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1. 发明授权

US08460985B2 Method of manufacturing semiconductor for transistor and method of manufacturing the transistor 有权
标题翻译：晶体管半导体的制造方法及晶体管的制造方法
公开(公告)号：US08460985B2
公开(公告)日：2013-06-11
申请号：US12829977
申请日：2010-07-02
申请人： Bo-Kyoung Ahn , Seon-Pil Jang , Gug-Rae Jo , Hong-Suk Yoo , Chang-Hoon Kim , Min-Uk Kim , Ju-Han Bae
发明人： Bo-Kyoung Ahn , Seon-Pil Jang , Gug-Rae Jo , Hong-Suk Yoo , Chang-Hoon Kim , Min-Uk Kim , Ju-Han Bae
IPC分类号： H01L21/336
CPC分类号： H01L21/02628 , C23C18/1212 , C23C18/1216 , C23C18/14 , H01L21/02554 , H01L21/02565 , H01L21/02614 , H01L21/268 , H01L27/1225 , H01L29/7869
摘要： A method of manufacturing a semiconductor for a transistor that includes forming a precursor layer by coating a surface of an insulation substrate with a precursor solution for an oxide semiconductor, forming an oxide semiconductor by oxidizing a portion of the precursor layer, and removing a remaining precursor layer except for the oxide semiconductor.
摘要翻译：一种制造用于晶体管的半导体的方法，其包括通过用氧化物半导体的前体溶液涂覆绝缘基板的表面来形成前体层，通过氧化前体层的一部分形成氧化物半导体，以及除去剩余的前体除了氧化物半导体。

2. 发明申请

US20110124152A1 METHOD OF MANUFACTURING SEMICONDUCTOR FOR TRANSISTOR AND METHOD OF MANUFACTURING THE TRANSISTOR 有权
标题翻译：制造晶体管半导体的方法及制造晶体管的方法
公开(公告)号：US20110124152A1
公开(公告)日：2011-05-26
申请号：US12829977
申请日：2010-07-02
申请人： Bo-Kyoung AHN , Seon-Pil Jang , Gug-Rae Jo , Hong-Suk Yoo , Chang-Hoon Kim , Min-Uk Kim , Ju-Han Bae
发明人： Bo-Kyoung AHN , Seon-Pil Jang , Gug-Rae Jo , Hong-Suk Yoo , Chang-Hoon Kim , Min-Uk Kim , Ju-Han Bae
IPC分类号： H01L21/36
CPC分类号： H01L21/02628 , C23C18/1212 , C23C18/1216 , C23C18/14 , H01L21/02554 , H01L21/02565 , H01L21/02614 , H01L21/268 , H01L27/1225 , H01L29/7869
摘要： A method of manufacturing a semiconductor for a transistor that includes forming a precursor layer by coating a surface of an insulation substrate with a precursor solution for an oxide semiconductor, forming an oxide semiconductor by oxidizing a portion of the precursor layer, and removing a remaining precursor layer except for the oxide semiconductor.
摘要翻译：一种制造用于晶体管的半导体的方法，其包括通过用氧化物半导体的前体溶液涂覆绝缘基板的表面来形成前体层，通过氧化前体层的一部分形成氧化物半导体，以及除去剩余的前体除了氧化物半导体。

3. 发明申请

US20100261105A1 Method of Exposing Substrate, Apparatus for Performing the Same, and Method of Manufacturing Display Substrate Using the Same 有权
标题翻译：基板的曝光方法，其基板的制造方法以及使用其的显示基板的制造方法
公开(公告)号：US20100261105A1
公开(公告)日：2010-10-14
申请号：US12778574
申请日：2010-05-12
申请人： Bo-Kyoung Ahn , Gug-Rae Jo , Hong-Suk Yoo , Chang-Hoon Kim , Min-Uk Kim , Joo-Han Bae
发明人： Bo-Kyoung Ahn , Gug-Rae Jo , Hong-Suk Yoo , Chang-Hoon Kim , Min-Uk Kim , Joo-Han Bae
IPC分类号： G03B27/72 , G03F7/20 , H01J9/00
CPC分类号： G03B27/72 , G02F1/133516 , G03F7/7035 , G03F7/70558 , G03F7/70575
摘要： A photoresist layer exposed through first slits of a mask is exposed using first light. The photoresist layer exposed through second slits of the mask is exposed by using second light. The first light passes thorough a transflective shutter to generate the second light.
摘要翻译：通过第一光照射通过掩模的第一狭缝曝光的光致抗蚀剂层。通过使用第二光来曝光通过掩模的第二狭缝曝光的光致抗蚀剂层。第一个光通过透反射快门以产生第二个光。

