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1. 发明申请

US20070000516A1 Device and method for cleaning the edges of substrates 审中-公开
标题翻译：用于清洁基板边缘的装置和方法
公开(公告)号：US20070000516A1
公开(公告)日：2007-01-04
申请号：US10575746
申请日：2004-10-07
申请人： Christian Krauss , Karl Appich , Jakob Szekeresch , Peter Dress
发明人： Christian Krauss , Karl Appich , Jakob Szekeresch , Peter Dress
IPC分类号： B08B3/02
CPC分类号： H01L21/67051
摘要： A device and method for cleaning the edges of substrates, including at least one cleaning head for receiving at least one nozzle element for supplying medium to a substrate. Formed in a main body of the cleaning head are a medium-suctioning port and an adjoining medium-suctioning duct. The cleaning head also has at least one first flange extending from the main body and having a flat side facing the port and extending essentially perpendicular to a surface of the main body containing the port. The nozzle element is provided on the flange and spaced from the main body, and has at least one outlet port opening in the direction that the flat side faces and directed substantially perpendicular thereto. The outlet port is recessed relative to the flat side or is flush therewith. During a cleaning process, the fat side is spaced by 0.05 to 0.5 mm from the substrate surface.
摘要翻译：一种用于清洁基底边缘的装置和方法，包括至少一个清洁头，用于接收至少一个用于将介质供给到基底的喷嘴元件。在清洗头的主体中形成有中等吸入口和相邻的介质吸入管。清洁头还具有至少一个从主体延伸的第一凸缘，并且具有面向端口的平坦侧面，并且基本垂直于容纳口的主体表面延伸。喷嘴元件设置在凸缘上并且与主体间隔开，并且具有至少一个出口端口，其在平坦侧面朝向并基本上与其垂直的方向上开口。出口相对于平坦侧凹入或与其平齐。在清洁过程中，脂肪侧与衬底表面间隔0.05至0.5mm。

2. 发明授权

US06858088B1 Method and apparatus for treating substrates 有权
标题翻译：处理基材的方法和设备
公开(公告)号：US06858088B1
公开(公告)日：2005-02-22
申请号：US09913986
申请日：2000-01-19
申请人： Peter Dress , Karl Appich , Peter Krauss , Jakob Szekeresch , Robert Weihing
发明人： Peter Dress , Karl Appich , Peter Krauss , Jakob Szekeresch , Robert Weihing
IPC分类号： B05D1/40 , B05C11/08 , B05D3/10 , G03F7/16 , H01L21/00 , H01L21/027 , C23C16/00 , C23F1/00 , H01L21/306
CPC分类号： H01L21/6715 , B05C11/08 , G03F7/162
摘要： To achieve a uniform coating of a substrate, with an apparatus and a method for coating substrates, according to which the substrate is supported on a substrate holder in such a way that a substrate surface that is to be coated is exposed, and the substrate is rotated together with the substrate holder, a cover can be secured to the substrate holder and together with the substrate holder forms a sealed chamber for the substrate.
摘要翻译：为了实现衬底的均匀涂布，使用用于涂覆衬底的装置和方法，根据该装置和衬底被支撑在衬底保持器上，使得待被涂覆的衬底表面被暴露，并且衬底是与衬底保持器一起旋转，盖可以固定到衬底保持器并与衬底保持器一起形成用于衬底的密封室。

3. 发明授权

US06512207B1 Apparatus and method for the treatment of substrates 有权
标题翻译：用于处理基材的装置和方法
公开(公告)号：US06512207B1
公开(公告)日：2003-01-28
申请号：US09914113
申请日：2001-08-23
申请人： Peter Dress , Uwe Dietze , Jakob Szekeresch , Robert Weihing
发明人： Peter Dress , Uwe Dietze , Jakob Szekeresch , Robert Weihing
IPC分类号： F27B514
CPC分类号： H01L21/67248 , H01L21/67103
摘要： A device and method for thermally treating substrates. A substrate is heated by a heating plate to improve thermal homogeneity. The heating plate is heated using a number of separately controlled heating elements. The temperature of the heating elements is measured and the heating process is controlled by a PID controller. In addition, the temperature of the substrate surface facing away from the heating plate is locally measured. The temperature distribution over the substrate surface is determined according to the measured temperatures and set values for the temperature of the individual heating elements are determined and transmitted to the PID controller.
摘要翻译：一种用于热处理基板的装置和方法。基板被加热板加热以改善热均匀性。使用多个单独控制的加热元件来加热加热板。测量加热元件的温度，加热过程由PID控制器控制。此外，局部测量背离加热板的基板表面的温度。根据测量的温度确定衬底表面上的温度分布，并确定各个加热元件的温度的设定值并将其传输到PID控制器。

