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    • 1. 发明授权
    • SRAM cell arrangement and method for manufacturing same
    • SRAM单元布置及其制造方法
    • US06309930B1
    • 2001-10-30
    • US09708636
    • 2000-11-09
    • Bernd GoebelEmmerich BertagnolliJosef WillerBarbara HaslerPaul-Werner von Basse
    • Bernd GoebelEmmerich BertagnolliJosef WillerBarbara HaslerPaul-Werner von Basse
    • H01L21336
    • H01L27/11H01L27/1104
    • The SRAM cell arrangement comprises six MOS transistors per memory cell that are fashioned as vertical transistors. The MOS transistors are arranged at sidewalls of trenches (G1, G2, G4). Parts of the memory cell such as, for example, gate electrodes (Ga2, Ga4) or conductive structures (L3) fashioned as spacer are contacted via adjacent, horizontal, conductive structures (H5) arranged above a surface (O) of a substrate (S). Connections between parts of memory cells ensue via third conductive structures (L3) arranged at the sidewalls of the depressions and word lines (W) via diffusion regions (D2) that are adjacent to the sidewalls of the depressions within the substrate (S), via first bit lines, via second bit lines (B2) or/and via conductive structures (L1, L2, L6) that are partially arranged at different height with respect to an axis perpendicular to the surface (O). Contacts (K5) contact a plurality of parts of the MOS transistors simultaneously.
    • SRAM单元布置包括每个存储单元的六个MOS晶体管,其被形成为垂直晶体管。 MOS晶体管布置在沟槽(G1,G2,G4)的侧壁处。 诸如例如形成隔离物的栅极(Ga2,Ga4)或导电结构(L3)的存储单元的部分通过布置在衬底的表面(O)上方的相邻的水平导电结构(H5)接触 S)。 存储器单元的部分之间的连接经由经由扩散区(D2)布置在凹陷和字线(W)的侧壁处的第三导电结构(L3),其经由衬底(S)内的凹陷的侧壁相邻的经由 通过相对于垂直于表面(O)的轴线以不同高度部分布置的第二位线(B2)或/和经由导电结构(L1,L2,L6)的第一位线。 触点(K5)同时接触MOS晶体管的多个部分。
    • 2. 发明授权
    • SRAM cell arrangement and method for manufacturing same
    • SRAM单元布置及其制造方法
    • US06222753B1
    • 2001-04-24
    • US09446419
    • 1999-12-20
    • Bernd GoebelEmmerich BertagnolliJosef WillerBarbara HaslerPaul-Werner von Basse
    • Bernd GoebelEmmerich BertagnolliJosef WillerBarbara HaslerPaul-Werner von Basse
    • G11C700
    • H01L27/11H01L27/1104
    • An SRAM cell arrangement which includes six MOS transistors per memory cell wherein each transistor is formed as a vertical transistors. The MOS transistors are arranged at sidewalls of trenches. Parts of the memory cell such as, for example, gate electrodes or conductive structures fashioned as spacers are contacted via adjacent, horizontal, conductive structures arranged above a surface of a substrate. Connections between parts of memory cells occur via third conductive structures arranged at the sidewalls of the depressions and word lines via diffusion regions that are adjacent to the sidewalls of the depressions within the substrate, via first bit lines, via second bit lines and/or via conductive structures that are partially arranged at different heights with respect to an axis perpendicular to the surface. Contacts contact a plurality of parts of the MOS transistors simultaneously.
    • 每个存储单元包括六个MOS晶体管的SRAM单元布置,其中每个晶体管形成为垂直晶体管。 MOS晶体管布置在沟槽的侧壁。 存储单元的部分,例如栅极电极或形成为间隔物的导电结构,经由布置在衬底表面上方的相邻的水平导电结构接触。 存储器单元的部分之间的连接通过布置在凹陷和字线的侧壁处的第三导电结构经由第一位线经由第二位线和/或通孔的扩散区域经由衬底内的凹陷的侧壁相邻布置 相对于垂直于表面的轴部分地布置在不同高度的导电结构。 触头同时接触MOS晶体管的多个部分。
    • 4. 发明授权
    • Circuit arrangement and method for operating a fingerprint sensor
    • 用于操作指纹传感器的电路布置和方法
    • US07239729B2
    • 2007-07-03
    • US10203220
    • 2001-02-07
    • Stephan MarksteinerPaul-Werner von Basse
    • Stephan MarksteinerPaul-Werner von Basse
    • G06K9/00
    • G06K9/0002
    • A circuit and method are provided for ensuring that a fingerprint sensor is started automatically when a finger is rested thereon such that a sufficiently contrasting image can be produced. A difference between a maximum and a minimum value of the sensor signals is generated wherein, if the difference is sufficiently large, indicating a sufficient contrast of an image to be produced, a normal scanning operation of the fingerprint sensor is initiated, thus ensuring that the complete fingerprint image is produced, a normal scanning operation of the fingerprint sensor is initiated, thus ensuring that the complete fingerprint images produced are of satisfactory quality.
    • 提供了一种电路和方法,用于确保当手指搁置在其上时自动启动指纹传感器,从而可以产生足够对比的图像。 产生传感器信号的最大值和最小值之间的差异,其中如果该差值足够大,则指示要产生的图像的足够的对比度,则开始指纹传感器的正常扫描操作,从而确保 产生完整的指纹图像,启动指纹传感器的正常扫描操作,从而确保生成的完整指纹图像质量令人满意。
    • 5. 发明授权
    • Semiconductor memory
    • 半导体存储器
    • US4126881A
    • 1978-11-21
    • US825225
    • 1977-08-17
    • Paul-Werner von BasseRudiger Hofmann
    • Paul-Werner von BasseRudiger Hofmann
    • G11C11/401G11C11/35G11C11/404H01L21/8242H01L27/07H01L27/10H01L27/108H01L29/78H01L29/06
    • G11C11/404G11C11/35H01L27/0733H01L27/10823H01L29/7827Y10S257/911
    • A semiconductor memory has storage cells composed of MOS selector transistors operated by a drive line and storage capacitors connected to selector transistors. The selector transistors are constructed in accordance with the V-MOS technique. A semiconductor substrate is highly doped with atoms of one conductivity type and carries a buried layer highly doped with atoms of the opposite conductivity type. An epitaxial layer, weakly doped with atoms of the one conductivity type is carried over the buried layer and the semiconductor substrate. A second layer, highly doped with atoms of the opposite conductivity type, is carried over the epitaxial layer above the buried layer. A V-shaped groove divides the second layer into two sub-portions in the region of the storage cells and extends into the buried layer and a conductor path is disposed in the groove.
    • 半导体存储器具有由驱动线操作的MOS选择晶体管和连接到选择晶体管的存储电容器组成的存储单元。 选择晶体管根据V-MOS技术构成。 半导体衬底被高度掺杂有一种导电类型的原子,并且具有高度掺杂有相反导电类型的原子的掩埋层。 在一个导电类型的原子上被弱掺杂的外延层承载在掩埋层和半导体衬底上。 高掺杂有相反导电类型的原子的第二层被承载在掩埋层上方的外延层上。 V形槽将第二层在存储单元的区域中分成两个子部分并延伸到掩埋层中,并且导体路径设置在沟槽中。