4. 发明授权

US08367281B2 Method of exposing substrate, apparatus for performing the same, and method of manufacturing display substrate using the same 有权
标题翻译：曝光基板的方法，其制造方法以及使用其制造显示基板的方法
公开(公告)号：US08367281B2
公开(公告)日：2013-02-05
申请号：US12778574
申请日：2010-05-12
申请人： Bo-Kyoung Ahn , Gug-Rae Jo , Hong-Suk Yoo , Chang-Hoon Kim , Min-Uk Kim , Joo-Han Bae
发明人： Bo-Kyoung Ahn , Gug-Rae Jo , Hong-Suk Yoo , Chang-Hoon Kim , Min-Uk Kim , Joo-Han Bae
IPC分类号： G03F7/20 , G02B5/20
CPC分类号： G03B27/72 , G02F1/133516 , G03F7/7035 , G03F7/70558 , G03F7/70575
摘要： A photoresist layer exposed through first slits of a mask is exposed using first light. The photoresist layer exposed through second slits of the mask is exposed by using second light. The first light passes thorough a transflective shutter to generate the second light.
摘要翻译：通过第一光照射通过掩模的第一狭缝曝光的光致抗蚀剂层。通过使用第二光来曝光通过掩模的第二狭缝曝光的光致抗蚀剂层。第一个光通过透反射快门以产生第二个光。

5. 发明授权

US09316923B2 Exposure apparatus and exposure method using the same 有权
标题翻译：曝光装置和曝光方法使用相同
公开(公告)号：US09316923B2
公开(公告)日：2016-04-19
申请号：US13082081
申请日：2011-04-07
申请人： Chang-Hoon Kim , Gug-Rae Jo , Hong-Suk Yoo , Bo-Kyoung Ahn
发明人： Chang-Hoon Kim , Gug-Rae Jo , Hong-Suk Yoo , Bo-Kyoung Ahn
IPC分类号： G03B27/42 , G03F7/20
CPC分类号： G03F7/7035 , G03F7/70058 , G03F7/7015
摘要： Provided are an exposure apparatus and an exposure method using the same. The exposure apparatus includes: a light source unit configured to emit light; a substrate stage supporting a substrate, the substrate comprising an exposure area and a non-exposure area; and a prism unit disposed between the light source unit and the substrate stage, the prism unit movable so as to transmit the light to the exposure area and to block the light from the non-exposure area.
摘要翻译：提供一种曝光装置和使用该装置的曝光方法。曝光装置包括：配置为发光的光源单元; 支撑衬底的衬底台，所述衬底包括曝光区域和非曝光区域; 以及设置在所述光源单元和所述基板台之间的棱镜单元，所述棱镜单元可移动以将光透射到所述曝光区域并阻挡来自所述非曝光区域的光。

