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1. 发明授权

US08254663B2 Ultrafine lithography pattern inspection using multi-stage TDI image sensors with false image removability 有权
标题翻译：使用具有假图像去除性的多级TDI图像传感器进行超细光刻图案检查
公开(公告)号：US08254663B2
公开(公告)日：2012-08-28
申请号：US12395840
申请日：2009-03-02
申请人： Akira Kataoka , Ikunao Isomura , Ryoichi Hirano , Nobutaka Kikuiri , Susumu Iida
发明人： Akira Kataoka , Ikunao Isomura , Ryoichi Hirano , Nobutaka Kikuiri , Susumu Iida
IPC分类号： G06K9/00
CPC分类号： G06K9/209 , G03F1/84 , G06T7/0004 , G06T2207/30121 , G06T2207/30148
摘要： A workpiece inspection apparatus includes a measured image generator unit configured to measure a pattern of a workpiece and generate a measured image; and a comparator unit configured to compare the measured image to a fiducial image, wherein said measured image generator unit includes a light-receiving device having an interconnection of two or more time delay integration (TDI) sensors each being arranged by two or more line sensors each being arranged by two or more pixels, for generating as the measured image an average value of pixel values excluding an abnormal pixel value from pixels of each TDI sensor with respect to a position of the pattern of the workpiece.
摘要翻译：工件检查装置包括测量图像发生器单元，被配置为测量工件的图案并产生测量图像; 以及比较器单元，被配置为将所测量的图像与基准图像进行比较，其中所述测量的图像生成器单元包括具有两个或更多个时间延迟积分（TDI）传感器的互连的光接收装置，每个传感器由两个或更多个线传感器每个由两个或更多个像素排列，用于相对于工件的图案的位置产生除了每个TDI传感器的像素之外的异常像素值的像素值的平均值作为测量图像。

2. 发明申请

US20090238446A1 ULTRAFINE LITHOGRAPHY PATTERN INSPECTION USING MULTI-STAGE TDI IMAGE SENSORS WITH FALSE IMAGE REMOVABILITY 有权
标题翻译：使用多级TDI图像传感器进行超声图像扫描模式检测，具有不正确的图像去除能力
公开(公告)号：US20090238446A1
公开(公告)日：2009-09-24
申请号：US12395840
申请日：2009-03-02
申请人： Akira Kataoka , Ikunao Isomura , Ryoichi Hirano , Nobutaka Kikuiri , Susumu Iida
发明人： Akira Kataoka , Ikunao Isomura , Ryoichi Hirano , Nobutaka Kikuiri , Susumu Iida
IPC分类号： G06K9/62
CPC分类号： G06K9/209 , G03F1/84 , G06T7/0004 , G06T2207/30121 , G06T2207/30148
摘要： A workpiece inspection apparatus includes a measured image generator unit configured to measure a pattern of a workpiece and generate a measured image; and a comparator unit configured to compare the measured image to a fiducial image, wherein said measured image generator unit includes a light-receiving device having an interconnection of two or more time delay integration (TDI) sensors each being arranged by two or more line sensors each being arranged by two or more pixels, for generating as the measured image an average value of pixel values excluding an abnormal pixel value from pixels of each TDI sensor with respect to a position of the pattern of the workpiece.
摘要翻译：工件检查装置包括测量图像发生器单元，被配置为测量工件的图案并产生测量图像; 以及比较器单元，被配置为将所测量的图像与基准图像进行比较，其中所述测量的图像生成器单元包括具有两个或更多个时间延迟积分（TDI）传感器的互连的光接收装置，每个传感器由两个或更多个线传感器每个由两个或更多个像素排列，用于相对于工件的图案的位置产生除了每个TDI传感器的像素之外的异常像素值的像素值的平均值作为测量图像。

3. 发明授权

US08442320B2 Pattern inspection apparatus and pattern inspection method 有权
标题翻译：图案检验装置和图案检验方法
公开(公告)号：US08442320B2
公开(公告)日：2013-05-14
申请号：US12815731
申请日：2010-06-15
申请人： Ikunao Isomura , Ryoichi Hirano , Nobutaka Kikuiri
发明人： Ikunao Isomura , Ryoichi Hirano , Nobutaka Kikuiri
IPC分类号： G06K9/00
CPC分类号： G03F1/84 , G01N21/95607
摘要： A pattern inspection apparatus includes: an optical image acquiring unit configured to acquire optical image data of a target object on which each of a plurality of identical patterns is respectively formed at a respective corresponding position of a plurality of forming positions with distortion; a cut-out unit configured to cut out a plurality of partial optical image data from the optical image data; a correction unit configured to correct positions of the plurality of partial optical image data by using distortion information from which each amount of distortion of the plurality of identical patterns respectively formed at the respective corresponding position of the plurality of forming positions on the target object can be acquired; and a comparison unit configured to compare a plurality of corrected partial optical image data against each other on a pixel to pixel basis.
摘要翻译：图案检查装置包括：光学图像获取单元，其被配置为获取其中分别在多个具有失真的多个成形位置的相应对应位置处形成有多个相同图案中的每一个的目标对象的光学图像数据; 切出单元，被配置为从所述光学图像数据切出多个部分光学图像数据; 校正单元，被配置为通过使用失真信息来校正多个部分光学图像数据的位置，所述失真信息分别形成在目标对象上的多个成形位置的各个对应位置处的多个相同图案的每个失真量可以是获得以及比较单元，被配置为在像素的基础上比较多个经校正的部分光学图像数据彼此。

