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    • 1. 发明申请
    • Method For Erasing A Flash Memory Cell Or An Array Of Such Cells Having Improved Erase Coupling Ratio
    • 用于擦除闪存单元的方法或者具有改善的擦除耦合比的这样的单元阵列
    • US20090201744A1
    • 2009-08-13
    • US12027654
    • 2008-02-07
    • Geeng-Chuan Michael ChernBen SheenJonathan PabustanPrateep TuntasoodDer-Tsyr FanYaw Wen Hu
    • Geeng-Chuan Michael ChernBen SheenJonathan PabustanPrateep TuntasoodDer-Tsyr FanYaw Wen Hu
    • G11C16/16
    • G11C16/16
    • A flash memory cell is of the type having a substrate of a first conductivity type having a first region of a second conductivity type at a first end, and a second region of the second conductivity type at a second end, spaced apart from the first end, with a channel region between the first end and the second end. The flash memory cell has a plurality of stacked pairs of floating gates and control gates with the floating gates positioned over portions of the channel region and are insulated therefrom, and each control gate over a floating gate and insulated therefrom. The flash memory cell further has a plurality of erase gates over the channel region which are insulated therefrom, with an erase gate between each pair of stacked pair of floating gate and control gate. In a method of erasing the flash memory cell, a pulse of a first positive voltage is applied to alternating erase gates (“first alternating gates”). In addition, a ground voltage is applied to erase gates other than the first alternating gates (“second alternating gates”). In a second method to erase the flash memory cell, a pulse of a first positive voltage is applied to the first alternating gates and a negative voltage is applied to the second alternating gates and to all control gates.
    • 闪存单元是具有第一导电类型的衬底的类型,在第一端具有第二导电类型的第一区域,在第二端处具有与第一端部间隔开的第二导电类型的第二区域 ,在第一端和第二端之间具有通道区域。 闪存单元具有多个堆叠的浮置栅极和控制栅极对,其中浮置栅极位于沟道区域的部分上方并与其绝缘,并且每个控制栅极在浮动栅极上并与其隔离。 闪速存储单元还在通道区域上具有与其绝缘的多个擦除栅极,在每对堆叠的一对浮置栅极和控制栅极之间具有擦除栅极。 在擦除闪存单元的方法中,将第一正电压的脉冲施加到交替擦除栅极(“第一交替栅极”)。 此外,施加接地电压以擦除除第一交流栅极(“第二交替栅极”)之外的栅极。 在擦除闪存单元的第二种方法中,将第一正电压的脉冲施加到第一交流栅极,并且向第二交替栅极和所有控制栅极施加负电压。
    • 2. 发明申请
    • Method of programming a non-volatile memory cell
    • 编程非易失性存储单元的方法
    • US20070091688A1
    • 2007-04-26
    • US11255905
    • 2005-10-20
    • Jonathan PabustanBen Sheen
    • Jonathan PabustanBen Sheen
    • G11C7/10
    • G11C16/0483G11C16/12G11C16/3459
    • The present invention relates to a method of programming a select non-volatile memory cell in a plurality of serially connected non-volatile memory cells with a serially connected select transistor. Each of the non-volatile memory cells has a control gate for receiving a programming voltage and the select transistor has a select gate for receiving a select voltage. The method comprises applying the programming voltage to the control gate of the select non-volatile memory cell in a program command sequence. The magnitude of the select voltage to the select gate of the select transistor within the program command sequence is then varied. The method can be applied to non-volatile cells in a NAND or NOR architecture.
