专利快速检索-快速检索全球专利，免费商用专利数据库-IPRDB

1. 发明申请

US20120001356A1 APPARATUS AND METHOD FOR CONTINUOUS PRODUCTION OF MATERIALS 有权
标题翻译：用于连续生产材料的装置和方法
公开(公告)号：US20120001356A1
公开(公告)日：2012-01-05
申请号：US13158142
申请日：2011-06-10
申请人： Chih-hung Chang , Hyungdae Jin
发明人： Chih-hung Chang , Hyungdae Jin
IPC分类号： B29B9/00 , B01J19/00 , B82Y40/00 , B82Y99/00
CPC分类号： B01J19/0093 , B01J2219/00788 , B01J2219/00795 , B01J2219/00849 , B01J2219/0086 , B01J2219/00873 , B01J2219/00889 , B01J2219/00894 , B82Y30/00 , B82Y40/00
摘要： Embodiments of a continuous-flow injection reactor and a method for continuous material synthesis are disclosed. The reactor includes a mixing zone unit and a residence time unit removably coupled to the mixing zone unit. The mixing zone unit includes at least one top inlet, a side inlet, and a bottom inlet. An injection tube, or plurality of injection tubes, is inserted through the top inlet and extends past the side inlet while terminating above the bottom outlet. A first reactant solution flows in through the side inlet, and a second reactant solution flows in through the injection tube(s). With reference to nanoparticle synthesis, the reactant solutions combine in a mixing zone and form nucleated nanoparticles. The nucleated nanoparticles flow through the residence time unit. The residence time unit may be a single conduit, or it may include an outer housing and a plurality of inner tubes within the outer housing.
摘要翻译：公开了连续流动注射反应器的实施例和连续材料合成的方法。反应器包括混合区单元和可移除地耦合到混合区单元的停留时间单元。混合区单元包括至少一个顶部入口，侧部入口和底部入口。注射管或多个注射管通过顶部入口插入并延伸通过侧入口，同时终止在底部出口上方。第一反应物溶液通过侧入口流入，并且第二反应物溶液流过注射管。关于纳米颗粒合成，反应物溶液在混合区中结合并形成有核的纳米颗粒。有核的纳米颗粒流过停留时间单位。停留时间单元可以是单个导管，或者它可以包括在外壳内的外壳和多个内管。

2. 发明授权

US08801979B2 Apparatus and method for continuous production of materials 有权
标题翻译：连续生产材料的设备和方法
公开(公告)号：US08801979B2
公开(公告)日：2014-08-12
申请号：US13158142
申请日：2011-06-10
申请人： Chih-hung Chang , Hyungdae Jin
发明人： Chih-hung Chang , Hyungdae Jin
IPC分类号： B29B9/00
CPC分类号： B01J19/0093 , B01J2219/00788 , B01J2219/00795 , B01J2219/00849 , B01J2219/0086 , B01J2219/00873 , B01J2219/00889 , B01J2219/00894 , B82Y30/00 , B82Y40/00
摘要： Embodiments of a continuous-flow injection reactor and a method for continuous material synthesis are disclosed. The reactor includes a mixing zone unit and a residence time unit removably coupled to the mixing zone unit. The mixing zone unit includes at least one top inlet, a side inlet, and a bottom outlet. An injection tube, or plurality of injection tubes, is inserted through the top inlet and extends past the side inlet while terminating above the bottom outlet. A first reactant solution flows in through the side inlet, and a second reactant solution flows in through the injection tube(s). With reference to nanoparticle synthesis, the reactant solutions combine in a mixing zone and form nucleated nanoparticles. The nucleated nanoparticles flow through the residence time unit. The residence time unit may be a single conduit, or it may include an outer housing and a plurality of inner tubes within the outer housing.
摘要翻译：公开了连续流动注射反应器的实施例和连续材料合成的方法。反应器包括混合区单元和可移除地耦合到混合区单元的停留时间单元。混合区单元包括至少一个顶部入口，侧部入口和底部出口。注射管或多个注射管通过顶部入口插入并延伸通过侧入口，同时终止在底部出口上方。第一反应物溶液通过侧入口流入，并且第二反应物溶液流过注射管。关于纳米颗粒合成，反应物溶液在混合区中结合并形成有核的纳米颗粒。有核的纳米颗粒流过停留时间单位。停留时间单元可以是单个导管，或者它可以包括在外壳内的外壳和多个内管。

