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1. 发明授权

US06512207B1 Apparatus and method for the treatment of substrates 有权
标题翻译：用于处理基材的装置和方法
公开(公告)号：US06512207B1
公开(公告)日：2003-01-28
申请号：US09914113
申请日：2001-08-23
申请人： Peter Dress , Uwe Dietze , Jakob Szekeresch , Robert Weihing
发明人： Peter Dress , Uwe Dietze , Jakob Szekeresch , Robert Weihing
IPC分类号： F27B514
CPC分类号： H01L21/67248 , H01L21/67103
摘要： A device and method for thermally treating substrates. A substrate is heated by a heating plate to improve thermal homogeneity. The heating plate is heated using a number of separately controlled heating elements. The temperature of the heating elements is measured and the heating process is controlled by a PID controller. In addition, the temperature of the substrate surface facing away from the heating plate is locally measured. The temperature distribution over the substrate surface is determined according to the measured temperatures and set values for the temperature of the individual heating elements are determined and transmitted to the PID controller.
摘要翻译：一种用于热处理基板的装置和方法。基板被加热板加热以改善热均匀性。使用多个单独控制的加热元件来加热加热板。测量加热元件的温度，加热过程由PID控制器控制。此外，局部测量背离加热板的基板表面的温度。根据测量的温度确定衬底表面上的温度分布，并确定各个加热元件的温度的设定值并将其传输到PID控制器。

2. 发明申请

US20070000516A1 Device and method for cleaning the edges of substrates 审中-公开
标题翻译：用于清洁基板边缘的装置和方法
公开(公告)号：US20070000516A1
公开(公告)日：2007-01-04
申请号：US10575746
申请日：2004-10-07
申请人： Christian Krauss , Karl Appich , Jakob Szekeresch , Peter Dress
发明人： Christian Krauss , Karl Appich , Jakob Szekeresch , Peter Dress
IPC分类号： B08B3/02
CPC分类号： H01L21/67051
摘要： A device and method for cleaning the edges of substrates, including at least one cleaning head for receiving at least one nozzle element for supplying medium to a substrate. Formed in a main body of the cleaning head are a medium-suctioning port and an adjoining medium-suctioning duct. The cleaning head also has at least one first flange extending from the main body and having a flat side facing the port and extending essentially perpendicular to a surface of the main body containing the port. The nozzle element is provided on the flange and spaced from the main body, and has at least one outlet port opening in the direction that the flat side faces and directed substantially perpendicular thereto. The outlet port is recessed relative to the flat side or is flush therewith. During a cleaning process, the fat side is spaced by 0.05 to 0.5 mm from the substrate surface.
摘要翻译：一种用于清洁基底边缘的装置和方法，包括至少一个清洁头，用于接收至少一个用于将介质供给到基底的喷嘴元件。在清洗头的主体中形成有中等吸入口和相邻的介质吸入管。清洁头还具有至少一个从主体延伸的第一凸缘，并且具有面向端口的平坦侧面，并且基本垂直于容纳口的主体表面延伸。喷嘴元件设置在凸缘上并且与主体间隔开，并且具有至少一个出口端口，其在平坦侧面朝向并基本上与其垂直的方向上开口。出口相对于平坦侧凹入或与其平齐。在清洁过程中，脂肪侧与衬底表面间隔0.05至0.5mm。

3. 发明授权

US06919538B2 Method for thermally treating substrates 有权
标题翻译：基板热处理方法
公开(公告)号：US06919538B2
公开(公告)日：2005-07-19
申请号：US10433253
申请日：2001-11-28
申请人： Jakob Szekeresch , Peter Dress , Uwe Dietze , Werner Saule
发明人： Jakob Szekeresch , Peter Dress , Uwe Dietze , Werner Saule
IPC分类号： H05B3/00 , H01L21/00 , H01L21/02 , H01L21/027 , F27B5/14
CPC分类号： H01L21/67248
摘要： To increase the temperature homogeneity on the surface of a substrate that is to be thermally treated, a method for thermally treating substrates is provided, according to which the substrate is heated by several separately controllable heating elements. A desired-value profile is predefined for each of said heating elements. The method comprises the following steps: locally-analysed measurement of the temperature of the surface of the substrate that faces away from the heating elements, during the thermal treatment; determination of the temperature inhomogeneities occurring on the substrate surface; definition of new desired-value profiles based on said temperature inhomogeneities; and preparation of the new desired-value profiles for subsequent treatments.
摘要翻译：为了提高待热处理的基板的表面上的温度均匀性，提供了一种热处理基板的方法，根据该方法，基板被几个可单独控制的加热元件加热。为每个所述加热元件预定义期望值曲线。该方法包括以下步骤：在热处理期间局部分析测量衬底表面远离加热元件的温度; 确定在基板表面上发生的温度不均匀性; 基于所述温度不均匀性定义新的期望值曲线; 并为后续处理准备新的期望值曲线。

4. 发明申请

US20130220773A1 PROCESS MACHINE, IN PARTICULAR FOR TREATING AND/OR INSPECTING SUBSTRATES 审中-公开
标题翻译：过程机器，特别是处理和/或检查基板
公开(公告)号：US20130220773A1
公开(公告)日：2013-08-29
申请号：US13878354
申请日：2011-08-20
申请人： Jakob Szekeresch , Klaus Oppelt , Gerd Krause
发明人： Jakob Szekeresch , Klaus Oppelt , Gerd Krause
IPC分类号： B65G37/00
CPC分类号： B65G37/005 , H01L21/6719 , H01L21/67724 , H01L21/67775 , H05K3/1216 , H05K13/0061 , H05K13/04
摘要： A process machine and a related method for treating and/or inspecting printed circuit boards, solar cells or the like, has at least one transport device for transporting the substrates and at least one process device for processing the substrates. The transport device and process device are both separate, self-supporting, modular units. The modular units can be selectively combined with one another in such a way that the transport device undertakes the transportation of the substrates through the process device.
摘要翻译：用于处理和/或检查印刷电路板，太阳能电池等的处理机和相关方法具有用于传送基板的至少一个输送装置和用于处理基板的至少一个处理装置。运输设备和过程设备都是单独的，自支撑的，模块化的单元。模块化单元可以以这样的方式选择性地组合，使得输送装置承担基板通过过程装置的运输。