    • 本发明涉及一种使用串行连接的选择晶体管对多个串行连接的非易失性存储单元中的选择非易失性存储单元进行编程的方法。 每个非易失性存储单元具有用于接收编程电压的控制栅极,并且选择晶体管具有用于接收选择电压的选择栅极。 该方法包括以编程命令序列将编程电压施加到选择非易失性存储单元的控制栅极。 然后,改变在程序命令序列内选择晶体管的选择栅极的选择电压的大小。 该方法可以应用于NAND或NOR架构中的非易失性单元。
    • 3. 发明授权
    • Method for erasing a flash memory cell or an array of such cells having improved erase coupling ratio
    • 擦除具有改善的擦除耦合比的这种单元的闪存单元或阵列的方法
    • US07974136B2
    • 2011-07-05
    • US12645337
    • 2009-12-22
    • Geeng-Chuan Michael ChernBen SheenJonathan PabustanDer-Tsyr FanYaw Wen HuPrateep Tuntasood
    • Geeng-Chuan Michael ChernBen SheenJonathan PabustanDer-Tsyr FanYaw Wen HuPrateep Tuntasood
    • G11C16/04
    • G11C16/16
    • A flash memory cell is of the type having a substrate of a first conductivity type having a first region of a second conductivity type at a first end, and a second region of the second conductivity type at a second end, spaced apart from the first end, with a channel region between the first end and the second end. The flash memory cell has a plurality of stacked pairs of floating gates and control gates with the floating gates positioned over portions of the channel region and are insulated therefrom, and each control gate over a floating gate and insulated therefrom. The flash memory cell further has a plurality of erase gates over the channel region which are insulated therefrom, with an erase gate between each pair of stacked pair of floating gate and control gate. In a method of erasing the flash memory cell, a pulse of a first positive voltage is applied to alternating erase gates (“first alternating gates”). In addition, a ground voltage is applied to erase gates other than the first alternating gates (“second alternating gates”). In a second method to erase the flash memory cell, a pulse of a first positive voltage is applied to the first alternating gates and a negative voltage is applied to the second alternating gates and to all control gates.
    • 闪存单元是具有第一导电类型的衬底的类型,在第一端具有第二导电类型的第一区域,在第二端处具有与第一端部间隔开的第二导电类型的第二区域 ,在第一端和第二端之间具有通道区域。 闪存单元具有多个堆叠的浮置栅极和控制栅极对,其中浮置栅极位于沟道区域的部分上方并与其绝缘,并且每个控制栅极在浮动栅极上并与其隔离。 闪速存储单元还在通道区域上具有与其绝缘的多个擦除栅极,在每对堆叠的一对浮置栅极和控制栅极之间具有擦除栅极。 在擦除闪存单元的方法中,将第一正电压的脉冲施加到交替擦除栅极(“第一交替栅极”)。 此外,施加接地电压以擦除除第一交流栅极(“第二交替栅极”)之外的栅极。 在擦除闪存单元的第二种方法中,将第一正电压的脉冲施加到第一交流栅极,并且向第二交替栅极和所有控制栅极施加负电压。
    • 4. 发明授权
    • Method for erasing a flash memory cell or an array of such cells having improved erase coupling ratio
    • 擦除具有改善的擦除耦合比的这种单元的闪存单元或阵列的方法
    • US07668013B2
    • 2010-02-23
    • US12027654
    • 2008-02-07
    • Geeng-Chuan Michael ChernBen SheenJonathan PabustanPrateep TuntasoodDer-Tsyr FanYaw Wen Hu
    • Geeng-Chuan Michael ChernBen SheenJonathan PabustanPrateep TuntasoodDer-Tsyr FanYaw Wen Hu
    • G11C16/04
    • G11C16/16
    • A flash memory cell is of the type having a substrate of a first conductivity type having a first region of a second conductivity type at a first end, and a second region of the second conductivity type at a second end, spaced apart from the first end, with a channel region between the first end and the second end. The flash memory cell has a plurality of stacked pairs of floating gates and control gates with the floating gates positioned over portions of the channel region and are insulated therefrom, and each control gate over a floating gate and insulated therefrom. The flash memory cell further has a plurality of erase gates over the channel region which are insulated therefrom, with an erase gate between each pair of stacked pair of floating gate and control gate. In a method of erasing the flash memory cell, a pulse of a first positive voltage is applied to alternating erase gates (“first alternating gates”). In addition, a ground voltage is applied to erase gates other than the first alternating gates (“second alternating gates”). In a second method to erase the flash memory cell, a pulse of a first positive voltage is applied to the first alternating gates and a negative voltage is applied to the second alternating gates and to all control gates.