3. 发明授权

US08143616B2 Making a structure 有权
标题翻译：制作结构
公开(公告)号：US08143616B2
公开(公告)日：2012-03-27
申请号：US12426955
申请日：2009-04-20
申请人： Gregory S. Herman , Peter Mardilovich , Chinmay Betrabet , Chih-hung Chang , Yu-jen Chang , Doo-Hyoung Lee , Mark W. Hoskins
发明人： Gregory S. Herman , Peter Mardilovich , Chinmay Betrabet , Chih-hung Chang , Yu-jen Chang , Doo-Hyoung Lee , Mark W. Hoskins
IPC分类号： H01L29/06 , H01L21/02
CPC分类号： H01L51/0022 , B41J11/002 , C23C18/04 , C23C18/06 , C23C18/14 , C30B7/005 , H01L21/67011 , Y10S977/938
摘要： A structure includes a surface and a non-equilibrium two-dimensional semiconductor micro structure on the surface.
摘要翻译：结构包括表面和表面上的非平衡二维半导体微结构。

4. 发明授权

US07846489B2 Method and apparatus for chemical deposition 有权
标题翻译：用于化学沉积的方法和装置
公开(公告)号：US07846489B2
公开(公告)日：2010-12-07
申请号：US11490966
申请日：2006-07-21
申请人： Chih-hung Chang
发明人： Chih-hung Chang
IPC分类号： B05D5/06 , B05D5/12
CPC分类号： B05B7/0408 , B05B1/14 , B82Y30/00 , C23C18/1204 , C23C18/1216 , C23C18/125 , C23C18/1603 , C23C18/161 , C23C18/1678 , C23C18/31 , H01L21/02568 , H01L21/02628 , H01L21/288 , H01L29/78681 , H01L29/7869 , H01L31/1828 , Y02E10/543 , Y02P70/521
摘要： Embodiments of the present system and method are useful for chemical deposition, particularly continuous deposition of thin films. Disclosed systems typically comprise a micromixer and a microchannel applicator. A deposition material or materials is applied to a substrate, such as an oxidized silicon substrate, a flexible substrate useful for forming flexible devices, such as flexible transistors, and combinations of different substrates. Uniform and highly oriented surface morphologies of films deposited using disclosed embodiments are clearly improved compared to films deposited by a conventional batch process. The process can be used to tailor the composition and morphology of the material deposited on a substrate. The present process can be used at low temperatures as a post-deposition, high-temperature annealing step is obviated.
摘要翻译：本发明的系统和方法的实施例可用于化学沉积，特别是薄膜的连续沉积。公开的系统通常包括微混合器和微通道施加器。将沉积材料或材料施加到诸如氧化硅衬底的基底，用于形成诸如柔性晶体管的柔性器件的柔性衬底以及不同衬底的组合。使用所公开的实施例沉积的膜的均匀且高度取向的表面形态与通过常规间歇方法沉积的膜相比是明显改善的。该方法可用于定制沉积在基底上的材料的组成和形态。本方法可以在低温下使用，因为后期沉积可以避免高温退火步骤。

5. 发明授权

US07547647B2 Method of making a structure 有权
标题翻译：制作结构的方法
公开(公告)号：US07547647B2
公开(公告)日：2009-06-16
申请号：US10885223
申请日：2004-07-06
申请人： Gregory S. Herman , Peter Mardilovich , Chinmay Betrabet , Chih-hung Chang , Yu-jen Chang , Doo-Hyoung Lee , Mark W. Hoskins
发明人： Gregory S. Herman , Peter Mardilovich , Chinmay Betrabet , Chih-hung Chang , Yu-jen Chang , Doo-Hyoung Lee , Mark W. Hoskins
IPC分类号： H01L21/00
CPC分类号： H01L51/0022 , B41J11/002 , C23C18/04 , C23C18/06 , C23C18/14 , C30B7/005 , H01L21/67011 , Y10S977/938
摘要： A method for making a structure includes depositing a solution upon a surface and irradiating the solution with microwaves to crystallize solute of the solution on the surface.
摘要翻译：制造结构的方法包括将溶液沉积在表面上并用微波照射溶液以使溶液的溶质在表面上结晶。