6. 发明申请

US20120013876A1 EXPOSURE APPARATUS AND EXPOSURE METHOD USING THE SAME 有权
标题翻译：曝光装置和曝光方法
公开(公告)号：US20120013876A1
公开(公告)日：2012-01-19
申请号：US13082081
申请日：2011-04-07
申请人： Chang-Hoon Kim , Gug-Rae Jo , Hong-Suk Yoo , Bo-Kyoung Ahn
发明人： Chang-Hoon Kim , Gug-Rae Jo , Hong-Suk Yoo , Bo-Kyoung Ahn
IPC分类号： G03B27/54 , G03B27/70
CPC分类号： G03F7/7035 , G03F7/70058 , G03F7/7015
摘要： Provided are an exposure apparatus and an exposure method using the same. The exposure apparatus includes: a light source unit configured to emit light; a substrate stage supporting a substrate, the substrate comprising an exposure area and a non-exposure area; and a prism unit disposed between the light source unit and the substrate stage, the prism unit movable so as to transmit the light to the exposure area and to block the light from the non-exposure area.
摘要翻译：提供一种曝光装置和使用其的曝光方法。曝光装置包括：配置为发光的光源单元; 支撑衬底的衬底台，所述衬底包括曝光区域和非曝光区域; 以及设置在所述光源单元和所述基板台之间的棱镜单元，所述棱镜单元可移动以将光透射到所述曝光区域并阻挡来自所述非曝光区域的光。

7. 发明授权

US08842258B2 Exposure apparatus, exposure method, and blind for exposure apparatus 有权
标题翻译：曝光装置，曝光方法，以及曝光装置的盲人
公开(公告)号：US08842258B2
公开(公告)日：2014-09-23
申请号：US13071962
申请日：2011-03-25
申请人： Bo-Kyoung Ahn , Hong-Suk Yoo , Chang-Hoon Kim
发明人： Bo-Kyoung Ahn , Hong-Suk Yoo , Chang-Hoon Kim
IPC分类号： G03F7/20
CPC分类号： G03F7/70066
摘要： An exposure apparatus includes a mask, a substrate which passes through a region disposed below the mask while moving in a first direction, a light source unit disposed above the mask, where the light source irradiates light on the substrate through the mask, and at least one blind disposed below the light source unit, where the blind blocks the light irradiated from the light source unit, where a second direction is perpendicular to the first direction in a same plane as the first direction, the blind is a polyhedron having a width, a length and a thickness and is disposed such that a direction of the length is substantially parallel to the second direction, and the blind is rotatable around a rotation axis substantially parallel to the second direction, and where the width is greater than the thickness.
摘要翻译：曝光装置包括掩模，在第一方向移动时穿过掩模下方的区域的基板，设置在掩模上方的光源单元，其中光源通过掩模将光照射在基板上，并且至少一个盲设置在所述光源单元下方，其中所述盲区阻挡从所述光源单元照射的光，其中第二方向在与所述第一方向相同的平面中垂直于所述第一方向，所述盲是具有宽度的多面体，长度和厚度被布置成使得长度方向基本上平行于第二方向，并且盲板可绕基本平行于第二方向的旋转轴线旋转，并且其中宽度大于厚度。

8. 发明授权

US08564762B2 Photolithography exposure apparatus having blinding plates and method of driving the same 失效
标题翻译：具有盲板的光刻曝光装置及其驱动方法
公开(公告)号：US08564762B2
公开(公告)日：2013-10-22
申请号：US13086293
申请日：2011-04-13
申请人： Chang-Hoon Kim , Bo-Kyoung Ahn , Hong-Suk Yoo
发明人： Chang-Hoon Kim , Bo-Kyoung Ahn , Hong-Suk Yoo
IPC分类号： G02B26/02 , G03B27/32 , G03B27/42 , G03B27/54 , G03B27/72
CPC分类号： G03F7/2008 , G03F7/7055
摘要： An exposure apparatus includes a light source for providing bursts of photolithographic exposure light, a mask for applying a pattern to the photolithographic exposure light, a variable length blind for blocking parts of an exposure window from receiving the photolithographic exposure light and a blind driver for controllably driving the variable length blind. The blind includes a plurality of movable blocking plates. The blind driver includes a plurality of motors and a motor control unit which are structured to rapidly return one or more of the blocking plates through the exposure window in a time duration between the bursts of photolithographic exposure light so that a return stain is not formed on the substrate. In one embodiment, the substrate is a mother substrate having a plurality of LCD daughter substrates being formed thereon.
摘要翻译：曝光装置包括用于提供光刻曝光光的脉冲的光源，用于向光刻曝光灯施加图案的掩模，用于阻挡曝光窗口的部分的可变长度遮光板接收光刻曝光灯和盲控制器驾驶可变长度盲人。盲板包括多个可移动阻挡板。盲驱动器包括多个电动机和电动机控制单元，其被构造为在光刻曝光光的脉冲之间的时间段内快速返回一个或多个阻挡板通过曝光窗，使得不会在底物。在一个实施例中，基板是在其上形成有多个LCD子基板的母基板。

