制的方法，其使得能够更好地控制使用图案化光致抗蚀剂制造的光掩模或掩模版的临界尺寸。此外，该方法可以用于使得能够改进对使用图案化光致抗蚀剂制造的半导体器件的尺寸的控制。特别地，用蚀刻剂等离子体处理图案化的光致抗蚀剂以重塑形成图案的光致抗蚀剂的表面，其中整形包括去除图案化抗蚀剂的上表面处的“t” - 顶部，去除存在于图案化表面上的驻波以及可能存在于图案化光致抗蚀剂的基底处的脚的移除，其中光致抗蚀剂接触诸如ARC层的下层。该方法对于化学放大的DUV光致抗蚀剂特别有用，其中在显影的图案化光致抗蚀剂中存在“t”顶，驻波和脚形成。

2. 发明授权

US5306980A Torsional force transducer and method of operation 失效
标题翻译：扭力传感器和操作方法
公开(公告)号：US5306980A
公开(公告)日：1994-04-26
申请号：US915928
申请日：1992-07-17
申请人： Melvin Montgomery
发明人： Melvin Montgomery
IPC分类号： B06B1/06 , E21B47/12 , E21B47/16 , G01V1/46 , H01L41/083 , H01L41/08
CPC分类号： B06B1/0611 , E21B47/124 , E21B47/16 , G01V1/46 , H01L41/083
摘要： A transducer and method for imparting vibrational signals to a structure are disclosed. In one embodiment, a set of piezoelectric disks are constructed in conjunction with a deformable housing to impart controlled distortions to the structure, such as to a well pipe string. Torsional forces are applied to the structure due to the orientation of the piezoelectric material relative to the electric field applied thereto. The piezoelectric material is placed in layers, with the polarization axis orthogonal to the direction of the electric field. Alternate layers are oriented in opposing directions, and alternating electrodes are connected together, so that each layer cooperates with the others to twist the housing in the same direction. To improve transmission, the apparatus can be tuned to a frequency determined by a spectrum analysis of the pipe string. A reactance mass may be connected to the transducer to increase the amplitude of the imparted vibrations, and also to allow tuning of the frequency of vibrations of the transducer.
摘要翻译：公开了一种用于向振动信号施加振动信号的传感器和方法。在一个实施例中，一组压电盘与可变形壳体相结合地构造，以对结构施加控制的变形，例如到井管柱。由于压电材料相对于施加到其上的电场的取向而施加扭转力。将压电材料放置成层，其偏振轴与电场的方向正交。交替的层被定向在相反的方向上，并且交替的电极连接在一起，使得每个层与其他层协作以沿相同的方向扭转壳体。为了改进传输，可以将设备调谐到由管柱的频谱分析确定的频率。电抗质量可以连接到换能器以增加被施加的振动的振幅，并且还允许调谐换能器的振动频率。

3. 发明授权

US5166908A Piezoelectric transducer for high speed data transmission and method of operation 失效
标题翻译：用于高速数据传输的压电传感器和操作方法
公开(公告)号：US5166908A
公开(公告)日：1992-11-24
申请号：US746309
申请日：1991-08-14
申请人： Melvin Montgomery
发明人： Melvin Montgomery
IPC分类号： E21B47/12 , E21B47/16 , G01V1/46 , H01L41/083
CPC分类号： E21B47/16 , E21B47/124 , G01V1/46 , H01L41/0833 , H01L41/0835
摘要： A transducer and method for imparting vibrational signals to a structure are disclosed. The transducer according to one embodiment includes a set of piezoelectric disks placed within a deformable housing that has longitudinal slits with rounded terminations. Electrodes are placed adjacent to the piezoelectric disks in such a manner that an electrical signal causes the piezoelectric disks to expand and contract along the longitudinal axis of the transducer. The longitudinal slits in the housing allow its expansion in a direction substantially parallel to its longitudinal axis, while the rounded terminations reduce the tendency of the housing to crack as a result of use, enabling high frequency operation over extended periods of time. The housing is mounted within the hollow interior of a structure, such as to a well pipe string, in such a manner that the deformation of the housing as a result of the force applied by the piezoelectric elements transmit data along the structure by way of axial compressional vibrations.
摘要翻译：公开了一种用于向振动信号施加振动信号的传感器和方法。根据一个实施例的换能器包括放置在具有圆形终端的纵向狭缝的可变形外壳内的一组压电盘。电极被放置在与压电盘相邻的位置，使得电信号使压电盘沿换能器的纵向轴线膨胀和收缩。壳体中的纵向狭缝允许其在基本上平行于其纵向轴线的方向上的膨胀，而圆形端接减少了由于使用而导致壳体破裂的倾向，使得能够在长时间段内进行高频操作。壳体被安装在结构的中空内部，例如到井管柱中，使得壳体由于压电元件施加的力的变形通过轴向沿结构传递数据压缩振动

