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    • 1. 发明授权
    • Method for erasing a flash memory cell or an array of such cells having improved erase coupling ratio
    • 擦除具有改善的擦除耦合比的这种单元的闪存单元或阵列的方法
    • US07974136B2
    • 2011-07-05
    • US12645337
    • 2009-12-22
    • Geeng-Chuan Michael ChernBen SheenJonathan PabustanDer-Tsyr FanYaw Wen HuPrateep Tuntasood
    • Geeng-Chuan Michael ChernBen SheenJonathan PabustanDer-Tsyr FanYaw Wen HuPrateep Tuntasood
    • G11C16/04
    • G11C16/16
    • A flash memory cell is of the type having a substrate of a first conductivity type having a first region of a second conductivity type at a first end, and a second region of the second conductivity type at a second end, spaced apart from the first end, with a channel region between the first end and the second end. The flash memory cell has a plurality of stacked pairs of floating gates and control gates with the floating gates positioned over portions of the channel region and are insulated therefrom, and each control gate over a floating gate and insulated therefrom. The flash memory cell further has a plurality of erase gates over the channel region which are insulated therefrom, with an erase gate between each pair of stacked pair of floating gate and control gate. In a method of erasing the flash memory cell, a pulse of a first positive voltage is applied to alternating erase gates (“first alternating gates”). In addition, a ground voltage is applied to erase gates other than the first alternating gates (“second alternating gates”). In a second method to erase the flash memory cell, a pulse of a first positive voltage is applied to the first alternating gates and a negative voltage is applied to the second alternating gates and to all control gates.
    • 闪存单元是具有第一导电类型的衬底的类型,在第一端具有第二导电类型的第一区域,在第二端处具有与第一端部间隔开的第二导电类型的第二区域 ,在第一端和第二端之间具有通道区域。 闪存单元具有多个堆叠的浮置栅极和控制栅极对,其中浮置栅极位于沟道区域的部分上方并与其绝缘,并且每个控制栅极在浮动栅极上并与其隔离。 闪速存储单元还在通道区域上具有与其绝缘的多个擦除栅极,在每对堆叠的一对浮置栅极和控制栅极之间具有擦除栅极。 在擦除闪存单元的方法中,将第一正电压的脉冲施加到交替擦除栅极(“第一交替栅极”)。 此外,施加接地电压以擦除除第一交流栅极(“第二交替栅极”)之外的栅极。 在擦除闪存单元的第二种方法中,将第一正电压的脉冲施加到第一交流栅极,并且向第二交替栅极和所有控制栅极施加负电压。
    • 2. 发明授权
    • Method of programming a non-volatile memory cell
    • 编程非易失性存储单元的方法
    • US07239550B2
    • 2007-07-03
    • US11255905
    • 2005-10-20
    • Jonathan G. PabustanBen Sheen
    • Jonathan G. PabustanBen Sheen
    • G11C11/34
    • G11C16/0483G11C16/12G11C16/3459
    • The present invention relates to a method of a programming a select non-volatile memory cell in a plurality of serially connected non-volatile memory cells with a serially connected select transistor. Each of the non-volatile memory cells has a control gate for receiving a programming voltage and the select transistor has a select gate for receiving a select voltage. The method comprises applying the programming voltage to the control gate of the select non-volatile memory cell in a program command sequence. The magnitude of the select voltage to the select gate of the select transistor within the program command sequence is then varied. The method can be applied to non-volatile cells in a NAND or NOR architecture.