9. 发明申请

US20120086930A1 PHOTOLITHOGRAPHY EXPOSURE APPARATUS HAVING BLINDING PLATES AND METHOD OF DRIVING THE SAME 失效
标题翻译：具有发泡板的光刻曝光装置及其驱动方法
公开(公告)号：US20120086930A1
公开(公告)日：2012-04-12
申请号：US13086293
申请日：2011-04-13
申请人： Chang-Hoon KIM , Bo-Kyoung Ahn , Hong-Suk Yoo
发明人： Chang-Hoon KIM , Bo-Kyoung Ahn , Hong-Suk Yoo
IPC分类号： G03B27/72
CPC分类号： G03F7/2008 , G03F7/7055
摘要： An exposure apparatus includes a light source for providing bursts of photolithographic exposure light, a mask for applying a pattern to the photolithographic exposure light, a variable length blind for blocking parts of an exposure window from receiving the photolithographic exposure light and a blind driver for controllably driving the variable length blind. The blind includes a plurality of movable blocking plates. The blind driver includes a plurality of motors and a motor control unit which are structured to rapidly return one or more of the blocking plates through the exposure window in a time duration between the bursts of photolithographic exposure light so that a return stain is not formed on the substrate. In one embodiment, the substrate is a mother substrate having a plurality of LCD daughter substrates being formed thereon.
摘要翻译：曝光装置包括用于提供光刻曝光光的脉冲的光源，用于向光刻曝光灯施加图案的掩模，用于阻挡曝光窗口的部分的可变长度遮光板接收光刻曝光灯和盲控制器驾驶可变长度盲人。盲板包括多个可移动阻挡板。盲驱动器包括多个电动机和电动机控制单元，其被构造为在光刻曝光光的脉冲之间的时间段内快速返回一个或多个阻挡板通过曝光窗，使得不会在底物。在一个实施例中，基板是在其上形成有多个LCD子基板的母基板。

10. 发明授权

US08097881B2 Thin film transistor substrate and a fabricating method thereof 有权
标题翻译：薄膜晶体管基板及其制造方法
公开(公告)号：US08097881B2
公开(公告)日：2012-01-17
申请号：US12502653
申请日：2009-07-14
申请人： Young-Wook Lee , Hong-Suk Yoo , Jean-Ho Song , Jae-Hyoung Youn , Jong-In Kim
发明人： Young-Wook Lee , Hong-Suk Yoo , Jean-Ho Song , Jae-Hyoung Youn , Jong-In Kim
IPC分类号： H01L29/76 , H01L29/04 , H01L31/036 , H01L27/01 , H01L27/12
CPC分类号： H01L29/7869 , H01L27/1225
摘要： An oxide semiconductor thin film transistor substrate includes a gate line and a gate electrode disposed on an insulating substrate, an oxide semiconductor pattern disposed adjacent to the gate electrode, a data line electrically insulated from the gate line, the data line and the gate line defining a display region, a first opening exposing a surface of the data line, a second opening exposing a surface of the oxide semiconductor pattern, and a drain electrode disposed on the first opening and a drain electrode pad, the drain electrode extending from the first opening to the second opening and electrically connecting the drain electrode pad and the oxide semiconductor pattern.
摘要翻译：氧化物半导体薄膜晶体管基板包括栅极线和设置在绝缘基板上的栅电极，邻近栅电极设置的氧化物半导体图案，与栅极线电绝缘的数据线，数据线和限定线显示区域，暴露数据线的表面的第一开口，暴露氧化物半导体图案的表面的第二开口和设置在第一开口上的漏电极和漏电极焊盘，漏电极从第一开口延伸到第二开口并电连接漏电极焊盘和氧化物半导体图案。

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