4. 发明授权

US06919538B2 Method for thermally treating substrates 有权
标题翻译：基板热处理方法
公开(公告)号：US06919538B2
公开(公告)日：2005-07-19
申请号：US10433253
申请日：2001-11-28
申请人： Jakob Szekeresch , Peter Dress , Uwe Dietze , Werner Saule
发明人： Jakob Szekeresch , Peter Dress , Uwe Dietze , Werner Saule
IPC分类号： H05B3/00 , H01L21/00 , H01L21/02 , H01L21/027 , F27B5/14
CPC分类号： H01L21/67248
摘要： To increase the temperature homogeneity on the surface of a substrate that is to be thermally treated, a method for thermally treating substrates is provided, according to which the substrate is heated by several separately controllable heating elements. A desired-value profile is predefined for each of said heating elements. The method comprises the following steps: locally-analysed measurement of the temperature of the surface of the substrate that faces away from the heating elements, during the thermal treatment; determination of the temperature inhomogeneities occurring on the substrate surface; definition of new desired-value profiles based on said temperature inhomogeneities; and preparation of the new desired-value profiles for subsequent treatments.
摘要翻译：为了提高待热处理的基板的表面上的温度均匀性，提供了一种热处理基板的方法，根据该方法，基板被几个可单独控制的加热元件加热。为每个所述加热元件预定义期望值曲线。该方法包括以下步骤：在热处理期间局部分析测量衬底表面远离加热元件的温度; 确定在基板表面上发生的温度不均匀性; 基于所述温度不均匀性定义新的期望值曲线; 并为后续处理准备新的期望值曲线。

5. 发明授权

US09662684B2 Method and apparatus for treating substrates 有权
公开(公告)号：US09662684B2
公开(公告)日：2017-05-30
申请号：US13505385
申请日：2010-03-15
申请人： Uwe Dietze , Peter Dress , Sherjang Singh
发明人： Uwe Dietze , Peter Dress , Sherjang Singh
IPC分类号： B08B3/10 , B08B7/00 , H01L21/67 , G03F1/82
CPC分类号： B08B3/10 , B08B7/0035 , B08B7/0057 , G03F1/82 , H01L21/67051
摘要： The application describes several methods and an apparatus for treatment of a substrate. In those methods, at least one liquid is applied thereto and electromagnetic radiation is generated in the liquid by means of radiation before applying the liquid to the substrate. Electromagnetic radiation is introduced into the film such that at least a portion of the radiation reaches the substrate surface. In another method for changing the surface characteristics of a substrate having an at least partially hydrophobic substrate surface such that at least a portion of said surface gets a hydrophilic surface characteristic, a liquid is applied to at least the partial area of the surface of the substrate, and UV radiation of a predetermined wavelength is guided onto at least the partial area of the surface of said substrate.

6. 发明授权

US07419549B2 Nozzle assembly for applying a liquid to a substrate 有权
标题翻译：用于将液体施加到基底的喷嘴组件
公开(公告)号：US07419549B2
公开(公告)日：2008-09-02
申请号：US10522563
申请日：2003-07-10
申请人： Anatol Schwersenz , Werner Saule , Andreas Nöring , Peter Dress , Christian Bürgel , Martin Tschinkl , Marlene Strobl
发明人： Anatol Schwersenz , Werner Saule , Andreas Nöring , Peter Dress , Christian Bürgel , Martin Tschinkl , Marlene Strobl
IPC分类号： B05C3/02
CPC分类号： B05C5/005
摘要： The aim of the invention is to achieve a rapid, homogeneous application of a liquid with as little force as possible to a substrate. To achieve this, the invention provides a nozzle assembly (22) for applying a liquid to a substrate, said assembly having a nozzle body (26) comprising a plurality of nozzles (36) that are substantially arranged in a line and a guide plate (28) that extends essentially in a vertical direction with a straight lower edge. According to the invention, the nozzles (36) above the lower edge are directed towards the guide plate (28) in such a way that a film of liquid forms on the guide plate (28) and flows over the lower edge (64).
摘要翻译：本发明的目的是以尽可能少的力将液体快速，均匀地应用于基底。为了实现这一点，本发明提供了一种用于将液体施加到基底的喷嘴组件（22），所述组件具有喷嘴主体（26），喷嘴主体（26）包括基本上布置在管线中的多个喷嘴（36）和引导板 28），其基本上在垂直方向上以直的下边缘延伸。根据本发明，下边缘上方的喷嘴（36）以导向板（28）上形成的液体薄膜流过下边缘（64）的方式指向引导板（28）。