4. 发明申请

US20080096138A1 Method of reducing critical dimension bias during fabrication of a semiconductor device 有权
标题翻译：在半导体器件制造期间减小临界尺寸偏压的方法
公开(公告)号：US20080096138A1
公开(公告)日：2008-04-24
申请号：US11983450
申请日：2007-11-09
申请人： Christopher Bencher , Melvin Montgomery , Alexander Buxbaum , Yung-Hee Lee , Jian Ding , Gilad Almogy , Wendy Yeh
发明人： Christopher Bencher , Melvin Montgomery , Alexander Buxbaum , Yung-Hee Lee , Jian Ding , Gilad Almogy , Wendy Yeh
IPC分类号： G03F7/00
CPC分类号： G03F1/68 , G03F1/46 , G03F1/80
摘要： An anti-reflective hard mask layer left on a radiation-blocking layer during fabrication of a reticle provides functionality when the reticle is used in a semiconductor device manufacturing process.
摘要翻译：当在半导体器件制造工艺中使用掩模版时，在掩模版的制造期间留在辐射阻挡层上的抗反射硬掩模层提供了功能。

5. 发明申请

US20050170655A1 Reticle fabrication using a removable hard mask 有权
标题翻译：使用可移除的硬掩模的标线制造
公开(公告)号：US20050170655A1
公开(公告)日：2005-08-04
申请号：US10768919
申请日：2004-01-30
申请人： Christopher Bencher , Melvin Montgomery , Alexander Buxbaum , Yung-Hee Lee , Jian Ding , Gilad Almogy , Wendy Yeh
发明人： Christopher Bencher , Melvin Montgomery , Alexander Buxbaum , Yung-Hee Lee , Jian Ding , Gilad Almogy , Wendy Yeh
IPC分类号： G03F1/08 , G03F7/09 , H01L21/311
CPC分类号： G03F1/68 , G03F1/46 , G03F1/80
摘要： We have reduced the critical dimension bias for reticle fabrication. Pattern transfer to the radiation-blocking layer of the reticle substrate essentially depends upon use of a hard mask to which the pattern is transferred from a photoresist. The photoresist pull back which occurs during pattern transfer to the hard mask is minimalized. In addition, a hard mask material having anti-reflective properties which are matched to the reflective characteristics of the radiation-blocking layer enables a reduction in critical dimension size and an improvement in the pattern feature integrity in the hard mask itself. An anti-reflective hard mask layer left on the radiation-blocking layer provides functionality when the reticle is used in a semiconductor device manufacturing process.
摘要翻译：我们已经减少了标线制造的临界尺寸偏差。图案转印到掩模版基板的辐射阻挡层基本上取决于使用从光致抗蚀剂转移图案的硬掩模。在图案转印到硬掩模期间发生的光致抗蚀剂拉回最小化。此外，具有与防辐射层的反射特性相匹配的抗反射性能的硬掩模材料能够降低临界尺寸尺寸并改善硬掩模本身中图案特征的完整性。当在半导体器件制造工艺中使用掩模版时，留在辐射阻挡层上的抗反射硬掩模层提供功能。

6. 发明授权

US5159226A Torsional force transducer and method of operation 失效
标题翻译：扭转力传感器和操作方法
公开(公告)号：US5159226A
公开(公告)日：1992-10-27
申请号：US554030
申请日：1990-07-16
申请人： Melvin Montgomery
发明人： Melvin Montgomery
IPC分类号： B06B1/06 , E21B47/12 , E21B47/16 , G01V1/46 , H01L41/083
CPC分类号： B06B1/0611 , E21B47/124 , E21B47/16 , G01V1/46 , H01L41/083
摘要： A transducer and method for imparting vibrational signals to a structure are disclosed. In one embodiment, a set of piezoelectric disks are constructed in conjunction with a deformable housing to impart controlled distortions to the structure, such as to a well pipe string. Torsional forces are applied to the structure due to the orientation of the piezoelectric material relative to the electric field applied thereto. The piezoelectric material is placed in layers, with the polarization axis orthogonal to the direction of the electric field. Alternate layers are oriented in opposing directions, and alternating electrodes are connected together, so that each layer cooperates with the others to twist the housing in the same direction. To improve transmission, the apparatus can be tuned to a frequency determined by a spectrum analysis of the pipe string. A reactance mass may be connected to the transducer to increase the amplitude of the imparted vibrations, and also to allow tuning of the frequency of vibrations of the transducer.
摘要翻译：公开了一种用于向振动信号施加振动信号的传感器和方法。在一个实施例中，一组压电盘与可变形壳体相结合地构造，以对结构施加控制的变形，例如到井管柱。由于压电材料相对于施加到其上的电场的取向而施加扭转力。将压电材料放置成层，其偏振轴与电场的方向正交。交替的层被定向在相反的方向上，并且交替的电极连接在一起，使得每个层与其他层协作以沿相同的方向扭转壳体。为了改进传输，可以将设备调谐到由管柱的频谱分析确定的频率。电抗质量可以连接到换能器以增加被施加的振动的振幅，并且还允许调谐换能器的振动频率。