5. 发明授权

US06858088B1 Method and apparatus for treating substrates 有权
标题翻译：处理基材的方法和设备
公开(公告)号：US06858088B1
公开(公告)日：2005-02-22
申请号：US09913986
申请日：2000-01-19
申请人： Peter Dress , Karl Appich , Peter Krauss , Jakob Szekeresch , Robert Weihing
发明人： Peter Dress , Karl Appich , Peter Krauss , Jakob Szekeresch , Robert Weihing
IPC分类号： B05D1/40 , B05C11/08 , B05D3/10 , G03F7/16 , H01L21/00 , H01L21/027 , C23C16/00 , C23F1/00 , H01L21/306
CPC分类号： H01L21/6715 , B05C11/08 , G03F7/162
摘要： To achieve a uniform coating of a substrate, with an apparatus and a method for coating substrates, according to which the substrate is supported on a substrate holder in such a way that a substrate surface that is to be coated is exposed, and the substrate is rotated together with the substrate holder, a cover can be secured to the substrate holder and together with the substrate holder forms a sealed chamber for the substrate.
摘要翻译：为了实现衬底的均匀涂布，使用用于涂覆衬底的装置和方法，根据该装置和衬底被支撑在衬底保持器上，使得待被涂覆的衬底表面被暴露，并且衬底是与衬底保持器一起旋转，盖可以固定到衬底保持器并与衬底保持器一起形成用于衬底的密封室。

6. 发明申请

US20100116157A1 METHOD AND DEVICE FOR APPLYING MEDIA TO FLAT SUBSTRATES 审中-公开
标题翻译：将介质应用于平面基板的方法和装置
公开(公告)号：US20100116157A1
公开(公告)日：2010-05-13
申请号：US12596920
申请日：2008-04-22
申请人： Franz Plachy , Oliver Stetter , Jakob Szekeresch
发明人： Franz Plachy , Oliver Stetter , Jakob Szekeresch
IPC分类号： B41L13/00 , B41F1/34
CPC分类号： H05K3/0008 , H05K1/0269 , H05K3/1216 , H05K3/1241 , H05K3/225 , H05K3/3484 , H05K2203/0126 , H05K2203/1476 , H05K2203/163
摘要： The invention relates to a device (1) for applying media to flat substrates (2), especially printed circuit boards, said device comprising a printing device for applying media to the substrate (2) during a printing method, an optical monitoring device for checking the arrangement and/or alignment of the substrate (2) in relation to the printing device, and a dispenser (10) for the additional application of media to the substrate (2). According to the invention, the dispenser (10) is fixed in relation to the optical monitoring device.
摘要翻译：本发明涉及一种用于将介质施加到平面基板（2），特别是印刷电路板的装置（1），所述装置包括用于在打印方法期间将介质施加到基板（2）的打印装置，用于检查的光学监视装置衬底（2）相对于打印装置的布置和/或对准，以及用于向衬底（2）额外施加介质的分配器（10）。根据本发明，分配器（10）相对于光学监视装置是固定的。

7. 发明授权

US5455062A Capillary device for lacquering or coating plates or disks 失效
标题翻译：用于涂漆或涂布板或盘的毛细管装置
公开(公告)号：US5455062A
公开(公告)日：1995-10-03
申请号：US372878
申请日：1995-01-13
申请人： Eberhard Muhlfriedal , Armin Kubelbeck , Torsten Gerisch , Karl Appich , Jakob Szekeresch , Martin Kallis
发明人： Eberhard Muhlfriedal , Armin Kubelbeck , Torsten Gerisch , Karl Appich , Jakob Szekeresch , Martin Kallis
IPC分类号： B05C9/02 , B05C9/12 , B05C11/08 , B05C11/105 , B05D1/00 , B05D1/26 , B05D1/40
CPC分类号： B05C9/12 , B05C11/08 , B05C11/105 , B05C9/02 , B05D1/005 , B05D1/26
摘要： A device for coating a plate has an open channel being open in an upward direction and a device for supplying a liquid to the open channel. The liquid in the open channel forms an convexly curved portion projecting upwardly from the open channel. A device for transporting a plate at a close distance past the open channel is provided, with which a surface to be coated of the plate facing the convexly curved portion of the liquid is guided such that a thin film of the liquid is deposited on the surface to be coated by adhesion effects. Another device for lacquering or coating plates or disks has a capillary slot that is filled with a liquid coating medium. The plate to be coated is advanced across the capillary slot with the surface to be coated facing downwardly so that due to the capillary effect a thin layer is deposited on the surface of the plate.
摘要翻译：用于涂覆板的装置具有向上方向打开的开放通道和用于向开放通道供应液体的装置。开放通道中的液体形成从开放通道向上突出的凸形弯曲部分。提供了一种用于在近距离通过开放通道的板材输送板的装置，其中面向液体的凸形弯曲部分的板的待涂覆表面被引导，使得液体的薄膜沉积在表面上被粘附效果涂层。用于涂漆或涂布板或盘的另一装置具有填充有液体涂布介质的毛细槽。要涂覆的板被推进穿过毛细管槽，待涂覆的表面朝下，使得由于毛细管效应，薄层沉积在板的表面上。

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