7. 发明申请

US20050220931A1 Nozzle assembly for applying a liquid to a substrate 有权
标题翻译：用于将液体施加到基底的喷嘴组件
公开(公告)号：US20050220931A1
公开(公告)日：2005-10-06
申请号：US10522563
申请日：2003-07-10
申请人： Anatol Schwersenz , Werner Saule , Andreas Noring , Peter Dress , Christian Burgel , Martin Tschinkl , Marlene Strobl
发明人： Anatol Schwersenz , Werner Saule , Andreas Noring , Peter Dress , Christian Burgel , Martin Tschinkl , Marlene Strobl
IPC分类号： G03F7/30 , B05B1/14 , B05C5/00 , H01L21/027
CPC分类号： B05C5/005
摘要： The aim of the invention is to achieve a rapid, homogeneous application of a liquid with as little force as possible to a substrate. To achieve this, the invention provides a nozzle assembly (22) for applying a liquid to a substrate, said assembly having a nozzle body (26) comprising a plurality of nozzles (36) that are substantially arranged in a line and a guide plate (28) that extends essentially in a vertical direction with a straight lower edge. According to the invention, the nozzles (36) above the lower edge are directed towards the guide plate (28) in such a way that a film of liquid forms on the guide plate (28) and flows over the lower edge (64).
摘要翻译：本发明的目的是以尽可能少的力将液体快速，均匀地应用于基底。为了实现这一点，本发明提供了一种用于将液体施加到基底的喷嘴组件（22），所述组件具有喷嘴主体（26），喷嘴主体（26）包括基本上布置在管线中的多个喷嘴（36）和引导板 28），其基本上在垂直方向上以直的下边缘延伸。根据本发明，下边缘上方的喷嘴（36）以导向板（28）上形成的液体薄膜流过下边缘（64）的方式指向引导板（28）。

8. 发明授权

US06385380B1 Hollow optical waveguide for trace analysis in aqueous solutions 有权
标题翻译：空心光波导，用于在水溶液中进行痕量分析
公开(公告)号：US06385380B1
公开(公告)日：2002-05-07
申请号：US09294686
申请日：1999-04-19
申请人： Karl Friedrich , Peter Dress , Mathias Belz
发明人： Karl Friedrich , Peter Dress , Mathias Belz
IPC分类号： G02B602
CPC分类号： G02B6/032 , G01N21/6428 , G01N21/645 , G01N2021/6482
摘要： Low concentrations of substances dissolved in liquids are detected by coupling analysis/excitation light into the liquid core of an optical waveguide in the form of a capillary. When the substance of interest is to be excited to cause the emission of fluorescent light, the excitation light is transversely coupled into the hollow core of the waveguide and the generated fluorescent light is kept in the optical path of the waveguide for as long as possible. The invention also contemplates the use, in either an absorption or fluorescence mode, of specially treated fused silica fibers to deliver analysis/excitation light with very short wavelengths into the liquid core of an optical waveguide.
摘要翻译：通过将分析/激发光耦合到毛细管形式的光波导的液芯中来检测溶解在液体中的低浓度物质。当感兴趣的物质被激发以引起荧光的发射时，激发光横向耦合到波导的中空芯中，并且所产生的荧光保持在波导的光路中尽可能长。本发明还考虑在吸收或荧光模式中使用特殊处理的熔融石英纤维将具有非常短的波长的分析/激发光输送到光波导的液芯中。