6. 发明授权

US08553333B2 Nanostructured anti-reflective coatings for substrates 有权
标题翻译：用于基材的纳米结构抗反射涂层
公开(公告)号：US08553333B2
公开(公告)日：2013-10-08
申请号：US13189411
申请日：2011-07-22
申请人： Chih-hung Chang , Seung-Yeol Han , Brian K. Paul
发明人： Chih-hung Chang , Seung-Yeol Han , Brian K. Paul
IPC分类号： G02B27/10 , B32B5/16
CPC分类号： G02B1/118 , B01F5/0256 , B01F13/0059 , B01F13/0066 , B01J19/0093 , B01J2219/00783 , B01J2219/00835 , B01J2219/00837 , B01J2219/00846 , B01J2219/00889 , B01J2219/00943 , B82Y20/00 , B82Y30/00 , C23C18/1212 , C23C18/1216 , C23C18/1225 , G02B1/14 , Y10T428/25
摘要： Embodiments of the present system and method are useful for chemical deposition, particularly continuous deposition of anti-reflective films. Disclosed systems typically comprise a micromixer and a microchannel applicator. A deposition material or materials is applied to a substrate to form a nanostructured, anti-reflective coating. Uniform and highly oriented surface morphologies of films deposited using disclosed embodiments are clearly improved compared to films deposited by a conventional batch process. In some embodiments, a scratch-resistant, anti-reflective coating is applied to a polycarbonate substrate, such as a lens. In certain embodiments, an anti-reflective coating is applied to a surface of a solar catalytic microreactor suitable for performing endothermic reactions, where energy is provided to the reactor by absorption of solar radiation. The composition and morphology of the material deposited on a substrate can be tailored. The process can be used at low temperatures as a post-deposition, high-temperature annealing step is obviated.
摘要翻译：本发明的系统和方法的实施例对于化学沉积，特别是抗反射膜的连续沉积是有用的。公开的系统通常包括微混合器和微通道施加器。将沉积材料或材料施加到基底以形成纳米结构的抗反射涂层。使用所公开的实施例沉积的膜的均匀且高度取向的表面形态与通过常规间歇方法沉积的膜相比显然改善。在一些实施例中，将防刮擦的抗反射涂层施加到聚碳酸酯基底，例如透镜。在某些实施方案中，将抗反射涂层施加到适于进行吸热反应的太阳能催化微反应器的表面，其中通过吸收太阳辐射将能量提供给反应器。沉积在基底上的材料的组成和形态可以被定制。该方法可以在低温下使用，因为后期沉积，高温退火步骤被消除。