    • 闪存单元是具有第一导电类型的衬底的类型,在第一端具有第二导电类型的第一区域,在第二端处具有与第一端部间隔开的第二导电类型的第二区域 ,在第一端和第二端之间具有通道区域。 闪存单元具有多个堆叠的浮置栅极和控制栅极对,其中浮置栅极位于沟道区域的部分上方并与其绝缘,并且每个控制栅极在浮动栅极上并与其隔离。 闪速存储单元还在通道区域上具有与其绝缘的多个擦除栅极,在每对堆叠的一对浮置栅极和控制栅极之间具有擦除栅极。 在擦除闪存单元的方法中,将第一正电压的脉冲施加到交替擦除栅极(“第一交替栅极”)。 此外,施加接地电压以擦除除第一交流栅极(“第二交替栅极”)之外的栅极。 在擦除闪存单元的第二种方法中,将第一正电压的脉冲施加到第一交流栅极,并且向第二交替栅极和所有控制栅极施加负电压。
    • 6. 发明申请
    • Method for Erasing a Flash Memory Cell or an Array of Such Cells Having Improved Erase Coupling Ratio
    • 擦除闪存单元或具有改善的擦除耦合比的这种单元阵列的方法
    • US20100157687A1
    • 2010-06-24
    • US12645337
    • 2009-12-22
    • Geeng-Chuan Michael ChernBen SheenJonathan PabustanPrateep TuntasoodDer-Tsyr FanYaw Wen Hu
    • Geeng-Chuan Michael ChernBen SheenJonathan PabustanPrateep TuntasoodDer-Tsyr FanYaw Wen Hu
    • G11C16/06G11C16/16
    • G11C16/16
    • A flash memory cell is of the type having a substrate of a first conductivity type having a first region of a second conductivity type at a first end, and a second region of the second conductivity type at a second end, spaced apart from the first end, with a channel region between the first end and the second end. The flash memory cell has a plurality of stacked pairs of floating gates and control gates with the floating gates positioned over portions of the channel region and are insulated therefrom, and each control gate over a floating gate and insulated therefrom. The flash memory cell further has a plurality of erase gates over the channel region which are insulated therefrom, with an erase gate between each pair of stacked pair of floating gate and control gate. In a method of erasing the flash memory cell, a pulse of a first positive voltage is applied to alternating erase gates (“first alternating gates”). In addition, a ground voltage is applied to erase gates other than the first alternating gates (“second alternating gates”). In a second method to erase the flash memory cell, a pulse of a first positive voltage is applied to the first alternating gates and a negative voltage is applied to the second alternating gates and to all control gates.
    • 闪存单元是具有第一导电类型的衬底的类型,在第一端具有第二导电类型的第一区域,在第二端处具有与第一端部间隔开的第二导电类型的第二区域 ,在第一端和第二端之间具有通道区域。 闪存单元具有多个堆叠的浮置栅极和控制栅极对,其中浮置栅极位于沟道区域的部分上方并与其绝缘,并且每个控制栅极在浮动栅极上并与之绝缘。 闪速存储单元还在通道区域上具有与其绝缘的多个擦除栅极,在每对堆叠的一对浮置栅极和控制栅极之间具有擦除栅极。 在擦除闪存单元的方法中,将第一正电压的脉冲施加到交替擦除栅极(“第一交替栅极”)。 此外,施加接地电压以擦除除第一交流栅极(“第二交替栅极”)之外的栅极。 在擦除闪存单元的第二种方法中,将第一正电压的脉冲施加到第一交流栅极,并且向第二交替栅极和所有控制栅极施加负电压。
    • 9. 发明授权
    • Program window adjust for memory cell signal line delay
    • 程序窗口调整存储单元信号线延迟
    • US08023334B2
    • 2011-09-20
    • US12262405
    • 2008-10-31
    • Jung-Sheng HoeiJonathan PabustanVishal SarinWilliam H. RadkeFrankie F. Roohparvar
    • Jung-Sheng HoeiJonathan PabustanVishal SarinWilliam H. RadkeFrankie F. Roohparvar
    • G11C16/04
    • G11C16/26G11C5/063G11C11/5628G11C11/5642G11C16/10
    • A memory device and programming and/or reading process is described that compensates for memory cell signal line propagation delays, such as to increase the overall threshold voltage range and non-volatile memory cell states available. Memory cell signal line propagation delay compensation can be accomplished by characterizing the memory cell signal line propagation delay, such as determining an amount of error due to the delay, and pre-compensating the programmed threshold voltage of the memory cells based on the amount of error induced by the memory cell signal line propagation delay and cell location on the selected memory cell signal line. Alternatively, memory cell signal line propagation delay can be post-compensated for, or the pre-compensation fine tuned, after sensing the threshold voltages of the selected memory cells based on the amount of error induced by the memory cell signal line propagation delay and cell location on the selected memory cell signal line. Other methods, devices, etc., are also disclosed.
