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    • 2. 发明授权
    • Spin-rinse-dryer
    • 旋转干燥机
    • US07226514B2
    • 2007-06-05
    • US10309832
    • 2002-12-04
    • Anwar HusainBrian J. BrownDavid G. AndeenSvetlana ShermanJohn M. WhiteMichael SugarmanMakoto InagawaManoocher Birang
    • Anwar HusainBrian J. BrownDavid G. AndeenSvetlana ShermanJohn M. WhiteMichael SugarmanMakoto InagawaManoocher Birang
    • B08B3/02
    • H01L21/67028Y10S134/902
    • An inventive vertical spin-dryer is provided. The inventive spin-dryer may have a shield system positioned to receive fluid displaced from a substrate vertically positioned within the spin-dryer. The shield system may have one or more shields positioned to at least partially reflect fluid therefrom as the fluid impacts the shield. The one or more shields are angled to encourage the flow of fluid therealong, and are preferably hydrophilic to prevent droplets from forming. Preferably the shield system has three shields positioned in a horizontally and vertically staggered manner so that fluid is transferred from a substrate facing surface of a first shield to the top or non-substrate-facing surface of an adjacent shield, etc. A pressure gradient may be applied across the interior of the spin-dryer to create an air flow which encourages fluid to travel along the shield system in a desired direction. A sensor adapted to facilitate desired flywheel position, an openable gripper having a remote actuator, a radiused gripper and a source of inert drying gas are also provided in individual embodiments.
    • 提供了一种创造性的垂直旋转干燥器。 本发明的旋转干燥器可以具有屏蔽系统,其被定位成接收从垂直定位在旋转干燥器内的衬底移位的流体。 屏蔽系统可以具有一个或多个屏蔽件,其定位成当流体冲击屏蔽时至少部分地反射流体。 一个或多个屏蔽件成角度以促使其流体流动,并且优选是亲水的以防止液滴形成。 优选地,屏蔽系统具有以水平和垂直交错方式定位的三个屏蔽件,使得流体从第一屏蔽件的面向基板的表面转移到相邻屏蔽件的顶部或非基板面向表面等。压力梯度可以 施加在旋转干燥器的内部以产生鼓风流体沿着屏蔽系统沿所需方向行进的空气流。 在各个实施例中还提供了适于促进期望的飞轮位置的传感器,具有远程致动器的可打开夹具,圆角夹持器和惰性干燥气体源。
    • 3. 发明授权
    • Gripper for supporting substrate in a vertical orientation
    • 夹持器用于垂直方向支撑基板
    • US06474712B1
    • 2002-11-05
    • US09559889
    • 2000-04-26
    • Boris I. GovzmanManoocher BirangMichael SugarmanAnwar Husain
    • Boris I. GovzmanManoocher BirangMichael SugarmanAnwar Husain
    • B66C100
    • H01L21/68707Y10S414/141
    • A gripper assembly is provided which supports a substrate in a vertical orientation. The gripper assembly's end effectors contact only the edge of the substrate. In a first aspect the end effectors each comprise a first pair of opposed surfaces and an second pair of opposed surfaces, all of which simultaneously contact the substrate, holding the substrate in a clamp-type manner. In a second aspect the end effectors each comprise a lower pair of opposed surfaces which simultaneously contact the substrate, and an upper pair of opposed surfaces, larger than the thickness of the substrate, which limit the substrate from horizontal tilting. In the second aspect the end effectors can close at a first elevation where they do not contact the substrate, and can then elevate to gently contact and support the substrate in a pocket-like manner. In a third aspect one of the end effectors has two pairs of opposed surfaces which simultaneously contact the substrate, and the other end effector has two pairs of opposed surfaces which limit the substrate from horizontal tilting. In any aspect no moving parts are required to limit the substrate's vertical and horizontal movement. In a further aspect, fingers to which the end effectors are coupled, are bent so that the gripper is not positioned above the substrate.
    • 提供了一种夹持器组件,其以垂直取向支撑衬底。 夹持器组件的端部执行器仅接触基板的边缘。 在第一方面,端部执行器各自包括第一对相对表面和第二对相对表面,所述第二对相对表面同时接触基板,以夹紧方式保持基板。 在第二方面,端部执行器各自包括同时接触基板的下一对相对表面,以及大于基板厚度的上对对相对表面,其将基板限制为水平倾斜。 在第二方面,末端效应器可以在它们不接触衬底的第一高度处关闭,然后可以以袋状方式轻轻地接触和支撑衬底。 在第三方面中,一个端部执行器具有两对同时接触基板的相对表面,而另一端部执行器具有两对相对的表面,这些对面限制了基板的水平倾斜。 在任何方面,无需移动部件来限制基板的垂直和水平运动。 在另一方面,端部执行器耦合到的手指被弯曲,使得夹持器不位于衬底上方。
    • 7. 发明授权
    • Wafer edge cleaning method and apparatus
    • 晶圆边缘清洗方法及装置
    • US06797074B2
    • 2004-09-28
    • US10278115
    • 2002-10-22
    • Fred C. RedekerBrian J. BrownMichael Sugarman
    • Fred C. RedekerBrian J. BrownMichael Sugarman
    • B08B704
    • H01L21/02052B08B3/02B08B3/12H01L21/67051H01L21/67086Y10S134/902
    • A method and apparatus is provided for removing material from the edge of a disk. In one embodiment, the edge of the disk is contacted with etchant via an etchant containing swab or trough (which may contain one or more transducers) and is rotated such that successive portions of the disk edge are scanned through the trough or past the swab. To prevent etchant from contacting the major surface of the substrate, and/or to prevent excessive etching, the edge of the disk is contacted with a rinsing fluid (e.g., a rinsing fluid nozzle or a trough filled with rinsing fluid). In a further embodiment material such as residue or particles may be removed via a trough containing sonically energized rinsing fluid.
    • 提供了一种从盘的边缘去除材料的方法和装置。 在一个实施例中,盘的边缘通过含有拭子或槽(其可以包含一个或多个换能器)的蚀刻剂与蚀刻剂接触,并且被旋转使得盘边缘的连续部分通过槽扫过或通过拭子。 为了防止蚀刻剂接触基板的主表面和/或防止过度蚀刻,盘的边缘与冲洗流体(例如,冲洗流体喷嘴或填充有冲洗流体的槽)接触。 在另一个实施方案中,可以通过含有声波激发的冲洗流体的槽来去除诸如残余物或颗粒的材料。