4. 发明申请

US20110229009A1 PATTERN INSPECTION APPARATUS AND PATTERN INSPECTION METHOD 有权
标题翻译：图案检查装置和图案检查方法
公开(公告)号：US20110229009A1
公开(公告)日：2011-09-22
申请号：US12815731
申请日：2010-06-15
申请人： Ikunao ISOMURA , Ryoichi Hirano , Nobutaka Kikuiri
发明人： Ikunao ISOMURA , Ryoichi Hirano , Nobutaka Kikuiri
IPC分类号： G06T7/00
CPC分类号： G03F1/84 , G01N21/95607
摘要： A pattern inspection apparatus includes: an optical image acquiring unit configured to acquire optical image data of a target object on which each of a plurality of identical patterns is respectively formed at a respective corresponding position of a plurality of forming positions with distortion; a cut-out unit configured to cut out a plurality of partial optical image data from the optical image data; a correction unit configured to correct positions of the plurality of partial optical image data by using distortion information from which each amount of distortion of the plurality of identical patterns respectively formed at the respective corresponding position of the plurality of forming positions on the target object can be acquired; and a comparison unit configured to compare a plurality of corrected partial optical image data against each other on a pixel to pixel basis.
摘要翻译：图案检查装置包括：光学图像获取单元，其被配置为获取其中分别在多个具有失真的多个成形位置的相应对应位置处形成有多个相同图案中的每一个的目标对象的光学图像数据; 切出单元，被配置为从所述光学图像数据切出多个部分光学图像数据; 校正单元，被配置为通过使用失真信息来校正多个部分光学图像数据的位置，所述失真信息分别形成在目标对象上的多个成形位置的各个对应位置处的多个相同图案的每个失真量可以是获得以及比较单元，被配置为在像素的基础上比较多个经校正的部分光学图像数据彼此。

5. 发明申请

US20120081538A1 PATTERN INSPECTION APPARATUS 审中-公开
标题翻译：图案检查装置
公开(公告)号：US20120081538A1
公开(公告)日：2012-04-05
申请号：US13242655
申请日：2011-09-23
申请人： Riki Ogawa , Masatoshi Hirono , Takeshi Nishizaka , Ryoichi Hirano , Ikunao Isomura , Kazuto Matsuki , Fumio Ozaki
发明人： Riki Ogawa , Masatoshi Hirono , Takeshi Nishizaka , Ryoichi Hirano , Ikunao Isomura , Kazuto Matsuki , Fumio Ozaki
IPC分类号： H04N7/18
CPC分类号： G01N21/956
摘要： This pattern inspection apparatus includes an inspection region information storage unit that stores an inspection region specified in a pattern region, a pattern surface height detection unit that detects a pattern surface height signal corresponding to a pattern surface height measurement position on the inspection sample, an autofocus mechanism that focuses on the inspection sample using the pattern surface height signal detected by the pattern surface height detection unit, a determination unit, and an autofocus mechanism control unit. When the determination unit determines that the pattern surface height measurement position is located within the inspection region, the autofocus mechanism control unit drives the autofocus mechanism, and the determination unit determines that the pattern surface height measurement position is not located within the inspection region, the autofocus mechanism control unit stops the autofocus mechanism.
摘要翻译：该图案检查装置包括：检查区域信息存储单元，其存储在图案区域中指定的检查区域;图案表面高度检测单元，其检测与检查样品上的图案表面高度测量位置对应的图案表面高度信号;自动对焦使用由图案表面高度检测单元，确定单元和自动对焦机构控制单元检测到的图案表面高度信号来关注检查样本的机构。当确定单元确定图案表面高度测量位置位于检查区域内时，自动聚焦机构控制单元驱动自动聚焦机构，并且确定单元确定图案表面高度测量位置不位于检查区域内，自动对焦机构控制单元停止自动对焦机构。