    • 本发明涉及一种使用串行连接的选择晶体管对多个串行连接的非易失性存储单元中的选择非易失性存储单元进行编程的方法。 每个非易失性存储单元具有用于接收编程电压的控制栅极,并且选择晶体管具有用于接收选择电压的选择栅极。 该方法包括以编程命令序列将编程电压施加到选择非易失性存储单元的控制栅极。 然后,改变在程序命令序列内选择晶体管的选择栅极的选择电压的大小。 该方法可以应用于NAND或NOR架构中的非易失性单元。
    • 3. 发明申请
    • Method and apparatus for reducing operation disturbance
    • US20070047298A1
    • 2007-03-01
    • US11212206
    • 2005-08-25
    • Tseng-Yi LiuPrateep TuntasoodBen Sheen
    • Tseng-Yi LiuPrateep TuntasoodBen Sheen
    • G11C16/04
    • G11C16/3418
    • A memory array has a plurality of memory cells, arranged in a plurality of rows and columns. Each cell has at least four terminals. The array has a plurality of column lines with each column line connected to a first terminal of a different column of cells. The array also has a plurality of first row lines, with each first row line connected to a second terminal of a different row of cells. The array also has a plurality of second row lines, with each second row line connected to a third terminal of a different row of cells. Finally, the array has a plurality of third row lines with each third row line connected to a fourth terminal of a different row of cells. A column decoder is connected to the plurality of column lines. A first row decoder is connected to the plurality of first row lines. A second row decoder is connected to the plurality of second row lines. A third row decoder is connected to the plurality of third row lines. During an operation of a selected cell, the column decoder selects one of the plurality of column lines, with the one column line selected connected to the first terminal of the selected cell. The first row decoder selects one of the plurality of first row lines with the one first row line selected connected to the second terminal of the selected cell. The second row decoder selects a first plurality of second row lines, with one of the first plurality of second row lines connected to the third terminal of the selected cell. The third row decoder selects a second plurality of third row lines, with one of the second plurality of third row lines connected to the fourth terminal of the selected cell. Finally, the first plurality of second row lines, other than the one second row line, are connected to cells arranged in rows other than rows of cells to which the second plurality of third row lines are connected. The interconnection minimizes programming disturbance.
    • 4. 发明申请
    • Method For Erasing A Flash Memory Cell Or An Array Of Such Cells Having Improved Erase Coupling Ratio
    • 用于擦除闪存单元的方法或者具有改善的擦除耦合比的这样的单元阵列
    • US20090201744A1
    • 2009-08-13
    • US12027654
    • 2008-02-07
    • Geeng-Chuan Michael ChernBen SheenJonathan PabustanPrateep TuntasoodDer-Tsyr FanYaw Wen Hu
    • Geeng-Chuan Michael ChernBen SheenJonathan PabustanPrateep TuntasoodDer-Tsyr FanYaw Wen Hu
    • G11C16/16
    • G11C16/16
    • A flash memory cell is of the type having a substrate of a first conductivity type having a first region of a second conductivity type at a first end, and a second region of the second conductivity type at a second end, spaced apart from the first end, with a channel region between the first end and the second end. The flash memory cell has a plurality of stacked pairs of floating gates and control gates with the floating gates positioned over portions of the channel region and are insulated therefrom, and each control gate over a floating gate and insulated therefrom. The flash memory cell further has a plurality of erase gates over the channel region which are insulated therefrom, with an erase gate between each pair of stacked pair of floating gate and control gate. In a method of erasing the flash memory cell, a pulse of a first positive voltage is applied to alternating erase gates (“first alternating gates”). In addition, a ground voltage is applied to erase gates other than the first alternating gates (“second alternating gates”). In a second method to erase the flash memory cell, a pulse of a first positive voltage is applied to the first alternating gates and a negative voltage is applied to the second alternating gates and to all control gates.