7. 发明申请

US20060105248A1 Method of reducing the average process bias during production of a reticle 失效
标题翻译：降低掩模版生产过程中平均偏差的方法
公开(公告)号：US20060105248A1
公开(公告)日：2006-05-18
申请号：US10989976
申请日：2004-11-16
申请人： Melvin Montgomery , Alexander Buxbaum
发明人： Melvin Montgomery , Alexander Buxbaum
IPC分类号： G03C1/494 , G03C1/492 , G03C5/00 , G03C1/76 , G03F1/00
CPC分类号： G03F7/405 , Y10S430/143
摘要： We are able to reduce the average process bias in a patterned reticle by treating the developed, patterned photoresist which is used to transfer a pattern to the reticle with a silicon-containing reagent prior to the pattern transfer. The process bias is a measure of the difference between a nominal feature critical dimension (CD) produced in a patterned reticle and the nominal isofocal CD for the feature. Improvement of the average process bias is directly related to an improved resolution in the mask features. The reduction in average process bias achievable using the method of the invention typically ranges from about 30% to about 70%. This reduction in average process bias enables the printing of smaller features.
摘要翻译：我们能够通过处理显影的图案化光刻胶来降低图案化掩模版中的平均工艺偏差，该光致抗蚀剂用于在图案转移之前用含硅试剂将图案转印到掩模版上。过程偏差是在图案化掩模版中产生的标称特征临界尺寸（CD）与特征的标称异焦点CD之间的差异的量度。平均过程偏差的改善与掩模特征中改进的分辨率直接相关。使用本发明的方法可实现的平均过程偏差的降低通常在约30％至约70％的范围内。平均过程偏差的这种减少使得能够打印更小的特征。

8. 发明申请

US20050191562A1 Method of increasing the shelf life of a photomask substrate 有权
标题翻译：提高光掩模基板保质期的方法
公开(公告)号：US20050191562A1
公开(公告)日：2005-09-01
申请号：US10651549
申请日：2003-08-29
申请人： Melvin Montgomery , Jeffrey Albelo , Zoilo Ho Tan
发明人： Melvin Montgomery , Jeffrey Albelo , Zoilo Ho Tan
IPC分类号： G03F7/039 , G03F1/08 , G03F7/004 , G03F7/09 , G03F7/11 , H01L21/027 , G03C1/76 , G03C1/492 , G03C1/494 , G03F9/00 , G11B7/24
CPC分类号： G03F7/0045 , G03F7/091 , G03F7/092 , G03F7/093 , G03F7/11 , Y10S430/143 , Y10S430/146
摘要： In photomask making, the environmental sensitivity of a chemically amplified photoresist is eliminated, or at least substantially reduced, by overcoating the photoresist with a thin coating (topcoat) of a protective but transmissive material. To provide improved stability during the long time period required for direct writing of a photomask pattern, typically in the range of about 20 hours, the protective topcoat material is pH adjusted to be as neutral in pH as possible, depending on other process variable requirements. For example, a pH adjusted to be in the range from about 5 to about 8 is particularly helpful. Not only is the stability of the chemically amplified photoresist better during direct writing when the protective topcoat is pH adjusted, but a photoresist-coated substrate with pH adjusted topcoat over its surface can be stored longer prior to imaging without adverse consequences.
摘要翻译：在光掩模制造中，通过用保护但透射材料的薄涂层（顶涂层）涂覆光致抗蚀剂，消除了化学放大的光致抗蚀剂的环境敏感性，或至少大大降低了环境敏感性。为了在通常在约20小时的范围内直接写入光掩模图案所需的长时间段期间提供改进的稳定性，根据其它工艺变量要求，将保护性面漆材料的pH调节至尽可能的pH中性。例如，调节至约5至约8范围内的pH特别有用。当保护性面漆进行pH调节时，不仅在直接书写期间化学放大光致抗蚀剂的稳定性更好，而在其表面之前具有pH调节的面漆的光致抗蚀剂涂覆的基材可以在成像之前被储存更长时间，而不会产生不良后果。

你已经成功收藏专利！

检索式保存成功!

IPRDB

热门服务

关于我们

友情链接

联系方式