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    • 2. 发明申请
    • EXPOSURE APPARATUS, EXPOSURE METHOD, AND BLIND FOR EXPOSURE APPARATUS
    • 曝光装置,曝光方法和曝光装置
    • US20120088196A1
    • 2012-04-12
    • US13071962
    • 2011-03-25
    • Bo-Kyoung AHNHong-Suk YOOChang-Hoon KIM
    • Bo-Kyoung AHNHong-Suk YOOChang-Hoon KIM
    • G03F7/20G03B27/72
    • G03F7/70066
    • An exposure apparatus includes a mask, a substrate which passes through a region disposed below the mask while moving in a first direction, a light source unit disposed above the mask, where the light source irradiates light on the substrate through the mask, and at least one blind disposed below the light source unit, where the blind blocks the light irradiated from the light source unit, where a second direction is perpendicular to the first direction in a same plane as the first direction, the blind is a polyhedron having a width, a length and a thickness and is disposed such that a direction of the length is substantially parallel to the second direction, and the blind is rotatable around a rotation axis substantially parallel to the second direction, and where the width is greater than the thickness.
    • 曝光装置包括掩模,在第一方向移动时穿过掩模下方的区域的基板,设置在掩模上方的光源单元,其中光源通过掩模将光照射在基板上,并且至少 一个盲设置在所述光源单元下方,其中所述盲区阻挡从所述光源单元照射的光,其中第二方向在与所述第一方向相同的平面中垂直于所述第一方向,所述盲是具有宽度的多面体, 长度和厚度被布置成使得长度方向基本上平行于第二方向,并且盲板可绕基本平行于第二方向的旋转轴线旋转,并且其中宽度大于厚度。
    • 3. 发明申请
    • PHOTOLITHOGRAPHY EXPOSURE APPARATUS HAVING BLINDING PLATES AND METHOD OF DRIVING THE SAME
    • 具有发泡板的光刻曝光装置及其驱动方法
    • US20120086930A1
    • 2012-04-12
    • US13086293
    • 2011-04-13
    • Chang-Hoon KIMBo-Kyoung AhnHong-Suk Yoo
    • Chang-Hoon KIMBo-Kyoung AhnHong-Suk Yoo
    • G03B27/72
    • G03F7/2008G03F7/7055
    • An exposure apparatus includes a light source for providing bursts of photolithographic exposure light, a mask for applying a pattern to the photolithographic exposure light, a variable length blind for blocking parts of an exposure window from receiving the photolithographic exposure light and a blind driver for controllably driving the variable length blind. The blind includes a plurality of movable blocking plates. The blind driver includes a plurality of motors and a motor control unit which are structured to rapidly return one or more of the blocking plates through the exposure window in a time duration between the bursts of photolithographic exposure light so that a return stain is not formed on the substrate. In one embodiment, the substrate is a mother substrate having a plurality of LCD daughter substrates being formed thereon.
    • 曝光装置包括用于提供光刻曝光光的脉冲的光源,用于向光刻曝光灯施加图案的掩模,用于阻挡曝光窗口的部分的可变长度遮光板接收光刻曝光灯和盲控制器 驾驶可变长度盲人。 盲板包括多个可移动阻挡板。 盲驱动器包括多个电动机和电动机控制单元,其被构造为在光刻曝光光的脉冲之间的时间段内快速返回一个或多个阻挡板通过曝光窗,使得不会在 底物。 在一个实施例中,基板是在其上形成有多个LCD子基板的母基板。
    • 4. 发明申请
    • BLIND, EXPOSURE APPARATUS HAVING THE BLIND AND METHOD OF DRIVING THE EXPOSURE APPARATUS
    • 黑色,具有黑色的曝光装置和驱动曝光装置的方法
    • US20130088700A1
    • 2013-04-11
    • US13438389
    • 2012-04-03
    • Chang-Hoon KIMHong-Suk YOOKab-Jong SEO
    • Chang-Hoon KIMHong-Suk YOOKab-Jong SEO
    • G03F7/20
    • G03F7/7055G03F7/70066
    • An exposure apparatus includes a light source, a mask and a blind. The light source is disposed over a substrate. The light source cyclically radiates light. The mask is disposed between the light source and the substrate. The mask includes an exposure region and a peripheral region. The peripheral region surrounds the exposure region. A pattern is formed in the exposure region. A plurality of first alignment marks is disposed in the peripheral region. The blind is disposed between the light source and the mask. The blind includes a blocking plate and an adjusting part. The blocking part may move across the substrate. The blocking plate includes second alignment marks disposed at end portions of the blocking plate, opposite to each other. The adjusting part adjusts a position of the blocking plate.
    • 曝光装置包括光源,掩模和盲人。 光源设置在基板上。 光源周期性地辐射光。 掩模设置在光源和基板之间。 掩模包括曝光区域和周边区域。 周边区域围绕曝光区域。 在曝光区域中形成图案。 多个第一对准标记设置在周边区域中。 盲板设置在光源和掩模之间。 盲人包括挡板和调节部。 阻挡部分可以跨过衬底移动。 阻挡板包括设置在阻挡板的彼此相对的端部处的第二对准标记。 调节部调节挡板的位置。
    • 5. 发明申请
    • EXPOSURE APPARATUS HAVING BLIND AND METHOD OF DRIVING
    • 具有盲点的接触装置和驱动方法
    • US20130077067A1
    • 2013-03-28
    • US13477992
    • 2012-05-22
    • Chang-Hoon KIMHong-Suk YOO
    • Chang-Hoon KIMHong-Suk YOO
    • G03B27/42
    • G03B27/423G03F7/7055
    • An exposure apparatus includes a light source, a mask, a blind, and a blind driver. The light source emits light in a light emitting cycle. The mask is disposed over a substrate and includes an exposure window. A pattern is formed in the exposure window. The blind is disposed over the exposure window. The blind moves in a first direction to block a non-exposed area in the substrate. The blind is returned to pass through the exposure window area in a second direction opposite to the first direction. The blind includes a plurality of blocking plates. The blocking plates include a blocking portion and an opening portion. The blind driver drives the blind.
    • 曝光装置包括光源,掩模,盲人和盲驱动器。 光源在发光循环中发光。 掩模设置在基板上并且包括曝光窗口。 在曝光窗口中形成图案。 盲人被布置在曝光窗口之上。 盲板沿第一方向移动以阻挡基板中的未曝光区域。 盲板返回以与第一方向相反的第二方向通过曝光窗区域。 盲板包括多个阻挡板。 阻挡板包括阻挡部分和开口部分。 盲人司机驾驶盲人。