9. 发明申请

US20120211024A1 METHOD AND APPARATUS FOR TREATING SUBSTRATES 有权
标题翻译：用于处理基板的方法和装置
公开(公告)号：US20120211024A1
公开(公告)日：2012-08-23
申请号：US13505385
申请日：2010-03-15
申请人： Uwe Dietze , Peter Dress , Sherjang Singh
发明人： Uwe Dietze , Peter Dress , Sherjang Singh
IPC分类号： B08B3/10 , B08B7/04 , B08B7/00
CPC分类号： B08B3/10 , B08B7/0035 , B08B7/0057 , G03F1/82 , H01L21/67051
摘要： The application describes several methods and an apparatus for treatment of at least partial areas of a substrate. In said methods, at least one liquid is applied to at least one partial area of the substrate and electromagnetic radiation is introduced into this liquid, in order to achieve a desired effect in accordance with the respective method. In one method, radicals are generated in the liquid by means of UV radiation prior to application of the liquid, wherein generation of the radicals occurs directly before applying the liquid to the substrate, such that at least a portion of the radicals reaches the substrate. In one method, in which ions are removed from at least partial areas of the surface of a substrate and near surface layers of said substrate, a liquid, which is heated above ambient temperature is applied to the substrate, in order to form a liquid film on at least a partial area of said substrate, wherein electromagnetic radiation is introduced into said liquid film such that at least a portion of the radiation reaches the substrate surface. In another method for changing the surface characteristics of a substrate having an at least partially hydrophobic substrate surface such that at least a portion of said hydrophobic surface gets a hydrophilic surface characteristic, a liquid is applied to at least the partial area of the surface of the substrate, whose surface characteristic is to be changed, and UV radiation of a predetermined range of wavelength is guided through said liquid onto at least the partial area of the surface of said substrate, whose surface characteristic is to be changed. The methods may be performed in a common apparatus in any desired order in series and/or in parallel.
摘要翻译：本申请描述了用于处理基底的至少部分区域的几种方法和装置。在所述方法中，至少一种液体被施加到衬底的至少一个部分区域，并且电磁辐射被引入到该液体中，以便根据各自的方法实现期望的效果。在一种方法中，在施加液体之前通过UV辐射在液体中产生自由基，其中在将液体施加到基底之前直接发生自由基，使得至少一部分自由基到达基底。在一种方法中，其中从衬底的表面的至少部分区域和所述衬底的表面层的至少部分区域除去离子，将加热到环境温度以上的液体施加到衬底上，以形成液膜在所述衬底的至少部分区域上，其中电磁辐射被引入所述液膜中，使得至少一部分辐射到达衬底表面。在用于改变具有至少部分疏水的基底表面的基底的表面特性的另一种方法中，使得所述疏水性表面的至少一部分具有亲水表面特性，将液体施加到至少部分疏水性基底表面的部分区域基板，其表面特性将被改变，并且预定波长范围的UV辐射被引导到所述液体的至少表面特性要改变的表面的部分区域上。这些方法可以以任何期望的顺序串联和/或并行地在公共设备中执行。

10. 发明申请

US20090071503A1 METHOD AND DEVICE FOR TREATING SUBSTRATES AND NOZZLE UNIT THEREFOR 审中-公开
标题翻译：用于处理基板和喷嘴单元的方法和装置
公开(公告)号：US20090071503A1
公开(公告)日：2009-03-19
申请号：US11718675
申请日：2005-10-28
申请人： Karsten Branz , Peter Dress , Michael Sowa , Thomas Gairing
发明人： Karsten Branz , Peter Dress , Michael Sowa , Thomas Gairing
IPC分类号： B08B3/12 , B08B13/00 , C23F1/00
CPC分类号： H01L21/67051 , H01L21/6704
摘要： A method and device for treating substrates, and a nozzle unit therefore. A liquid film is formed on a local surface area of a substrate that is to be treated by means of a nozzle unit comprised of at least on elongated nozzle arrangement and an ultrasonic or megasonic transducer arrangement disposed adjacent to the nozzle arrangement. The transducer arrangement is composed of a plurality of transducers having different resonant frequencies. At least a portion of the transducer arrangement is brought into contact with the liquid film, and ultrasound or megasound is introduced into the liquid film by the transducer arrangement. The transducers are excited individually and/or in groups with different intensities and/or frequencies,
摘要翻译：因此，用于处理基板的方法和装置以及喷嘴单元。通过由至少在细长喷嘴装置上构成的喷嘴单元和邻近喷嘴装置设置的超声波或超声波换能器装置在待处理的基板的局部表面区域上形成液膜。换能器装置由具有不同谐振频率的多个换能器组成。换能器装置的至少一部分与液膜接触，超声波或兆声波通过换能器装置被引入到液膜中。传感器单独地和/或以不同强度和/或频率的组被激发，

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