7. 发明申请

US20120176681A1 NANOSTRUCTURED ANTI-REFLECTIVE COATINGS FOR SUBSTRATES 有权
标题翻译：用于基材的纳米结构抗反射涂层
公开(公告)号：US20120176681A1
公开(公告)日：2012-07-12
申请号：US13189411
申请日：2011-07-22
申请人： Chih-hung Chang , Seung-Yeol Han , Brian K. Paul
发明人： Chih-hung Chang , Seung-Yeol Han , Brian K. Paul
IPC分类号： G02B1/11 , B01J19/10 , B05D5/06 , C23C16/50 , B01J19/08 , B01J19/12 , B82Y20/00 , B82Y99/00
CPC分类号： G02B1/118 , B01F5/0256 , B01F13/0059 , B01F13/0066 , B01J19/0093 , B01J2219/00783 , B01J2219/00835 , B01J2219/00837 , B01J2219/00846 , B01J2219/00889 , B01J2219/00943 , B82Y20/00 , B82Y30/00 , C23C18/1212 , C23C18/1216 , C23C18/1225 , G02B1/14 , Y10T428/25
摘要： Embodiments of the present system and method are useful for chemical deposition, particularly continuous deposition of anti-reflective films. Disclosed systems typically comprise a micromixer and a microchannel applicator. A deposition material or materials is applied to a substrate to form a nanostructured, anti-reflective coating. Uniform and highly oriented surface morphologies of films deposited using disclosed embodiments are clearly improved compared to films deposited by a conventional batch process. In some embodiments, a scratch-resistant, anti-reflective coating is applied to a polycarbonate substrate, such as a lens. In certain embodiments, an anti-reflective coating is applied to a surface of a solar catalytic microreactor suitable for performing endothermic reactions, where energy is provided to the reactor by absorption of solar radiation. The composition and morphology of the material deposited on a substrate can be tailored. The process can be used at low temperatures as a post-deposition, high-temperature annealing step is obviated.
摘要翻译：本发明的系统和方法的实施例对于化学沉积，特别是抗反射膜的连续沉积是有用的。公开的系统通常包括微混合器和微通道施加器。将沉积材料或材料施加到基底以形成纳米结构的抗反射涂层。使用所公开的实施例沉积的膜的均匀且高度取向的表面形态与通过常规间歇方法沉积的膜相比显然改善。在一些实施例中，将防刮擦的抗反射涂层施加到聚碳酸酯基底，例如透镜。在某些实施方案中，将抗反射涂层施加到适于进行吸热反应的太阳能催化微反应器的表面，其中通过吸收太阳辐射将能量提供给反应器。沉积在基底上的材料的组成和形态可以被定制。该方法可以在低温下使用，因为后期沉积，高温退火步骤被消除。

8. 发明申请

US20070020400A1 Method and apparatus for chemical deposition 有权
标题翻译：用于化学沉积的方法和装置
公开(公告)号：US20070020400A1
公开(公告)日：2007-01-25
申请号：US11490966
申请日：2006-07-21
申请人： Chih-hung Chang
发明人： Chih-hung Chang
IPC分类号： B05D5/12 , B05D7/00 , B05C5/00 , B05C13/02
CPC分类号： B05B7/0408 , B05B1/14 , B82Y30/00 , C23C18/1204 , C23C18/1216 , C23C18/125 , C23C18/1603 , C23C18/161 , C23C18/1678 , C23C18/31 , H01L21/02568 , H01L21/02628 , H01L21/288 , H01L29/78681 , H01L29/7869 , H01L31/1828 , Y02E10/543 , Y02P70/521
摘要： Embodiments of the present system and method are useful for chemical deposition, particularly continuous deposition of thin films. Disclosed systems typically comprise a micromixer and a microchannel applicator. A deposition material or materials is applied to a substrate, such as an oxidized silicon substrate, a flexible substrate useful for forming flexible devices, such as flexible transistors, and combinations of different substrates. Uniform and highly oriented surface morphologies of films deposited using disclosed embodiments are clearly improved compared to films deposited by a conventional batch process. The process can be used to tailor the composition and morphology of the material deposited on a substrate. The present process can be used at low temperatures as a post-deposition, high-temperature annealing step is obviated.
摘要翻译：本发明的系统和方法的实施例可用于化学沉积，特别是薄膜的连续沉积。公开的系统通常包括微混合器和微通道施加器。将沉积材料或材料施加到诸如氧化硅衬底的基底，用于形成诸如柔性晶体管的柔性器件的柔性衬底以及不同衬底的组合。使用所公开的实施例沉积的膜的均匀且高度取向的表面形态与通过常规间歇方法沉积的膜相比显然改善。该方法可用于定制沉积在基底上的材料的组成和形态。本方法可以在低温下使用，因为后期沉积可以避免高温退火步骤。