    • 描述了补偿存储器单元信号线传播延迟的存储器件和编程和/或读取过程,例如增加总体阈值电压范围和可用的非易失性存储器单元状态。 可以通过表征存储单元信号线传播延迟来实现存储单元信号线传播延迟补偿,例如确定由于延迟引起的误差量,并且基于误差量预先补偿存储器单元的编程阈值电压 由所选存储单元信号线上的存储单元信号线传播延迟和单元位置引起。 或者,可以基于由存储器单元信号线传播延迟和单元引起的误差量感测所选择的存储器单元的阈值电压之后,对存储单元信号线传播延迟进行后补偿或预补偿微调 所选存储单元信号线上的位置。 还公开了其他方法,装置等。
    • 10. 发明申请
    • PROGRAM WINDOW ADJUST FOR MEMORY CELL SIGNAL LINE DELAY
    • 程序窗口调整记忆体信号线延迟
    • US20100110798A1
    • 2010-05-06
    • US12262405
    • 2008-10-31
    • Jung-Sheng HoeiJonathan PabustanVishal SarinWilliam H. RadkeFrankie F. Roohparvar
    • Jung-Sheng HoeiJonathan PabustanVishal SarinWilliam H. RadkeFrankie F. Roohparvar
    • G11C16/10
    • G11C16/26G11C5/063G11C11/5628G11C11/5642G11C16/10
    • A memory device and programming and/or reading process is described that compensates for memory cell signal line propagation delays, such as to increase the overall threshold voltage range and non-volatile memory cell states available. Memory cell signal line propagation delay compensation can be accomplished by characterizing the memory cell signal line propagation delay, such as determining an amount of error due to the delay, and pre-compensating the programmed threshold voltage of the memory cells based on the amount of error induced by the memory cell signal line propagation delay and cell location on the selected memory cell signal line. Alternatively, memory cell signal line propagation delay can be post-compensated for, or the pre-compensation fine tuned, after sensing the threshold voltages of the selected memory cells based on the amount of error induced by the memory cell signal line propagation delay and cell location on the selected memory cell signal line. Other methods, devices, etc., are also disclosed.
    • 描述了补偿存储器单元信号线传播延迟的存储器件和编程和/或读取过程,例如增加总体阈值电压范围和可用的非易失性存储器单元状态。 可以通过表征存储单元信号线传播延迟来实现存储单元信号线传播延迟补偿,例如确定由于延迟引起的误差量,并且基于误差量预先补偿存储器单元的编程阈值电压 由所选存储单元信号线上的存储单元信号线传播延迟和单元位置引起。 或者,可以基于由存储器单元信号线传播延迟和单元引起的误差量感测所选择的存储器单元的阈值电压之后,对存储单元信号线传播延迟进行后补偿或预补偿微调 所选存储单元信号线上的位置。 还公开了其他方法,装置等。