    • 闪存单元是具有第一导电类型的衬底的类型,在第一端具有第二导电类型的第一区域,在第二端处具有与第一端部间隔开的第二导电类型的第二区域 ,在第一端和第二端之间具有通道区域。 闪存单元具有多个堆叠的浮置栅极和控制栅极对,其中浮置栅极位于沟道区域的部分上方并与其绝缘,并且每个控制栅极在浮动栅极上并与其隔离。 闪速存储单元还在通道区域上具有与其绝缘的多个擦除栅极,在每对堆叠的一对浮置栅极和控制栅极之间具有擦除栅极。 在擦除闪存单元的方法中,将第一正电压的脉冲施加到交替擦除栅极(“第一交替栅极”)。 此外,施加接地电压以擦除除第一交流栅极(“第二交替栅极”)之外的栅极。 在擦除闪存单元的第二种方法中,将第一正电压的脉冲施加到第一交流栅极,并且向第二交替栅极和所有控制栅极施加负电压。
    • 5. 发明申请
    • Method of programming a non-volatile memory cell
    • 编程非易失性存储单元的方法
    • US20070091688A1
    • 2007-04-26
    • US11255905
    • 2005-10-20
    • Jonathan PabustanBen Sheen
    • Jonathan PabustanBen Sheen
    • G11C7/10
    • G11C16/0483G11C16/12G11C16/3459
    • The present invention relates to a method of programming a select non-volatile memory cell in a plurality of serially connected non-volatile memory cells with a serially connected select transistor. Each of the non-volatile memory cells has a control gate for receiving a programming voltage and the select transistor has a select gate for receiving a select voltage. The method comprises applying the programming voltage to the control gate of the select non-volatile memory cell in a program command sequence. The magnitude of the select voltage to the select gate of the select transistor within the program command sequence is then varied. The method can be applied to non-volatile cells in a NAND or NOR architecture.
    • 本发明涉及一种使用串行连接的选择晶体管对多个串行连接的非易失性存储单元中的选择非易失性存储单元进行编程的方法。 每个非易失性存储单元具有用于接收编程电压的控制栅极,并且选择晶体管具有用于接收选择电压的选择栅极。 该方法包括以编程命令序列将编程电压施加到选择非易失性存储单元的控制栅极。 然后,改变在程序命令序列内选择晶体管的选择栅极的选择电压的大小。 该方法可以应用于NAND或NOR架构中的非易失性单元。
    • 6. 发明授权
    • Method for erasing a flash memory cell or an array of such cells having improved erase coupling ratio
    • 擦除具有改善的擦除耦合比的这种单元的闪存单元或阵列的方法
    • US07668013B2
    • 2010-02-23
    • US12027654
    • 2008-02-07
    • Geeng-Chuan Michael ChernBen SheenJonathan PabustanPrateep TuntasoodDer-Tsyr FanYaw Wen Hu
    • Geeng-Chuan Michael ChernBen SheenJonathan PabustanPrateep TuntasoodDer-Tsyr FanYaw Wen Hu
    • G11C16/04
    • G11C16/16
    • A flash memory cell is of the type having a substrate of a first conductivity type having a first region of a second conductivity type at a first end, and a second region of the second conductivity type at a second end, spaced apart from the first end, with a channel region between the first end and the second end. The flash memory cell has a plurality of stacked pairs of floating gates and control gates with the floating gates positioned over portions of the channel region and are insulated therefrom, and each control gate over a floating gate and insulated therefrom. The flash memory cell further has a plurality of erase gates over the channel region which are insulated therefrom, with an erase gate between each pair of stacked pair of floating gate and control gate. In a method of erasing the flash memory cell, a pulse of a first positive voltage is applied to alternating erase gates (“first alternating gates”). In addition, a ground voltage is applied to erase gates other than the first alternating gates (“second alternating gates”). In a second method to erase the flash memory cell, a pulse of a first positive voltage is applied to the first alternating gates and a negative voltage is applied to the second alternating gates and to all control gates.
    • 闪存单元是具有第一导电类型的衬底的类型,在第一端具有第二导电类型的第一区域,在第二端处具有与第一端部间隔开的第二导电类型的第二区域 ,在第一端和第二端之间具有通道区域。 闪存单元具有多个堆叠的浮置栅极和控制栅极对,其中浮置栅极位于沟道区域的部分上方并与其绝缘,并且每个控制栅极在浮动栅极上并与其隔离。 闪速存储单元还在通道区域上具有与其绝缘的多个擦除栅极,在每对堆叠的一对浮置栅极和控制栅极之间具有擦除栅极。 在擦除闪存单元的方法中,将第一正电压的脉冲施加到交替擦除栅极(“第一交替栅极”)。 此外,施加接地电压以擦除除第一交流栅极(“第二交替栅极”)之外的栅极。 在擦除闪存单元的第二种方法中,将第一正电压的脉冲施加到第一交流栅极,并且向第二交替栅极和所有控制栅极施加负电压。