6. 发明授权

US5642373A Monolithic semiconductor laser array of radially disposed lasers 失效
标题翻译：放射性配置激光器的单片半导体激光器阵列
公开(公告)号：US5642373A
公开(公告)日：1997-06-24
申请号：US550119
申请日：1995-10-30
申请人： Takeshi Kamizato , Ryoichi Hirano
发明人： Takeshi Kamizato , Ryoichi Hirano
IPC分类号： H01S3/08 , H01S5/00 , H01S5/022 , H01S5/042 , H01S5/10 , H01S5/18 , H01S5/42 , H01S3/19
CPC分类号： H01S5/42 , H01L2224/48463 , H01L2224/73265 , H01S5/02292 , H01S5/0422 , H01S5/18 , H01S5/4018 , H01S5/4056
摘要： A monolithic semiconductor laser array includes an insulating substrate, a plurality of semiconductor layers epitaxially grown on the substrate and forming a laser structure, and at least one groove transverse to the substrate extending through the semiconductor layers into the substrate, dividing the semiconductor laser structure into at least two mutually isolated parts. Within each of the isolated parts of the semiconductor laser structure, a first groove includes a side wall transverse to the substrate and forming a first resonator facet of a semiconductor laser. A second groove in each of the parts includes a second side wall transverse to the substrate and opposite the first side wall, forming a second resonator facet of the semiconductor laser in that part. Each second groove also includes a third side wall oblique to the substrate and opposite the second side wall for reflecting light from the respective semiconductor laser so that light from each of the semiconductor lasers is emitted along a common axis transverse to the substrate. The second grooves are arranged radially about a common point on the substrate. The semiconductor lasers may be electrically connected in series to each other.
摘要翻译：单片半导体激光器阵列包括绝缘基板，在基板上外延生长并形成激光结构的多个半导体层以及横跨于基板的至少一个沟槽延伸穿过半导体层进入基板，将半导体激光器结构分成至少两个相互隔离的部分。在半导体激光器结构的每个隔离部分中，第一凹槽包括横向于衬底的侧壁并形成半导体激光器的第一谐振器面。每个部件中的第二凹槽包括横向于基板并与第一侧壁相对的第二侧壁，在该部分中形成半导体激光器的第二谐振器面。每个第二凹槽还包括与基板倾斜并与第二侧壁相对的第三侧壁，用于反射来自各个半导体激光器的光，使得来自每个半导体激光器的光沿着与基板横向的共同轴线发射。第二槽围绕基板上的公共点径向地布置。半导体激光器可以彼此串联电连接。

7. 发明授权

US5442445A Registration method and apparatus therefor 失效
标题翻译：注册方法及其设备
公开(公告)号：US5442445A
公开(公告)日：1995-08-15
申请号：US173879
申请日：1993-12-27
申请人： Kyoichi Tatsuno , Toshiya Umeda , Ryoichi Hirano
发明人： Kyoichi Tatsuno , Toshiya Umeda , Ryoichi Hirano
IPC分类号： G02B27/42 , B23Q15/24 , G03F9/00 , H01L21/027 , H01L21/30 , G01B11/00
CPC分类号： G03F9/7088 , B23Q15/24
摘要： A registration system for registering a target registration object with respect to a predetermined reference position by using a registration mark formed on the target registration object includes the intensity measurement step of receiving a mark image for a predetermined period of time by a storage type sensor while an area of the target registration object which includes the mark is illuminated, the storage type sensor having elements whose positional relationship is known with respect to the mark image, the process of obtaining a center position of the mark image on the storage type sensor in a positioning direction in accordance with outputs from the elements of the storage type sensor obtained in the intensity measurement step, the distance calculation step of calculating a distance between the reference position and the center position obtained by the process, and the moving step of moving the target registration object by a distance corresponding to the distance obtained in the distance calculation step.
摘要翻译：用于通过使用形成在目标登记对象上的登记标记来登记目标登记对象的登录系统包括：强度测量步骤，通过存储型传感器接收一段时间的标记图像; 包含标记的目标登记对象的区域被照亮，存储型传感器具有相对于标记图像的位置关系已知的元素，在定位中获取存储型传感器上的标记图像的中心位置的处理根据在强度测量步骤中获得的存储型传感器的元件的输出，计算基准位置与通过处理获得的中心位置之间的距离的距离计算步骤，以及移动目标登记对象距离对应于获得的距离距离计算步骤