9. 发明授权

US08273245B2 Microfluidic devices, particularly filtration devices comprising polymeric membranes, and methods for their manufacture and use 有权
标题翻译：微流体装置，特别是包括聚合物膜的过滤装置及其制造和使用的方法
公开(公告)号：US08273245B2
公开(公告)日：2012-09-25
申请号：US13292903
申请日：2011-11-09
申请人： Goran Nadezda Jovanovic , Sundar V. Atre , Brian Kevin Paul , Vincent Thomas Remcho , Chih-hung Chang
发明人： Goran Nadezda Jovanovic , Sundar V. Atre , Brian Kevin Paul , Vincent Thomas Remcho , Chih-hung Chang
IPC分类号： B01D63/00 , B01D61/00 , C02F1/44
CPC分类号： B01D61/18 , A61M1/16 , A61M1/1698 , A61M1/3472 , A61M2205/3334 , A61M2205/3368 , A61M2205/50 , B01D63/08 , B01D63/088 , B01D71/10 , B01D71/68 , B01D2313/21 , B01D2313/38
摘要： The present disclosure describes devices useful for microscale fluid purification, separation, and synthesis. Such devices generally comprise a fluid membrane that separates two or more fluids flowing through plural microchannels operatively associated with the membrane. Often, the membrane is a semipermeable membrane, such as might be used with a filtration device, such as a dialyzer. Devices of the present invention can be combined with other microscale devices to make systems. For example, the devices may be coupled with one or more microchemical microfactories, one or more micromixers, one or more microheaters, etc. Examples of devices made according to the present invention included an oxygenator, a dialyzer, microheat exchangers, etc.
摘要翻译：本公开描述了可用于微量流体纯化，分离和合成的装置。这种装置通常包括流体膜，其分离流过与膜操作性相关联的多个微通道的两个或更多个流体。通常，膜是半透膜，例如可以与过滤装置如透析器一起使用。本发明的装置可以与其他微型装置组合以制造系统。例如，这些装置可以与一个或多个微化学微生物，一个或多个微混合器，一个或多个微量加热器等连接。根据本发明制造的装置的实例包括氧合器，透析器，微热交换器等。

10. 发明授权

US08236599B2 Solution-based process for making inorganic materials 有权
标题翻译：制备无机材料的基于溶液的工艺
公开(公告)号：US08236599B2
公开(公告)日：2012-08-07
申请号：US12798755
申请日：2010-04-09
申请人： Chih-hung Chang , Wei Wang
发明人： Chih-hung Chang , Wei Wang
IPC分类号： H01L21/00
CPC分类号： H01L31/18 , C23C18/06 , C23C18/1204 , C23C18/1225 , C23C18/1275 , C23C18/1295 , H01L21/02521 , H01L21/02554 , H01L21/02565 , H01L21/02568 , H01L21/02628 , H01L27/1292 , H01L29/2003 , H01L29/78681 , H01L29/7869 , H01L29/812 , H01L31/0296 , H01L31/0322 , H01L31/0749 , H01L31/1836 , Y02E10/541 , Y02P70/521
摘要： Disclosed embodiments provide a solution-based process for producing useful materials, such as semiconductor materials. One disclosed embodiment comprises providing at least a first reactant and a second reactant in solution and applying the solution to a substrate. The as-deposited material is thermally annealed to form desired compounds. Thermal annealing may be conducted under vacuum; under an inert atmosphere; or under a reducing environment. The method may involve using metal and chalcogen precursor compounds. One example of a metal precursor compound is a metal halide. Examples of suitable chalcogen precursor compounds include a chalcogen powder, a chalcogen halide, a chalcogen oxide, a chalcogen urea, a chalcogen or dichalcogen comprising organic ligands, or combinations thereof. Certain disclosed embodiments concern a method for making a solar cell from I-III-VI semiconductors.
摘要翻译：公开的实施例提供了一种用于生产有用材料（例如半导体材料）的基于溶液的方法。一个公开的实施方案包括在溶液中提供至少第一反应物和第二反应物并将溶液施加到基底。将沉积的材料热退火以形成所需的化合物。热退火可以在真空下进行; 在惰性气氛下或在减少的环境下。该方法可以涉及使用金属和硫属前体化合物。金属前体化合物的一个实例是金属卤化物。合适的硫族元素前体化合物的实例包括硫族元素粉末，硫族化合物卤化物，硫族元素氧化物，硫属元素尿素，含有有机配体的硫属元素或二硫原子，或其组合。某些公开的实施例涉及从I-III-VI半导体制造太阳能电池的方法。

你已经成功收藏专利！

检索式保存成功!

IPRDB

热门服务

关于我们

友情链接

联系方式