8. 发明授权

US5100234A Method and apparatus for aligning two objects, and method and apparatus for providing a desired gap between two objects 失效
标题翻译：用于对准两个对象的方法和装置，以及用于在两个对象之间提供所希望的差距的方法和装置
公开(公告)号：US5100234A
公开(公告)日：1992-03-31
申请号：US538186
申请日：1990-06-13
申请人： Yoriyuki Ishibashi , Ryoichi Hirano , Kyoji Yamashita
发明人： Yoriyuki Ishibashi , Ryoichi Hirano , Kyoji Yamashita
IPC分类号： G03F9/00
CPC分类号： G03F9/7049 , G03F9/7023
摘要： A first diffraction grating is formed on a mask, and a second diffraction grating is formed on a wafer. Two light beams having slightly different frequencies interfere with each other and are diffracted as they travel through the first diffraction grating, are reflected by the second diffraction grating, and again pass through the first diffraction grating. As a result, they change into thrice diffracted light beams. The diffracted light beams are combined into a detection light beam which has a phase shift .phi..sub.A representing the displacement between the wafer and the mask, or a phase shift .phi..sub.G representing the gap between the wafer and the mask. The detection light beam is converted into a detection signal. The phase difference between the detection signal and a reference signal having no phase shifts are calculated, thus determining phase shift .phi..sub.A or .phi..sub.G. The displacement or the gap is determined from the phase shift. In accordance with the displacement or the gap, the wafer and the mask are aligned to each other, or the gap between them is adjusted to a desired value. Since the detection signal is generated from diffracted light beams, its S/N ratio is sufficiently great. Therefore, the displacement or the gap is determined with high precision. In addition, it is possible with the invention to perform the aligning of the wafer and the mask and the adjusting of the gap therebetween, simultaneously. Further, the incident light may be either circularly polarized light or non-polarized light.

9. 发明授权

US07036980B2 Apparatus and method for forming pattern 有权
标题翻译：用于形成图案的装置和方法
公开(公告)号：US07036980B2
公开(公告)日：2006-05-02
申请号：US10329514
申请日：2002-12-27
申请人： Ryoichi Hirano , Satoshi Imura , Noriaki Nakayamada
发明人： Ryoichi Hirano , Satoshi Imura , Noriaki Nakayamada
IPC分类号： G01K13/12 , G01K1/16
CPC分类号： B82Y10/00 , B82Y40/00 , G03F1/78 , H01J37/3174 , H01J2237/2001 , H01J2237/304 , Y10S430/143
摘要： A pattern forming apparatus includes a drawing chamber having a drawing substrate on which an original pattern is drawn, a first temperature control unit having a first temperature regulator to make the temperature of the drawing chamber constant, and a constant-temperature member arranged near the drawing substrate. The pattern forming apparatus further includes a second temperature control unit having a second temperature regulator. The second temperature control unit is configured to control the set temperature of the constant-temperature member independently such that the temperature of the drawing substrate becomes substantially constant when the original pattern is drawn.
摘要翻译：图案形成装置包括具有绘制原始图案的绘图基板的拉伸室，具有使拉伸室的温度恒定的第一温度调节器的第一温度控制单元和布置在图中的恒温部件基质。图案形成装置还包括具有第二温度调节器的第二温度控制单元。第二温度控制单元被配置为独立地控制恒温部件的设定温度，使得当拉制原始图案时拉伸基板的温度基本上恒定。

10. 发明授权

US06182369B2 Pattern forming apparatus 失效
标题翻译：图案形成装置
公开(公告)号：US06182369B2
公开(公告)日：2001-02-06
申请号：US09038038
申请日：1998-03-11
申请人： Ryoichi Hirano , Shusuke Yoshitake , Kazuto Matsuki , Toru Tojo
发明人： Ryoichi Hirano , Shusuke Yoshitake , Kazuto Matsuki , Toru Tojo
IPC分类号： G01B5004
CPC分类号： G03F7/70383 , G03F7/70433 , H01J37/3023 , H01J2237/30461 , H01J2237/31764
摘要： A pattern forming apparatus comprising a sample base for positioning a sample on the base and moving a drawing position of the sample, a position measuring unit for measuring a position of the sample base, a correcting unit for mutually independently correcting drawing positions at those respective areas into which a whole drawing section of the sample is divided, the drawing position being calculated by the position measuring unit at the respective area, and a drawing unit for drawing a pattern on the sample on the basis of the position of the sample base measured by the position measuring unit and drawing position of the respective area corrected by the correcting unit.
摘要翻译：一种图案形成装置，包括用于将样本定位在基座上并移动样本的绘制位置的样本基座，用于测量样本基座的位置的位置测量单元，用于相互独立地校正各个区域的绘制位置的校正单元样本的整个绘图部分被划分成，绘图位置由各个区域的位置测量单元计算，以及绘图单元，用于根据样本的位置根据由位置测量单元和由校正单元校正的各个区域的绘图位置。

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